22nd International Symposium on Plasma Chemistry July 5-10, 2015; Antwerp, Belgium Effect of the deposition method on silver diffusion in Ag-TiO 2 thin coatings: advantages and inconveniencies for photocatalytic applications and water treatment H. Fakhouri1,2, F. Arefi-Khonsari1,2, A.K. Jaiswal1,2 and J. Pulpytel1,2 1 Sorbonne Universités, UPMC Univ Paris 06, UMR 8235, Laboratoire Interfaces et Systèmes Electrochimiques, 75005 Paris, France 2 CNRS, UMR8235, LISE, 75005 Paris, France Abstract: Titania can be modified with silver to increase the lifetime of the photo-excited electrons and holes, however, silver can have a negative effect due to its increased mobility and diffusion especially during the annealing process. Photocatalytic TiO 2 and Ag doped TiO 2 coatings were deposited by injecting Ti precursor (with and without silver) in the after-glow of an Atmospheric Pressure Plasma Jet APPJ under different conditions. The deposited coatings presented a high porosity to give a unique advantage of the effect of silver diffusion for photocatalytic and anti-bacterial applications. The morphology, phase structure, chemical composition and photocatalytic properties of the coatings have been studied. Keywords: TiO 2 , atmospheric pressure plasma jet, spray, photocatalytic membrane 1. Introduction The primary application of photocatalysis is the photodegradation of organic materials dissolved in water (or any other liquid). The most prominent photocatalytic material that has been studied is TiO 2 , however, the latter can only reach a certain level of photocatalytic efficiency due to its fast electron-hole pair recombination. Many attempts have been investigated to reduce the charge recombination within TiO 2 , including doping with silver. But in most cases, whatever the doping process used, silver diffuses to the surface, through the adjacent layers to form islands, after annealing at relatively low temperatures, in the range of 100°C to 400°C which is used to crystallize the TiO 2 films. [1]. Hence, silver has the disadvantage to lead to non-uniform dispersion on the surface of titania. Another research axis is to modify the surface properties of TiO 2 by introducing silver on the topmost surface[2], which also forms islands on the surface. Atmospheric pressure plasma jets APPJ have received significant attention due to their combination of simplicity, low cost and wide possibilities for surface treatment. Recently such plasmas have been used to deposit porous thin films of TiO 2 [3] by injecting liquid precursor of Ti in the plasma, the coating process can be easily integrated into existing production line, to treat complex 3D shapes, but the most interesting characteristic of this technique is its capacity to treat photocatalytic membranes which can efficiently combine filtration and photocatalysis for water treatment and for other selfcleaning surfaces, O-20-5 2. Experimental details Ag doped TiO 2 thin films were prepared by two methods: first by RF reactive magnetron sputtering system (SPT 120, Plasmionique). Metallic Ti and Ag targets (50 mm diameter) were co-sputtered in a reactive gas atmosphere containing Ar and O 2 for the deposition of TiO 2 and Ag alone for the deposition of Ag, fabricating 32 bilayers of Ag/TiO 2 . The deposition pressure was fixed at 6 mTorr with corresponding Ar flow 50 sccm. Oxygen flow rate was fixed at 2.3 sccm during the TiO 2 . The RF powers were 200 W and 50 W for the Ti and Ag targets, respectively. The fixed experimental conditions chosen were situated in the intermediate region between two stable sputtering modes of Ti, reactive and metallic [4-5]. Secondly, we introduced a liquid precursor of titanium tetra-isoperoxide TTIP in an open-air atmospheric pressure plasma jet APPJ (Fig.1). Different concentrations of Ag nanoparticles (0 to 5% wt.) were added for silver doping. As the plasma jet contains highly reactive species (radicals, metastables, vibrationally excited molecules…) it can promote a very rich chemistry for surface treatment. On the other hand, the technique used in this study is a blown arc system giving rise to quite high temperature at the nozzle exit (i.e. Tg ~ 1000-1500 K) leading to an interesting heat transfer phenomena to tailor the physicochemical properties of the coatings. This high temperature then quenches quite rapidly further away from the nozzle exit, providing the possibility to treat temperature sensitive materials as well. More interestingly, the control of the heat transfer gave predominant impact on the position of the Ag doping sites in the host material (TiO 2 ). 1 The crystal structure of thin films was characterized by X-ray diffraction (XRD) (X’Pert Pro PW3040-Pro, Panalytical Inc.) using a Cu Kα1 (λ = 1.5418 Å) X-ray radiation source in Bragg-Brentano configuration. X’Pert High Score pattern processing was used to collect and process the data. The photocatalytic activity was evaluated by using an aqueous solution of Rhodamine B with an initial concentration of 5 mg/L at room temperature. A 125 W (Philips) white lamp was used to irradiate the samples during the photocatalytic measurements. porosity as compared to the sputtering technic. Moreover, the kinetic energy of the reactive species directed to the surface is much higher in a sputtering system operating at a low pressure (in the order of a few mTorr), as compared to APPJ (atmospheric pressure). In the latter, the species that reach the substrate surface have consequently less surface mobility which also explains the higher porosity of the coatings. Working gas (Air) Holes for spiraling the working gas (a) Discharge chamber Liquid precursor Titanium tetraisopropoxide Ti(OC3H7)4 - TTIP Electrode Rotating arc Plasma Jet Air spraying system Substrate Fig. 1. Atmospheric pressure plasma jet (APPJ) with the spraying system. 