Materials Transactions, Vol. 45, No. 5 (2004) pp. 1601 to 1606 Special Issue on Recent Research and Developments in Titanium and Its Alloys #2004 The Japan Institute of Metals Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition Tsuyoshi Mano1 , Osamu Sugiyama1 , Yoshio Shibuya1 , Hiroshi Nakayama1 and Osamu Takai2 1 2 Fuji Industrial Research Institute of Shizuoka Prefecture, Fuji 417-8550, Japan Center for Integrated Research in Science and Engineering, Nagoya University, Nagoya 464-8603, Japan A double-layer film, in which the top layer was a diamond-like carbon (DLC) film and the bottom layer was a compositionally graded film of silicon and carbon compounds with decreasing C/Si atomic ratio to a substrate, was successfully formed on a Ti-6Al-4V substrate by an ionization deposition method. In the film deposition process, a benzene vapor was used for the DLC deposition as a source gas, and hexamethyldisiloxane and benzene vapors were used as source gasses for the compositionally graded film of silicon and carbon compounds. The results of ball-on-disk and scratching tests showed that the double-layer film with graded composition provided a low friction coefficient, high wear resistance and good adhesion with the Ti-6Al-4V substrate compared to a single-layer DLC film. The DLC-based double-layer film developed in this study is much effective in wide applications of the Ti-6Al-4V alloy for which the use to antifriction components has been difficult. (Received November 19, 2003; Accepted January 29, 2004) Keywords: titanium alloy, diamond-like carbon (DLC), double-layer film, graded composition, ionization deposition, X-ray photoelectron spectroscopy, low friction, wear resistance, adhesion 1. Introduction Ti-6Al-4V alloy is one of the most promising materials for mechanical and biomedical uses because it has excellent properties such as high strength, high ductility and high corrosion resistance. However, the wear resistance of Ti-6Al4V is often weak, which results in the difficulty to use for sliding parts without any surface treatment.1–3) In order to overcome this obstacle, some researches on implantation of nitrogen or carbon into the Ti-6Al-4V alloy or formation of TiN coating on it by a PVD process were carried out.4–7) However, the modified layer by the implantation process has insufficient thickness to be durable for a long period. Moreover, TiN coating has a high friction coefficient under dry condition, and its corrosion resistance is not enough, either.8–10) Consequently, development of novel coating material which provides high wear and corrosion resistance to Ti-6Al-4V has been intensely desired. Diamond-like carbon (DLC) coatings have good properties, such as high hardness, low friction coefficient and high corrosion resistance.11–14) However, the adhesion of hard DLC films with substrates is often weak, due to their high internal stress.15,16) Therefore the substrates which can offer good adhesion to DLC are limited, such as WC-Co alloy, silicon, etc. Hence there are very few reports17) of the deposition of DLC on Ti-6Al-4V. In this research, formation of a DLC based double-layer film on the Ti-6Al-4V substrate by an ionization deposition method18,19) was carried out to improve the wear resistance and adhesion for the Ti-6Al-4V substrate. The feature of this DLC based double-layer film is that the top layer is thick DLC of high hardness and the bottom layer is silicon-carbon compositionally graded compounds with decreasing C/Si atomic ratio to the substrate. Furthermore, this double-layer deposition process can be performed successively without the extinction of plasma. The wear resistance and adhesion of the DLC based double-layer film were examined by a ball-on- disk test and a scratch test. Further, the chemical bonding and composition of the compositionally graded film were evaluated with an X-ray photoelectron spectrometer (XPS). 