Progress in Bright for Industry, Industry, Progress Ion Progress in in Bright Bright Ion Ion Beams Beams for for Progress Beams for Industry, Industry, Medicine at LBNL and Fusion at LBNL Medicine and and Fusion Fusion at Medicine at LBNL LBNL Joe W. Kwan Joe Joe W. W. Kwan Kwan Lawrence Berkeley National Laboratory Lawrence National Laboratory Berkeley National 1 Cyclotron Berkeley, CALaboratory 94546 USA Lawrence Road, Berkeley National Laboratory 11 Cyclotron Berkeley, CA 94546 USA USA Road, Berkeley, CA Cyclotron Road, Berkeley, CA 94546 94546 USA Abstract. Recent progresses at LBNL in developing ion beams for industry, radiation therapy and inertia! fusion Abstract. Recent progresses at ion for therapy and fusion Abstract. Recent progresses at LBNL developing beams for industry, industry, radiationcapture therapytherapy and inertial inertial fusion applications discussed. The ion beam lithography, boron radiation neutron (BNCT), and Abstract. were Recent progresses at highlights LBNL in in include developing ion beams beams for industry, radiation therapy and inertial fusion applications were discussed. The ion beam lithography, boron neutron capture therapy (BNCT), applications were discussed. The highlights include lithography, boron neutron capture therapy (BNCT), and heavy ion fusion (HIF) drivers using multiple linacs. applications were discussed. The highlights include ion beam lithography, boron neutron capture therapy (BNCT), and and heavy ion fusion (HIF) drivers using heavy heavyion ionfusion fusion(HIF) (HIF) drivers drivers using using multiple multiple linacs. linacs. INTRODUCTION INTRODUCTION INTRODUCTION INTRODUCTION Accelerator research atatLBNL, inin the Accelerator Accelerator research LBNL, Accelerator Accelerator research at Accelerator research at LBNL, LBNL, in athe theportfolio Accelerator and Fusion Research Division, has of and Fusion Research Division, of and Fusion Research Division, has a portfolio and Fusion Research Division, has a portfolio of diverse applications including areas outside high diverse applications including high diverse applications including areas outside diverse applications including areas outside high energy and nuclear physics such asas semi-conductor energy and nuclear physics such semi-conductor energy nuclear physics such as energy and and nuclear physicsand such as semi-conductor semi-conductor industry, radiation therapy fusion. This paper industry, radiation therapy and fusion. This industry, radiation therapy and fusion. This paper industry, radiation therapy and fusion. This paper paper briefly reports the recent progress in the development briefly reports the recent progress in the development briefly reports the recent progress in the development briefly reports the recent progress in the development ofofion beam lithography, neutron capture radiation ion beam lithography, neutron capture radiation of beam lithography, neutron capture of ion ion and beam lithography, neutron capture radiation radiation therapy, heavy ion driven inertial fusion. therapy, and heavy ion driven inertial fusion. therapy, and heavy ion driven inertial fusion. therapy, and heavy ion driven inertial fusion. SEMI-CONDUCTOR INDUSTRY SEMI-CONDUCTOR INDUSTRY SEMI-CONDUCTOR SEMI-CONDUCTOR INDUSTRY INDUSTRY ItItItisisiswell wellknown knownthat thation ionbeams beams are are useful useful for for ion ion It is well well known known that that ion ion beams beams are are useful for ion implantation in the semi-conductor industry. For this implantation in the semi-conductor industry. For this implantation in the semi-conductor industry. For this implantation in the semi-conductor industry. purpose, purpose,LBNL LBNLhas hasdeveloped developedion ionsources sources such such as as the the purpose, purpose, LBNL LBNL has has developed developed ion ion sources sources such as the multi-cusp gas plasma sources and the Metal Vapor multi-cusp gas plasma sources and the Metal Vapor multi-cusp multi-cusp gas gas plasma plasma sources sources and and the the Metal Vapor VacuumArc Arc(MEWA) (MEVVA)sources. sources. Another Another application application Vacuum Vacuum Vacuum Arc Arc (MEVVA) (MEVVA) sources. sources. Another Another application that is under development is the ion projection that is under development is the ion that projection that isis under under development development is is the the ion ion projection lithography system. lithography system. lithography lithographysystem. system. Hydrogen or Helium gas Hydrogen or Helium beam Stencil Wafer Nevertheless, constant ion bombardment on the Nevertheless, Nevertheless, constant constant ion ion bombardment bombardment on on the the Nevertheless, ion bombardment on the stencil mask limits limitsconstant its lifetime, lifetime, thus affecting both both the stencil mask its thus affecting the stencil mask limits its lifetime, thus affecting both the stencil mask limits its lifetime, thus affecting both the replacement cost and downtime. A maskless microreplacement replacement cost cost and and downtime. downtime. A A maskless masklessmicromicroreplacement cost and downtime. A maskless microbeam reduction lithography system, asshown shownin in Fig. beam reduction lithography system, as beam reduction lithography system, as shown in Fig. beam reduction lithography system, as shown in Fig. Fig. 2, can improve the situation [1]. Here the exposure 2, can improve the situation[1]. Here the exposure 2, can improve the situation[1]. Here the exposure 2, can improve the at exposure pattern is due due to tothe the situation[1]. aperture plate plateHere located the ion pattern the pattern is is due due to to the the aperture