Journal of Luminescence 132 (2012) 1–5 Contents lists available at ScienceDirect Journal of Luminescence journal homepage: www.elsevier.com/locate/jlumin A very simple method of constructing efficient inverted top-emitting organic light-emitting diode based on Ag/Al bilayer reflective cathode Xiao-Wen Zhang a,b,c,n, Hua-Ping Lin b, Jun Li b, Liang Zhang b, Bin Wei b, Xue-Yin Jiang b, Zhi-Lin Zhang b a School of Materials Science and Engineering, Guilin University of Electronic Technology, 1 Jinji Road, Guilin 541004, People’s Republic of China Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, People’s Republic of China c Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, People’s Republic of China b a r t i c l e i n f o abstract Article history: Received 12 February 2011 Received in revised form 3 July 2011 Accepted 7 July 2011 Available online 26 July 2011 A comparative study on top-emitting organic light-emitting diodes (TOLEDs) with normal and inverted structures is briefly investigated. In comparison with the normal TOLED having Ag reflective anode, the inverted device with monolayer Al reflective cathode shows low efficiency as a result of lower reflectance of Al and inferior electron injection. Using Ag/Al bilayer reflective cathode is demonstrated to be a simple and effective method of enhancing efficiency in inverted TOLED. With tris(8-hydroquinoline) aluminum (Alq3) as emitter the luminous efficiency reaches 5.9 7 0.6 cd/A, which is much higher than those of the corresponding normal TOLED ( 5.1 cd/A) and inverted TOLED with monolayer Al reflective cathode ( 4 cd/A). The improved performance is attributed to the enhanced reflectance and significant microcavity effect. The electron-injection barrier height of 0.1 eV from Al to Alq3 via an ultrathin LiF is estimated in the tunneling process for both normal and inverted devices. & 2011 Elsevier B.V. All rights reserved. Keywords: OLED Top emitting Inverted structure Microcavity Electron injection 1. Introduction Organic light-emitting diodes (OLEDs) have been heavily studied in the recent years because of their promising applications to high-resolution full-color displays and solid state lightings. In comparison with conventional bottom-emitting OLED (BOLED), top-emitting OLED (TOLED) is considered to hold many advantages for constructing superior active matrix (AM) OLED displays due to its enhanced light outcoupling, large aperture ratio and ease of fabrication on thin-film transistor (TFT) backplanes. Although the availability of both n- and p-type TFTs in commercial AM OLED products is demonstrated, there is a growing interest in developing the n-TFT for its superior performance and feasible fabrication [1–3]. In addition the combination of n-TFT with inverted TOLED (ITOLED) having bottom cathode is regarded to be ideal in AM OLED displays as the drain line of n-TFT can be directly connected with the bottom cathode of ITOLED, which considerably decreases driving voltage and improves electrical stability. A major challenge to ITOLED is the fabrication of bottom cathode with high reflectance and efficient electron-injection ability. The most widely used electrodes such as Al, Ag and n Corresponding author at: School of Materials Science and Engineering, Guilin University of Electronic Technology, 1 Jinji Road, Guilin 541004, People’s Republic of China. Tel.: þ 86 773 2291179; fax: þ 86 773 2290129. E-mail address: [email protected] (X.-W. Zhang). 