2. Experimental Procedure An ionization deposition apparatus (Nanotec, DASH450DS) was used for the preparation of the DLC based double-layer films. Source gasses were hexamethyldisiloxane (abbreviated as HMDSO; [(CH3 )3 Si]2 O, >99:0% in purity) and benzene (C6 H6 , >99:9% in purity). Distance between a substrate and an anode was set to be 180 mm. Substrates were mirror-polished Ti-6Al-4V plates (Ra <0:05 mm, annealed; 34 mm 34 mm 3.2 mm). Ar ion bombardment for 20 min was performed prior to the deposition in order to clean up the surface of the substrate. The deposition was carried out under the conditions, gas pressure 0.15 Pa, filament current 30 A, anodic current 0.35 A, and negative bias voltage of the substrate 1500 V.20) These conditions were fixed throughout the deposition process for a set of all the layers. Three types of layer-structures with DLC films were formed in the present study as follows: (1) ‘‘single-layer DLC’’ (abbreviated as DLC), (2) ‘‘DLC/single composition layer’’ (abbreviated as DLC/SCL), and (3) ‘‘DLC/graded composition layer’’ (abbreviated as DLC/GCL). In the ‘‘DLC’’ structure, the DLC film was deposited directly onto the substrate. In the ‘‘DLC/SCL’’ or ‘‘DLC/GCL’’ structure, the SCL or GCL was deposited onto the substrate first and then the DLC film was done onto it. The DLC films were prepared by using a benzene vapor as a source gas. The SCL was prepared from the source gas of HMDSO alone, and the GCL was prepared from the source gasses of both HMDSO and benzene. In the preparation of the GCL, an adding volume ratio of HMDSO to benzene, [HMDSO]/[benzene] was decreased in a stepped mode as follows; 1.0 at first 5 min, 0.75 from 5 to 10 min, 0.50 from 10 to 15 min and 0.25 from T. Mano, O. Sugiyama, Y. Shibuya, H. Nakayama and O. Takai 3.1 Wear resistance and adhesion The nanoindentation hardness of three types of DLC-based films was measured in advance of the friction and wear experiments. The hardness of DLC, DLC/SCL and DLC/ GCL surfaces, on which each maximum indentation depth was about 110 nm, was 32 GPa, 29 GPa, and 30 GPa, respectively. That is, a hard DLC film was formed on the surface and the influence of a difference among the layerstructures on hardness was not observed. Figure 1 shows the variation of coefficients of friction with increasing number of cycles for three types of DLC-based films and the Ti-6Al-4V substrate obtained by the ball-ondisk test. The Ti-6Al-4V substrate has high coefficient of friction, about 0.40, from the early cycles. The DLC shows low coefficient of friction of 0.10 or less up to about 700 cycles, however the coefficient of friction is increasing rapidly after that cycle. The reason of this result is that the DLC film removed and the direct contact of the substrate with a ball occurred. It became clear by the observation of the DLC DLC / SCL 0.60 DLC / GCL Substrate (Ti-6Al-4V) 0.40 DLC 0.20 DLC/SCL DLC/GCL 0.0 0 200 400 600 800 1000 Number of cycles, N Fig. 1 Variations of the coefficients of friction with increasing number of cycles in the ball-on-disk test for three types of DLC-based films and the Ti-6Al-4V substrate. optical microscope. The DLC/SCL and the DLC/GCL are maintaining with the low coefficient of friction. Moreover, the lifetime of the DLC/SCL and the DLC/GCL was 70700 cycles and more than 100000 cycles, respectively. The DLC/ GCL maintained the low coefficient of friction over the long time. Figure 2 shows the wear volumes of the samples tested at 1000 cycles and at 60000 cycles. The Ti-6Al-4V and the DLC had severe wear volumes more than 0.3 mm3 . The measurement of wear volume was unable at 60000 cycles due to their over-wearing apparent. The DLC/SCL and the DLC/ GCL have better wear resistance when compared to these two samples. For the DLC/SCL, the wear volume at 60000 cycles (0.0035 m3 ) has about 1.5 times larger than that the wear volume at 1000 cycles (0.0025 m3 ). The wear resistance of the DLC/SCL is falling with increasing number of cycles. For the DLC/GCL, both the wear volumes at 1000 cycles and 60000 cycles are around 0.002 m3 . That is, the DLC/GCL exhibits better wear resistance than the DLC/SCL. 0.350 At 1000 cycles At 60000 cycles 0.300 0.006 0.004 0.002 No data Results and Discussion Substrate (Ti-6Al-4V) No data N 3. 