aperture plate plate located locatedat theion ion pattern is the aperture located atat the ion source. The goal is to produce an array of microsource. source. The The goal goal is is to to produce produce an an array array of of micromicrosource. The goal is to produce an array of microbeams with the the ability ability to to switch switch on on eachmicro-beam micro-beam beams beams with with the the ability ability to to switch switch on on each each micro-beam micro-beam beams with each individually. individually. individually. individually. Figure shows the concept of constructingmicromicroFigure Figure 3333 shows shows the the concept concept of ofconstructing constructing microFigure shows the concept of constructing microbeam channels using layers of insulator. By applying beam beam channels channels using usinglayers layersof ofinsulator. insulator. By Byapplying applying using layers of insulator. By applying Ion IonSource Source Ion Source Source Ion 34 cm 34cm cm 34 S XY XY XY XY Stage Stage Stage Stage SS N N N Electrode Electrode Electrode Lenses Lenses Lenses 2. Maskless micro-beam reduction FIGURE Maskless micro-beam reductionlithography. lithography. Maskless micro-beam micro-beam reduction reduction lithography. FIGURE 2. 2. Maskless lithography. Beam Beam forming formingelectrode electrode forming electrode Beam forming electrode in " in \— EinzelLens-t Wafer Wafer Wafer Switching Switchingelectrode electrode Switching electrode Switching electrode Field Lens FIGURE 1. Ion projection lithography using a stencil mask. FIGURE FIGURE1.1.1.Ion Ionprojection projectionlithography lithographyusing usingaaastencil FIGURE Ion projection lithography using stencil mask. mask. In a conventional lithography system, a photon InIn Inaaaconventional conventionallithography lithography system, system, aa photon lithography photon beam is conventional projected through a stencilsystem, mask to produce beam produce beamisisisprojected projectedthrough throughaaastencil stencilmask mask to beam projected through stencil mask to produce images on a wafer that is covered by a layer of photoimagesonona awafer waferthat thatisisiscovered coveredby byaaalayer layer of images images that covered layer of photophotoresist. onAsa wafer the industry advances,bythe dimension of resist. As Asthe theindustry industryadvances, advances, the the dimension resist. of resist. As the industry advances, the dimension of components is now approaching the photon diffraction componentsisisisnow nowapproaching approachingthe thephoton photondiffraction diffraction components components now approaching the photon limit of ~ 100 nm. Ion beams can potentially extend limitofof of~~~100 100nm. nm. Ion Ionbeams beamscan canpotentially potentiallyextend extend limit limit 100 nm. beams can potentially extend the limit down to ~ Ion 5 nm. Figure 1 shows a schematic the limit down to ~ 5 nm. Figure 1 shows a schematic the limit down to ~ 5 nm. Figure 1 shows a schematic the to ~ 5 nm. Figure 1system showsby a schematic of limit an iondown projection lithography replacing ofan anion ionprojection projectionlithography lithographysystem system by by replacing replacing ofof an ion projection replacing the photon beam withlithography an ion beam.system by the photonbeam beamwith withan anion ionbeam. beam. the photon the photon beam with an ion beam. Insulator Insulator Insulator Insulator Insulator FIGURE 3. Electrical connections Electrical connections Electrical connections connections A micro-beam channel made of insulator FIGURE FIGURE micro-beam channel made made ofof insulator insulator FIGURE 3. 3. A micro-beam micro-beam channel insulator layers. layers. layers. layers. CP642, High Intensity and High Brightness Hadron Beams: 20th ICFA Advanced Beam Dynamics Workshop on High Intensity and High Brightness Hadron Beams, edited by W. Chou, Y. Mori, D. Neuffer, and J.-F. Ostiguy © 2002 American Institute of Physics 0-7354-0097-0/02/$ 19.00 19 thethe appropriate voltages, neutron appropriate voltages,a micro-beam a micro-beamcan canbebegated gated neutronsource. source. Figure Figure55 illustrates illustrates the the difference difference in in theeither appropriate voltages, a micro-beam can be gated neutron source. Figure 5 illustrates the difference in in either on or off. Separate layers of electrodes can be reactor-based and accelerator-based neutron the appropriate voltages, a micro-beam can be gated neutron source. Figure 5 illustrates the difference on or off. Separate layers of electrodes can be reactor-based and accelerator-based neutron energy energy either or control off.off.Separate layers of of electrodes be be andand accelerator-based neutron spectrum. most useful for BNCT used toonto control rows of of micro-beams ininxcan y y reactor-based either on or Separate layers electrodes can reactor-based accelerator-based neutron energyis used rows micro-beams xand and spectrum. The The most usefulenergy energyrange range forenergy BNCT is used to control rows of micro-beams in x and y spectrum. The most useful energy range for BNCT is is directions for multiplexing. between 1 keV to 30 keV. These neutrons be used to control rows of micro-beams in x and y spectrum. The most useful energy range for BNCT directions for multiplexing. between 1 keV to 30 keV. These neutrons can can be directions forfor multiplexing. between 1 keV to to 30 30 keV. These neutrons cancan be Li obtained bombarding 2.5 MeV directions multiplexing. between 1bykeV keV. neutrons obtainedby bombarding 2.5 These MeV protons protons on on aabe Li obtained by by bombarding 2.5 MeV protons on a Li target with a A1/A1F moderator. The necessary obtained