0022-2313/$ - see front matter & 2011 Elsevier B.V. All rights reserved. doi:10.1016/j.jlumin.2011.07.010 indium–tin oxide (ITO) possess high work function, which deteriorates electron-injection ability. Methods considered to circumvent such a challenging task are mainly focused on the following aspects: (i) incorporating low work function metals of Mg [3–5] or Sm [6]; (ii) using Li or Cs (or Cs-based compounds) doped electron-transport layer (e.g., BPhen:Li [7–9], BPhen:Cs [10], BPhen:Cs2O [3,9] and Alq3:CsOH [11]); (iii) inserting metal oxides such as TiO2 [12], ZnO [2], MgO [13,14] and PbO [15] as electroninjection layer and (iv) Using superior organic electron-injection and transport materials [1,16]. However the active metals are easily oxidized and cause diffusion in organic layers, which results in operation instability [17]. Metal oxides usually possess high evaporation temperature and thereby complicating fabrication process. Fortunately, it is well demonstrated that Al/LiF cathode, the most widely used contact in OLEDs with normal architecture, still works efficiently in ITOLEDs [18–20]. On the other hand, some common hole-injection materials incorporated with ultrathin metals such as WO3/Ag [1], MoO3/Ag [15,20], [F4-TCNQ:m-MTDATA]/Au [8], O2-plasma-treated CuPc/Au [18] and MoO3/C60/Al [19] are proven to be effective semitransparent anodes in ITOLEDs. To investigate the differences and performances improvement of TOLEDs with normal and inverted structures, in this study, we first carried out a brief comparative study on normal and inverted devices using a conventional Ag (or Al) reflective electrode and LiF electron-injection layer, since LiF/Al is the most widely used contact in OLEDs and practically applied in mass production. 2 X.-W. Zhang et al. / Journal of Luminescence 132 (2012) 1–5 Fig. 1. Schematic structures of TOLEDs with (a) normal and (b) inverted structures and (c) BOLED. Second we proposed a very simple method of constructing efficient ITOLED using Ag/Al bilayer reflective cathode and LiF electron-injection layer, suggesting a potential application in AM OLED displays. Lastly, we estimated the electron-injection barrier-heights ( 0.1 eV) from Al to tris(8-hydroquinoline) aluminum (Alq3) via ultrathin LiF in the tunneling process for both normal and inverted devices. Lambertian distribution) vs. current density characteristics of these devices are depicted in Fig. 2. It is clear that the maximum luminous efficiency ( 3.3 cd/A) of Device B is much lower than that ( 5.1 cd/A) of Device A. The poor performance of Device B may be related to the following three factors: (i) the carrier recombination and emitting zone (i.e., the position of the emitting layer in the cavity) is located towards the reflective cathode, which results in weak enhancement of antinode resonance [21]; (ii) inefficient electron-injection ability from reflective Al cathode, because the deposition sequence of Alq3–LiF–Al plays a significant role in electron-injection characteristics, i.e, the electron-injection ability from Al to Alq3 in inverted architecture is inferior to that of the normal architecture and (iii) low reflectivity of Al cathode (will be discussed later). It can also be seen that the luminous and power efficiencies of both TOLEDs (Devices A and B) are higher than those of the corresponding BOLED at the same current densities (Fig. 2). This is due to the fact that the microcavity effect in TOLED promotes light outcoupling [22]. Moreover, the driving voltage of Device C is much higher than those of TOLEDs (Fig. 3). This results from the higher sheet resistance of ITO, which is about one order of magnitude higher than those of Ag or Al electrode. The higher driving voltage also leads to lower power efficiency in Device C, as shown in Fig. 2(b). 2. Experimental details The BOLED and TOLEDs with normal and inverted structures, as shown in Fig. 1, were fabricated by thermal evaporation under a vacuum of 3 10–4 Pa. All devices were fabricated on glass substrates subjected to routine chemical cleaning. Here, the ultrathin MoOx and LiF layers served as hole-injection layer and electron-injection layer, respectively. The organic bilayer structure consists of N,N0 -bis(naphthalen-1-yl)-N,N0 -bis(phenyl) benzidine (NPB) as the hole-transport layer and Alq3 as the emitting and electron-transport layer. MoOx/Ag served as the semitransparent anode of ITOLEDs. The layer thickness and deposition rate ( 1 Å/s for organic