0.80 Coefficient of friction 15 to 20 min. Total thicknesses of DLC, DLC/SCL and DLC/GCL were fixed at about 1.5 mm, which were measured with a contacting profilometer, by controlling deposition time. The thicknesses of the SCL and the GCL were about 0.25 mm. Hardness of the films was measured with a nanoindentation hardness tester (CSM, NHT) using a Vickers type indenter under the conditions where maximum load was 5.0 mN and load-unloading velocity was 10 mN/min. Friction and wear experiments were carried out under dry air at room temperature using a ball-on-disk type wear tester (CSM, Tribometer). An alumina ball (radius; 3.2 mm, Vickers hardness; 14 GPa) was used as a counterpart material. A normal load of 20 N was applied on top of the ball. A sliding velocity was 0.2 m/s, number of cycles were 1000 and 60000 (wear distance; 31.4 m and 1884 m, respectively). The coefficient of friction was measured during the tests. The reproducibility of the measurements was good and the uncertainty was negligible. After the tests, to calculate wear volume, measurements of the cross sectional areas of the wear tracks were conducted at four different places and the measured values were then averaged. The wear tracks were characterized with an optical microscope (Keyence, VHX-100) and an electron probe microanalyzer (EPMA: Shimadzu, EPMA-1600). A scratch tester (CSM, Revetest) equipped with a radius of 200 mm diamond indenter was used at the load velocity of 100 N/min to estimate the adhesion of DLC-based films. A critical load was defined as the load at which the frictional force began to increase rapidly.21) Composition and chemical bonding state of the GCL were analyzed with an X-ray photoelectron spectrometer (XPS: Shimadzu, ESCA-K1) using MgK radiation of 12 kV20 mA. Ar ion etching for 10 to 250 min at a 10 min interval was performed for the depth profiling. The analyzing surface area was approximately 5.0 mm 5.0 mm. The absolute values for the energy scale were calibrated by referencing them to the O1s binding energy of O-Si as 531.5 eV.22) Wear volume, V / mm3 1602 0 DLC DLC/SCL DLC/GCL Substrate (Ti-6Al-4V) Fig. 2 Wear volumes of three types of DLC-based films and the Ti-6Al-4V substrate obtained at 1000 cycles and 60000 cycles. Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition 1603 film. Figure 3(b) shows the tracks for the DLC/SCL. Long and slender scars are observed in some places on the wear tracks at 60000 cycles. The depth from the surface to the scars was about 1.3 mm, and the presence of silicon and carbon was confirmed by the EPMA measurement. Therefore the ‘‘SCL’’ was exposed in these scars. Thin and shallow wear tracks were observed for the DLC/GCL at 60000 cycles, and no particle and scar were observed along the wear tracks, as shown in Fig. 3(c). Since there was no significant difference of the bonding states in Raman spectra as well as the surface hardness among the three types of the DLC-based films, the enhancement of wear resistance for DLC/GCL is not owing to an improvement of the top DLC layer. The scratch test was performed in order to investigate the adhesion strength between each DLC-based film and the Ti6Al-4V substrate. Figure 4 shows the critical loads obtained by the scratch test, in which average values of three repetitive measurements and their standard deviations are drawn as vertical columns and error-bars, respectively. The critical loads of the DLC/SCL and DLC/GCL were 28 N and 34 N, which were approximately 2.5 and 3.0 times larger than the critical load (11 N) of the DLC. As a result, the insertion of the intermediate layers, especially of this GCL film, was approved to be fairly effective on the enhancement of adhesion strength between the top DLC film and the substrate. A residual stress value was roughly estimated from the displacements in the bending curvature of silicon wafer substrates (34 mm 34 mm 0.5 mm) with the DLC, the DLC/SCL, and the DLC/GCL film. As a result, the residual stress was about 5.4 GPa, 2.0 GPa, and 1.4 GPa as compressive, respectively, and the DLC/GCL film was the lowest. The reduction of this residual stress of DLC/GCL presumably enhanced the adhesion with the substrate. Furthermore, it is speculated that the reason why the DLC layer of the DLC film was peeled off in the ball-on-disk wear test is possibly because the adhesion strength of the DLC layer with the substrate was insufficient. That is, the excellent adhesion between the DLC film and the substrate is considered to have contributed also to the improvement of the wear resistance by the ball-on disk tests of normal load of 20 N. Fig. 3 Optical micrographs of the wear track surfaces of three types of DLC-based films: (a) the DLC at 1000 cycles, (b) the DLC/SCL at 60000 cycles and (c) the DLC/GCL at 60000 cycles. Figure 3 shows the wear track surfaces of three types of DLC-based films observed with an optical microscope. In the case of the DLC shown in Fig. 3(a), wide and deep wear tracks are formed at 1000 