Coupling of high frequency oscillations in a non-transferred dc plasma torch Jinwen Cao, Heji Huang, Wenxia Pan State Key Laboratory of High Temperature Gas Dynamics, Institute of Mechanics, Chinese Academy of Sciences, Beijing, China, 100190 Email: [email protected] Abstract The coupling among high-frequency oscillations of arc voltage, arc current and cathode cavity pressure in a non-transferred dc plasma torch were observed experimentally. These oscillations co-occur with the same frequency of 4 kHz in an argon plasma. The oscillation of cathode cavity pressure is inspired by the input electric power when the electric power increases to a threshold value. And the relationship between the amplitudes of arc voltage oscillation and arc current oscillation is also obtained. Keywords: Helmholtz mode, high frequency oscillation, coupling 1. Introduction Non-transferred direct current plasma torch with long inter-electrode channel and abruptly expanded anode has its advantages in thermal plasma coating process. Compared to conventional torch with self-setting arc, the arc length is fixed in such kind of torches, which helps to restrict large amplitude movement of arc root and hence large fluctuations of arc voltage. Moreover, the longer arc is also beneficial for obtaining relatively high enthalpy which allows effective convection of heat and momentum to injected particles [1,2]. However, even with such kind of torch configuration, there are still small amplitude and high frequency oscillations in arc voltage, arc current and consequently in input electric power. Previous results show that the time scale of the high frequency oscillation is close to the order of characteristic residence time of nano-sized particles as feedstock in plasma spraying. Therefore, the fluctuation may lead to different thermal history for different particles which remain as one of the main issues hampering the application of dc plasma in advanced coating deposition [1]. The high frequency coupling phenomena also occur in self-setting arc length torch and have been studied in large amount of work. Cheron firstly suggested that the high frequency fluctuation in arc voltage might be caused by Helmholtz oscillation in cathode cavity [3]. This inspiring idea was developed by J. F. Coudert, V. Rat, etc. in their studies on the coupling between arc voltage and cathode cavity pressure in non-transferred dc plasma torch [4-6]. In the torch the nozzle acts as a Helmholtz resonator and the rear cold gas chamber and the plasma are similar to a spring-mass system. The pressure fluctuation is generated by the oscillation of the plasma in the nozzle channel which plays the role of a plug. The oscillation in the nozzle which superimposed in mean flow causes the oscillation movement of arc root and the voltage variation, and the voltage variation influence cathode cavity pressure [4]. In this paper, the coupling phenomena among arc voltage, arc current and cathode cavity pressure in non-transferred dc plasma torch with inter-electrode channel and abruptly expanded anode were studied. 2. Experimental details The torch and power supply are the same as those shown in ref. [1], the schematic diagram of the torch is shown in Figure 1 [2]. The plasma-formed gas was pure Argon with the total flow-rate fixed in 6 standard liters per minute (slm). The chamber pressure was kept below 500Pa in all experiments. The cathode cavity pressure was measured by a piezoelectric pressure sensor connected to the Fig.1 schematic diagram of the experimental system. rear part behind the injection ring with an accuracy of 0.5% and a working range of 0~100 kHz. The distance from pressure sensor to cathode cavity was varied with different length copper tubes to study the phase-shift phenomena between pressure and arc voltage. The distance varied among l0 +4.14cm, l0 +10.87cm, l0 +13.77cm and l0 +17.80cm. l0 related to other parts of the pressure sensor and was constant. The arc current was measured by a hall-effect sensor with working range of 0~100 kHz. Temporal data on arc voltage, arc current and cathode cavity pressure were recorded synchronically by an oscilloscope (Textronic TBS 2024). 