materials) was monitored in situ using an oscillating quartz thickness monitor. The active area of devices was 5 5 mm2. The current density– voltage–luminance (J–V–L) characteristics were measured using a computer controlled programmable Keithley 2400 Source Meter and a Minolta LS-110 Luminance Meter. The electroluminescence (EL) spectra and 1931 Commission Internationale d’Eclairage (CIE) color coordinates were measured with a PR-650 Spectra Scan. 3. Results and discussion To investigate the effect of device structures on performances, two types of TOLEDs with normal and inverted structures were constructed as follows. Device A (normal structure): Ag (100 nm)/MoOx (2 nm)/NPB (58 nm)/Alq3 (50 nm)/LiF (0.5 nm)/Al (2 nm)/Ag (18 nm). Device B (inverted structure): Al (100 nm)/LiF (0.5 nm)/Alq3 (50 nm)/NPB (58 nm)/MoOx (2 nm)/Ag (20 nm). The BOLED (Device C) with a structure of ITO/MoOx (2 nm)/ NPB (58 nm)/Alq3 (50 nm)/LiF (0.5 nm)/Al (100 nm) was also fabricated for comparison. It is well established that efficient electron injection works only for an Al cathode in OLED with an electron-injection layer of LiF and an electron-transport layer of Alq3. Consequently, Al is selected as the reflective cathode in Device B. The luminous efficiency and power efficiency (assuming Fig. 2. (a) Luminous efficiency vs. current density characteristics and (b) power efficiency vs. current density characteristics of Devices A–D. X.-W. Zhang et al. / Journal of Luminescence 132 (2012) 1–5 Fig. 3. J–V characteristics of Devices A–D. 3 of NPB thickness alteration on hole transport can be neglected. We optimized the NPB thickness to 69 nm and fabricated Device D with a structure of Al (100 nm)/LiF (0.5 nm)/Alq3 (50 nm)/NPB (69 nm)/MoOx (2 nm)/Ag (20 nm). The performances of Device D are also incorporated in Figs. 2 and 3 for comparison, while the EL spectra at different viewing angles are shown in Fig. 4(b). It is obvious that the efficiencies of Device D were enhanced with increasing NPB thickness as compared with those of Device B (Fig. 2). This shows the same characteristics as reported in other literatures, i.e., the TOLED shows higher efficiency when the resonant emission was adjusted to 540 nm for green emitters [24]. However, the efficiencies ( 4.1 cd/A and 1.6 lm/W) of Device D are still lower than those ( 5.1 cd/A and 2.9 lm/W) of Device A. In TOLED, it is well established that, besides the reflectance and transmittance of the semitransparent electrode, the reflectivity of reflective bottom contact also plays a crucial role in tuning the microcavity effect. We calculated the reflectivity from organic stacks with a refractive index of 1.75 into Ag (or Al) by a transfer matrix method [25]. The results (Fig. 5) indicate that Al shows much lower reflectance spectra compared with Ag within the range 450–700 nm. The lower reflectance of Al results in inferior performance of ITOLED as a result of reduced multiplebeam and wide-angle interferences within the cavity [26]. It is also noted that the EL spectra of all TOLEDs (Devices A, B and D) show considerable blueshift with increasing viewing angles off the surface normal (Fig. 4) as a result of microcavity effect [26]. To take advantage of high reflectance of Ag and without sacrificing the electron-injection ability of Al in inverted architecture, we develop a bilayer reflective cathode of Ag/Al for ITOLED with an effort to improve device performances. An ITOLED (Device E) having a structure of Ag (100 nm)/Al (2 nm)/LiF (0.5 nm)/Alq3 (50 nm)/NPB (58 nm)/MoOx (2 nm)/Ag (20 nm) was fabricated. The luminous efficiency of Device E compared with Device A is shown in Fig. 6. The figure shows that the ITOLED using Ag/Al bilayer reflective cathode shows improved luminous efficiency of 5.970.6 cd/A, which is much higher than those of the normal TOLED ( 5.1 cd/A) and the ITOLEDs with monolayer Al reflective cathode ( 4 cd/A). This indicates that using bilayer Ag/Al reflective cathode is a promising