NANO LETTERS Formation of λ-DNA’s in Parallel- and Crossed-Line Arrays by Molecular Combing and Scanning-Probe Lithography 2006 Vol. 6, No. 7 1334-1338 Minjung Shin,† Chilwoo Kwon,† Seong Kyu Kim,*,† Hyung Jin Kim,‡ Yonghan Roh,‡ Byungyou Hong,‡ Jong Bae Park,†,§ and Haeseong Lee*,§ Department of Chemistry and School of Information and Communication Engineering, Sungkyunkwan UniVersity, Suwon 440-746, Korea, and Korea Basic Research Institute, Jeonju 561-756, Korea Received January 24, 2006; Revised Manuscript Received May 16, 2006 ABSTRACT With the combination of a molecular combing technique and scanning-probe lithographic patterning, λ-DNA’s were stretched and aligned to form line array structures on patterned organic monolayer surfaces. The pattern was generated by anodizing a silicon surface using scanningprobe lithography to implant a polar organic layer in the middle of a nonpolar layer. The molecule in the polar layer, (aminopropyl)triethoxysilane (APS), has a −NH3+ terminal group, which interacts strongly with phosphate backbone of DNA and provides a site for selective attachment of DNA. When parallel lines of APS were patterned, followed by combing along the lines, a single DNA was attached from the very top of each line and stretched along the line all the way to the bottom. The DNA−APS interaction was strong enough to withstand the second combing applied perpendicular to the first one. Thereby, the crossed-line array of DNA’s was formed on the crossed-line array pattern of APS on a silicon substrate. For many applications of nanoscale science, positioning component materials into a desired location on a solid surface is a crucial technique. Selective binding of the component materials can be achieved on a functionalized surface that is patterned with two different chemical layers whose interaction strengths with the materials are markedly different. Alignment of nanowires or nanotubes along one direction can be induced if the surface pattern is designed with parallel lines or if an external force by flow, gravity, gas blowing, or electric field is exerted along one direction. The reports on selective binding and alignment of carbon nanotubes,1,2,6 Si, InP and GaP nanowires,3,4 and V2O5 nanowires5,6 are good examples. In the case of aligning long DNA’s into a single direction on surface, techniques generally termed “molecular combing”7-17 are used widely. They use a surface tensional force at the air-water interface of a DNA solution translating on a grafted substrate. When the speed of translation and the substrate-DNA interaction are balanced, DNA’s are stretched along the direction normal to the air-water interface. The translation of the air-water interface is induced by sliding * Corresponding authors. E-mail: [email protected]; [email protected]. † Department of Chemistry, SKKU. ‡ School of Information and Communication Engineering, SKKU. § Korea Basic Research Institute. 10.1021/nl060160u CCC: $33.50 Published on Web 06/14/2006 © 2006 American Chemical Society a droplet of DNA solution between a pair of glasses,7-13 or by pulling the substrate out of DNA solution.14-16 In modified versions of the combing, methods of sucking up17-19 the droplet using a pipet, blowing it with gas,20,21 or evaporating it on a spinning substrate22 have been demonstrated. In our recent (unpublished) work, sliding the DNA droplet down the tilted substrate produced a similar effect. The combing method can maximize its capability when the surface is prepatterned. By specifying the location and the direction of DNA attachment determined by prepatterning, the substrate can serve as templates for wires in nanoscale devices or can assist in high-resolution genomic studies. There are a few examples in which DNA’s were stretched and aligned across the patterned lines.23,24 However, if DNA’s are stretched and aligned along parallel lines, the direction and interval of the attached DNA’s would be predetermined and formed much more uniformly. We showed in our recent report25 that constructing such a structure is realistic; λ-DNA’s were successfully stretched and aligned by combing along parallel lines of a polar organic layer produced by self-assembly and the scanning-probe lithography (SPL) technique. In this letter, we will present some new characteristics in the parallel-line structures and will show that the same methodology can be used to produce crossed-line arrays of long DNA’s. Figure 1. Summary of DNA alignment in this work. Parts a-e are the procedure and part f depicts the