Product Information
MCS 100 UV/VIS /(N)I R
Multi- Component
Process Photometer
On- Line Measuring Technology for
Increased Process Quality and Safety
High-Quality Process
Analysis for HighQuality Products
In chemical processing, the
quality of the product often
depends on the quality of the
measuring technique
employed. High-quality
products demand high-quality
measuring technology.
SICK provides suitable
measuring systems for such
products, but also turnkey
solutions.
Proven Success
Process analyzers from SICK
have been used successfully
for many years.
The single-component
photometer Spectran 677 is
a good example. Its success
led to the development of the
multi-component system
MCS 100 - a system capable
of continuously and
simultaneously monitoring a
number of components liquid or gas, high pressure
and high temperature. A
measuring system that fulfills
even the most stringent
process requirements.
Worldwide
Applications
SICK process photometers
are used throughout the world
to analyze gases and liquids from acetaldehyde to vinyl
chloride, from acetone to
traces of water. An
experienced applications
laboratory provides solutions
for difficult measuring tasks.
Fro m U V t o I R : M u l t i - C o m p o n e n t T e ch n o l o g y
Geared to the Needs of Industrial Users
MCS 100 Physical Unit
High Accuracy with
Excellent Economy
Multi-component analysis
achieves a high degree of
analytical precision but not at
the expense of economy –
the price-benefit ratio is
excellent.
By simultaneously analyzing
numerous components with
interference compensation a
much better accuracy than
with a single component
system is achieved.
Flexibility and Safety
The MCS 100 is designed to
give maximum flexibility, in
terms of its mechanics and
software. Different versions
for different spectral ranges
(UV/VIS/NIR/IR) are available.
The system can easily be
adapted to a wide range of
applications. Its robustness
and self-monitoring facility
guarantee reliability.
EMC and Ex
MCS 100 Electronics
All requirements in respect of
electromagnetic compatibility
as specified by the chemical
industry are fulfilled by the
MCS 100. And the system
can easily be modified to
comply with use in explosionendangered areas.
Typical Applications
Application
Range
Phys.
Condition
Application
Range
Phys.
Condition
Acetaldehyde (C2H4O) in air
■
●
Hydrosilicon in Hydrochloric Acid (HCl)
◆
●
Acetic Acid (C2H4O2) in Acetic Anhydride
◆
■
≈
Acetic Anhydride (C4H6O3) in Acetic Acid
◆
Isopropanol (C3H8O) in Air
▲
●
Acetone (Dimethylketone, C3H6O) in Water
■
≈
≈
≈
Isocyanate (NCO) in MCB/ODB
Methane (CH4) in Air
▲
●
Acetylene (C2H2) in Methane/Ethane
◆
●
Methanol (CH4O) in Water
◆
Ammonia (NH3) in Air
▲
●
Methylchloride (CH3Cl) in Dimethylether
◆
≈
≈
Ammonia (NH3) in Stack Gas
■
●
Nitrobenzene (C6H5NO2) in Air
■
●
Benzaldehyde in Water Vapor
◆
●
Nitrotoluene (C7H7NO2) in Cyclohexane
▲
≈
Benzene (C6H6) in Water
■
≈
Nitrous Oxide (N2O) in Air
■
●
Butene (C4H8) in Ethylene/H2
■
●
Nitrous Oxide (N2O) in Nitrogen (N2)
▲
●
1-Butene (C4H8) in Hydrogen and Nitrogen
◆
●
Perchloroethylene (C2Cl4) in Air
◆/ ■
●
Butylamine (C4H9)4N in Ammonia