easy-to-do method for constructing efficient ITOLED, suggesting a potential application in AM OLED displays. The improved performance of Device E is obviously attributed to the enhanced reflectance and appropriate electron-injection ability. Fig. 4. EL spectra of (a) Devices A–B and (b) Device D at viewing angles of 01, 301 and 601 off the surface normal. In addition, the resonant emission peaks of Devices A and B show considerable differences [Fig. 4(a)]. This can be explained by the differences in phase changes of reflective Ag and Al, which alters the total optical length of the cavity [23]. To adjust the EL peak of ITOLED at 540 nm (the same as the EL peak of Device A), we altered the NPB thickness. Taking into account that the typical hole mobility in NPB is about two orders of magnitude higher than the electron mobility in electron-transport material Alq3, the effect Fig.5. Calculated reflective spectra of Ag and Al from organic stacks with a refractive index of 1.75. 4 X.-W. Zhang et al. / Journal of Luminescence 132 (2012) 1–5 Fig. 6. Luminous efficiency vs. current density characteristics of Device E compared with Device A. Inset: J–V characteristics. To verify the differences in electron-injection ability of devices with normal and inverted structures, we fabricated a series of ‘Electron-only’ devices having the following structures Cell E1: Al (100 nm)/BPhen (19.5 nm)/Alq3 (80 nm)/LiF (0.5 nm)/Al (100 nm). Cell E2: Al (100 nm)/LiF (0.5 nm)/Alq3 (80 nm)/BPhen (19.5 nm)/Al (100 nm). Cell E3: Ag (100 nm)/Al (2 nm)/LiF (0.5 nm)/Alq3 (80 nm)/ BPhen (19.5 nm)/Al (100 nm). Here, 4,7-diphenyl-1,10-phenanthroline (BPhen) served as a holeblocking layer. The J–V characteristics of these devices are compared in Fig. 7(a). It is clear that the inverted cell (Cells E2 and E3) shows much lower current density in comparison with the normal cell (Cell E1) at the same voltage. This indicates inferior electron-injection ability from Al to Alq3 in inverted architecture as compared with the normal architecture. This also verifies the fact that the deposition sequence of Alq3–LiF–Al has large effect on electron-injection characteristics. The inferior electron-injection, to a certain extent, explained the fact that ITOLED (Devices B and D) shows lower efficiency in comparison with the normal device (Device A). It can also be found that the J–V characteristics of these ‘only’ devices are controlled dominantly by the Fowler–Nordheim (F–N) tunneling process in high electric field, which gives the current density as [27,28] " # q3 F 2 4 2m 1=2 F3=2 J¼ exp ð1Þ 3 _2 4_F qF Here J is the current density, F is the electric filed, _ is the reduced Planck constant, ^ is the zero-field barrier height and m is the mass of the free electron. We replot the data [Fig. 7(a)] of Cells E1–E3 as log(J/F2) vs. F 1 [Fig. 7(b)]. An explicit linear dependence of log(J/F2) on F 1 in high electric field is observed in these devices, suggesting a tunneling process [28]. From the slopes of the straight lines, the electron-injection barrier heights are estimated at ^ ¼0.11, 0.10 and 0.097 eV for Cell E1, E2 and E3, respectively. The calculated barrier height (0.11 eV) for Alq3/LiF/ Al structure is in good agreement with the measured result (0.1 eV) using ultraviolet photoelectron spectroscopy (UPS) by Mori et al. [29], suggesting that our calculation is feasible and Fig. 7. (a) J–V characteristics of ‘Electron-only’ devices. (b) The F–N plots of log(J/F2) as a function of 1/F for J–V data as shown in (a). The barrier heights of electron injection are derived from the slopes of the fitted lines delineated in the figure. valid. On the other hand, the electric field of triggering tunneling process in Cells E2 and E3 is much higher than in Cell E1. This clearly elucidates that the electron-injection ability in inverted structure is inferior to that in the normal structure. As a whole the electron injection from Al to Alq3 layer via an ultrathin LiF interlayer is mostly controlled by the tunneling process in high electric field for both normal and inverted structures, although the inferior electron-injection ability in inverted structure is observed. 