scia Batch 350 for Plasma Enhanced Chemical Vapor Deposition (PECVD)
The scia Batch 350 is designed for homogeneous coating
of several 3-dimensional shaped substrates in one batch.
Typical applications are biocompatible films for medical
objects.
The scia Batch 350 uses a RF parallel plate arrangement
with rotation of each substrate for a homogeneous
coating of all sides. The system is also available with an
additional DC bias applied to the substrate holder.
Features
Two independently operating opposite RF electrodes
Coupled or decoupled operation mode of electrodes
Deposition on 3D-substrates in batches
Homogeneous gas inlet with gas shower
near discharge area
Substrate holder with DC bias
scia Batch 350
Applications
Biocompatible films for medical objects
(e.g. pacemaker and stents)
Principle of scia Batch 350
Application example: Stent for endovascular surgery.
www.scia-systems.com
01/2016
Technical Data
Carrier size
2 carriers with maximum size of 350 mm x 240 mm
Substrate holder
Water cooled, pulsed DC bias
Plasma source
RF parallel plate arrangement, 13.56 MHz
Max. RF power
2 x 600 W
Electrode setup
Temperature: Heating up to 400°C
Distance: Adjustable between 50 mm and 150 mm
Operation modes
Independent or coupled electrodes
Typical deposition rate for SiC
5 nm/min
Base pressure
< 5 x 10-7 mbar
System dimensions (W x D x H)
0.90 m x 1.70 m x 2.30 m
(without electrical rack and pumps)
Tool configuration
1 process chamber with manual loading
Software interface
SECS II / GEM
process chamber
pump
1.70 m
electrical
rack
rough pump
electrical box
0.90 m
2.60 m
Footprint of scia Batch 350
scia Systems GmbH
www.scia-systems.com
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Annaberger Straße 240
[email protected]
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09125 Chemnitz
Tel.: +49 371 5347 780
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Germany
Fax: +49 371 5347 781