MBE PRO 753-V01/Oct10
MBE Systems / LAB-10 MBE System
LAB-10 MBE System: Standard System
with Preparation/Storage Chamber
and with Loadlock Chamber
LAB-10 chamber cross-section
Example for a realized system
LAB-10 Design
Main Features:
• Accepts all types of Omicron standard small samples
• Proofen chamber design for up to 7 effusion cells
• Effusion cell capacity from 10 cm3 up to 35 cm3
• Rotary shutters for the effusion cells
• Source to substrate distance: 160 mm
• Source angle tilt wrt. sample normal: 18°
=> < 1% thickness homogeneity for a 10 mm substrate
• In-Vacuum length for effusion cells: 287 mm for CF70
270 mm for CF114
• Large pumping port for high pumping speed and
true UHV using Turbo-, TSP- and IGP-Pump
www.omicron.de
• System design allows different growth applications:
- Metal MBE Growth
- Semiconductor Growth
- Magnetic Materials Growth
- Oxide MBE Growth
- Organic MBE
• Reliable sample manipulator with different options
(cooling, heating, e-beam heating, ultra high
temperature)
• Main shutter for the sample manipulator
• Easy and intuitive to operate the growth control
software
• Reliable and fast sample transfer
• Excellent performance at low cost of ownership
Detailed Deposition Chamber Design:
Sample Manipulator:
Standard chamber diameter:
10“ O.D. (254 mm)
Accepts standard Omicron small samples up to 10 x 10 mm
Larger chamber diameter: 12“ O.D. (305 mm) - on request
Movement: x/y-direction (± 8 mm) Standard chamber top flange:
12“ O.D. (305 mm)
z-direction (100 mm)
Larger chamber top flange: 14.25“ O.D. (362 mm) - on request
azimuthal rotation (±180°)
Cluster flange options: a) seven ports for effusion cells (7 x 2.75“ O.D.)
With substrate shutter (optional electrically driven and remote controlled
one 2.75“ flange perpendicular to the sample for
via software)
optical measurements
b) seven ports for effusion cells (3 x 4.5“ and 4 x 2.75“)
one 2.75“ flange perpendicular to the sample for optical
measurements - on request
With heating and cooling options (all refractory metals)
With resistive PBN heater (RT < T < 1170 K)
- optional e-beam heating (RT < T < 1370 K)
Further ports for: Viewports on the chamber sides for good visibility during
- optional high temperature heating (RT < T < 1670 K)
transfer, 2 x 2.75“ tilted flanges for ellipsometry, 2.75“ flanges - optional tilt rotation (±90°)
for Beam Flux Monitor, Quartz Micro Balance, RGA, venting,
pressure measurement, RHEED electron gun and 6“ flange
- optional LN2-cooling (140 K < T < 1130 K)
- optional special purposes heater (e.g. for oxygen environment)
for a RHEED screen
using SiC heating element or special materials (e.g. Inconell) for compatibility with specific requirements
10” O.D. (254 mm)
Pumping configuration:
General Design Aspects:
For deposition chamber:
• The distance between source flanges and support frame bottom is Standard: 230 l/s Ion Getter Pump, Titanium Sublimation Pump,
265 l/s Turbomolecular Pump with oil-free Roughing Pump
• All shutter blades are operated from soft-acting shutter modules.
optimized for good accessibility of all source flanges.
The increasing/decreasing shutter movement speed follows a
On request: 400 l/s Ion Getter Pump, Titanium Sublimation Pump,
sinusoidal speed curve to avoid particles being flinged away by the
685 l/s Turbomolecular Pump with oil-free Roughing Pump
shutter blades.
•
Special care has been taken to allow safe operation using interlocks
Achievable base pressure < 1 x 10-10 mbar/torr with Iongetterpump and TSP and
and convenient system control.
<5 x 10-10 mbar/torr with Turbomolecularpump and TSP.
•
The bakeout tent ensures homogeneous heat distribution for
ultimate vacuum conditions and clean environment. For preparation / storage chamber:
•
The system comes completely assembled and fully tested as a
Standard: 120 l/s Ion Getter Pump, Titanium Sublimation Pump,
turn-key system.
Optional: 120 l/s Ion Getter Pump replaced with 265 l/s
•
LAB-10 MBE systems can be easily extended with Omicron systems
Turbomolecular Pump, Titanium Sublimation Pump
providing various analysis techniques (SPM, AFM, XPS, UPS, AES and many others).
Achievable base pressure < 1 x 10-10 mbar/torr with Iongetterpump and TSP and
<5 x 10-10 mbar/torr with Turbomolecularpump and TSP.
For loadlock chamber:
Standard: loadlock with by-pass pumping to main Turbomolecular Pump
On request: loadlock with 60 l/s Turbomolecular Pump and with oil-free Roughing Pump
Achievable base pressure < 5 x 10-9 mbar/torr with Turbomolecularpump after bakeout.
Pressure measurement:
How to contact us:
for deposition chamber using Ion- and Pirani-Gauge
for preparation / storage chamber using Ion- and Pirani-Gauge
Headquarters: Omicron NanoTechnology GmbH
for loadlock chamber using optional combined Pirani-/Cold Cathode-Gauge
Limburger Str. 75 • 65232 Taunusstein • Germany
Tel. +49 (0) 61 28 / 987 - 0 • Fax +49 (0) 61 28 /0 987 - 185
www.omicron.de • [email protected]
Omicron NanoTechnology is part of the Oxford Instruments Group.
For more information: www.oxford-instruments.com or just send us
an e-mail: [email protected]
www.omicron.de
Technical alterations reserved. Specifications and descriptions contained in this brochure are subject to alteration without notice.
MBE LAB 751-V02/Mar12 __ Printed by Druckerei und Verlag Klaus Koch GmbH
Large pumping port: