RF Atom Source for Atomic Oxygen and Atomic
Nitrogen
Instrument Concept
At a Glance
RF Atom Source for atomic oxygen and atomic
nitrogen
Minimized power losses due to optimized design
Discharge zone is manufactured from highquality materials ensuring a minimal
contamination of the beam
Zero-ion current configuration as standard
The growth of high-quality compound materials ideally
require neutral, atomic species. Whereas molecular
gases such as oxygen or nitrogen have shown to orders
of magnitude less reactive than if dissociated into atomic
form.
Therefore oxide formation using molecular oxygen
typically requires highly elevated temperatures and/or
extended oxidation periods, while molecular nitrogen
shows almost no reactivity for many materials.
Thus the dissociated species are increasing the reactivity
by many orders of magnitude and therefore allows oxides
or nitrides to be grown at low pressure and at reasonable
substrate temperatures.
However, ionic species generated in plasma processes
tend to be energetic and possibly create point defects. On
the other hand, atomic species carry negligible kinetic
energy and therefore allow rapid film growth without
generating defects.
© scientaomicron 2017
http://www.scientaomicron.com/products/330/989/449
2017-07-31 - Page 1 of 2
Plasma Source (Nitrogen / Oxygen)
2017-07-31 - Page 2 of 2
List of figures
At a Glance
© scientaomicron 2017
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