cycles, and the metal surface of Ti6Al-4V is exposed. Many particles are seen in the wear tracks. The main element of these particles is carbon from the elemental analysis by EPMA, and they are debris of the DLC Critical load, L / N 50 40 30 20 10 0 DLC Fig. 4 DLC/SCL DLC/GCL Critical loads of three types of DLC-based films. T. Mano, O. Sugiyama, Y. Shibuya, H. Nakayama and O. Takai Ti Si O 0 50 100 150 200 250 Etching time, t / min Intensity (arb.unit) Ti Fig. 5 XPS compositional change along the depth direction from surface to substrate for the GCL film obtained with Ar etching (etching time: 0 to 250 min). Si-C C Si-O Si O C4 Intensity (arb.unit) C Ti silicon content increases simultaneously with increasing etching time. These contents change in a stepped mode, corresponding to the intermittent changes in the gas volume ratio by the 5 min intervals in the deposition process. This compositional change contributes to relaxation of the residual stress between the DLC layer and the substrate. Figure 6 shows the variation of O1s , Ti2p , C1s and Si2p photoelectron spectra of the GCL with the etching time. At the etching time of 10 min (near the GCL surface), C1s peak intensity is highest. After that, it decreases with increasing etching time, corresponding to the compositional change shown in Fig. 5. Moreover, the peak shift from ‘‘C3’’ to ‘‘C4’’ was observed with increasing etching time. It shifted from 284.5 to 283.7 eV between the etching times of 10 min and 200 min. The reason of this peak shift will be discussed later. The intensity of Si2p peak becomes high till the etching time of about 180 min, corresponding to inversely decrease in that of C1s . At the same etching time, Ti2p peak appears which belongs to the substrate. The significant peak shifts of Si2p do not occur. The binding energy of Si2p peak is close to 100.4 eV of Si-C, a reference value.22) Here, Si was not bonded to a methyl group since this value much differs from 105.9 eV22) of Si(CH3 )4 . Small O1s peak appears and disappears being synchronized with Si2p peak. This peak is, therefore, possibly assigned to O-Si. The deconvolution of Si2p showed the relative area for Si-O bond (102.2 eV) as about 1% in the total Si2p area. It is thought that a little amount of Si-O species also exists in a large amount of Si-C species. This Si-O probably originated from siloxane bonds, Si-O-Si, in HMDSO as a source gas. Figure 7 shows the enlarged C1s spectra at the etching time of 20 min, 150 min and 200 min paying attention to C1s of Fig. 6. These peaks were fitted to a deconvolution of a Gaussian profile.23,24) At the etching time of 20 min, as shown in Fig. 7(a), the binding energy before the deconvolution of C1s spectrum is 284.5 eV, and it is very close to 284.4 eV22) C5 3.2 Analysis of the GCL film The DLC/GCL on the Ti-6Al-4V substrate was approved to be fairly effective on the enhancement of wear resistance and adhesion. In order to clarify the reason of these improvements, the composition and chemical bonding state of the GCL were analyzed. Although X-ray diffraction measurement of this GCL was performed, any peaks except for the Ti-6Al-4V substrate were not observed. Thus, the GCL was considered to be amorphous or microcrystalline structure. From XPS analysis, existence of carbon, silicon and oxygen was observed in the GCL film. Figure 5 shows the compositional change along the depth direction from the film surface to the substrate obtained by changing the etching time from 0 to 250 min. The carbon content decreases but the C3 1604 Binding energy, E/ eV B Fig. 6 Variation of O1s , Ti2p , C1s and Si2p photoelectron spectra of the GCL with the etching time. Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition these facts into account, the reduction in the residual stress of the DLC/GCL is due to the changes in these compositions and chemical bonding states, which results in the improvement of the adhesion with the substrate. C3 (a) C1 C2 C4 C5 4. Intensity (arb.unit) 1605 Conclusion Formation of the DLC based double-layer film on the Ti6Al-4V substrate by an ionization deposition method was carried out in order to improve the wear resistance and adhesion of the film. The DLC/GCL on the substrate was approved to be fairly effective on the enhancement of wear resistance and adhesion, comparing with the DLC and the DLC/SCL. The GCL was characterized by the change in composition