CMPE 103 Electronic Materials Mid Term Solution Q 1(a) [5 marks] Epitaxy is one of the methods of growing crystal lattices using a seed on a material called substrate. There are two types: a) seed and crystal to be grown are of same type. b) seed and crystal are different but have the same lattice constant. Some of the methods of epitaxy are (i) liquid phase epitaxy (LPE) (ii) vapour phase epitaxy (VPE) (iii) molecular beam epitaxy (MBE) (b) [5 marks] Kd = 0.3 CS = 1015 cm-3 Kd = CS / CL CL = CS / Kd = 1015 = 3.33 x 1015 cm-3 Weight of Si = 1 kg = 1000 g Volume of initial solution = mass / density = 1000 / 2.33 = 429.18 cm3 No. of Arsenic atoms required in the initial mixture = 429.18 x 3.33 x 1015 = 1.43 x 1018 atoms 23 6.02 x 10 atoms of Arsenic = 74.9 grams 1.43 x 1018 atoms of Arsenic = (74.9 / 6.02 x 1023) x 1.43 x 1018 = 1.779 x 10-4 grams Q 2(a)(i) [3 marks] λ = 522 x 10-9 m f = c / λ = 3 x 108 / 522 x 10-9 = 5.74 x 1014 Hz Em = 0 Em = hf – qФ 0 = (6.63 x 10-34 x 5.47 x 1014) – qФ Work function = qФ = 3.81 x 10-19 J (ii) [3 marks] λ = 250 x 10-9 m f = c / λ = 3 x 108 / 250 x 10-9 = 1.2 x 1015 Hz Em = 0 Em = hf – qФ Em = (6.63 x 10-34 x 1.2 x 1015) – (3.81 x 10-19) Em = 4.145 x 10-19 J (b) [4 marks] Si = 1s2 2s2 2p6 3s2 3p2 Ge = 1s2 2s2 2p6 3s2 3p6 4s2 3d10 4p2 Na+ = 1s2 2s2 2p6 Cl- = 1s2 2s2 2p6 3s2 3p6 CMPE 103 Electronic Materials Q 3(a) [5 marks] Type Since VAB is negative, there are more electrons in the semiconductor. Therefore, it is an n-type semiconductor material. Concentration B = 10 x 10-5 Wb.cm-2 = 10-4 Wb.cm-2 = 1 Wb.m-2 no = Ix Bz / q t VAB no = (1 x 10-3 x 1) / (1.6 x 10-19 x 10 x 10-6 x 2 x 10-3) no = 3.125 x 1023 m-3 = 3.125 x 1019 cm-3 Mobility R = L / Wtσ ------- (1) R = VCD / I -------- (2) Equating equation (1) and (2) L / Wtσ = VCD / I σ = L I / WtVCD σ = (5 x 10-3 x 1 x 10-3) / (0.1 x 10-3 x 10 x 10-6 x 100 x 10-3) σ = 50000 (Ωm)-1 Ignoring po as this is an n-type semiconductor, σ = µn q no µn = σ / q no = 50000 / (1.6 x 10-19 x 3.125 x 1023) = 1.0 m2 V-1 s-1 = 1.0 x 10-4 cm2 V-1 s-1 (b) [5 marks] At very low temperatures, the electrons do not have sufficient energy to jump from the valence band to the conduction band, so they remain in the valence band whereas the conduction band remains empty. Therefore conductivity happens mainly due to ionization of the semiconductor. At around room temperature, Electron Hole Pairs (EHP) begin to form as electrons gain energy to cross the band gap and jump to the conduction band. Since holes are being caused by displacement of electrons, the number of holes is equal to the number of electrons. Electrons and holes both cause current to flow but in opposite directions so the net effect is no current. Therefore to make the semiconductor conduct electricity during this temperature range, doping has to be done i.e. some impurity has to added that results in either more electrons or more holes for a net current to flow. So the extrinsic semiconductor character is dominant during this temperature range. As temperature increases to very high temperatures, intrinsic character starts dominating because lattice scattering dominates impurity scattering.
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