Gamma Vacuum
Gamma Vacuum designs, manufactures, and services ion pumps, titanium sublimation pumps, and their controls.
We have grown to be an industry leading ion pump supplier through superior quality, delivery, service and innovation. The
employees of Gamma Vacuum have experience in real world vacuum applications ranging from systems manufacturing and
optics assembly to TIG welding for vacuum environments.
Our staff and facility are dedicated to one thing; creating the purest vacuum environments on earth.
Ion pumps are used in a wide variety of high and ultra-high vacuum (UHV) environments. They are used for their capability to
reach the lowest possible pressure for an economical cost. In addition, ion pumps have some technical advantages over other
technologies:
• Vibration free operation
• Low operational cost
• Bakeable
INDUSTRY
Industrial and
Medical
Processes
Semiconductor
Ion Pump Features
• Low maintenance
• Pressure indicator
• Non-contaminating technology
Instrumentation
• Permanent gas capture
• Radiation tolerance
• Long operating lifetime
High Energy
Physics
Customization
Gamma Vacuum has a wide range of standard products on the shelf or built to order. Dedicated research and engineering
staff are available for producing custom ion pumps for any application.
•
•
•
•
•
•
SEM ion pumps (patent pending)
Unique port configurations
Custom dimensions
High pressure applications
Extreme high vacuum (XHV) applications
Legacy feedthrough adaptions
Gamma Vacuum is ISO 9001:2000 registered
www.gammavacuum.com
Ion Pump Applications
TEC
HNO
© 2007 Image - Courtesy of Diamond Light Source, UK
ION PUMP SIZE (I/S)
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.2 – 3
X
X
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3 – 20
X
X
X
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X
20 – 75
X
X
X
X
X
X
X
X
X
X
X
X
X
X
X
X
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75 – 800+
X
X
X
X
X
X
X
X
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X
X
X
X
Ion Pump Operation
TiTan™ Ion Pump Characteristics
TiTan™ Pumping Elements
TiTan™ ion pump elements are “tuned” for specific pumping applications.
Surfaces are chemically processed to remove potential surface
contaminants and provide maximum adhesion for extended lifetime.
Ceramics are optimally shielded to reduce exposure to sputtered material.
Ion pumps are electro-physical vacuum pumps and remove gases
from their environment by turning them into solid materials.
Step 4: Capture gas ions
Step 1: Create a high
magnetic field
When the positive ion reaches the cathode
plate, its velocity creates a physical impact
called sputtering. Cathode materials are
ejected towards the anode tube and the
ion behaves in one of two ways:
Permanent magnets located outside the vacuum are
used to generate a 1200 gauss magnetic field. This
field is used to contain and guide electrons within
circular anode rings.
•Chemical Reaction – reactive gas ions
react with cathode materials and form
new solid compounds. For example, an
ionized oxygen molecule will take an
electron from and readily react with a
titanium cathode atom creating a solid
titanium oxide.
Step 2: Generate a cloud of
electrons (plasma)
High voltage is applied to the element
assembly after rough pumping. Electrons
are pulled into the anode tube assembly
and generate a cloud of spinning electrons,
commonly referred to as a plasma, and are
trapped by the high magnetic field.
•TiTan™ CV (Conventional) – two titanium cathodes for high
pumping speed of reactive gases
•TiTan™ DI (Differential) – a titanium and tantalum cathode for
maintained pumping speeds of reactive gases and long term
stability of noble gases
•TiTan™ 30 – tantalum embedded sputter zones for stability
insurance against air leaks
•TiTan™ TR – classic triode element for higher pressure operation
Vacuum Processing
Port Configurations
Ion pumps are shipped under vacuum at
pressures less than 1x10-10 mbar. Certificates
of conformance are provided and record all
leak check points and pump characteristic
values. RGA scans can be provided upon
request.
Each ion pump can be configured with a
variety of pumping port options. Additional
ports are available in most designs on the
top, bottom, or side and can accommodate
TSP or non-evaporable getter (NEG)
modules.
Feedthroughs
Ion implanted within
cathode plate
•Physical Reaction – heavier gas
ions, like argon, impact the cathode,
acquire an electron, and bounce back
(reflect) towards the anode assembly.
These reflected ions are called high
energy neutrals because they still have
enough energy to implant themselves
physically in pump surfaces and
stop contributing to the vacuum
environment pressure.
Step 3: Ionize gas molecules
Heaters
Integrated Heaters can be added to ion
pumps for economical and efficient baking.
Cables
In addition to incorporating the SAFECONN
interlock system, high voltage cables are
made of flexible silicone materials that
are heat resistant and have high radiation
tolerance.
As gases move into the anode assembly, they are struck by electrons. Electrons are removed from the gas molecules valence
shell in the collision and the gas molecule now has a positive charge. This is called a positive ion. The positive ion is forced by the
high voltage field at high velocity out of the anode tube towards the cathode plate.
www.gammavacuum.com
Gamma Vacuum has standardized on
the 10kV SHV feedthrough since 1996.