bombarding 2.5 MeV protons on a Li target with a Al/AlF3 3 moderator. The necessary RADIATION target with a Al/AlF TheThenecessary 3 moderator. target Al/AlF moderator. necessary dosage, totobe aareasonable time RADIATIONTHERAPY THERAPY 3 within dosage,with beadelivered delivered within reasonable time (~ (~ aa RADIATION THERAPY RADIATION THERAPY dosage, to to be requires delivered within adcreasonable time (~ (~ a a dosage, be delivered within a reasonable time few hours), a 20 mA proton beam. few hours), requires a 20 mA dc proton beam. LBNL is is a pioneer LBNL a pioneerin inradiation radiationtherapy therapysince sincethe the hours), requires a 20 mAmA dc dc proton beam. hours), requires a 20 proton beam. LBNL is aBevatron. pioneer inNowadays radiation therapy since thethe fewfew LBNL pioneer in radiation therapy since early days of is proton and hadron early days of aBevatron. Nowadays proton and hadron early days of Bevatron. Nowadays proton and hadron early days of Bevatron. Nowadays proton and hadron therapies arearecommon Accelerator-based Most therapies commonmedical medicalfacilities facilitiesworldwide. worldwide. Accelerator-basedproduction production Most therapies areto common medical facilities worldwide. Most Accelerator-based production therapies are common medical facilities worldwide. (LBNL) 2,5 MeV useful Accelerator-based production The trend is develop facilities that areare cost-effective, (LBNL)2020mA, mA, 2.5 MeVppon on The trend is to develop facilities that cost-effective, useful ergies useful (LBNL) 20 AL/A1F'? mA, 2.5 2.5 MeV p onp on Li(LBNL) moderator The trend isand to develop facilities thatthat areare cost-effective, energies 20 mA, MeV The trend isand tohas develop facilities cost-effective, Liwith with AL/AlF 3 moderator compact, beam controls. energies compact, hasgood good beamand anddose dose controls. for Li Li withwith AL/AlF energies 3 moderator forBNCT BNCT AL/AlF 3 moderator compact, and has good beam and dose controls. compact, andthethe has good beam of and dose types controls. for for BNCT Figure 4 shows size comparison various BNCT Figure 4 shows size comparison of various typesofof Figure 4 shows the size comparison of various types of Figure 4 shows the size comparison of various types of machines. The is isto tobuild a a6-m machines. The Thenew newproposal proposal build 6-m machines. is is tofor aMeV/u Reactor-based machines. Thenew newproposal proposal tobuild build a6-m 6-m Reactor-based diameter super-conducting cyclotron 250 diameter super-conducting cyclotron for 250 MeV/u Reactor-based Reactor-based (BNL) diameter super-conducting cyclotron for 250 MeV/u (BNL)3 3MW MW diameter super-conducting cyclotron for 250 MeV/u (BNL) 3 MW (q/m=l/2) light ionion therapy. (q/m=1/2) light therapy. (BNL) 3 MW (q/m=1/2) light ionion therapy. (q/m=1/2) light therapy. Low Lowenergy energynn Low energy n n Low energy kill killhealthy healthy killkill healthy healthy cells cellsininfront front cellscells in front in front ofoftumor tumor of tumor of tumor FIGURE 5. Accelerator-based Accelerator-based neutron sources are superior superior FIGURE neutron sources FIGURE 5. 5.5. Accelerator-based neutron sources are are superior FIGURE toreactors reactors forAccelerator-based neutron therapy. neutron sources are superior for neutron therapy. toto reactors for neutron therapy. to reactors for neutron therapy. FIGURE 4. Comparing Comparing the sizes of various types of FIGURE 4. 4. the sizes ofofof various types ofofof FIGURE Comparing thethe sizes various types FIGURE Comparing sizes various types medical accelerators. medical accelerators. medical accelerators. medical accelerators. Another newchallenge challengeisis is istototo toproduce produceananan an Another challenge produce Anothernew new challenge produce accelerator-based neutron source for boron neutron accelerator-based neutron source for boron neutron accelerator-based accelerator-basedneutron neutronsource sourceforforboron boronneutron neutron capture therapy (BNCT).The The concept of BNCT has capture therapy (BNCT). concept ofofof BNCT has capture therapy (BNCT). The concept BNCT has capture therapy (BNCT). The concept BNCT has been known for many years [2], but the practice lacks been known for many years [2], but the practice lacks been known for many years [2], but the practice lacks been known for many years [2], but the practice lacks effective boron-absorbing drug and neutron source an an effective boron-absorbing drug and neutron source an effective boron-absorbing drug and neutron source an effective boron-absorbing drug and neutron source of the correct energy spectrum. The basic principle of of the correct energy spectrum. The basic principle ofofof of the correct energy spectrum.The Thebasic basicprinciple principle of the correct energy spectrum. BNCT is to administer the patient with a tumorBNCT is to administer the patient with a tumorBNCTis isto toadminister administerthethepatient patientwith with a a tumortumorBNCT seeking chemical that contains boron.After After high seeking chemical that contains boron. a ahigh seeking chemical that contains boron. After aahigh high seeking chemical that contains boron. After concentration of boron is gathered gathered at the the tumor cells, concentration of boron is gathered at the tumor cells, concentration of boron is at tumor cells, concentration of boron is gathered at the tumor cells, patient receives neutron radiation dose. Since the thethe patient receives neutron radiation dose. Since thethe the patient receives neutron radiation dose. Since the patient receives neutron radiation dose. Since the 11 11 11 B formed by capturing a