◆
●
Phosgene (COCl2) in CO
◆
●
Carbon Bisulfide (CS2) in Air
■
●
Phosgene (COCl2) in MCD/ODB
◆
≈
Carbon Dioxide (CO2) in Air
◆
●
Propene (C3H6) in Air
◆
●
Carbon Dioxide (CO2) in Helium
■
●
1-Propyleneglycol-2-Monomethylether
◆
≈
Carbon Dioxide (CO2) in Water/Ammonia
■
≈
Silicon Tetrafluoride (SiF4) in HCl
◆
●
Carbon Monoxide (CO) in Phosgene (COCl2)
◆
●
Sulfur Dioxide (SO2) in Air
■
●
Carbonylsulfide (COS) in Air
■
●
Sulfur Hexafluoride (SF6) in He or H2
▲
●
Chlorine (Cl2) in Air
▲
●
Tetrachloride (CCl4) in Air
■
●
Chlorine Dioxide (ClO2) in Air
■
●
Tetrachloroethylene (C2Cl4) in Air
■
●
Chloroform (CHCl3) in Air
■
●
Toluene (C7H8) in Triethylamine
■
≈
Dichlorobenzene in Air
▲
●
Trichloroethylene (C2HCl3) in Air
■
●
Dichloromethane in Air
■
●
Triethylamine (C6H15N) in Air
■
●
1,2-Dichloromethane (C2H4Cl2) in Air
■
●
Trimethylechlorosilene (C6H9SiCl) in Air
■
●
Ethane (C2H6) in Hydrogen and Nitrogen
◆
●
Uranium Hexafluoride (UF6) in He or H2
▲
●
Ethanol (C2H6O) in Air
◆
●
Vinyl Aceta (C4H6O2) in Ethylene (C2H4)
◆
●
Ethanol (C2H6O) in Water
◆
≈
Vinyl Chloride (C2H3Cl)
▲
●
Ethrane (C3F5ClOH) in Air
■
●
Water in Acetic Acid (C2H4O2)
◆
Ethylene (C2H4) in Hydrogen and Nitrogen
◆
●
Water in Acetone (C3H6O)
▲
≈
≈
Freon in Air
■
●
Water in Air
▲
●
Freon 12 (CCl2F2) in He /H2 /UF6
■
●
Water in Ammonia (NH3)
■
Freon 12 (CCl2F2) in Hexafluoropropene
◆
●
Water in Benzene (C6H6)
■
Freon 12 (CCl2F2) in Hexafluoropropylene
▲
●
Water in 1,2 Dichloroethane (C2H4Cl2)
■
Freon 12 (F22,CHCIF2) in Freon 12 mixture
◆
●
Water in Dimethylacetamide (C4H9NO)
◆
Glycerole (C3H8O3) in Water
◆
≈
Water in E-caprolactam
■
≈
≈
≈
≈
≈
Halothane (CF3CHBrCl, C2F3HBrCl) in Air
■
●
Water in Helium
■
●
Hexafluoropropylene (HFP, C3F6)
◆
●
Water in Methanol (CH4O)
■
Hexafluoropropene Oxide (HFPO, C3F6O)
◆
●
Water in Methylchloride (CH2Cl2)
■
Hydrochloric Acid (HCl) in Hydrosilicon
◆
●
Water in Methylethylketone (C4H8O)
■
Hydrochloric Acid (HCl) in SiCl4
◆
●
Water in Monochloroacetic Acid
◆
≈
≈
≈
≈
Hydrocyanic Acid (HCN) in Air
■
●
Water in SiF4, HF, HCl
◆
●
Hydrofluoric Acid (HF) in He /H2 /UF6
■
●
Water in Vinylchloride (C2H3Cl)
■
≈
Hydrofluoric Acid (HF) in SiF4
◆
●
■ ppm
▲ ppm/Vol.-%
◆ Vol.-%
● gas
≈ liquid
The Analyzer
The MCS 100 Process Photometer is a microprocessorcontrolled single beam photometer which permits the
simultaneous use of dual
wavelength and gas filter correlation techniques. In addition, the MCS 100 makes use
of time and event controlled
program functions. The controller, which can be freely
programmed using a keypad
or an industry-standard compatible PC, permits the monitoring and control of the
system peripherals.
Further technical
standards of the
MCS 100 are the
self-check function
and the interference
compensation as well
as the linearization of
the monitored values.
filter wheels
detector
cell
chopper
light source
Structure
The photometer in the MCS
100 consists of:
■ Gas cell,
which can be heated to
temperatures up to
200/250 °C. The long-path
design uses adjustable
mirror optics for optical
path lengths up to 20 m;
the short path design uses
a single pass cell for path
lengths up to 75 cm.
