PROJECT RESULT
Technology platform
for next-generation
core CMOS process
2T102: High yield driven manufacturing excellence
in sub 65nm CMOS (HYMNE)
Improvements in
manufacturing science
show way ahead for
European chipmakers
E
uropean semiconductor fabrication plants
chipmakers. The main actors were the then
– or ‘fabs’ – face tough competition from
members of the Crolles 2 Alliance –
giant chip foundries in the Far East. Asia can
STMicroelectronics and NXP Semiconductors
achieve major economies of scale in manufac-
– in France, together with NXP in the
ture and also introduce new processes very
Netherlands, STMicroelectronics in Italy and
quickly as they have much material to help
Atmel in France. The end of the Crolles 2
way sub-65 nm CMOS chips
them learn about the yield detractors and
Alliance in 2007 could have affected success,
are processed. This has been
process issues involved.
but the consortium made a big effort to
achieved by optimising
Europe needs to rely on methods and tools
adapt.
that compensate for the economies of scale in
Other partners were universities and institutes
the Asian foundries. This requires Europe to
providing theoretical approaches to the prob-
become expert at the top level of manufactur-
lems involved. CMP-GC focused on manufac-
ing science.
turing scheduling, while CEA-LETI was involved
The MEDEA+ HYMNE
project has boosted the
competitiveness of European
chipmakers and their
suppliers by improving the
process control and
improving the knowledge of
yield detractors and possible
recovery actions. The success
of the project has made it
in methods for characterisation and control-
Introducing new processes fast
ling in-line contamination.
The consortium included equipment sup­
possible for European
For Europe to stay competitive, chipmakers
pliers, mainly small and medium-sized enter-
chipmakers to face the
must introduce new processes quickly with
prises making characterisation and contamin­
competition from the giant
smaller quantities of product to analyse. The
ation-monitoring equipment. It was crucial for
Asian foundries, enabled
MEDEA+ 2T102 HYMNE project achieved faster
them to develop new tools and new methods
yield learning by developing new tools and
to use existing tools to move from off-line to
methods for fabs. This has resulted in shorter
in-line use. Finally, solution providers devel-
equipment suppliers to widen
their portfolio of methods
cycle times, faster yield stabilisation and more
oped statistical algorithms and software proto-
and tools to meet worldwide
efficient approaches to optimise processing
types to support the introduction of new pro-
demand, and allowed the
and control in-line contamination.
duction and process-control methods.
establishment of a European
HYMNE focused on shortening the learning
expert network in
manufacturing science.
curve for sub-65 nm processes currently com-
Improving working processes
ing into production. This concerned pure
manufacturing science dedicated to the most
Chipmakers gained much in terms of manag-
advanced CMOS technologies but not linked
ing the working process. This involved opti-
directly to final products.
mising fab loading without affecting work-
HYMNE involved several major European
ing processes or the cycle times with a wide
mix of products – prototypes with very
demic partners have become recognised
short cycle times and standard production
actors on the worldwide scene – for example,
in the same line.
the CMP-GC laboratory is appreciated as a
Much effort was spent on redesigning dis-
point of expertise at global level in manufac-
patching strategies and batch optimisation.
turing science.
These strategies are already being applied
During the four years of the project, more
on the different lines involved. New
than 85 publications related to HYMNE work
approaches were developed in advanced
have been accepted in international confer-
process control (APC) – such as in the way
ences or published in technical reviews.
Technology platform
for next-generation
core CMOS process
2T102: High yield driven
manufacturing excellence in sub
65nm CMOS (HYMNE)
PARTNERS:
joint efforts by device manufacturers, tech-
proto­type for a series of new projects cru-
nology institutes and suppliers of cleaning
cial to maintaining critical semiconductor
equipment and characterisation equipment.
knowledge and high level manufacturing
It led to a substantial innovation in key char-
skills in Europe
acterisation methods for reliable and fast
The MEDEA+ project was a first step on the
problem solving in sub-90 nm technology, as
road. Further projects are already underway
indicated by the International Technology
or planned that will ideally also involve chip-
Roadmap for Semiconductors (ITRS). To sus-
makers Infineon and possibly Intel Ireland as
tain these methods, several tools were devel-
well as the Fraunhofer institute in Germany.
oped or deeply enhanced and, as a conse-
A key advantage for chipmakers working at
quence, now meet ITRS specifications.
the level of manufacturing science is that
Knowledge was also improved on the effect
intercompany co-operation is easy. Developing
of different contaminants in the line and
a process can lead to problems of intellectual
how to reduce them – leading to a yield
property. In manufacturing science, very
Air Liquide
Alcatel Vacuum Adixen
ALES
Atmel
BEDE Scientific Instruments
CEA-LETI
CMP-GC
ELDIM
FEI
GeMeTec
ION-TOF GmbH
Jobin Yvon
KEMESYS
LTM CNRS
M+W Zander FE
MASA
NETRAL
NXP Semiconductors
PDF Solution SA
R2D
RECIF Technologies
SEZ
SOPRA
STMicroelectronics
40-30
improvement of several percent.
open-minded collaboration is possible.
PROJECT LEADER:
Finally, for other partners – particularly the
In HYMNE, the different companies quickly
SMEs – benefits include proving viability of
appreciate this collaboration and, by the end
François Finck
STMicroelectronics
new solutions in their portfolio that have
of the project, were exchanging solutions
helped enhance competitiveness. The suc-
between the two main fabs involved. A solu-
KEY PROJECT DATES:
cess has helped them gain new markets –
tion was tried on one line, and then moved
some of the solutions have already been sold
to the other. This is what the consortium
to other chipmakers outside the consortium,
hopes to achieve in future projects – and at
including customers in Asia.
the same time to build a network of European
Equally important for Europe is that the aca-
experts in manufacturing science.
batches are controlled to enable merging of
different recipes. Control limits for differ-
Part of continuous process
ent batches have also been standardised for
the various recipes.
HYMNE was something of a first in European
A major achievement is a significant leap in
co-operative research as it focused on manu­
zero-defect and advanced yield learning for
facturing science rather than on design or
sub-90 nm technology processes. This involved
technology. As a result it has become a
Start:
End:
February 2005
January 2009
COUNTRIES INVOLVED:
Austria
France
Germany
Italy
The Netherlands
UK
EUREKA
MEDEA+ Office
140bis, Rue de Rennes
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France
Tel.: +33 1 40 64 45 60
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Email: [email protected]
http://www.medeaplus.org
MEDEA+ !2365 is the industry-driven pan-European
programme for advanced co-operative R&D in
microelectronics to ensure Europe's technological and
industrial competitiveness in this sector on a worldwide basis.
MEDEA+ focuses on enabling technologies for the
Information Society and aims to make Europe a leader in
system innovation on silicon.