Two Step Ni/Cu Metallization for Commercial c-Si Solar Cells: 1 to 10 Suns Vikrant A. Chaudhari and Chetan S. Solanki* Department of Energy Science and Engineering Indian Institute of Technology Bombay Powai, Mumbai-400076, India Telephone +91-22-25767895, FAX +91-22-25764890, email-: [email protected]* ABSTRACT A new metallization scheme as an alternative to screen printed metallization for crystalline Si (c-Si) solar cells is studied with an objective to reduce the series resistance. The reduction in series resistance of solar cells results in an improved efficiency at one-sun as well as at low concentration levels (less than 10 suns). Commercially processed c-Si solar cells without front contacts are used as a starting point. A new technique of polymer sheet masking and laser engraving is used to open the SixNy antireflective coating (ARC) followed by two step metallization consisting of electrodeposited Ni and Cu for the front contact. The deposited Ni layer on Si substrate is then annealed (to obtain nickel silicide (NiSi)). This is followed by Cu electroplating on the silicide layer. An optimum temperature and time for Ni annealing to obtain NiSi is investigated based on the solar cells parameters such as η, Isc, Voc and FF at one sun. It is observed that the optimum result of the solar cell is obtained for 0 annealing temperature 420 C with efficiency levels within 13-14%. These solar cells are then used to fabricate a low concentrator c-Si solar cell whose performance is tested between the concentration levels of two to four suns.. INTRODUCTION Two step metallization is a technique that has gained interest in recent years [1] and [2]. Solar cells with efficiencies in the range of 16-17 % have been reported using this technique [3] and [4]. Two step metallization involves use of two metal layers on top of each other. Such an arrangement is known to reduce the series resistance of the solar cell. The first metal layer called as the seed layer is a transition metal such as Ni, Ti or W etc. These transition metals are known to form a metal silicide when heated with Si at high temperature. This process reduces the metal semiconductor contact resistivity. In the present paper, study of a Ni/Cu two step metallization using a novel fabrication procedure on the commercial cSi solar cell is investigated. Ni deposition is done in an electro less bath followed by the annealing to obtain the NiSi and then subsequent electroplating with Cu to reduce the metal grid line resistivity. cells are processed with ARC (antireflective coating), p-n junction (sheet resistance in the range of 40 – 50 Ω/square) and back surface field. Low cost polymer sheets are used for patterning the SixNy ARC on which the front contacts are fabricated. The polymer sheet masks the entire area of ARC of solar cell. A laser engraving is done on the polymer mask (covered over the ARC) in order to pattern the grid structure. After engraving, wet chemical etching of ARC is done in a 10% HF (hydrofluoric acid) for one minute. Once the ARC is etched the sample is o immersed in the hot Ni bath operating at 80 C. The Ni bath consists of a nickel salt (NiCl2), reducing agent (NaH2PO2) along with certain complexing agents [5]. A small amount of NH4OH is added to the bath to change the pH of the solution, and also to enhance the deposition rate of Ni. The immersion time for the solar cell in Ni bath is about two – three minutes. After Ni deposition the cell is removed from the bath, washed in D.I (de-ionized) water, cleaned and dried. The Ni plated samples are then annealed in a tube furnace in an Ar atmosphere for 0 various temperatures ranging from 400 to 460 C and for time ranging between 0.5 to 6 minutes. After contact annealing the samples are electroplated with Cu in a CuSO4 bath operating at a constant current at 11.5 2 mA/cm for 120 minutes. The solar cells are then characterized to extract their I-V characteristics and efficiency at one sun. Figure 1 shows the I-V characteristics and the image of the finished Ni/Cu plated 2 solar cell of area 4 × 4 cm . SOLAR CELL FABRICATION 2 Solar cells of area 4 x 4 cm with out front contact are used for Ni/Cu metallization. These half finished solar cells are procured from the commercial production line. The 978-1-4244-5892-9/10/$26.00 ©2010 IEEE Figure 1 I-V curve of Ni/Cu front contact solar cell and Image of the same 001322 RESULTS AND OBSERVATION OF METALLIZATION ON SOLAR CELLS THE Ni/Cu Fully fabricated Ni/Cu front contact solar cells are characterized at one sun under standard test conditions using solar simulator. I-V and P-V curves along with the solar cell parameters are extracted from the illuminated characteristics. An illuminated I-V curve of the Ni/Cu o plated annealed solar cell at 420 C 0.5minute is shown in the figure 1. A solar cell of efficiency 13.2% and FF of about 72.4% is obtained as seen in the figure. From the solar cell analysis it is observed that the annealing temperature is most crucial in determining the performance of the solar cell. An optimum annealing temperature is found out by observing the solar cell o performance within temperatures 400 to 450 C annealed at different times as shown in the figure 2. that Ni-Si system forms a low resistivity NiSi at o temperature higher than 400 C [6]. Cell no 400_0.5 410_0.5 420_0.5 430_0.5 450_0.5 n2 1.45 1.32 1.6 1.75 1.94 2 Jo2 (nA/cm ) 12.5 0.114 6.92 50 123 Table 1 Ideality factor and reverse saturation currents of the solar cells annealed at various temperatures In our case the higher performance of the solar cell is o obtained at temperature 420 C. Contact resistivity measurements on Ni-Si contacts are done using TLM (Transmission Line Model). It is observed that the lowest 2 contact resistivity of about 