Industrial Lasers
High-Power Femtosecond Lasers
FEATURES
PHAROS is a single-unit integrated femtosecond laser system
combining millijoule pulse energies and high average power.
PHAROS features a mechanical and optical design optimized
for industrial applications such as precise material processing.
Market-leading compact size, integrated thermal stabilization
system and sealed design allows PHAROS integration into
machining workstations. The use of solid state laser diodes for
pumping of Yb medium significantly reduces maintenance cost
and provides long laser lifetime.
Most of the PHAROS output parameters can be easily set via
PC tuning the laser for a particular application in seconds.
Tunability of laser output parameters allows PHAROS system to
cover applications normally requiring different classes of lasers.
Tunable parameters include: pulse duration (190 fs – 10 ps),
repetition rate (single pulse to 1 MHz), pulse energy (up to
2 mJ) and average power (up to 20 W). Its deliverable power is
Up to 2 mJ pulse energy

Up to 20 W average power

Single pulse – 1 MHz tunable
repetition rate

Includes pulse picker for
pulse-on-demand operation

Rugged, industrial grade
mechanical design

Automated harmonic generators
(2H, 3H, 4H, 5H)
140
28
120
26
6.04
24
25
6.00
20
5.98
15
5.96
5.94
10
5
5.92
0
5
10
15
20
25
30
Beam direction, µrad
100
6.02
30
Output power, W
Ambient temperature, °C
35

abundant for most of material processing applications at high
machining speeds. The built-in pulse picker allows convenient
control of the laser output in pulse-on-demand mode. It comes
along with an extensive external control interface dedicated
for easy laser integration into larger setups and machining
workstations. PHAROS compact and robust optomechanical
design includes easy to replace modules with temperature
stabilized and sealed housings ensuring stable laser operation
across varying environments. PHAROS is equipped with an
extensive software package, which ensures smooth hands-free
operation as well as allows fast and easy integration into various
processing devices.
PHAROS is built upon the conventional chirped pulse amplifi­
cation technique, employing the seed oscillator, regenerative
amplifier and pulse stretcher/compressor modules.
6.05
Ambient temperature
Output power, RMS=0.12%
190 fs – 10 ps tunable pulse duration
80
Temperature
22
60
Horizontal
Vertical
18
40
20
20
16
0
14
-20
12
-40
10
-60
0
5
15
10
Time, h
Time, h
PHAROS output power with power lock on under unstable environment
20
8
25
Temperature, °C
40