cross-section of part c. Our strategy is summarized in Figure 1. First, a monolayer of octadecyltrichlorosilane (OTS) was formed on a cleaned surface of silicon substrate, cut by 5 × 5 mm2 (Figure 1a). Then, using an atomic force microscope (AFM, SII SPA400), SPL patterning by anodizing the silicon surface was performed. The lithographic pattern was an array of either parallel lines or crossed lines (like a checkerboard pattern). Lines of oxidized silicon were formed whose width and height were typically about 150 and 3 nm, respectively. During this process, the OTS molecules in the oxidized region must have been stripped out26 (Figure 1b). Then, the sample was immersed into 0.1 mM (aminopropyl)triethoxysilane (APS) solution of anhydrous toluene. APS is expected to replace the stripped-out OTS in the oxidized region (Figure 1c) and provides a site for selective attachment of DNA through a Coulombic interaction between the -NH3+ moiety of APS and the phosphate backbone of DNA. For the combing, we used a custom-made dipping/pulling machine whose translation is directed parallel to the side edges and the patterned lines of the silicon substrate. The patterned silicon substrate was translated into a 9-mm-innerdiameter tube that contained 500 µL of λ-DNA solution (BioLabs, 48.5 kbp, pH 8.0) until the whole substrate was immersed. The concentration of the λ-DNA solution was 2 µg/mL for the parallel-line array or 0.2 µg/mL for the crossed-line array. After 3 min, the substrate was translated out at the same speed. The speed of the substrate translation was 32 µm/s, corresponding to 50 µm/s for water meniscus. Nano Lett., Vol. 6, No. 7, 2006 After the combing, the sample was washed with water to remove solid salts and weakly bound λ-DNA’s. On the first combing, λ-DNA’s were stretched and attached only on the APS/SiOx lines (Figure 1d). When the crossed-line array of λ-DNA’s was to be formed, the sample after the first combing was dried over hours and the second combing was applied perpendicular to the first one (Figure 1e). Other experimental details are found in ref 25 and also in the Supporting Information. Figure 2 is an example of fully aligned λ-DNA’s along the parallel lines of APS/SiOx. Thirteen APS/SiOx parallel lines 15 µm in length, separated by 1 µm, were manufactured by SPL, and the combing was applied from the top to the bottom of Figure 2. Here, we define the direction of combing as that of the receding water meniscus when the substrate is pulled out of the solution. Initially, we obtained the tappingmode AFM image of the patterned area with 512 × 512 pixels2 in a 18 × 18 µm2 window (not shown in this letter). However, because the thickness of DNA is much smaller than the pixel size, the presence of DNA was not identifiable. Then, the tapping-mode AFM scans were conducted with 512 × 512 pixels2 in 4 × 4 µm2 windows. Five areas in the left side of the whole pattern were scanned with the finer resolution, and their images were then overlapped to reconstruct the whole picture for the left four lines (the left image of Figure 2). The black broken lines in Figure 2 indicate the boundaries of the overlaps. The yellow bold lines represent mostly the outgrown oxidized silicon. The white 1335 Figure 2. Attachment of stretched λ-DNA’s along the parallel APS/SiOx lines. The left image shows only the left 4 lines of the 13 fabricated lines. The left image was reconstructed by overlapping five high-resolution images of the AFM tapping-mode scan. The black broken lines indicate the boundaries of the overlaps. The three images on the right are magnified from the blocked area of the left image. Single λ-DNA is found on every APS/SiOx line. More magnified images are available in the Supporting Information. 1336 objects are unwashed solid salts that were originated from the buffer solution. When Figure 2 is examined closely, a single λ-DNA is found on every APS/SiOx line. (See the magnified images on the right side of Figure 2. More magnified images are available in the Supporting Information.) In fact, a single DNA was attached from the very top of each line and stretched along the line all the way to the bottom. In contrast, no DNA is found in the OTS area. Because the average length of a stretched λ-DNA is estimated (following 2.4 kbp/µm)9,10 to be 21 µm, the tailing part of it should appear outside the 15 µm APS/SiOx line. This was observed in our recent work,25 where tailing parts of λ-DNA’s were clung to the bottom of APS/SiOx lines and extended into the OTS region. The length of the