3. Results and discussion a) Structure of the Ag-TiO 2 coatings Fig. 2 shows two examples of SEM-FEG images of annealed Ag-TiO 2 , deposited by APPJ and sputtering. It is clear that the specific surface area and porosity of the coatings are drastically increased with the APPJ coatings as compared to sputtered ones. The coatings deposited by APPJ are composed of agglomerated clusters having an average grain size of approximately 30-40 nm, a pore size around 0.3 to 1 µm have been observed which present a good adhesion on different substrates. In the case of rf reactive sputtering, the deposition rate is typically between 1~10 nm/min for TiO2 in the oxide mode and the films are characterized by a 1D columnar structure. Whereas, in the case of the APPJ-spray process, the deposition rate is estimated to be between 10-20 µm/s and the structure observed is the consequence of a ballistic-like growth. The difference in the porosity between the films deposited by sputtering and APPJ can be explained by the difference in the deposition rates between the two techniques and the difference in the kinetic energy of the reactive species in the plasma reaching the surface. The deposition rate of TiO 2 by sputtering is in the order of 0.1 nm/s, whereas for APPJ the latter is ten orders of magnitude higher. Therefore, it is reasonable to assume that in the APPJ process, the species adsorbed on the surface have less time to diffuse to the surface of the coatings which lead to a higher 2 (b) Fig. 2. SEM-FEG images of the Ag-TiO 2 thin films deposited by (a)rf sputtering annealed at 350 °C for 1 hr, and (b) APPJ from TTIP liquid spray annealed at 450 °C for 1 hr. In insert of (a) is the cross section after annealing at 450 °C. b) Silver diffusion in the TiO 2 layer In the samples prepared by sputtering and annealed at 350°C, Fig. 1 (a), due to the diffusion through the TiO 2 layers, silver atoms have agglomerated on the film surface, creating clusters. The compositional contrast gives a clear distribution of grains on the sample surface. Silver particles are brighter as they have the highest density in the analyzed Ag-TiO 2 system. However, after annealing at 450°C, most of the surface of TiO 2 was covered with a silver layer (see the cross section). As presented in Fig. 2 (b), samples prepared by APPJ showed similar diffusion of silver, but the latter was limited by the morphology of the APPJ’s coatings. In fact, silver diffused in the adjacent layer of TiO 2 to partially cover the top part of the clusters but not the whole surface of TiO 2 . c) Photocatalytic activity Fig. 3 shows the photocatalytic degradation kinetics on glass coated samples by APPJ. No degradation of Rhodamine B was observed after 4 hours with uncoated substrates, which means that the photo-bleaching of the solution was negligible in the absence of TiO 2 or AgTiO 2 . The most efficient photocatalytic activity was found in the presence of samples prepared with 3% and 4% of Ag. Also, the half-life of Rhodamine B was reduced 3 times with the sample having 3% wt. of silver as compared with the pure TiO 2 . This indicates that silver doping can increase the charge separation and the life time of the photo-generated electron-holes in TiO 2 when using an optimal concentration of Ag in the composite material. O-20-5 Absorption of Rhodamine B (a.u) 0,7 0,6 TiO2 0,5 % Ag 1 % Ag 2 % Ag 3 % Ag 4 % Ag 5 % Ag Ag-TiO2 at 200°C 0,5 0,4 0,3 [5] A. Brudnik, M. Bucko, M. Radecka, A. TrenczekZajac, K. Zakrzewska, Vacuum, 82, 936 (2008). [6] W.K. Jung, H.C. Koo, K.W. Kim, S. Shin, S.H. Kim, Y.H. Park, Applied and Environmental Microbiology, 74, 2171 (2008). [7] V. Kumar, C. Jolivalt, J. Pulpytel, R. Jafari, F. ArefiKhonsari, Journal of Biomedical Materials Research Part A, 101, 1121, (2012). Half life 0,2 0,1 0,0 0 20 40 60 80 100 120 140 160 Time (min) Fig. 3. Photocatalytic activity of the Ag-TiO 2 coatings deposited by APPJ. In addition, the degradation of a target pharmaceutical molecule Carbamazepine, CBZ spiked at 1 mg/L in deionized water, has been investigated in presence of the photocatalytic coatings. The experiments showed similar results as compared to the degradation of Rhodamine B. These results are potentials to escort the study on biological tests with virus and bacteria, in order to investigate more the effect of silver ions to enhance the oxidation of bacteria [6-7]. 4. Conclusion Injection of liquid precursor of Ag/TiO2 in APPJ can give significant control of the porosity and crystallinity by varying the deposition parameters such as the energy of plasma and substrate temperature. Investigation of the effect of post annealing showed significant improvement in the photo activity under UV and visible irradiation for an optimal concentration of silver in TiO 2 as compared to thin films prepared by low pressure systems. Overall, blown arc atmospheric pressure plasma jet applied for TiO 2 /Ag thin coatings has shown a unique and highly desirable control over several important physical characteristics, which can be beneficial for many optoelectronic and photocatalytic applications, due to the unique structure and the good controlled charge separation within the doped TiO 2 . 5. References [1] J. Kulczyk-Malecka, P.J. Kelly, G. West, G.C.B. Clarke, J.A. Ridealgh, K.P. Almtoft, A.L. Greer, Z.H. Barber, Acta Materialia, 66, 396 (2014). [2] L. Su Pei, A. Pandikumar, N. Ming Huang, H.N. Lim International Journal of Hydrogen Energy, 39, 14720 (2014) [3] H. Fakhouri, D. Ben Salem, O. Carton, J. Pulpytel, F. Arefi-Khonsari, Journal of Physics D: Applied Physics, 46 (26) 265301 (2014). [4] W.D. Sproul, D.J. Christie, D.C. Carter, Thin Solid Films, 491, 1 (2005). O-20-4 3
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