neutron is unstable and will B formed by capturing a neutron is unstable and will U B formed by capturing a neutron is unstable and will Bdecay formed by 7 7 capturing 4 44 a neutron is unstable and will into Li+ + He with the emission of alpha decay into with thethe emission of of alpha 7 Li7Li 4+He decay into He with emission alpha decay into The LiThe +short-range He with alpha thealpha emission of alpha radiation. short-range can destroy the radiation. can destroy the radiation. The Theshort-range short-rangealpha alphacan candestroy destroy the the radiation. tumor's DNA while leaving the surrounding normal tumor's DNA while leaving thethe surrounding normal tumor's DNA while leaving surrounding normal tumor's DNA while leaving the neutrons. surrounding normal cells unharmed by by thethe epithermal This type cells unharmed by the epithermal neutrons. This type cells unharmed epithermal neutrons. This type cells unharmed by the epithermal neutrons. This type of of treatment is most effective for glioblastoma brain treatment is most effective for glioblastoma brain of treatment is mosteffective effectiveforforglioblastoma glioblastomabrain brain of treatment most tumors thatthat areisare usually untreatable by by other means. tumors are usually untreatable by other means. tumors that usually untreatable other means. tumors that are usually unbeatable by other means. Recently there is significant progress in developing Recently there is significant significant progress in developing developing Recently there is progress in Recently there is significant progress ine.g. developing tumor-seeking drugs with boron content BOPP. tumor-seeking drugs with boron content e.g. BOPP. tumor-seeking drugs with boron content e.g. BOPP. tumor-seeking drugsBNCT with boron content e.g. BOPP. Hence a successful clinical trail is expected if ifif Hence aa successful BNCT clinical trail is expected Hence successful BNCT clinical trail is expected Hence a successful clinical trail expected if wewecancan provide theBNCT with anis appropriate provide with an appropriate thetreatment treatment with an appropriate we can provide the treatment with an appropriate FIGURE 6. 2.5 2.5 MV, 50 mA proton dcESQ ESQ accelerator FIGURE 6. 6.6. A MV, 50 50 mA proton dc dc ESQ accelerator FIGURE 2.5 MV, proton accelerator FIGURE AAA2.5 MV, mA proton dc ESQ accelerator for BNCT; also similar design for contraband application. forfor BNCT; also similar design for contraband application. forBNCT; BNCT;also alsosimilar similar design design for contraband application. application. As spin-off technology from our fusion research, AsAs a spin-off technology from ourour fusion research, As spin-off technology fusion research, aaaspin-off technology from fusion research, we have developed aconceptual conceptual design for2.5 a2.5 2.5 MV, wewe have developed a conceptual design for a MV, we have developed a design for a MV, have developed a conceptual design for a 2.5 MV, 50-100 mA proton dc accelerator accelerator [3]. Similar to2aa22 50-100 mA proton dc accelerator [3]. Similar to a 50-100 mA proton dc [3]. Similar to 50-100 mA proton dc accelerator [3]. Similar to a 2 MVinjector injectorused used the fusion program, MV in inin thethe fusion program, the the MV injector used fusion MV injector used in the fusion program, program, the the accelerator uses ESQ focusing to handle the beam's accelerator uses ESQ focusing to handle the beam's accelerator uses uses ESQ ESQ focusing focusing to handle the beam's accelerator to handle the beam's space charge force as well stretching out the space charge force as as well as asas stretching outout thethe space charge force well stretching space charge force as well as longitudinal stretchingelectric out the accelerator length reduce electric accelerator length to toto reduce longitudinal accelerator length reduce longitudinal electric accelerator length to breakdowns). reduce longitudinal electric gradient (for preventing breakdowns). A schematic schematic gradient (for(for preventing AA schematic gradient preventing breakdowns). gradient (for preventing breakdowns). A schematic diagram of of this accelerator is shown in Fig. 6. 6. diagram of this this accelerator shown in Fig. diagram accelerator isisshown diagram of this accelerator is shown in in Fig. Fig. 6.6. TheThe same accelerator design cancan be be used forfor The same accelerator design can be used for same accelerator design used The same accelerator beMeV, used for contraband applications. In In that case acan 1.76 10 10 contraband applications. Indesign that case 1.76 MeV, 10 contraband applications. that case aa1.76 MeV, contraband applications. In that case a target. 1.76target. MeV, 10 mA proton beam is directed onto a carbon The mA proton beam is directed onto a carbon The mA proton beam is directed onto a carbon target. The 13 13 14 14 13 beam mA proton isreleases aMeV carbon target. The reaction C(p,γ) N14 theonto 9.179.17 γ radiation reaction C(p,γ) Ndirected releases the MeV radiation reaction γγradiation 13 C(p,γ)14 N releases the 9.1714MeV 14 y radiation reaction C(p,y) N releases the 9.17 MeV 14 andand subsequent resonant absorption by by N14will detect and subsequent resonant absorption by will detect subsequent resonant absorption NNwill detect and subsequent resonant explosives andand drugs [4].[4]. explosives and drugs [4].absorption by N will detect explosives drugs explosives and drugs [4]. 