patterned lines in the previous work was 20 µm, and that of the λ-DNA’s extended into the OTS region ranged between 0 and 6 µm, from which we estimated the anchoring positions of the λ-DNA’s to be within 5 µm from the top of APS/SiOx lines. In contrast to our previous work, the tailing parts of λ-DNA’s at the bottom of APS/SiOx lines were not observed in Figure 2. This is probably because they were cut out by the AFM tip during the tapping-mode scan. The λ-DNA’s may be cut at the boundary of APS/SiOx and OTS regions because an excess force by the tip may be exerted due to the abrupt height change during the scan. In fact, even in the previous work25 the cuts were found at several boundaries. The condition of the tapping-mode AFM scan under which λ-DNA’s are cut at the boundary is currently unknown and beyond our control. The absence of λ-DNA’s extended above the top of APS/ SiOx lines may have a different implication from the cut at the boundary. In most AFM images taken in our laboratory, λ-DNA’s extended above the top of the lines were rarely observed while the tailing parts often appeared at the bottom. It suggests that DNA extremities have higher binding strengths, in agreement with Bensimon’s model,7-10 and the anchoring position of λ-DNA was the top of each APS/SiOx line. This can be explained as follows. While the substrate is in DNA solution at the incubation stage of the combing, the water meniscus is in the OTS environment above the top of APS/SiOx lines. The hydrophobic or van der Waals (vdW) interaction between OTS and DNA near the substrate surface is so weak that the tensional force of the moving water meniscus can sweep the DNA’s off the substrate surface. As the water meniscus moves down, DNA’s accumulate at the water meniscus. (There are many evidences of the higher concentration of DNA at moving meniscus on combing. For example, see ref 27.) At the moment the water meniscus reaches the top of APS/SiOx lines, DNA is anchored by the strong Coulombic interaction with APS. Because at this point the surface concentration of DNA at the top is much higher than that at the rest part, the anchoring is preferentially made at the top of the APS/SiOx lines. We think that this effect was small in our previous work25 because a much lower concentration of DNA was used for the combing. After the water meniscus passes by the top of the lines, the interfacial force stretches DNA’s along the APS lines, Nano Lett., Vol. 6, No. 7, 2006 while weakly bound DNA’s in the OTS region are washed away. The speed of combing should be determined such that the interfacial force is greater than the vdW interaction between OTS and DNA but less than the Coulombic interaction between APS and DNA, while DNA’s are in solution. After the combing is over, water molecules evaporate away from the substrate and the vdW force increases as the DNA’s come closer to the substrate surface. Any DNA’s in the OTS region that were not detached during the process of combing should be rinsed away before the vdW force increases too much. After the sample is completely dried, it is very difficult to remove DNA’s from both APS and OTS regions. Another remarkable observation in Figure 2 is that a single DNA is attached in each patterned line. A single DNA in fact runs through the middle of each patterned line. This observation is similar to the work by Hong and co-workers,6 where V2O5 nanowires and carbon nanotubes were aligned along lines of micrometer-thick polar organic layers. Following their idea and experimental evidences, we suggest that the binding efficiency of APS with DNA across the line is shaped as a convex lens; the density of APS and the orientation of the -NH3+ moiety are most favorable in the middle of a patterned line and become unfavorable towards the line edges. So even if the width of the patterned APS/ SiOx line was 150 nm, the effective width for binding DNA was much narrower. And this effect plus the electrostatic repulsion between multiple DNA’s may have resulted in the formation of a single DNA per patterned line. There have been several successful attempts to construct a two-dimensional (2D) network structure of DNA by applying combing methods twice,21,28 the second one perpendicular to the first one. However, none have produced the 2D structure on a crossed-line patterned surface. When the combing is applied to the crossed-line pattern, there are a couple of difficulties to be overcome. First, there is a high possibility of the crossover after the first combing, because perpendicular