■ Light Source and Detector
Unit,
built into a cast housing
with degree of protection
IP 65 (NEMA 12).
■ Electronics Section
All instrument electronics
are enclosed in a 19” slidein rack and safeguarded
according to degree of protection IP 65 (NEMA 12). All
relay and analog outputs
are fully integrated and are
routed to their transfer
units via disturbance free
fiber optics.
Measurement
Principle
After leaving the cell, the
modulated light from the
source encounters two filter
wheels located one behind
the other. Stepper motors
move the optical components
used for the dual wavelength
technique or gas filter correlation technique into the light
beam. The intensity of the
light is measured using a
following detector.
Dual Wavelength
Method
The optical components used
in connection with this
method are band pass filters,
generally one measuring filter
and one reference filter per
component. The measuring
filter selects the spectral
range of an absorption band
of the substance to be measured.
The reference filter selects
the spectral range in which
there is no absorption by
either the measured component or any other component.
When the measuring filter is
swung into place, a signal is
generated the intensity of
which depends upon the concentration of the substance to
be measured. When the reference filter is swung into place,
a signal is generated the
intensity of which is independent of the concentration. The
absorbance is determined by
calculating the quotient of
these two signals and then
taking the logarithm. It is,
basically, not affected by
changes in the optical properties of the photometer and
permits a high long-term stability and reproducibility of the
monitored values. In subsequent calculations, the
absorbance determined in
this manner is corrected for
possible interferences,
linearized, and sent to the
display and outputs.
Gas Filter Correlation
Method
In the gas filter correlation
method, the concentrationindependent reference signal
is produced by swinging the
gas filter into place. The gas
filter is a miniature cell which
is filled with the component to
be measured under a high
partial pressure. The gas filter
is used to eliminate the
spectra of the component to
be measured. The concentration-dependent measurement
signal is obtained by swinging
an empty opening of the filter
wheel into the beam. In order
to limit the spectral range to
the absorption band of the
component to be measured,
a band pass filter is swung
into place on the second filter
wheel during both measurements. The calculation of the
absorbance and further signal
processing are performed in a
manner analogous to the dual
wavelength method.
Convenient Sample Handling
Sample processing is an
essential part of the analytical
procedure. SICK has the necessary experience in this field
and provides a whole range
of suitable accessories for
process analysis, including
those for use with reactive
and corrosive samples.
The Cells
SICK process photometer
cells are specially manufactured to meet the stringent
demands of process analysis.
They are:
■
■
■
Thermostattable
Corrosion-resistant
Made of optimally adapted
materials
Cells for Liquid
Samples
These are pressure-resistant
to well over 100 bar and temperature-resistant to 180 °C.
Path lengths as low as
0.1 mm are available.
Standard materials are stainless steel and Monel.
Short Path Cells for
Gases
Cells with path lengths of 10,
50 and 75 cm are available
for highly concentrated or
strongly absorbing media. The
small volumes involved give
rise to a fast response time.
Standard material is
aluminum with a hardcoat
surface.
Long Path Cells for
Gases
A typical application with the cell for liquids.
The lower part of the cabinet contains the sample preparation
Two versions of cells are
available for trace analysis: a
6 m cell has a low volume for
rapid response and can be
heated up to 180 °C. The
15 m path length cell has a
lower detection limit capability
combined with increased
thermal stability and can be
heated up to 250 °C.
Standard material is
aluminum with hardcoat
surface.
Software and Data Transfer
SICK’s goal is not only to
provide perfect analytical
results on the basis of the
quality of its instruments but
to present these in an optimal
way to the user.
This is made possible by
simple programming of the
analyzers and by providing
numerous and flexible interfaces.
OPTION
OPTICAL/
ELECTRICAL
PROCESS
OPTICAL/
ELECTRICAL
OPERATOR
PC
PROGRAMMING
DATA
ACQUISITION
HARDDISK
PRINTER
MCS 100
MEASURED DATA
DATA
DISPLAY
SCREEN
Data flow
of MCS 100
Fiber optic-controlled
relay interfaces
Once installed and calibrated,
the MCS 100 operates completely automatically. Measured results are shown on
the display and transferred
via fiber-optics.
I/O module boxes can be
connected to the fiber-optics
forming the digital and anlog
interface to the process.
Relay outputs serve as digital
limit selectors, e.g. for alarm
purposes etc.
Actual method: PROCESS
Measurement
Change measuring method
Display
Utilities
other measuring method (PROCESS now)
PC measuring method
MCS measuring method
Change
Overwrite from an other method
Read from MCS
Write to MCS
Via the I/O module boxes,
analog and digital values can
be fed into the system. This
enables the system to be
controlled externally, to communicate with external
sensors and to process data
from other instruments.
An RS 232 interface enables
a PC to be connected to the
MCS 100. A computer connected in this way can be
used to alter the program of
the system in a simple way.
This feature offers all the
capabilities associated with
computer processing –
graphic presentation, relay or
analog output and permanent
recording on a hard disk.
Menu-driven
easy-to-use
PC Software
Technical Data
MCS 100 UV/VIS/(N)IR
Spectral range:
(also depending on optics)
IR Version
approx. 1.5 - 17.0 µm,
NIR Version
approx. 1.0 - 3.0 µm,
VIS Version
approx. 450 - 900 nm,
UV Version
approx. 200 - 360 nm,
light
light
light
light
source:
source:
source:
source:
IR, Detector: pyroelectric
IR, Detector: PbS
Halogen lamp, Detector: Silicon diode
Deuterium lamp, Detector: Silicon diode
System cabinet:
Dimensions:
Weight:
Degree of protection:
EMC:
Ambient temperature:
Power supply:
Power consumption:
19“ cabinet with window
(200 x 550 x 380) mm (H x W x D) (plus connectors)
approx. 23 kg
IP 65 (NEMA 12), special designs, also for hazardous areas, available on request
complies with NAMUR (Normen-Ausschuß für Meß- und Regeltechnik) specifications
0 to + 40 °C
3~230V + 10% / -15% / 50 Hz optional 3~115/ 60 Hz
260 VA plus additional power for sample cell (approx. 100-500 VA)
Physical unit:
Dimensions:
Weight:
Probe connector:
depends on cell
approx. 18 kg (without cell)
8 mm cutting ring screwing
Distance system cabinet - physical unit:
up to 100 meter
Number of components:
Measuring ranges:
max. 8
for each component 2 measuring ranges with automatic range selection,
freely programmable
adjustable between approx. 0 - 1200 sec. (depends on application)
< 2 % of the particular measuring range
Automatic after input of the calibration values
two limits freely programmable for each component as ”normally closed“ or
”normally open“ relay
taking account of up to a maximum of four interfering variables, external variables
also possible, automatic compensation after input of the measured value
0.7 - 1.2 bar ambient pressure variations (option) (one analog signal input is used)
Response Time (T90-time):
Detection limits:
Linearization:
Limits:
Interference compensation:
Barometrical correction:
Signal outputs:
- Interface:
- Analog:
- Digital:
Signal inputs:
- Analog:
- Digital:
RS 232 (V 24), max. distance 5 m without amplifier
24 channels (opto boxes via optical interfaces)
64 channels (opto boxes via optical interfaces)
Display:
Peripherical system control:
Operation:
Zero and span calibration:
Multiple sampling:
Compliances:
1 x LED-Display, 4 1/2 place; 1 x LC-Display, 4 x 20 characters; alphanumeric display
by integrated, freely programmable run-off control via optical interfaces, via opto boxes
typical complex analytical systems can be controlled and monitored
via membrane keyboard or PC
remote control or internal clock controlled programs
up to eight samples, time sharing operation controlled by built-in plc
IEC 1010-1/A1+A2:1995
EMV: EN 50 081-2:93 and 50 082-2:95
S
D
P
SICK MAIHAK GmbH • Analyzers and Process Instrumentation • Nimburger Str. 11 • 79276 Reute • Germany
Phone: +49 76 41 4 69 0 • Fax: +49 76 41 4 69 11 49 • www.sick-maihak.de • [email protected]
Order No.: 800 90 13 09/01 09/01 Printed in Germany • Subject to change without prior notice
max. 8 channels (opto boxes via optical interfaces)
max. 64 channels (opto boxes via optical interfaces)