3. Results and discussion Figure 2 is a typical result of the arc voltage, arc current, cathode cavity pressure fluctuations together with their FFT analysis results. The black curve is the arc voltage, the red one is the pressure and the blue one is the arc current. It shows that the oscillations of the three signals have the same high frequency of 4 kHz. The voltage ratio of high frequency fluctuation to mean value is almost 2.2%, much larger than the arc current and the pressure which are less than 1%. U (V) P (kPa) I (A) 77 Amplitude (V) Amplitude (kPa) Amplitude (A) 20.0 19.8 76 19.6 96 95 1.6 1.4 19.4 94 1.0 74 19.2 93 0.8 73 19.0 92 0.6 72 18.8 91 18.6 90 0.004 0.005 0.006 T (s) 0.007 0.008 0.08 0.4 1.2 75 71 0.10 0.5 0.06 0.3 0.04 0.2 0.4 0.02 0.1 0.2 0.0 0 5000 10000 15000 Frequency (Hz) 0.00 0.0 20000 Fig.2 Arc voltage, arc current, cathode cavity pressure fluctuations in time (a) and frequency (b) domains The phase difference between the pressure and arc voltage corresponds to the propagating time of the pressure variation from downstream to cathode cavity [4]. This coupling might be caused by Helmholtz oscillation [4-6]. The phase difference changes while the tube length changes as shown in figure 3. The data is filtered by low-pass filter with the cutoff frequency of 4.5 kHz. Figure 3(d) is the linear fitting between the four kinds of distance and corresponding time delay. The ordinate is the distance minus l0 , and the abscissa is the time delay. The slope of the fitting line is 332m/s with a standard error of 34.9m/s which corresponds the acoustic velocity in the tube. (a) Voltage (V) Pressure (kPa) 19.4 76 19.3 74 (c) U (V) P (kPa) 20.0 80 19.8 78 19.6 76 19.2 72 19.1 70 19.4 74 19.2 72 0 0.0000 0.0002 0.0004 0.0006 Time (s) 0.0008 0 0.0010 19.0 0 0.0000 0.0002 0.0004 0.0006 T (s) 0.0008 0.0 0.0010 (d) (b) U (V) P (kPa) 0.18 20.0 0.16 80 0.14 78 19.6 76 19.4 74 19.2 72 Length (m) 19.8 0.12 0.10 0.08 0.06 0.04 0.02 0 0.0000 0.0002 0.0004 0.0006 T (s) 0.0008 19.0 0.0 0.0010 0.00 Equation y = a + b*x Value Intercept Slope 0.07135 332.29578 Standard Error 0.00866 34.88696 0.00000 0.00005 0.00010 0.00015 0.00020 0.00025 0.00030 0.00035 0.00040 Time delay (s) Fig.3 Different phase-shift with different tube length (a-c), and the fitting line between distance and time delay (d). (a):L= l0 +10.87cm; (b): L= l0 +13.77cm; (c): L= l0 +17.80cm. Linear relationship between mean electric power and the cavity pressure is shown in figure 4(a), which can be explained by equation deduced from [4] as below: 1 m P0 Pa (1 L) (U * I Pth ) 2 pa s 2 (3) Figure 4(b) shows an almost linear relationship between mean electric power and the pressure fluctuation. When the mean electric power is lower than 6.2kW in this experimental condition, both the vibrations of cathode pressure and arc voltage are hard to be observed. This is because the amplitude of Helmholtz oscillation is proportional to the square root of the inspiring energy. (a) 20.5 (b) 0.14 0.12 19.5 0.10 19.0 0.08 δp (kPa) p (kPa) 20.0 18.5 0.06 0.04 18.0 0.02 17.5 0 0.00 0 0 5500 6000 6500 7000 7500 8000 8500 9000 U*I (W) 5500 6000 6500 7000 7500 8000 8500 9000 U*I (W) Fig.4 Dependence of the pressure and pressure vibration on electric power fluctuation. As shown in Figure 2 the high frequency vibration of arc current has almost inverse phase with the vibration of arc voltage. Figure 5(b) shows a non-linear relationship between δI and δU, which indicates that the arc has inductive or capacitive impedance. (a) 2.5 2.5 2.0 2.0 1.5 1.5 1.0 0.5 (b) 3.0 δU(V) δU (V) 3.0 1.0 0.5 0.0 0.0 0 5500 6000 6500 7000 7500 8000 8500 9000 U*I (W) 0.0 0.1 0.2 δI(A) 0.3 0.4 0.5 Fig 5. dependence of arc voltage vibration on electric power and arc current vibration. Acknowledgement This work is supported by the National Natural Science Foundation of China. (No. 11175226) References [1] Heiji Huang, Wenxia Pan, Chengkang Wu 2011 Plasma Chem Plasma Process 32:65-74 [2] Heiji Huang, Wenxia Pan, Zhiying Guo, Chengkang Wu 2010 J.Phys. D: Appl. Phys. 43 085202 [3] L. Delair, X. Tu, A. Bultel, B. G. Cheron, High Temperature Material Processes, 9(4): p.583-597 [4] J F Coudert, V Rat, D Rigot 2007 J.Phys. D: Appl. Phys. 40 7357-7366 [5] V. Rat and J. F. Coudert 2010 Journal of Applied Physics 108, 043304 [6] V. Rat and J. F. Coudert, Improvement of Plasma Spraying Torch Stability by Controlling Pressure and Voltage Dynamic Coupling. 2011 Journal of Thermal Spraying Technology 20:28-38
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