Industrial Lasers
pecifications
Model
Pharos-4W
Pharos-6W
Pharos-10W
Pharos-15W
Pharos-20W
4W
6W
10 W
15 W
20 W
Max. average power
Pulse duration
< 290 fs
(assuming Gaussian pulse shape)
Pulse duration range
290 fs – 10 ps
Max. pulse energy
> 0.2 mJ
Beam quality
> 0.2 mJ / > 0.4 mJ
< 190 fs
< 300 fs
190 fs – 10 ps
300 fs – 10 ps
> 1.5 mJ
> 2 mJ
Single-Shot, Pulse-on-Demand, any base repetition rate division
1028 nm ± 5 nm
Output pulse-to-pulse stability
< 0.5 % rms over 24 hours ²⁾
Power stability
< 0.5 % over 100 h
Pre-pulse contrast
< 1 : 1000
Post-pulse contrast
< 1 : 200
Polarization
Linear, horizontal
Beam pointing stability
< 20 µrad/°C
Oscillator output
Optional, please see specifications of FLINT oscillators on page 14
Some particular repetition rates are software denied due to system design.
Relative spectral intensity, a.u.
1.0
0.8
SH ACF a.u.
6W
TEM₀₀; M² < 1.3
Centre wavelength
Gaussian fit
223 fs
0.6
0.4
0.2
-1000
Pharos 2mJ
1 kHz – 200 kHz (extendable to 1 MHz) ¹⁾
Pulse selection
0.0
-1500
Pharos SP 1.5
6W
> 1.0 mJ
TEM₀₀; M² < 1.2
Base repetition rate
1)
Pharos SP
-500
0
500
1000
Under stable environmental conditions.
1.0
Spectral
FWHM = 8.2 nm
0.8
0.6
0.4
0.2
0.0
1500
2)
1010
1015
1020
1025
1030
1035
1040
Wavelength, nm
Delay, fs
Pulse duration of Pharos
Spectrum of Pharos
Typical Pharos far field beam profile
at 200 kHz
1000
Waist diameter, µm
Pulse energy, µJ
1000
100
Pharos 2 mJ
Pharos-SP 1.5 mJ
Pharos-SP 1 mJ
Pharos-20W 400 µJ
Pharos-10W 200 µJ
Pharos-4W 200 µJ
10
1
10
800
600
400
200
100
1000
350
Repetition rate, kHz
400
450
500
550
600
650
Z location, mm
Typical Pharos M² measurement data
Pulse energy vs PRR
Typical Pharos near field beam profile
at 200 kHz
20.18
Output power, W
20.16
20.14
20.12
20.10
RMS < 0.03%
20.08
20.06
0
100
200
300
Time, h
Pharos long term stability graph
400
500
600
38
Pump current, A
36
34
32
30
Output power, W
9
8
7
6
5
4
2009.08.04
2009.10.14
2009.10.26
2010.01.25
2010.03.23
2010.05.26
2011.07.25
2011.09.20
2011.11.21
2012.01.25
2012.03.13
2012.06.25
2012.07.27
2013.01.22
2013.11.19
2014.03.19
2014.08.08
Output power, W
36
34
32
28
3
40
38
8
7
6
5
4
3
2009.06.18
2010.01.21
2010.07.27
2010.09.14
2011.09.12
2011.10.24
2011.12.05
2012.02.15
2012.04.17
2012.10.25
2012.10.29
2013.01.28
2013.10.03
2013.10.04
2013.12.16
2014.02.05
2014.06.30
2014.07.03
2014.07.31
2014.08.06
2014.11.17
2015.01.15
2014.01.21
Pump current, A
Industrial Lasers
Output power of industrial PHAROS lasers operating 24/7 and current of pump diodes during the years
(272)
(104)
(74)
168
70
212
54 2030
Auto 2H
515 nm
670
1030 nm output
1030 nm output
without H
with Auto H
360
Physical dimensions (mm)
Auto 3H, 4H
343, 257 nm
PHAROS laser drawing
Utility requirements
Laser head
670 L x 360 W x 212 H
Power supply rack for PHAROS-4W
640 L x 520 W x 530 H
Power supply rack for other PHAROS
models
640 L x 520 W x 660 H
Electric
110 VAC, 50-60 Hz, 20 A or 220 VAC,
50-60 Hz, 10 A
Room temperature
15-30 °C (air conditioning recommended)
Relative humidity
20-80 % (non condensing)
Industrial Lasers
Automated Harmonic Generators
PHAROS laser can be equipped with optional automated
harmonics modules. Selection of fundamental (1030 nm),
second (515 nm), third (343 nm), fourth (257 nm) or fifth
(206 nm) harmonic output is available by software control.
Harmonic generators are designed to be used in industrial
applications where a single output wavelength is desired.
Modules are mounted directly on the output of the laser and
integrated into the system.
The principle of OEM harmonic generators operation is based
on collinear generation of higher laser radiation harmonics in
angle-phase-matched nonlinear crystals. The optical layout of
OEM harmonic generator also includes beam reduction and
collimation optics that ensures highest harmonics conversion
efficiencies. All the accessible harmonics exiting OEM harmonic
generators are separated from the pump radiation by dichroic
mirrors.
SPECIFICATIONS
Model
2H
2H-3H
2H-4H
4H-5H
1030 nm
515 nm
1030 nm
515 nm
343 nm
1030 nm
515 nm
257 nm
1030 nm
257 nm
206 nm
20 – 1000 μJ
50 – 1000 μJ
20 – 1000 μJ
200 – 1000 μJ
>50 % (2H)
>50 % (2H)
>25 % (3H)
>35 % (2H)
>10 % (4H) *
>10 % (4H) *
>5 % (5H)
Beam quality (M2)
<200 μJ pump
<1.4 (2H)
<1.4 (2H)
<1.7 (3H)
<1.4 (2H)
n/a (4H)
n/a
Beam quality (M2)
>200 μJ pump
<1.7 (2H), <1.5 typical
<1.7 (2H), <1.5 typical
<2 (3H), <1.7 typical
<1.7 (2H), <1.5 typical
n/a (4H)
n/a
Output wavelength
(automated selection)
Input pulse energy
Pump pulse duration
190 – 300 fs
Conversion efficiency
* Max 1 W output.
1000
500
300
200
2.7
100
2.5
2.4
2.3
2.2
2.1
2.0
50
0
50
100
150
200
250
300
Time, h
30
3H output stability
20
1.56
1.54
10
Output power, W
Pulse energy, µJ
RMS = 0.27%
2.6
Output power, W
PHAROS-SP
2H optimized for 1000 µJ pump
3H optimized for 1000 µJ pump
2H optimized for 200 µJ pump
3H optimized for 200 µJ pump
2H optimized for 50 µJ pump
3H optimized for 50 µJ pump
5
3
2
RMS = 0.23%
1.52
1.50
1.48
1.46
1
1
2
3 5
10
20
30
50
100
200 300 500
Repetition rate, kHz
Harmonics energy vs pulse repetition rate
1000
1.44
0
2
4
6
Time, h
4H output stability
8
10
12
asers
Industrial Lasers
new
Industrial grade Optical Parametric Amplifier
FEATURES
Based on experience with ORPHEUS
line of OPA products