lines were drawn in addition to the parallel lines in the pattern. DNA’s will attach not only along the parallel lines but also across the perpendicular lines. The difference is in the binding energies of the two; the DNA’s aligned along the parallel lines must have much higher binding energies than the DNA’s hung across the perpendicular lines. The weaker-bound crossover DNA’s can be washed away during the combing or by extra rinsing. The difference in the binding energy increases as the width of the patterned line decreases for a fixed line interval. In our case, the average width of the patterned lines was about 150 nm while their interval was 1 µm. However, because the effective area of APS for binding DNA’s is much narrower, the chance of crossover will be lower than the ratio dictates. Another aspect to consider for the formation of the crossed-line structure is whether the structure of the first combing would be preserved in the process of the second combing. The image of Figure 2 remained unchanged after several harsh wash-outs. Therefore, we expect that the structure after the first combing can be preserved during the second combing. However, Figure 2 shows one drawback; Nano Lett., Vol. 6, No. 7, 2006 Figure 3. Attachment of stretched λ-DNA’s on the crossed-line array of APS/SiOx. (a) Tapping-mode AFM (topographic) image of the whole patterned area. (b) A higher scan-resolution image. The attached λ-DNA’s were stained with gold nanoparticles and appeared as the brightest objects. The two arrows marked with I and II indicate the directions of the first and the second combing, respectively. More higher scan-resolution images are available in the Supporting Information. there appears to be a large amount of solid salts that reside in the APS area. The presence of the solid salts would decrease the binding strength of APS with DNA on the second combing. The amount of solid salts is high at high DNA concentration. (For examples, compare Figure 2 with the figures in ref 25.) This is probably because the ion concentration in the DNA solution is locally high in the vicinity of a DNA chain, so more ions would be attracted to APS when the combing was carried out at a high concentration of DNA solution. To form a crossed-line array of λ-DNA’s, a 9 × 9 array of 11-µm-long APS/SiOx lines was patterned. Then, the combing with λ-DNA was carried out twice; the second one perpendicular to the first one. When the same concentration of λ-DNA solution as that in Figure 2 was used, some λ-DNA’s, after the first combing, were undesirably attached across the perpendicular lines in addition to the desirable parallel attachment. Besides, the high concentration produced too many solid salts in the APS area. Therefore, we reduced the concentration of λ-DNA solution to 0.2 µg/mL. This time, 1337 to observe the structure in a large window at once, we made the attached DNA’s thicker by staining with positively charged gold nanoparticles, synthesized with aniline as a reducing agent. (See ref 25 or the Supporting Information.) Figure 3 is the tapping-mode AFM images of the result. The brightest objects are gold nanoparticles attached to the DNA backbone. The gold nanoparticles bound very weakly on the OTS and APS layers were washed away by rinsing, whereas they attached strongly to the negatively charged DNA backbone. In Figure 3a, the directions of the first and the second combings are indicated by the arrows marked with I and II, respectively. Figure 3b is a finer-scan image with 512 × 512 pixels2 in a 4 × 4 µm2 window, where the brighter objects forming lines indicate the DNA backbone. Because the DNA’s were not fully stained with the gold nanoparticles, we may not give a clear picture of the structure. However, to the best of our analysis with more finer-scan images (see the Supporting Information), we judge the structure as follows. In the direction of the first combing, each line of 2, 4, 6, 8, and 9 was fully covered with a λ-DNA from the top to the bottom. On lines 3, 5, and 7, the coverage within a few micrometers from the top was not clear. Line 1 was covered with multiple DNA’s, one of which was displaced from the line when the second combing or washing was carried out. In the direction of the second combing, each line of A, B, D, E, F, G, and I was fully covered with a λ-DNA from the top to the bottom. On lines C and H, the coverage within a few micrometers from the top was not clear. The overall quality of the first combing in Figure 3 was not as good as that in Figure 2. Other