20 INERTIAL FUSION possible recirculation target Ion beams are essential to progress in fusion INERTIAL FUSION INERTIAL FUSION research. There are two main approaches to fusion: INERTIAL FUSION magnetic confinement and inertial confinement. The Ion beams are essential to IonIonbeams progress inin fusion fusion beamsareareessential essentialtotoprogress progressin fusion most advanced magnetic confinement concept are the research. There are two main approaches to fusion: research. research.There Therearearetwo twomain mainapproaches approachestotofusion: fusion: tokamak, a device that has a toroidal shape with magnetic confinement and inertial confinement. The magnetic confinement magnetic confinementand andinertial inertialconfinement. confinement. The The magnetic field generated byconfinement field coils in combination most advanced magnetic confinement concept are most advanced magnetic confinement concept are the most advanced magnetic concept arethe the tokamak, aa device that shape with with the self-field generated the plasma tokamak, that has toroidal shape with tokamak, adevice device thathas hasaaby atoroidal toroidal shapecurrent. with magnetic field generated by field coils in Significant progresses have been made by injecting magnetic field generated byby field coils inincombination combination magnetic field generated field coils combination with the self-field generated plasma current. with self-field generated bythe thethe plasma current. with thethe self-field generated byheat the plasma current. energetic deuterium beams toby plasma, drive Significant progresses made by Significant progresses havebeen been madeThese injecting Significant progresses have been made bybyinjecting injecting current and control the have density profile. "neutral energetic deuterium beams plasma, energetic deuterium beamsto heatthe thetypically plasma,drive drive ~ energetic deuterium beams totoheat heat the plasma, drive beam injectors" (developed by LBNL) have current and control the density profile. These "neutral current and control the density profile. These "neutral current controlthe the density profile. "neutral 100 keVand energy; beam ions are These converted into beam injectors" (developed by LBNL) have beam injectors" (developed LBNL) typically have~ beam injectors" (developed byby LBNL) typically have ~~ neutral particles before entering thetypically tokamak. The 100 keV energy; thebeam beamions ionsare areconverted convertedinto into 100 keV energy; the 100 keV energy; the beam ions are converted into newneutral generation of before tokamak is larger, thus requiring particles enteringthe thetokamak. tokamak. The The neutral before entering neutralofparticles particles beforeenergy entering the tokamak. The beams up to 1 MeV to penetrate the plasma. new generation tokamakisisislarger, larger,thus thus requiring new generation of tokamak requiring new generation ofof tokamak larger, thus requiring beams of up 1 MeV energy penetrate theplasma. plasma. in beams of to MeV energy to penetrate the beams ofup up to1to1beams MeV energy toto penetrate the plasma. While ion are auxiliary components magnetic fusion devices, they components are the main Whileion ionbeams beams auxiliary components While are in While ion beams areareauxiliary auxiliary components inin magnetic fusion devices, they are the main components in an inertial fusion machine ion magnetic main magnetic fusion fusion devices, devices, they they are are the theusing main components in an inertial fusion machine using ion beam drivers.in ionmachine beams can be ion more components an inertial using components inIn ancomparison, inertial fusion fusion machine using ion beam drivers. comparison, ion beamscan canthe more advantageous than laser beams because of higher beam drivers. In comparison, ion beams be beam drivers. InIn comparison, ion beams can bebemore more advantageous than laser beams because the higher advantageous than laser beams because power efficiency (~30%), higher duty of rate (~higher 10 Hz) advantageous than laser beams because ofofthe the higher power efficiency (~30%), higher duty rate (~ 10 Hz) power efficiency duty Hz) and more robust(~30%), againsthigher radiation damages power efficiency (~30%), higher duty rate rate (~ (~ 10 10 at Hz)the and more robustagainst againstradiation radiationdamages damagesatatthe the and more robust and more robust against radiation damages at the target chamber windows. target chamber windows. target targetchamber chamber windows. windows. TheThe goal of of a heavy is totodeliver deliver goal a heavyion ionfusion fusion driver driver is The goal of aa heavy fusion driver isis to The beam goal ofpower heavy ion fusion drivertarget to deliver deliver enough totoion ignite aa fusion target about5 5 enough beam power ignite fusion about enough beam power to ignite fusion target 55 enough power to ignite fusion target about mm in diameter (see Fig.7 ).).aa To theabout required mm inbeam diameter (see Fig.7 To do do so, the required mm in diameter (see Fig.7 ). To do so, the required mm in diameter (see Fig.7 ). To do so, the beam energy MJwith withaapulse pulse length length ~~ 10 beam energy is is ~ 5~ 5MJ 10nsnsinin beam energy isis ~~ 55 MJ with length ~~1515 10 ns beam energy with apower a pulse pulse of length10 10W/cm ns in in2.2 order to achieve apeak peak order to achieve a MJ power of ~ 10 W/cm 15 22 . 