Mechanical and corrosive failures do not
exist with the 10kV SHV feedthrough. For
legacy purposes, alternate feedthroughs are
available.
Ion reflected as a
high-energy neutral
1.952.445.4841
[email protected]
TiTan™ Ion Pumps
SPECIFICATIONS
SMALL ION PUMPS
Small Ion Pumps (mini – 75S)
Small ion pumps come in a wide variety of
sizes and configurations. Gamma Vacuum
maintains stock of the most common
configurations for same day delivery. Achieving
speeds up to 75 l/s, these pumps have the
added advantage that they can be mounted in
any orientation without additional support.
Mi
ni
X
10
2–3
DN 16 (1.33”)
1.8 x 1.8 x 4.3
(45 x 45 x 108)
0.35 (0.8)
X
25
8 – 10
DN 35 (2.75”)
4.2 x 4.4 x 7.5
(107 x 113 x 190)
6 (13)
X
15 – 20
DN 35 (2.75”)
8.0 x 4.9 x 5.1
(202 x 125 x 130)
9 (20)
X
30 – 40
DN 35 (2.75”)
DN 63 (4.5”)
8.2 x 9.9 x 5.1
(209 x 251 x 130)
16 (34)
X
X
40 – 75
DN 35 (2.75”)
DN 63 (4.5”)
DN 100 (6”)
10.9 x 9.5 x 5.1
(277 x 242 x 130)
19 (42)
X
X
20
80 – 100
DN 100 (6”)
13 x 13 x 5
(325 x 325 x 128)
29 (62)
X
X
30
160 – 200
DN 150 (8”)
13 x 16 x 9
(325 x 413 x 233)
49 (108)
X
X
X
40
240 – 300
DN 150 (8”)
13 x 16 x 13
(325 x 413 x 337)
66 (145)
X
X
X
40
320 – 400
DN 150 (8”)
13 x 16 x 16
(325 x 413 x 413)
72 (159)
X
X
60
320 – 400
DN 150 (8”)
20 x 16 x 9
(508 x 413 x 233)
115 (253)
X
X
60
480 – 600
DN 150 (8”)
13 x 20 x 20
(325 x 513 x 513)
103 (226)
X
X
80
480 – 600
DN 150 (8”)
20 x 16 x 13
(508 x 413 x 336)
115 (253)
X
X
640 – 800
DN 150 ( 8”)
20 x 16 x 16
(508 x 413 x 413)
124 (273)
X
X
120 – 150
DN 100 (6”)
14 x 10 x 9
(338 x 247 x 231)
32 (70)
X
X
X
240 – 300
DN 150 (8”)
14 x 18 x 9
(345 x 450 x 231)
65 (143)
X
X
X
480 – 600
DN 150 (8”)
21 x 18 x 12
(525 x 450 x 305)
109 (243)
X
X
S
S
S
S
LOW PROFILE ION PUMPS
0L
0L
0L
0L
0LX
0L
TALL PROFILE
0LX
15
0T
V
30
0T
V
60
0T
Lifetime
Ultimate Pressure
All Gamma Vacuum ion pumps are designed to operate for 45,000
– 50,000 hours at 1x10-6 mbar. Lifetime increases linearly with
decreased pressure.
Ion Pumps are capable of reaching pressures below 1x10-10 mbar.
Ultimate pressure of an ion pump is dictated by overall system conditions
and materials. All ion pumps are shipped at less than 1x10-10 mbar.
www.gammavacuum.com
TSP
0.35 (0.8)
0LX
Tall Profile ion pumps designed for mounting
in narrow locations. These pumps are also built
to order and are designed to fit into locations
where a Low Profile Ion Pump may not fit. They
also match competitive dimensions.
LPCe MPCe
1.5 x 1.5 x 2.0
(38 x 38 x 51)
10
Tall Profile Ion Pumps (150TV – 600TV)
SPC
DN 16 (1.33”)
75
Low Profile ion pumps are under 12" (300 mm)
in height for standard configurations. Custom
built to each order, the closed magnetic loop
of these pumps reduce stray magnetic field
created by the pump making these pumps ideal
for any type of charged particle application.
COMPATABILITY
.2
3S
45
Low Profile Ion Pumps (100L – 800LX)
in (mm) Weight, kg (lbs)
Speed (l/s) Inlet Flange(s) Dimensions,
(h x l x w, max)
V
1.952.445.4841
[email protected]
Digitel™ Ion Pump Controllers
Digitel™ Flexibility
The DIGITEL™ line is flexible enough to control a wide variety of ion pump and TSP configurations. The LPCe and MPCe
can operate up to 4 ion pumps simultaneously or independent operation of one or two ion pumps respectively. The MPCe is
capable of controlling one or two TSP cartridges independently.