than the DNA coverage on the APS/SiOx lines, DNA’s in the OTS region were not completely removed. Over each top of lines 2, 4, and 6, a DNA was extended into the OTS region. The shorter patterned lines and the lower DNA concentration to avoid the crossover and the solid salts formation could be reasons for the poor performance of the first combing. We think that the translation speed and the incubation time on combing should yet be optimized for the crossed-line array. Nonetheless, Figure 3 implies that the decent structure of crossedline array of λ-DNA is possible once optimizing the combing condition is further developed. In conclusion, we produced a perfect line array structure of λ-DNA’s with the combination of the organic monolayer assembly, SPL, and molecular combing. For the crossedline array structure, the optimal condition for combing is stricter, but the example structure we produced in this work suggests the methodology is a promising technique for constructing similar structures for two-dimensional nanoscale devices. Acknowledgment. This work was supported by the National R&D Project for Nano Science and Technology 1338 (Contract No. M10214000110-02B1500-01800) of MOST and the SRC program (Center for Nanotubes and Nanostructured Composites) of KOSEF. Supporting Information Available: Experimental details, magnified details of Figure 2, and higher resolution images of Figure 3. This material is available free of charge via the Internet at http://pubs.acs.org. References (1) Liu, J.; Casavant, M. J.; Cox, M.; Walters, D. A. Boul, P.; Lu, W.; Rimberg, A. J.; Smith, K. A.; Colbert, D. T.; Smalley, R. E. Chem. Phys. Lett. 1999, 303, 125-129. (2) Choi, K. H.; Bourgoin, J. P.; Auvray, S. Esteve, D.; Duesberg, G. S.; Roth, S.; Burghard, M. Surf. Sci. 2000, 462, 195-202. (3) Huang, Y.; Duan, X.; Wei, Q.; Lieber, C. M. Science 2001, 291, 630-633. (4) Whang, D.; Jin, S.; Lieber, C. M. Jpn. J. Appl. Phys. 2004, 43, 44654470. (5) Myung, S.; Lee, M.; Kim, G. T.; Ha, J. S.; Hong, S. AdV. Mater. 2005, 17, 2361. (6) Myung, S.; Im, J.; Huang, L.; Rao, S. G.; Kim, T.; Lee, D. J.; Hong, S. J. Phys. Chem. B 2006, 110, 10217-10219. (7) Bensimon, A.; Simon, A.; Chiffaudel, A.; Croquette, V.; Heslot, F.; Bensimon, D. Science 1994, 265, 2096-2098. (8) Bensimon, D.; Simon, A. J.; Croquette V.; Bensimon, A. Phys. ReV. Lett. 1995, 74, 4754-4757. (9) Weier, H.-U. G.; Wang, M.; Mullikin, J. C.; Zhu, Y.; Cheng, J.-F.; Greulich, K. M.; Bensimon, A.; Gray, J. W. Hum. Mol. Genet. 1995, 4, 1903-1910. (10) Allemand, J.-F.; Bensimon, D.; Jullien, L.; Bensimon, A.; Croquette, V. Biophys. J. 1997, 73, 2064-2070. (11) Ouyang, Z.; Hu, J.; Chen, S.; Sun, J.; Li, M. J. Vac. Sci. Technol., B 1997, 15, 1385-1387. (12) Hu, J.; Wang, M.; Weier, H.-U. G.; Frantz, P.; Kolbe, W.; Oglitree, D. F.; Salmeron, M. Langmuir 1996, 12, 1697-1700. (13) Woolley, A. T.; Kelly, R. T. Nano Lett. 2001, 1, 345-348. (14) Michalet, X.; Eklong, R.; Fougerousse, F.; Rousseaux, S.; Schurra, C.; Hornigold, N.; van Slegtenhorst, M.; Wolfe, J. Povey, S.; Beckmann, J. S.; Bensimon, A. Science 1997, 277 1518-1523. (15) Gueroui, Z.; Place, C.; Freyssingeas, E.; Berge, B. Proc. Natl. Acad. Sci. U.S.A. 2002, 99, 6005-6010. (16) Petit, C. A. P.; Carbeck, J. D. Nano Lett. 2003, 3, 1141-1146. (17) Otobe, K.; Ohtani, T. Nucleic Acids Res. 2001, 29, e109. (18) Nakao, H.; Hayashi, H.; Yoshino, T.; Sugiyama, S.; Otobe, K.; Ohtani, T. Nano Lett. 2002, 2, 475-479. (19) Nakao, H.; Shiigi, H.; Yamamoto, Y.; Tokonami, S.; Nagaoka, T.; Sugiyama, S.; Ohtani, T. Nano Lett. 2003, 3, 1391-1394. (20) Li, J.; Bai, C.; Wang, C.; Zhu, C.; Lin, Z.; Li, Q.; Cao, E. Nucleic Acids Res. 1998, 26, 4786-4786. (21) Deng, Z.; Mao, C. Nano Lett. 2003, 3, 1545-1548. (22) Yokota, H.; Sunwoo, J.; Sarikaya, M.; van den Engh, G.; Aebersold, R. Anal. Chem. 1997, 71, 4418-4422. (23) Nyamjav, D.; Ivanisevic, A. AdV. Mater. 2003, 15, 1805-1809. (24) Klein, D. C. G.; Gurevich, L.; Janssen, J. W.; Kouwenhoven, L. P.; Carbeck, J. D.; Sohn, L. L. Appl. Phys. Lett. 2001, 78, 2396-2398. (25) Shin, M.; Kim, T.; Kwon, C.; Kim, S. K.; Park, J. B.; Lee, H. Jpn. J. Appl. Phys. 2006, 45, 2076-2081. (26) Sugimura, H.; Hanji, T.; Hayahi, K.; Takai, O. Ultramiscoscopy 2002, 91, 221-226. (27) Liu, Y.-Y.; Wang, P.-Y.; Dou, S.-X.; Wang, W.-C.; Xie, P.; Yin, H.-W.; Zhang, X.-D.; Xi, X. G. J. Chem. Phys. 2004, 121, 43024309. (28) Hu, J.; Zhang, Y.; Gao, H.; Li, M.; Hartmann, U. Nano Lett. 2002, 2, 55-57. NL060160U Nano Lett., Vol. 6, No. 7, 2006
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