Difference of Irradiation Effects between Ar Cluster Ion and Ar+ for DLC film formation T. Kitagawa1,2,3), K. Miyauchi1), K. Kanda1), S. Matsui1), N. Toyoda1), H. Tsubakino4), J. Matsuo5), and I. Yamada1,3) 1) Lab. of Adv. Sci. and Tech. for industry, Himeji Inst. of Tech., Ako-gun, Hyogo, JAPAN, 2) Nomura Plating Co. Ltd., Nishiyodogawa, Osaka, JAPAN, 3) Collaborative Research Center for Cluster ion Beam Process Tech., 4) Faculty of Eng., Himeji Inst of Tech., Shosha, Himeji Hyogo, JAPAN, 5) Ion Beam Eng. Exp. Lab. Kyoto University, Sakyo, Kyoto, JAPAN Abstract. In order to study the influences of Ar monomer ion (Ar+) on carbon film properties induced by ion beams assisted deposition, Ar cluster ion, Ar+, and their mixed ions (Ar cluster ion and Ar+) irradiated surface during evaporation and deposition of C60. From Near Edge X-ray Absorption Fine Structure (NEXAFS) and Raman spectroscopy measurements, lower sp2 content in carbon films was obtained via Ar cluster ion beam bombardment in comparison with bombardment by Ar+ and mixed ion beams. Furthermore higher hardness and smoothness of surface were demonstrated via Ar cluster ion bombardments. Thus, it was important to irradiate using higher fraction Ar cluster ions in the beam, in order to obtain hard DLC films with flat surface. irradiation of Ar cluster ion beam during evaporating used C60 as a carbon source. In this study, various ionassisted depositions were carried out, in order to understand differences in irradiation effects obtained by Ar cluster and Ar+. That is useful to develop a new deposition method for hard DLC fabrication. Characteristics of DLC films deposited simultaneously with Ar cluster ion, Ar+ and their mixed ions (Ar cluster and Ar+) surface bombardment by an evaporation of C60 were studied using the Near Edge X-ray Absorption Fine Structure (NEXAFS) and Raman spectroscopy. Both hardness and the surface morphology were investigated. INTRODUCTION Diamond-Like Carbon (DLC) films have been used as protective coatings for various applications. Especially hard-DLC films are expected for disks and heads coatings of hard disk drives [1]. Development of magnetic media and sensors of reading head such as GMR and TMR is very fast. Modern trends claim that floating space between head and media should be lower than 15 nm to obtain higher recording density. The floating space can be reduced by depositing DLC films with thinner thickness. However thinner thickness induces the degradation of film durability. Thus, high wear-resistance DLC films, possessing higher hardness (> 20~30 GPa) compared with present DLC films formed by plasma CVD deposition, are required. In order to satisfy these demands, hard DLC deposition realized simultaneously with cluster ion beam assisted deposition was proposed. EXPERIMENT Figure 1 shows the various Ar ions assisted DLC deposition system. Ar cluster ion, Ar+ and their mixed ions bombarded the target during evaporation of C60. The experimental procedures of these ion beam irradiations are described as follows. In the case of Ar cluster ion irradiation, Ar cluster was generated by supersonic expansion of high-pressure gas (3000 torr) through a small orifice of the nozzle. The neutral Ar In the previous study, we’ve demonstrated that Gas Cluster Ion Beam (GCIB) assisted deposition was useful for forming DLC films with high hardness (~50 GPa), smooth surface, and low content of sp2 orbital at room temperature [2, 3]. DLC films were formed by CP680, Application of Accelerators in Research and Industry: 17th Int'l. Conference, edited by J. L. Duggan and I. L. Morgan © 2003 American Institute of Physics 0-7354-0149-7/03/$20.00 755 (Ultra-Violet Synchrotron Radiation) facility of Institute for Molecular Science (beam-line 8B1) in Japan. Soft X-ray generated from synchrotron radiation irradiated to a film at normal incidence with photon energy from 275 to 320 eV. Total electron yield mode, where applied to count all electrons emitted from the surface by X-ray radiation, was applied. The energy resolution of the monochromator having grating was better than ~0.5 eV. The normalization of spectra was performed by the spectra of an Au sheet. Each normalization was done before and after measurement on carbon films. The sp2 content in carbon films was analyzed by using near edge peak of π* resonance (285.5 eV), which was referred from spectrum of graphite. As it is very difficult to determine absolute values of sp2 contents of DLC films, the relative values of the contents were estimated. The DLC films deposited with RF plasma method were used as a standard sample to determine those values. Also C60 film was investigated with NEXAFS measurement as standard carbon films. Furthermore Raman spectroscopy was applied to study the bonding structures of the films (JASCO Corp., Laser Raman