Laser-Enabled Directed Nanomanufacturing Costas P. Grigoropoulos Laser Thermal Laboratory Department of Mechanical Engineering University of California, Berkeley This image cannot currently be display ed. U.S.-Korea Nanotechnology Forum October 15, 2013 This image cannot currently be display ed. Topics • Laser nano/micromanufacturing – Laser Chemical Vapor Deposition – Directed growth of nanomaterials • Laser-assisted electronic materials processing and device fabrication – Flexible electronics • Laser interactions with biological materials – Surface patterning for cell growth – Fibrous material scaffolding This image cannot currently be display ed. Nanomachined patterns by femtosecond laser coupled to apertureless near field scanning optical microscope (NSOM) This image cannot currently be display ed. This image cannot currently be display ed. 14 nm 11 nm This image cannot currently be display ed. Chimmalgi et al., Appl. Phys. Lett., (2003) J. Appl. Phys., (2005) Hwang et al., Appl. Phys. A, (2009) This image cannot currently be display ed. Nano-crystallization by apertureless NSOM This image cannot currently be display ed. Chimmalgi, Nano Lett. (2005) This image cannot currently be display ed. In-situ TEM Imaging and NSOM Processing This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. NSOM Probe Superposed laser beams CW + pulsed Transformation of an a-Si dot to a single Si nanocrystal on a non-participating substrate a-Si pillar Xiang et al., Nano Lett. (2012) This image cannot currently be display ed. Alternating Crystal Structure This image cannot currently be display ed. This image cannot currently be display ed. (a) This image cannot currently be display ed. (b) This image cannot currently be display ed. (c) (d) This image cannot currently be display ed. amorphous Poly-crystal Poly-crystal singlecrystal This image cannot currently be display ed. This image cannot currently be display ed. Poly-crystal This image cannot currently be display ed. (e) This image cannot currently be display ed. single crysta l (f) This image cannot currently be display ed. Poly-crystal singlecrystal This image cannot currently be display ed. (g) (h) This image cannot currently be display ed. This image cannot currently be display ed. Laser In-situ TEM Diagnostics & Processing This image cannot currently be display ed. This image cannot currently be display ed. Libra TEM column Libra TEM sample holder Raman probe assy. Laser exciter & sample assy. Fiber coupled signal delivery This image cannot currently be display ed. Libra TEM Raman spectroscope This image cannot currently be display ed. Laser-based Selective Nanowire growth metal nanoparticle catalyzed silicon nanowire growth under VLS mechanism VLS (Vapor-Liquid-Solid) Si nanowire growth Laser Illumination Laser-assisted localized Si nanowire growth setup This image cannot currently be display ed. Localized heating of catalysts & NW growth within laser spot This image cannot currently be display ed. SiH4 gas Au Catalyst 100nm This image cannot currently be display ed. This image cannot currently be display ed. Temperature and time dependent growth of GeNWs This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. On-demand Vertical GeNW Integration on Si(111) Location/shape controlled GeNW on a single Si(111) in vertical integration architecture Plane wave This image cannot currently be display ed. D0 = 65 nm (fixed) D (varied) This image cannot currently be display ed. Ryu et al., ACS Nano (2013) This image cannot currently be display ed. Defect Free Epitaxial Growth of GeNWs on Si (111) This image cannot currently be display ed. Cross sectional HRTEM images of the vertically oriented GeNW on Si (111) This image cannot currently be display ed. Laser hydrothermal Growth of ZnO nanowires This image cannot currently be display ed. In et al., Small (2013) This image cannot currently be display ed. Growth visualization and control This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. Graphene patterning and transferring This image cannot currently be display ed. Yoo et al, Small (2013) This image cannot currently be display ed. Graphene devices This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. Vertically Aligned Carbon Nanotube Transfer on Flexible Substrates Laser Pressure VACNTs Si Glass PC Si Separation Si Si This image cannot currently be display ed. This image cannot currently be display ed. PC CNT 200 µm This image cannot currently be display e This image cannot currently be display ed. In et al., ACS Nano (2012) Beyond graphene Laser annealed MoS2 transistors on plastic This image cannot currently be display ed. Choi, Kwon et al. IMID (2013) This image cannot currently be display ed. Nanopaticle processing for flexible electronics This image cannot currently be display ed. Nano Tech Nanomaterial synthesis & characterization - Low melting temperature - Solution processible This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. LIFT This image cannot currently be display ed. This image cannot currently be display ed. 5nm Low Temperature Flexible Electronics This image cannot currently be display ed. Inkjet Printing Nanoimprinting This image cannot currently be display ed. This image cannot currently be display ed. This image cannot currently be display ed. - Direct patterning (lithography free, maskless) No vacuum deposition, no etching, low T Single step process Solution processible, additive process Direct patterning - Resolution enhancement Laser Tech This image cannot currently be display ed. Digital Direct Metal Patterning (DDMP) Process on a Flexible Substrate This image cannot currently be display ed. This image cannot currently be display ed. Yeo et al., PLOS ONE, (2012) Laser Sintering Examples 532nm wavelength, 70mW, CW laser, 4” wafer size, 2 m/s scanning speed Room temperature, ambient pressure, Non-vacuum process, maskless process This image cannot currently be display ed. This image cannot currently be display ed. High resolution metal features ( total processing time: ~ 7 mins) (down to several microns) 16,000 OFETs on a PI substrate, 3 layered structures (PI substrate/ gate electrode / PVP / source & drain electrodes) ( total processing time: ~ 10 mins) This image cannot currently be display ed. Laser Enabled Wafer scale ZnO Nanoimprinting on Flexible Substrates This image cannot currently be display ed. Master mold PDMS stamp ZnO mesh ZnO on polycarbonate This image cannot currently be display ed. Fiber scaffold fabrication via 2PP (two-photon polymerization) Low N.A. objective High N.A. objective Fiber scaffold fabrication This image cannot currently be display ed. Jeon et al., Biomed. Microdev. (2011) This image cannot currently be display ed. This image cannot currently be display ed. Jeon et al., JACS 133 (2011) Jeon et al., 2011, submitted 2D pitch gradient pattern This image cannot currently be display ed. This image cannot currently be display ed. 2D pitch gradient pattern This image cannot currently be display ed. This image cannot currently be display ed. 3D 2PP nanofabrication examples This image cannot currently be display ed. This image cannot currently be display ed. 25 layer photonic crystal – periodicity of 400nm Multi-scale biomimetic structure This image cannot currently be display ed. LTL Sanghoon Ahn Anant Chimmalgi Taeyul Choi Hirofumi Hidai Kuniaki Hiromatsu Nico Hotz David J. Hwang Jung Bin In Hojeong Jeon Eunpa Kim Moosung Kim Jaden Kwon Seung-Hwan Ko Daeho Lee Ming-Tsang Lee Julian Marschewski Nipun Misra Heng Pan Jongbok Park Patrick Rohner Matt Rogers Ioanna Sakellari Bin Xiang Jae-Hyuck Yoo Acknowledgment Funding DARPA/MTO, DOE, USAF, NSF, NIH, KAUST, industry Collaborators Oscar D. Dubon, Andrew M. Minor, Kevin E. Healy, Junqiao Wu (UCB) Dimos Poulikakos (ETH) Seung-Hwan Ko (KAIST) Maria Farsari (IESL/FORTH, Greece) Sunkook Kim (Kyung Hee U.) Woong Choi (Kookmin U.) Dieter Bäuerle (JKU, Austria) This image cannot currently be display ed.
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