9 mΩ-cm is achieved for the o samples annealed at 420 C 0.5 minutes. In case of the o samples annealed at 400 and 410 C the contact resistivity 2 is about 12-14 mΩ-cm . This indicates a lower contact o resistivity for the samples annealed at 420 C than at lower time periods. At higher temperatures the contact resistivity is lower but the solar cell performance is lower. From the fully fabricated solar cell the series resistance is estimated using the technique as mentioned by Wolf [7]. Figure 3 shows the series resistance and the contact resistivity measurements for the Ni/Cu front contact solar o cells annealed between the temperatures 400 to 450 C. It is observed that the series resistance reduces with annealing temperature. Figure 2 Efficiencies of the solar cells annealed at various time and temperature It is observed that, as the annealing temperature increases the performance of the solar cells begins to o improve. At 420 C we obtained a maximum efficiency of 13.7%. After which the efficiency begins to reduce drastically. This reduction is due to the diffusion of Ni into the SCR (space charge region) which results in recombination and hence lowers the solar cell performance. Dark I-V characteristics of these solar cells are measured and ideality factor and reverse saturation currents are estimated. It is observed that for the cells o annealed at temperatures higher than 420 C, higher values of ideality factor and reverse saturation currents were observed. This is an indication of Ni diffusion in the space charge region and increased recombination in the junction region. Table 1 shows the ideality factor and the reverse saturation currents estimated form the dark I-V characteristics. In case of the lower annealing temperatures we observed that efficiencies are low this lower efficiency could be due to higher contact resistance of the Ni and Si. It is observed 978-1-4244-5892-9/10/$26.00 ©2010 IEEE Figure 3 Series resistance and contact resistivity of the Ni/Cu plated solar cells TESTING AT CONCENTRATOR LEVELS o An optimum annealing temperature of 420 C was identified which gave higher performance of the solar cells. These higher performing solar cells are then exposed to the low concentration ranges of two to four 001323 suns. The measurements are done using a solar simulator by placing a Fresnel’s lens in between the Xe lamp and the solar cell at various distances. Figure 4 shows performance of Ni/Cu front contact solar cells at various concentration levels. These solar cells are annealed at various temperatures and exposed to the different concentration levels. It is observed that as the concentration levels increases the performance of the solar cells begins to reduce. But the solar cells annealed o at 420 C indicate higher performance than the solar cell o o annealed at 400 C and 450 C. This is due to the lower o series resistance of the solar cells annealed at 400 C. o While in the case of solar cell annealed at 450 C the major performance reduction factor is the reduction in the recombination in the space charge region which becomes dominant at concentration levels even though there is reduction in the series resistance. ACKNOWLEDGEMENT The authors would like to thank the staff of Department of Energy Science and Engineering for their valuable help in setting up the concentration set up. REFERENCES [1]. N. Bay, V. Radtke, M. Alemán, J. Bartsch, S.W. Glunz, Electrolytic Nickel Deposition for the Front side th Metallization of Silicon Solar cells, 24 European PV Solar th Energy Conference and Exhibition, 21-25 September 2009, Hamburg, Germany. [2]. V.A. Chaudhari and C.S. Solanki, Two Step Metallization using Ni/Cu and Ni/Ag front contacts for conversion of commercial C-Si solar cell to low rd concentrator solar cell, 23 European Photovoltaic th Conference and Exhibition, Valencia, Spain, 1-5 September 2008 [3]. J.A.D. Gensen, Per Moller, Tim Bruton, Nigel Mason, Richard Russel, John Hadley, Peter Verhoeven, and Alan Matthewsone. Electrochemical deposition of buried contacts in high efficiency crystalline silicon photovoltaic cells. Journal of Electrochemical Society, 150:49–57, 2003. Figure 4 Efficiency variations with concentration ratio for a Ni/Cu front contact solar cells CONCLUSION An experimental study for investigation of the Ni/Cu two step metallization on commercial c-Si solar cell is performed. A new low cost method for fabrication of the Ni/Cu front contacts is proposed. An optimum annealing temperature and time for the annealing Ni to form NiSi is investigated. It is found that the efficiency improvement o takes place for the solar cells annealed at 420 C 0.5 to 0.25 minutes. A maximum efficiency in the range of 13-14 % is obtained for the solar cells annealed within this time temperature range. Reduction in series resistance and lower diffusion of Ni in the SCR were identified as the performance enhancing parameters for these solar cells at o 420 C annealing. Also the use of two step metallization for low concentrator solar cells is performed and it is observed that their performance is better as compared to the solar cells annealed at different temperatures. 978-1-4244-5892-9/10/$26.00 ©2010 IEEE [4]. Jinmo Kanga, Jae Sung Youb, Choon Sik Kangb, James Jungho Pakc, and Donghwan Kim. Investigation of Cu metallization for Si solar cells. Solar Energy Materials and Solar Cells, 74:91–96, 2002. [5]. M.V. Sullivan and J.H. Eigler. Nickel plating for making ohmic contacts to silicon. Journal of Electrochemical Society, 104:226–230, 1957. [6]. C.M. Liu, W.L. Liu, S.H. Hsieh, T.K. Tsai, and W.J. Chen. Interfacial reactions of electroless nickel thin film on silicon. Applied Surface Science, 243:259–264, 2005. 001324
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