15 order to achieve a peak power of ~ 10 W/cm ..a order to achieve a peak power of ~ 10 W/cm Furthermore, theenergy energymust must be be deposited deposited within Furthermore, the within a 2 Furthermore, the energy must be deposited within a Furthermore, the energy must be deposited within a 2 short penetration range,e.g. e.g.0.02 0.02 to to 0.2 0.2 g/cm the 22 of short penetration range, g/cm of the short penetration e.g. 0.2 g/cm the short penetration range, e.g. 0.02 0.02 towith 0.2 atomic g/cm of of the target material.range, For heavy ionsto masses target material. For heavyions ions withatomic atomicmasses masses target material. For heavy with target material. For heavy ions with atomic masses ~ 200, the allowable kinetic energy is < 10 GeV. ~~~200, kineticenergy energyisisis<<<10 GeV. 200, the allowable GeV. 200,the theallowable allowable kinetic kinetic energy 1010 GeV. FIGURE 7. A typical IFE indirect-drive (hohlraum) target. Beam is converted to x-ray radiation, compressing the FIGURE 7.7. A IFE (hohlraum) target. FIGURE typical IFE indirect-drive (hohlraum) target. FIGURE power 7. AAtypical typical IFEindirect-drive indirect-drive (hohlraum) target. target material to reach high density andcompressing ultimately the high Beam power is converted to x-ray radiation, Beam power is converted to x-ray radiation, compressing the Beam power is converted to x-ray radiation, compressing the temperature target material to reach high target materialfor to ignition. reach high high density and ultimately high target material to reach high density densityand andultimately ultimately high temperature for ignition. temperature for ignition. Figure 8 is the block diagram of a typical heavy ion temperature for ignition. fusion using induction [8]. Starting Figure 88isisthe block diagram of heavy ion Figuredriver the block diagramlinacs ofaatypical typical heavyfrom ion Figure 8injector isusing the block diagram of [8]. a typical ion a 2 MV may contain up toStarting 100 heavy beams fusion driver using (that induction linacs [8]. Starting fromat fusion driver induction linacs from fusion driver using induction linacs [8]. Starting from ~ 1 A per beam), the ions will be accelerated to ~ 100 MV injector injector (that (that may may contain contain up up to to 100 100 beams beams atat aa 22MV a~~211MV MV injector (that maywill contain up (ESQ) to 100tofocusing. beams using electrostatic quadrupole per beam), the ions ions will be accelerated accelerated 100 at AA per beam), the be ~ 100 At higher ion velocity, magnetic quadrupole focusing ~MV 1 A per beam), the ions will be accelerated to ~ 100 MV using using electrostatic electrostatic quadrupole quadrupole (ESQ) (ESQ) focusing. focusing. becomes more effective. Combining beams at this MV using electrostatic quadrupole (ESQ) focusing. At higher higher ion ion velocity, velocity, magnetic magnetic quadrupole quadrupole focusing focusing At point may preferred in Combining order toquadrupole optimize theat At higher ionbevelocity, focusing becomes more effective.magnetic Combining beams atoverall this becomes more effective. beams this cost and to rematch beams into the magnetic becomes more effective. Combining beams at this point may be preferred in order to optimize the overall point may be preferred in order to optimize the overall quadrupole lattices. cost and beto topreferred rematchinbeams beams into the magnetic magnetic cost and rematch the point may order tointo optimize the overall quadrupole lattices. quadrupole lattices. cost and to rematch beams into the magnetic quadrupole lattices. ion source and injector ion source ion source and and injector injector acceleration acceleration possible recirculation possible with electric with magnetic possible recirculation recirculation focusing focusing acceleration acceleration with electric with electric focusing focusing chamber chamber transport final focusing transport acceleration acceleration with magnetic with magnetic focusing focusing bending matching beam combining compression 2-3 MeV ~100 MeV ~10 GeV ~1 A/beam ~10 µs ~10 A/beam ~ 4 µs ~400 A/beam ~100 ns matching matching beam beamcombining combining compression compression final focusing final focusing ~10 GeV ~4000 A/beam bending bending ~10 ns ~10GeV GeV ~10 ~100 2-3 MeV ~10 ~10 GeV GeV 1014-1015 W ~100MeV MeV 2-3 MeV Power amplification to the required is achieved ~4000 A/beam ~400 A/beam ~10 ~1~1 A/beam A/beam ~400 A/beam ~10A/beam A/beamacceleration A/beam -400 A/beam -4000 A/beam and longitudinal~4000 bunching. ~10 ns ~100 ns ~~44µsµs ~10 µsµs beam combining, ~10 ns ~100 ns ~10 -100ns ~10ns by 14-1015 FIGURE 8. Block diagram ofWWisaisisachieved typicalby Power achieved byHeavy Ion Beam Poweramplification amplificationto tothe therequired required 10 1014-10 -1015W achieved by Power amplification to the required 10 beam acceleration bunching. beamcombining, combining, acceleration and longitudinal beam combining, acceleration and longitudinal longitudinal bunching. bunching. Driver for IFE. FIGURE Heavy Ion Ion Beam Beam FIGURE8. Block diagram FIGURE 8.8. Block Block diagram of aa typical Heavy Driver Driverfor forIFE. IFE. Driver for 14 15 Present HIF Experiments Presentthe HIF Experiments Present HIF Experiments At present HIF program is doing proof-ofprinciple experiments in orderis to learnproof-ofhow to build At present present the the HIF HIF program At doing proof-ofAt is doing proof-ofhigh current multiple beam injectors, how to transport principle experiments in order to learn how to principle principle experiments experiments in order to learn how to build build space charge dominated beams through quadrupoles, high current multiple beam injectors, how to transport high high current current multiple beam injectors, how to transport space charge dominated beams quadrupoles, andcharge how to neutralized the through space charge during final space dominated beams through quadrupoles, space charge dominated and how to neutralized the space charge during final focusing into the target chamber. Figure and how to neutralized the space charge during final9 is a and how focusing into the target chamber. Figure 9 is aa photograph