Manually tunable wavelength

Industrial grade design provides
excellent long-term stability

Very small footprint

Bandwidth limited or short-pulse
configurations available

CEP option
12
1200
I-OPA-ONE signal
I-OPA-ONE idler
I-OPA signal
I-OPA idler
1100
Output power, mW
1000
900
11
10
9
800
8
700
7
600
6
500
5
400
4
300
3
200
2
100
1
0
500
1000
1500
2000
2500
3000
3500
4000
0
4500
Wavelength, nm
I-OPA module energy conversion curves.
Pump: PHAROS-10W, 100 µJ, 100 kHz
PHAROS i-OPA model comparison table
Model
I-OPA
I-OPA-F
I-OPA-ONE
Based on OPA
ORPHEUS
ORPHEUS-F
ORPHEUS-ONE
–
Pump pulse energy
10 – 500 µJ
10 – 400 µJ
20 – 500 µJ
150 – 500 µJ
Tuning range, signal
630 – 1030 nm
650 – 900 nm
1350 – 2060 nm
–
Tuning range, idler
1030 – 2600 nm
1200 – 2500 nm
2060 – 4500 nm
1400 – 2500 nm
Conversion efficiency
signal+idler combined
>12 %
>12 %
>15 %
>10 %
Pulse energy stability
< 2% STD over 1 min.
650 – 950 nm
1150 – 2000 nm
650 – 850 nm
1350 – 2000 nm
1500 – 3500 nm
1400 – 2000 nm
100 – 150 cm-1
200 – 600 cm-1
80 – 200 cm-1
~150 cm-1
150 – 250 fs
30 fs – 80 fs
200 – 300 fs
< 200 fs
Micro-machining
Microscopy
Spectroscopy
Nonlinear microscopy
Ultrafast spectroscopy
Micro-machining
Mid-IR generation
OPCPA front-end
Pulse repetition rate
Pulse bandwidth
Pulse duration
Applications
Up to 1 MHz
Better stability can be specified for a specific wavelength (e.g. < 1% STD at 800 nm).
Output pulse duration depends on wavelength and pump laser pulse duration.
3)
I-OPA-F outputs broad bandwidth pulses which are compressed externally.
1)
2)
I-OPA-CEP
Up to 100 kHz
Pulse energy, µJ
I-OPA is an optical parametric amplifier of white-light
continuum pumped by the PHAROS laser. This OPA is focused
on generating long-term stable output with reliable and handsoff operation. Manually tunable output wavelength extends
the application possibilities of a single laser source, instead of
requiring multiple lasers based on different technologies.
In comparison to standard ORPHEUS line of devices, the I-OPA
lacks only computer controlled wavelength selection. On the
other hand, in-laser mounted design provides mechanical
stability and eliminates the effects of air-turbulence, ensuring
stable long-term performance and minimizing energy
fluctuations.

Lasers
Industrial Lasers
Comparison with other femtosecond and picosecond lasers
Laser technology
Our solution
HG or HIRO
I-OPA-F
I-OPA-ONE
Pulse energy at 100 kHz, using PHAROS-10W laser
Excimer laser (193 nm, 213 nm)
5H of PHAROS (205 nm)
5 µJ
–
–
TH of Ti:Sa (266 nm)
4H of PHAROS (257 nm)
10 µJ
–
–
TH of Nd:YAG (355 nm)
3H of PHAROS (343 nm)
25 µJ
–
–
SH of Nd:YAG (532 nm)
2H of PHAROS (515 nm)
50 µJ
35 µJ
–
Ti:Sapphire (800 nm)
OPA output (750 – 850 nm)
–
10 µJ
–
Nd:YAG (1064 nm)
PHAROS output (1030 nm)
Cr:Forsterite (1240 nm)
OPA output (1200 – 1300 nm)
–
5 µJ
–
Erbium (1560 nm)
OPA output (1500 – 1600 nm)
–
3 µJ
15 µJ
Thulium / Holmium (1.95 – 2.15 µm)
OPA output (1900 – 2200 nm)
–
2 µJ
10 µJ
Other sources (2.5 – 4.0 µm)
OPA output
–
–
1 – 5 µJ
100 µJ
Note that the pulse energy scales linearly in a broad range of pump parameters. For example, a PHAROS-20W laser at 50 kHz (400 µJ energy) will increase the output power twice, and the
pulse energy – 4 times compared to the reference table above. The pulse duration at the output is <300 fs in all cases. The OPA output is not limited to these particular ranges of operation, it is
continuously tunable as shown in energy conversion curves.
85
62
30 30
114
70
125
212
(39)
Idler
Signal
Residual OPA pump (515 nm or 1030 nm)
Optional Uncompressed Fundamental (for SHBC)
Fundamental (1030 nm)
Pharos with I-OPA output ports
430
691
1070
PHAROS with I-OPA-F and compressors for signal and ilder
www.phototechnica.co.jp
〒336-0017 埼玉県さいたま市南区南浦和 1-2-17　TEL:048-871-0067 FAX:048-871-0068
e-mail:[email protected]