Spectroscope, NRS-2100). A wavelength of Ar laser to measure Raman spectroscopy was 514 nm. In this measurement, the resolution of the Raman shift was better than 20 cm-1. This resolution is sufficiently higher, if the spectra of the DLC films were broad. Hardness of the DLC films was measured by nano-indentation technique (Hysitron Inc. (TriboScope)). Maximum indentation depth of the tip was below 30 nm. The substrate hardness of Si wafer did not affect on the film hardness, because this depth was much shallower than film thickness (0.3 µm). The hardness of the each film was obtained by averaging 5 times measurements of hardness. Surface morphology for films was observed with non-contact mode by Atomic Force Microscope (AFM; JEOL, JSPM-4200, scanning area of 1 µm2). FIGURE 1. Schematic diagram of the apparatus for DLC films formed with various Ar ion beams assisted deposition. clusters were inserted into ionizer, and ionized by 150 eV electrons. The current of electron emission was 120 mA. After acceleration, Ar cluster ions irradiated a substrate. The mean size of the Ar cluster was approximately 1000 atoms/ion, which was estimated from retarding potential technique [2]. Thus, if Ar cluster ion is accelerated at 5 keV, the each constitutional atom of Ar cluster has energy of only 5 eV. For Ar+ extraction, Ar gas was supplied from a tube, which was installed near the ionizer as shown in figure 1. In the case of Ar+ irradiation, Ar cluster beam was not used. The ionization condition where kept the same for both Ar monomer and Ar cluster. For generation of ‘mixed ion beam’, introduction of both Ar cluster beam and Ar gas to the ionizer was applied. The content of the Ar monomer ion in the beam was more than 50 %. Acceleration voltage of these ion beams was fixed at 5 kV, to obtain maximum hardness by Ar cluster ion beam assisted deposition [3]. The energy of cluster constitutional atoms and monomer were 5 eV and 5 keV, respectively. Thus, the energy of Ar+ was substantially higher in comparison with the energy per atoms in cluster. C60 used as a carbon source was evaporated from a heated crucible with the deposition rate of 3.5 nm/min. In this evaporation rate, crucible temperature was approximately 400 degree of C. The C60 molecules and incident ions where in 1.5 proportion. This proportion was considered as an optimum DLC deposition condition to obtain hard film properties with Ar cluster ion beams [2]. The thickness of each film was 0.3 µm. Si wafers used as substrates were kept at room temperature during the deposition. RESULTS AND DISCUSSIONS Figure 2 shows NEXAFS spectra of carbon films formed by various ion beams assisted deposition. C60 film and RF plasma DLC film were also examined. The NEXAFS spectrum of C60 film showed three π* peak of the carbon K edge (284.5eV, 285.5 eV, and 287.4 eV). This result demonstrates a good agreement with the previous theoretical study [5]. Spectra of our films were different from standard spectrum of C60 film. It indicates that C60 molecules were broken by the ion irradiations, then amorphous film was created. However the spectrum of the film formed with Ar+ Bonding structures of the films were studied with NEXAFS and Raman spectroscopy. NEXAFS measurement was used to obtain information of containing sp2-hybridized orbital in DLC films [3, 4]. NEXAFS measurements were performed at UVSOR 756 (1350cm-1) and G (1550-1600cm-1) peaks for a rough estimation of sp2 contents. D peak is usually assigned to A1g zone-edge mode because of the finite size of the graphic domains. G peak is originated from the zonecenter E2g photon, which indicates the existence of lattice vibrations in the plane of the graphite-like rings [6-9]. I(D)/I(G) peak ratios were obtained from the peak separation of Raman spectra. When the I(D)/I(G) ratio was small, it indicates that small amount of sp2 content in the DLC film is exist[10]. Table 2 shows the I(D)/I(G) peak ratio of carbon films deposited with various ion beams. The films by Ar+ and mixed ion had the peak ratio around 1.5~1.6. The films formed with Ar cluster ion had lower peak ratio of 0.58. From both Raman and NEXAFS spectra studies, it could be estimated that the films formed with Ar cluster ion irradiation had lower sp2 contents than those formed by assisted irradiation of ion beams with higher fraction of Ar+ contents. FIGURE 2. NEXAFS spectra of carbon films formed with various Ar ion beams assisted deposition. The C60 film and DLC film formed by RF plasma method were mesured to obtain standard spectra. TABLE 1. Integrals of π* peak (285.3 eV) extracted from NEXAFS spectra of the films irradiated with various ion beam irradiation. The integrals were normalized with that of the films by RF plasma method as a standard. Incident Ion Ar cluster Ar cluster Ar+ species ion and Ar+ Integral of π* 0.68 