4. Conclusions In comparison with the normal TOLED having Ag reflective anode, the ITOLED with monolayer Al reflective cathode showed lower efficiency as a result of inferior electron injection and lower reflectance of Al. The Ag/Al bilayer reflective cathode was proven to be a simple and efficient method of improving ITOLED performance. With Alq3 as emitter the luminous efficiency of ITOLED having Ag/Al bilayer reflective cathode reached 5.970.6 cd/A, which is much higher than those of normal TOLED ( 5.1 cd/A) and ITOLED having monolayer Al reflective cathode ( 4 cd/A). The electron-injection barrier height from Al to Alq3 via LiF interlayer was estimated to be 0.1 eV in the tunneling process for both normal and inverted devices. X.-W. Zhang et al. / Journal of Luminescence 132 (2012) 1–5 Acknowledgments The authors would like to acknowledge the financial support given by the National Natural Science Foundation of China (60777018, 60776040, 61077013) and 863 Project (2008AA03A336). References [1] C. Yun, H. Cho, H. Kang, Y.M. Lee, Y. Park, S. Yoo, Appl. Phys. Lett. 95 (2009) 053301. [2] H. Lee, I. Park, J. Kwak, D.Y. Yoon, C. Lee, Appl. Phys. Lett. 96 (2010) 153306. [3] T.Y. Chu, J.F. Chen, S.Y. Chen, C.J. Chen, C.H. Chen, Appl. Phys. Lett. 89 (2006) 053503. [4] T.Y. Chu, S.Y. Chen, J.F. Chen, C.H. Chen, Jpn. J. Appl. Phys. 45 (Part 1) (2006) 4948. [5] T. Dobbertin, M. Kroeger, D. Heithecker, D. Schneider, D. Metzdorf, H. Neuner, E. Becker, H.H. Johannes, W. Kowalsky, Appl. Phys. Lett. 82 (2003) 284. [6] W.Q. Zhao, G.Z. Ran, W.J. Xu, G.G. Qin, J. Phys. D 41 (2008) 035106. [7] J. Meyer, T. Winkler, S. Hamwi, S. Schmale, H.H. Johannes, T. Weimann, P. Hinze, W. Kowlasky, T. Riedl, Adv. Mater. 20 (2008) 3839. [8] X. Zhou, M. Pfeiffer, J.S. Huang, J.B.- Nimoth, D.S. Qin, A. Werner, J. Drechsel, B. Maennig, K. Leo, Appl. Phys. Lett. 81 (2002) 922. [9] S.Y. Chen, T.Y. Chu, J.F. Chen, C.Y. Su, C.H. Chen, Appl. Phys. Lett. 89 (2006) 053518. [10] M. Thomschke, R. Nitsche, M. Furno, K. Leo, Appl. Phys. Lett. 94 (2009) 083303. 5 [11] T. Xiong, F. Wang, X. Qiao, D. Ma, Appl. Phys. Lett. 92 (2008) 263305. [12] H.J. Bolink, E. Coronado, D. Repetto, M. Sessolo, E.M. Barea, J. Bisquert, G.G.- Belmonte, J. Prochazka, L. Kavan, Adv. Funct. Mater. 18 (2008) 145. [13] H.W. Choi, S.Y. Kim, W.K. Kim, J.L. Lee, Appl. Phys. Lett. 87 (2005) 082102. [14] H.W. Choi, S.Y. Kim, W.K. Kim, K. Hong, J.L. Lee, J. Appl. Phys. 100 (2006) 064106. [15] Q. Wang, Z. Deng, D. Ma, Opt. Express 17 (2009) 17269. [16] L. Hou, F. Huang, W. Zeng, J. Peng, Y. Cao, Appl. Phys. Lett. 87 (2005) 153509. [17] B.W. D’Andrade, S.R. Forrest, A.B. Chwang, Appl. Phys. Lett. 83 (2003) 3858. [18] K. Hong, K. Kim, J.L. Lee, Appl. Phys. Lett. 95 (2009) 213307. [19] J. Hou, J. Wu, Z. Xie, L. Wang, Appl. Phys. Lett. 95 (2009) 203508. [20] Q. Wang, Z. Deng, J. Chen, D. Ma, Opt. Lett. 35 (2010) 462. [21] C.L. Lin, T.Y. Cho, C.H. Chang, C.C. Wu, Appl. Phys. Lett. 88 (2006) 081114. [22] R.H. Jordan, L.J. Rothberg, A. Dodabalapur, R.E. Slusher, Appl. Phys. Lett. 69 (1996) 1997. [23] H. Becker, S.E. Burns, N. Tessler, R.H. Friend, J. Appl. Phys. 81 (1997) 2825. [24] C.C. Liu, S.H. Liu, K.C. Tien, M.H. Hsu, H.W. Chang, C.K. Chang, C.J. Yang, C.C. Wu, Appl. Phys. Lett. 94 (2009) 103302. [25] M. Born, E. Wolf, Principles of Optics, 7th edition, Cambridge University Press, 1999. [26] X.W. Zhang, J. Li, L. Zhang, X.Y. Jiang, K. Haq, W.Q. Zhu, Z.L. Zhang, Thin Solid Films 518 (2010) 1756. [27] N. Huby, L. Hirsch, G. Wantz, L. Vignau, A.S. Barrie re, J.P. Parneix, L. Aubouy, P. Gerbier, J. Appl. Phys. 99 (2006) 084907. [28] I.D. Parker, J. Appl. Phys. 75 (1994) 1656. [29] T. Mori, H. Fujikawa, S. Tokito, Y. Taga, Appl. Phys. Lett. 73 (1998) 2763.
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