Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
One Kendall Square
Cambridge, MA 02139
T: 617-674-8800
F: 617-674-8850
www.cambridgenanotech.
Cambridge NanoTech Inc.
Document Name: Fiji F202 Factory Acceptance Test
Customer Name: UMASS Lowell
Fiji F200
Date: 13 July 2017
Cambridge NanoTech Inc., 2010
Author: BK
Issue Date: 0100217
Document Status: Approved
1
Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
Processes and Procedures
1. Purpose
This Acceptance document is to be used for Factory as well as when applicable Customer Site
Acceptance of the Fiji Series Atomic Layer Deposition systems.
2. Vacuum Test Results
Item
Base Pressure
Result
Factory Results
Initial and Date
Base pressure BOC
w/o Turbo 1.20E-03
Base pressure WRG
w Turbo 2.38E-05
Customer Site
Initial and Date
MV 3/29/12
Base pressure to be checked at 250C after initial bake out, with 20sccm Ar, plasma gas flow, and
20sccm Ar carrier gas flow.
Item
Time to reach base
pressure
Result
Less than 2 min
Factory Results
Initials and Date
Customer Site
Initials and Date
MV 3/29/12
Method: Start at base pressure, vent with N2 or Ar, open chamber to atmosphere. Results shall be <3
mins, pump down chamber.
Rate
0.
60.
120.
180.
240.
300.
of rise (mTorr)
1.29
2.03
3.03
4.49
5.84
7.36
Cambridge NanoTech Inc., 2010
Author: BK
Issue Date: 0100217
Document Status: Approved
2
Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
3. Heater Functionality Results
Item
Spec
Set
point
Factory
site
Actual
Cust site
Actual
Factory
Result
Cust site
Result
Factory
Results
Initial and
Date
Chuck Heater
Functional
250
250
Yes/ No
Yes/ No
MV 3/29/12
Chamber Wall
Heaters
Functional
250
250
250
250
Yes/ No
Yes/ No
MV 3/29/12
ALD Valve Heater
Functional
150
149
Yes/ No
Yes/ No
MV 3/29/12
Prec. Del. Heater
Functional
150
150
Yes/ No
Yes/ No
MV 3/29/12
Cone Heater
Functional
250
250
Yes/ No
Yes/ No
MV 3/29/12
Prec. Jacket 1
Functional
75
75
Yes/ No
Yes/ No
MV 3/29/12
Prec. Jacket 2
Functional
75
74
Yes/ No
Yes/ No
MV 3/29/12
Prec. Jacket 3
Functional
75
75
Yes/ No
Yes/ No
MV 3/29/12
Customer
Site
Initial and
Date
Check the functionality of all available heaters. The actual temperature should be within 2C of the set
point temperature.
Note: Jalapeño valve heater is either on or off.
Cambridge NanoTech Inc., 2010
Author: BK
Issue Date: 0100217
Document Status: Approved
3
Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
4. ALD Valve Functionality Results
Item
Spec
Factory
Result
Cust. site
Result
ALD Valve 1
Functional
Yes/ No
Yes/ No
MV 3/29/12
ALD Valve 2
Functional
Yes/ No
Yes/ No
MV 3/29/12
ALD Valve 3
Functional
Yes/ No
Yes/ No
MV 3/29/12
ALD Valve 4
Functional
Yes/ No
Yes/ No
MV 3/29/12
Factory Results
Initial and Date
Customer Site
Initial and Date
Check the functionality of all available ALD valves by pulsing each valve. Observe the presence of the
pulse.
MFC Functionality Results
Item
Spec
Set
point
Factory
site
Actual
Cust site
Actual
Factory
Result
Cust site
Result
Factory
Results
Initial and
Date
MFC 1 Ar
Functional
50
49.7
Yes/ No
Yes/ No
MV 3/29/12
MCF 2 Ar plasma
Functional
50
50.4
Yes/ No
Yes/ No
MV 3/29/12
MFC 3 N2 (tested
with Ar
Functional
50
49.8
Yes/ No
Yes/ No
MV 3/29/12
MFC 4 O2
Functional
50
49.7
Yes/ No
Yes/ No
MV 3/29/12
MFC 5 H (tested
with Ag)
Functional
50
49.8
Yes/ No
Yes/ No
MV 3/29/12
Customer
Site
Initial and
Date
Check the flow functionality of all available MFCs by flowing gas from each MFC and verifying it is
within 5% of the set point.
@ 50 sccms
MFC 0 (021782349)
MFC 1 (021782939)
MFC 2 (021783246)
MFC 3 (021783244)
MFC 4 (021783249)
Cambridge NanoTech Inc., 2010
Author: BK
49.7
50.4
49.8
49.7
49.8
Issue Date: 0100217
Document Status: Approved
4
Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
5. Functional Process Test Results
Standard Al2O3 & HfO2 by thermal and plasma on 150mm Si substrates
150mm Si wafer measurements adjusted for native oxide
F200
FAT
Thermal
Plasma
HfO2
Al2O3
F200
CAT
HfO2
Al2O3
Thermal
Plasma
1
2
216.1
172.1
211.1
180.1
1
2
-13
-13
-13
-13
3
4
Thickness (Å)
217.1
208.1
176.1
176.1
3
4
Thickness (Å)
-13
-13
-13
-13
5
227.1
180.1
5
-13
-13
Non-Unif
(1-σ)
GPC
(%)
(Å/cycle)
215.9
3.36%
1.08
176.9
1.89%
0.88
Ave.
Non-Unif
(1-σ)
GPC
(%)
(Å/cycle)
-13
0.00%
-0.07
-13
0.00%
-0.07
Ave.
Note: The thermal HfO2 run above had a higher than normal growth at position 5. This is caused by a
slightly high door purge value. It was corrected prior to the plasma run. Which shows a perfect
value. The results will be rerun at your facility with less than 2% uniformity over the whole wafer.
6. Factory Acceptance and Shipment Authorization
Based on the inspection and test results achieved on the Fiji F200 system the system has met the
conditions for acceptance at the vendor site and/or the customer site.
_________Bob Kane __________________
_______3/29/2012____________
Cambridge NanoTech
Date
__________________________________
____________________________
Customer Representative
Date
7. Customer Site Acceptance Authorization
__________________________________
____________________________
Cambridge NanoTech
Cambridge NanoTech Inc., 2010
Author: BK
Date
Issue Date: 0100217
Document Status: Approved
5
Process Name: Fiji Acceptance Test
Document Number / Version Number: 2011
__________________________________
____________________________
Customer Representative
Cambridge NanoTech Inc., 2010
Author: BK
Date
Issue Date: 0100217
Document Status: Approved
6