of the High Current Experiment at focusing into the target chamber. Figure 9 is(HCX) focusing into photograph of the the High Current Experiment (HCX) atat+ at 1.6 photograph of High Current Experiment (HCX) LBNL [6]. The goal is to transport 0.5A of K photograph of the + LBNL[6]. [6]. The The goal is is to to transport transport 0.5A of LBNL 0.5Amodules of K K+ atat 1.6 1.6 MeV[6]. energy through 30-40 ESQ and LBNL The goal 1.6 4 or MeV energy energy through through 30-40 30-40 ESQ modules and 4 or MeV and MeV energy throughquadrupoles 30-40 ESQ modules 4study or the more magnetic in order to more magnetic quadrupoles in order to study the more magnetic quadrupoles in order to study the more magnetic quadrupoles dynamicaperture, aperture, steering, scraping, emittance dynamic steering, scraping, emittance dynamic aperture, steering, scraping, emittance dynamic steering, growth, and electron cloud effects. growth, andaperture, electron cloud effects. growth, growth, and and electron electron cloud effects. FIGURE 9. High Current Experiment (HCX) to study heavy ion 9. beam transport at 0.25µC/m line charge FIGURE High Current Experiment (HCX) to study FIGURE 9. 9. High Current (HCX)density. FIGURE High Current Experiment (HCX) to study heavy ion beam transport at 0.25µC/m line charge density. heavyTo ionbe beam transport at 0.25(iC/m cost effective, a fusion power plant driver heavy ion beam transport at 0.25µC/m line charge density. must multiple beams thatpower share plant a common To be aa fusion driver Toconsist be cost costofeffective, effective, To beof effective, a that fusion power plant driver set ofconsist induction cores. Since the cost share of the must multiple beams ainduction common must consist ofcost multiple share must consist of multiple beams that share a common cores is a major cost factor, it is necessary to minimize set of of induction induction cores. cores. Since Since the cost of the induction set set of induction cores. Since the cost of the induction the core size by building arrays of compact supercores is is aa major cost factor, it is necessary to minimize cores conducting quadrupoles. Figure 10 is an example of cores is a major cost factor, it is necessary to minimize the core size size by building arrays of compact superthe how to pack multiple quadrupole channels. the core size by building arrays of compact conducting quadrupoles. quadrupoles. Figure 10 10 is is an an example example of superconducting conducting quadrupoles. Figure 10 is example of how to how to pack multiple quadrupole channels. The traditional HIF injector, as the one an used in how to pack multiple quadrupole channels. HCX in Fig. is basedas large Theshown traditional HIF9,injector, injector, asontheusing The traditional HIF one aused in diameter surface ionization source. This type of HCX shown showntraditional in Fig. Fig. 9, 9,HIF is based HCX in is on as using large The injector, the aaone used in diameter surface in diameter surface ionization type ofa large HCX shown Fig. 9, source. is basedThis on using diameter surface ionization source. 21 chamber transport target target This type of injector is considered too large (and too costly) when it injector is considered too large (and too costly) when it comes to assembling ~ 100 beams for a driver. The comes to isassembling - 100 beams forcostly) a driver. injector considered large (and too whenThe it large diameter beams too also require a long matchinglarge diameter beams also require a long matchingcomes to assembling ~ 100 beamscomplicates for a driver.matter. The and-steering section that further and-steering section that complicates matter. large diameter alsofurther require long ofmatchingTherefore we arebeams developing a newatype compact Therefore we section are developing a new type of compact and-steering that further complicates matter. injector that is based on using plasma ion sources injector that isare based on using plasma ioncompact sources Therefore developing a new type of coupled withwe mini-beamlet channels [7]. coupled with mini-beamlet channels [7]. injector that is based on using plasma ion sources In new design, than hundred of of high high coupled channels In the thewith newmini-beamlet design, more more than aa[7]. hundred intensity mini-beamlets are extracted and accelerated intensity mini-beamlets are extracted and accelerated In the new design, more than a hundred of high to >> 11 MeV inside channels before they are are mini-beamlets are extracted accelerated tointensity MeV inside individual individual channelsand before they merged together to form a single beam of 0.5 -1.0 A to > 1 MeV inside channels merged together to form a single beambefore of 0.5they -1.0areA + individual + equivalent). beam current (K By controlling the merged together form a single beam of 0.5 -1.0 the A beam current (K to equivalent). By controlling aiming beamlets, aa merged can beam of current (K+ equivalent). By controlling the aiming of beamlets, merged beam beam can be be quickly quickly matched the Computer simulation aiming into of beamlets, merged beam can be quickly matched into the ESQ ESQachannel. channel. Computer simulation (using a 3D PIC code) showed that the emittance of matched into the ESQ channel. Computer simulation (using a 3D PIC code) showed that the emittance of the merged beam was acceptable and the required (using a 3D PIC code) showed that the emittance of the merged beam was acceptable and the required brightness could be if mini-beamlets have the merged beam was acceptable and the required brightness could be achieved achieved if the the mini-beamlets have 2 2. mini-beamlets brightness could>>be100 