RTP Crystal Based EO Cell for 1030 nm PN: R-H-Y-32-34-30-1030

RTP Crystal Based EO Cell for 1030 nm
PN: R-H-Y-32-34-30-1030
Housed RTP EO Cells assembly in a thermally compensated double-crystal configuration, in
which two matched crystals are placed in line of the propagation axis (X or Y) with one rotated
by 90 degrees.
Common Applications
RTP EO Features
Q Switches | Pulse Pickers
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Phase Modulators | Amplitude Modulators
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Cavity Dumpers | Shutters
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Attenuators & Deflectors
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Low half-wave voltage for EO Cells to enable a
compact design
Rise time, fall time, and pulse width of 1 ns to
enable fast operation
Designed to operate over wide temperature
range (-50°C to 70°C)
High laser-induced damage threshold (up to
1000 MW/cm2, at 1064 nm, 10 ns pulse)
Minimal ringing, compatible for 1 MHz
repetition rate
Non-hygroscopic, easy handling, no cover
needed
The best material in the spectral range of 5003000 nm for electro-optics applications
Very low absorption losses at 1064 nm
wavelength
Extremely high homogeneity: up to 15*15mm
EO cells as a standard size
Product specifications:
General
Material
Diameter of clear aperture (CA ), mm
The thermo – compensated EO Cell based
on two RTP elements
Single domain flux grown, Y - cut RTP
(Rubidium titanyl phosphate - RbTiOPO4) crystal
Housed Matched Pair assembly 4*4*5.3(*2) mm
> 3.0, centered
Wavefront distortion
< λ/4 over CA as viewed
in a single pass interferometer at 633 nm
Scratch/dig
< 10/5 (laser finish )
Capacitance, pF
4-6
Coating
AR /AR @ 1015 - 1045 nm, R < 0.15 % @ 1015 - 1045 nm
Optical transmittance, %
> 98.5 @ 1030 nm, single-pass
Damage threshold
> 600 MW/cm²@1064nm, 10 ns pulse, 10 Hz
EO Cell Housing diameter, mm
35 (± 0.1 )
EO Cell Housing length, mm
34 (± 0.25 )
Extinction ratio, dB
> 30 in CA, @ 1030 nm tested by angular adjustment, ±1°
Static quarter wave voltage, V
1250 ± 200 V @ 1030 nm
Wedged windows
W2-LW-30MRAD-0512-UV (CVI)