and chemical bonding state. The results led us that the improvement in adhesion and wear resistance of the top DLC layer was based on this change in the composition and chemical bonding state in the GCL. The DLC/GCL double-layer film is much effective in wide applications of Ti-6Al-4V for which the use for antifriction components has been difficult. (b) Acknowledgements (c) The collaboration of Mr. M. Yoshioka, Shizuoka Industrial Research Institute of Shizuoka Prefecture, with the XPS measurements is gratefully acknowledged. The authors would also like to thank Mr. A. Nishiguchi and Dr. T. Sumiya, Nanotec Co., for their helpful discussion on this study. 290 286 282 278 Binding energy, E/ eV Fig. 7 C1s XPS spectra of the GCL at various etching time: (a) 20 min, (b) 150 min and (c) 200 min. (C3) of graphite. It is thought that the graphite-rich layer contributes to the binding strength between the top DLC layer and the GCL. Moreover, 286.7 eV22) (C1) of C-O bond, 285.5 eV22) (C2) of C-H, and 283.3 eV22) (C4) of C-Si also exist slightly. It could be separated into two high peaks of C3 at graphite and C4 at C-Si and one low peak of C1 at C-O, as shown in Fig. 7(b). That is, the composition in the GCL is probably a mixture of graphite and silicon carbide. In Fig. 7(c), the 281.8 eV22) (C5) peak of the C-Ti bond is newly indicated in addition to C3, C4 and C1. Accordingly, existence of titanium carbide implies that the chemically bonding reaction has occurred between the deposited GCL and the Ti-6Al-4V substrate. From the results of the compositional depth profile by the XPS analysis, the GCL was characterized as the compositional change of silicon from carbon in a stepped mode. Furthermore, based on the analysis of the chemical bonding state, it was confirmed that variation of components occurred from ‘‘graphite’’ to ‘‘silicon carbide + graphite’’ and ‘‘silicon carbide + graphite + titanium carbide’’, which corresponded to the positions from the top to bottom of the GCL. Taking REFERENCES 1) Y. J. Kim, H. S. Chung and S. J. L. Kang: Mater. Sci. Eng. A 333 (2002) 343–350. 2) M. Long and H. J. Rack: Biomaterials 19 (1998) 1621–1639. 3) K. Takahashi and Y. Marui: Kinzoku (Materials Science & Technology) 73 (2003) 435–439. 4) S. Saritas, R. P. M. Procter and W. A. Grant: Mater. Sci. Eng. 90 (1987) 297–306. 5) R. A. Buchanan, E. D. Rigney and J. M. Williams: J. Biomed. Mater. Res. 21 (1987) 367–377. 6) M. Ueda, M. M. Silva, C. Otani, H. Reuther, M. Yatsuzuka, C. M. Lepienski and L. A. Berni: Surf. Coat. Technol. 169–170 (2003) 408– 410. 7) E. Leitao, C. Sa, R. A. Silva, M. A. Barbosa and H. Ali: Corr. Sci. 37 (1995) 1861–1864 8) A. Mitsuo and T. Aizawa: Mater. Trans., JIM 40 (1999) 1361–1366. 9) A. Mitsuo, T. Akhadejdamrong and T. Aizawa: Mater. Trans. 44 (2003) 1295–1302. 10) A. Kagiyama, K. Terakado and R. Urao: Surf. Coat. Technol. 169–170 (2003) 397–400. 11) D. Drees, J. P. Celis, E. Dekempeneer and J. Meneve: Surf. Coat. Technol. 86–87 (1996) 575–580. 12) D. Y. Wang, C. L. Chang and W. Y. Ho: Surf. Coat. Technol. 111 (1999) 123–127. 13) C. Donnet, J. Fontaine, T. L. Mogne, M. Belin, C. Heau, J. P. Terrat, F. Vaux and G. Pont: Surf. Coat. Technol. 120–121 (1999) 548–554. 14) H. Liu, A. Tanaka and K. Umeda: Thin Solid Films 346 (1999) 162– 168. 15) H. Fukui and H. Ohara: Surf. Coat. Technol. 146–147 (2001) 378–382. 16) M. M. Morshed, D. C. Cameron, B. P. McNamara and M. S. J. Hashimi: Surf. Coat. Technol. 169–170 (2003) 254–257. 17) D. H. Kim, H. E. Kim, K. R. Lee, C. N. Whang and I. S. Lee: Mater. Sci. Eng. C 22 (2002) 9–14. 1606 T. Mano, O. Sugiyama, Y. Shibuya, H. Nakayama and O. Takai 18) C. Weissmantel, K. Bewilogua, K. Breuer, D. Dietrich, U. Ebersbach, H. J. Erler, B. Rau and G. Reisse: Thin Solid Films 96 (1982) 31–34. 19) T. Ueda, T. Nakamura, Y. Ide and K. Mukai: J. Japan Inst. Metals 58 (1994) 1120–1125. 20) T. Mano, Y. Shibuya, O. Sugiyama, H. Nakayama and O. Takai: J. Surf. Finish. Soc. Jpn. 54 (2003) 545–546. 21) P. A. Steinmann, Y. Tardy and H. E. Hintermann: Thin Solid Films 154 (1987) 333–349. 22) D. Briggs and M. P. Seah: Practical Surface Analysis, (Vol. 1, 2nd. ed. 1990) pp. 598–606. 23) Y. Inoue, T. Komoguchi, H. Nakata and O. Takai: Journal of Korean Institute of Surface Engineering 29 (1996) 519–524. 24) K. H. Lee, Y. Inoue, H. Sugimura and O. Takai: Surf. Coat. Technol. 169–170 (2003) 336–339.
© Copyright 2026 Paperzz