achieved if the haveaa current density mA/cm Figure 11 gives current density 100 mA/cm . Figure 11 gives 2 current density mA/cm . Figurebetween 11 gives the a comparison of reduction between the comparison of >the the100size size reduction comparison of advanced the size designs. reduction between the traditional and the traditional and the advanced designs. Future HIF HIF Projects Projects and and Plans Plans Future The HIF program is proposing to build the next HIF Projects and to Plans TheFuture HIF program is proposing build the next facility called the Integrated Beam Experiment (IBX), facility called the Integrated Beam Experiment (IBX), HIF program proposing build the next at The about $50M total is project cost. toThe experiment will at about $50M total project cost. The experiment will facility called the Integrated Beam Experiment (IBX),pulse be driver-scale in beam current but only short driver-scale in project beam current butexperiment only shortwill pulse atbeabout total The (~1 µs)$50M and limited in thecost. number of parallel beams (1 |is) and limited in the number parallel be(~1 driver-scale in beam current but of only short beams pulse (1 upgradable to 4). This experiment will demonstrate upgradable to 4). in This experiment will beams demonstrate (~1 µs) and limited the number of parallel (1 integrated beam beam models models for for injection, injection, acceleration, acceleration, integrated upgradable to 4). This experiment will demonstrate drift compression, compression, final focus focus and chamber chamber transport. drift final and transport. integrated beam models for injection, acceleration, drift compression, final focus andonchamber transport. In our development path, the way to eventually In our development path, on the way to eventually reaching commercial IFE power plant, we expect expect In our development path, on power the wayplant, to eventually reaching aa commercial IFE we another $300M facility containing prototype multiple reaching commercial power plant, we expect another a$300M facilityIFE containing prototype multiple beams $300M (>4) with with full pulse pulse lengthprototype and beam beam energy atat another facility containing multiple beams (>4) full length and energy few 100 MeV. Successful demonstration of beams (>4)100 withMeV. full pulseSuccessful length and beam energy at of ~~ few demonstration experiments on this facility will lead into the ~experiments few 100 MeV. Successful demonstration of on this facility will lead into the realization of ofonaa $$1B DEMO at beam beam energies energies of aa experiments this facility willat lead into the of realization IB class class DEMO realization of a $1B class DEMO at beam energies of a few GeV. few GeV. few GeV. ACKNOWLEDGMENTS ACKNOWLEDGMENTS ACKNOWLEDGMENTS traditional and the advanced designs. I would would like like to to thank thank Dr. Dr. William William Barletta Barletta for for I Iwould likemetoto thank Dr. invited Williamtalk, Barletta for recomending give this as well as his recomendingmemetoto give this invited talk, as well as his recomending this invited talk, as well as his contribution to to the thegive viewgraphs. am also also thankful for contribution viewgraphs. II am thankful for contribution to the viewgraphs. I am also thankful for the graphic graphic materials materials provided provided by by Dr. Dr. Ka-Ngo Ka-Ngo Leung Leung the the graphic materials provided by Dr. Ka-Ngo Leung and Dr. Dr. Bill Bill Chiu. Chiu. This This work work is supported supported by the the and and Dr. Bill Chiu. This work is is supported by by the Office of Fusion Energy, US DOE under contract No. OfficeofofFusion FusionEnergy, Energy, DOE under contract Office USUS DOE under contract No. No. DE-AC03-76SF00098. DE-AC03-76SF00098. DE-AC03-76SF00098. beam beam pipe pipe REFERENCES REFERENCES REFERENCES Y. Lee, Lee, et et etal,al, al,“Maskless “MasklessIonIon Ion Beam Projection 1.1. Beam Projection 1. Y.Y. Lee, "Maskless Beam Projection Lithography System”, in Proc. the International Conf. Lithography System”, in Proc. the International Conf. Lithography System", in Proc. the International Conf. 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Duggan and I. L. Morgan, AIP Press, New York (1997) 1313. Morgan, AIP Press, New York (1997) 1313. FIGURE 10. AAHIF HIF driver consists consists of an array of linacs FIGURE FIGURE 10. 10. A HIF driver driver consists of of an an array array of of linacs linacs using compactsuper-conducting super-conducting quadrupoles. quadrupoles. using compact using compact super-conducting Morgan, AIP Press, New York (1997) 1313. 4. S.T. Melnychuk, E. Kamykowski, J. Sredniawski, T. Melnychuk, E. E. Kamykowski, Kamykowski, J.J. Sredniawski, Sredniawski, T. 4. Debiak, S.T. Melnychuk, R. Ruegg, B. Milton, in Proc. of the Particle T. Debiak, R. R. Ruegg, Ruegg, B. B. Milton, Milton, in in Proc. Proc. of of the Particle Debiak, Accelerator Conference, New York, 1999, p587. the Particle i GUN Accelerator Conference, Conference, New New York, York, 1999, 1999,p587. p587. Accelerator 5. R.O. Bangerter, in Proc. of Inter. Symp. on Heavy Ion 5. Inertial R.O. Bangerter, Bangerter, in Proc. 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Kwan, published in in Laser Laser and and Particle ParticleBeams. Beams. published FIGURE 11. The HIF program is developing a new type of multicompact 11. injector toHIF replace the conventional type. FIGURE program is a new type of FIGURE 11. The The HIF program is developing developing compact compact injector injector to to replace the conventional type. p379, (2001) (2001) p379, 22
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