Digitel™ SPC
Small Pump Controller
The SPC is a versatile way to fully operate ion pumps
0.2 – 75 l/s. A pressure/current/voltage display along with standard
serial communications makes the SPC able to accommodate the
needs of basic and advanced users. Nano amp resolution provides
gauging capabilities using the appropriate ion pump set-up.
Digitel™ LPCe
Large Pump Controller
Ion pumps 100 l/s and over require higher currents for starting and
higher pressure operation. The LPCe supplies higher currents to a
dedicated single ion pump (or up to four ion pumps in parallel) and
has an easy to read touchscreen LCD display that simultaneously
displays pressure, current, and voltage. Standard serial
communications and 8 set points allow for easy system integration.
And the LPCe fits into any rack at just 3U high and 1⁄2 rack wide.
Digitel™ MPCe
Multiple Pump Controller
Incorporating the same features as the LPC, the MPCe
allows for high current control of two ion pumps independently or up
to four in parallel. At 3U high and a full rack in width, the MPCe is
ideally featured to operate a wide variety of ion pump configurations
on any system. With remote TSP control capability, there is no need
to have more than one controller for all of the UHV pumps on a
system.
TSP/DTSP
Remote TSP Controller
The remote TSP (titanium sublimation pump) controller is fully
operated from the touchscreen LCD of the MPCe. A TSP filament can
be fired manually or based on pressure of either ion pump the MPCe
is monitoring. Timed modes also let the user have full control over
the exact parameters under which a filament can be fired. A single
remote TSP controller can operate up to 8 filaments in various TSP
configurations.
www.gammavacuum.com
Ease of Use
Operator Safety
Communications
Economical
Each DIGITEL™ has a highly visible
display. The SPC has an easy to ready
LED that displays pressure, current
or voltage. The LPCe and MPCe are
each fully controlled with an intuitive
touch panel LCD. Digital resolution
down to 1nA is possible dependent
upon pump size and current
requirements.
The integrated SAFECONN high
voltage interlock system eliminates
electrical shocks and false positive
pressure readings. The controller
automatically shuts off high voltage
when the cable is disconnected from
the ion pump or controller end. The
system is isolated and guarantees
ground, high voltage, and then safety
connectivity that prevents accidental
arcing.
Serial communications (RS232, RS422
and RS485) are standard on all
DIGITEL™ products. MPCe and LPCe
configurations also allow for optional
Ethernet protocol for advanced
facility and instrumentation
communications.
Each DIGITEL™ has programmable
analog and interlock capabilities. This
allows for optimal flexibility when
integrating with standard and/or
legacy set-point and analog
monitoring systems.
1.952.445.4841
[email protected]
TiTan™ Sublimation Pumping
Titanium Sublimation Pumps (TSPs) are often used in combination with ion pumps or independently to remove reactive
gases from the vacuum environment. Combined with an ion pump, the TSP allows for low ultimate pressures in a shorter
amount of time. All TSP components are bakeable to 400˚C.
TSP Filament Cartridge
The filament cartridge is mounted on a 2 3/4" CFF (NW 35). The feedthrough supports
three titanium-molybdenum filaments and a return path for ground isolation. Each
filament contains 1.5 grams of usable titanium and averages 20 hours of operation.
Liquid Cryoshroud
The liquid cryoshroud consists of a double walled, type 304L stainless steel cylinder
with two liquid nitrogen feedthroughs (.375" diameter) with flare type fittings. It
provides 1578 cm2 (245 in2) of liquid nitrogen cooled surface area that provides
pumping speeds up to 12,000 L/s for hydrogen (see table). The shroud is mounted
on an 8" CFF (NW 150).
Ambient Sputter Shield
The ambient sputter shield economically maximizes surface area when cooling is not
practical or possible. It provides 827cm2 (128 in2) of ambient temperature surface area
that provides pumping speeds up to 2200 L/s for hydrogen (see table). The shield is
mounted on an 8" CFF (NW 150).
Typical TSP Pumping Speeds
H2
Cry Liqui
o d
Am shrou
d
bie
nt S
Shi pu
eld tte
r
H2O
Rate
Speed
Speed Rate
Speed
Area Temperature Rate
2
2
2
2
2
(˚ C)
(L/s/cm ) (L/S) (L/s/cm ) (L/S) (L/s/cm ) (L/S)
(cm /in )
8.2
5,814
7.3
5,176
20˚ C
2.6
1,843
709/110
-195˚ C
17
12,053
11
7799
14.6 23,039
1578/245*
827/128
20˚ C
2.6
CO
2,150
8.2
6,780
7.3
6,037
* Applies to H2O speed only
www.gammavacuum.com
Creating the purest
2915 133rd Street West
Shakopee, MN 55379
Phone: 952.445.4841
Toll Free: 800.237.3603
Fax: 952.445.7615
[email protected]
www.gammavacuum.com
vacuum
environments
on Earth