0.99 1.18 peak irradiation have a small peak at 287eV, which is at the same position with the third peak of C60. The similarity also is observed on σ* broad peak around 294 eV. Thus, the structures of C60 were still remained in the film formed by Ar+ assisted deposition. On the other hand, films irradiated with Ar cluster ions and mixed ions had no structure of C60. However, a slightly lager peak at 285.3 eV was obtained from the film with mixed ion irradiation. This peak at 285.3 eV was originated from sp and sp2 hybridized orbital of carbon bonding [4]. The peak was usually identified as sp2 orbital because the sp orbital is not stable. Integral of this peak in the spectra that is useful to discuss sp2 contents in films was shown in table 1. The integrals of the peaks were normalized using that of RF plasma DLC as a reference. The smallest integral of the peak was obtained from the films by cluster ion beam assisted deposition. With increasing Ar cluster ion content in the beam, the integral of the peak decreased. It indicated that, when fraction of Ar+ was high, sp2 contents also became larger due to graphitization of carbon. FIGURE 3. Raman spectra of films deposited with various assisted ion bombardments. The spectra was sparated into D and G band (D band: 1350cm-1, G band: 1550-1600cm-1). I(D)/I(G), that was the ratio of the integral of the each peak, was estimated for rough evaluation of DLC film quality. TABLE 2. I(D)/I(G) peak ratio of the films with various ion beam bombardments. Incident Ion Ar cluster Ar cluster Ar+ species ion and Ar+ I(D)/I(G) 0.58 1.51 1.60 peak ratio Figure 3 shows Raman spectra of films formed with various ion-assisted deposition. Raman spectra of the DLC films were generally discussed using D 757 Also higher hardness and smoother surface were obtained by the higher fraction cluster ions. Therefore, it was important to increase the Ar cluster ion ratio in the beam to obtain hard DLC films with flat surface. Furthermore, it was difficult to fabricate DLC films with high hardness and smooth surface only with Ar+ bombardment. ACKNOWLEDGMENTS This work is supported by New Energy and Industrial Technology Development Organization (NEDO). REFERENCES FIGURE 4. Hardness of the films formed with various assisted ion bombardments. Hardness values increased with increasing the fraction of Ar cluster ion in the beam. 1. T.W. Scharf, R.D. Ott, D. Yang, and J.A. Barnard, J. Appl. Phys., 85, 3142, (1999). Hardness of the films with various ion irradiations was shown in figure 4. Hardness of the film deposited with Ar cluster ion irradiation was 46 GPa. However films deposited with Ar+ had the hardness of 18 GPa. The RF plasma method shows the similar hardness (16 GPa). The film deposited with mixed ion beam presented the medium hardness between the films by Ar cluster ion and Ar+ irradiation. Therefore, the film hardness increased with increasing the fraction of Ar cluster ion in the beam. 2. T. Kitagawa, I. Yamada, N. Toyoda, H. Tsubakino, J. Matsuo, G.H. Takaoka, and Allen Kirkpatrick, Nucl. Instr. and Meth. in Phys. Res. B, submitted. 3. K. Kanda, T. Kitagawa, Y. Shimizugawa, Y. Haruyama, S. Matsui, M. Terasawa, H. Tsubakino, I. Yamada, T. Gejo, and M. Kamada, Jpn. J. Appl. Phys., 41, 4295, (2002). 4. C.Lenardi, P. Piseri, V. Briois, C.E. Bottani, A. Li BassiP. Milani, J. Appl. Phys., 85, 7159, (1999). From AFM observations, a rough surface (Ra 2.7 nm) was obtained under the condition of Ar+ bombardment. However, very flat DLC film with average roughness of 0.4nm was obtained with Ar cluster ion irradiation. Thus, it was necessary to generate the ion beam with higher fraction of cluster ions, in order to obtain low average roughness below 1.0 nm. Almost the same flat surface was obtained by cluster ion bombardment and mixed ion bombardment, in spite of significantly different hardness. 5. L.J.Terminello, D.K. Shuh, F.J.Himpsel, D.A. LapianoSmith, J.Stohr, D.S. Bethune and G. Meijer, Chem. Phys. Lett., 82, 491, (1991). 6. F. Tuinstra and J. L. Koenig, J. Chem. Phys. 53, 1126 (1970). 7. R. J. Nemanich and S. A. Solin, Phys. Rev. B 20, 392 (1979). 8. P. Lespade, R. Al-Jishi, and M. S. Dresselhaus, Carbon 20, 427 (1982). 9. P. Lespade, A. Marchard, M. Couzi, and F. Cruege, Carbon 22, 375 (1984). CONCLUSIONS 10. D. G. McCulloch, D. R. McKenzie, S. Prawer, A. R. Merchant, E. G. Gerstner, and R. Kalish, Diam. Relat. Mater. 6, 1622 (1997). Ar cluster ion, Ar+ (Ar monomer), and their mixed ion (Ar cluster and Ar+) irradiated surface during the evaporation of C60, in order to study the differences of the irradiation effects of Ar cluster ion and Ar+ on DLC film fabrication. From NEXAFS and Raman spectroscopy measurements, higher fraction of Ar cluster ion in the beam brought lower sp2 contents. 758
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