2223-21 Winter College on Optics in Imaging Science 31 January - 11 February, 2011 On breaking the Abbe diffraction limit in Optical Nanopatterning & Nanoscopy MENON Rajesh Laboratory for Optical Nanotechnologies Department of Electrical and Computer Engineering University of Utah U.S.A. On breaking the Abbe diffraction limit in Optical Nanopatterning & Nanoscopy Rajesh Menon [email protected] http://lons.utah.edu Laboratory for Optical Nanotechnologies Department of Electrical and Computer Engineering University of Utah Research Laboratory of Electronics MIT Complex geometries at the nanoscale are typically patterned via Scanning-electron-beam Lithography (SEBL) 10nm HSQ patterned on a 30kV Raith-150 two. 9nm pitch 13 nm 4.5nm J. K. W. Wang & K. K. Berggren, J. Vac. Sci. Technol. B, 25, 2025 (2007). This is analogous to a (very sharp) “pencil” drawing an image. Time for SEBL to pattern a 150mm wafer with 10nm features ~ 1 year! pix e l 2 1 0 5 1 0 w id t h 2 0 ( nm ) 5 0 100 200 7 Writing speed (cm2/s) 1 mont h 1 0 6 1 0 5 1 0 4 da t a r a t e 1 we e k 10 1 1 0 1 MHz 1 day MHz ho ur 100 3 MHz 1 0 0 e le c t r o ns p e r p ix e l 1 0 2 1 0 1 1 GHz 2 T ime t o e xpos e 1 c m a r e a b y e - b e a m lit ho g r a phy at 1 0 0 0 A / cm 1 0 0 e le c t r o ns 1 0 1 0 2 a s s uming pe r pix e l 0 - 1 1 0 2 0 5 0 100 200 Feature size (nm) 500 1000 Courtesy of H. I. Smith (MIT) Electrons are deflected by stray electric & electromagnetic fields leading to pattern distortion Distortions in a spoke-wheel pattern jcnabity.com 3KRWRQVDYRLGWKHVHSUREOHPV 3KRWRPDVNOD\RXW *UDWLQJV ,QWHJUDWHG2SWLFV QP QP 0LFURPDJQHWLFV QP QP 3KRWRQLF'HYLFH 6HDORI0,7 NM MM 50HQRQ$3DWHO'*LO+,6PLWK0DW7RGD\)HE QP 3DWWHUQLQJZLWKSKRWRQVFDQEHIDVWDFFXUDWH %XWWKH\VXIIHUIURPGLIIUDFWLRQ L Q a L VLQQ L $EEHOLPLW QP QP QP QP QP QP 89LRQL]LQJ &RPSOH[ QP H[SHQVLYHVRXUFHV QP Superresolution using Fluorescence STimulated Emission Depletion (STED) Folds of the mitochondrial inner membrane STED Confocal T. A. Klar, et. al, PNAS 97, 8206 (2000). STochastic Optical Reconstruction Microscopy (STORM) Target structure Localizing activated subset of probes STORM imag e X. Zhuang, Nat. Photonics, 3, 365 (2009). 0RGHOLQJ$EVRUEDQFH0RGXODWLRQ 3KRWRQ7UDQVSRUW(TXDWLRQV LQFLGHQWOLJKW L L 5DWH(TXDWLRQ $0/ $ ] RSDTXH L L N%$ % WUDQVSDUHQW 3KRWRVWDWLRQDU\$SSUR[LPDWLRQ 3KRWRQ7UDQVSRUW(TXDWLRQ 5DWH(TXDWLRQ %HHU/DPEHUW/DZ '\QDPLF(TXLOLEULXP 7KHUPDO6WDELOLW\ FRQWUROV´VTXHH]LQJµ ODUJH´HIIHFWLYHµ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a L QP 6DPSOH6WDFN aQP QP $0/%LWKLHQ\OHWKHQH aQP 39$ aQP $0/ SKRWRUHVLVW QP !2# NM ´VTXHH]HGµOLQHV ):+0aQP SUHGLFWHG VXEVWUDWH SKRWRUHVLVW QP QP $5& QP VLOLFRQ QP QP 4 , !NDREW (9 4SAI 2 -ENON 3CIENCE 3DWWHUQLQJEH\RQGWKHGLIIUDFWLRQOLPLWL QP aQP L QP L QP $0/ SUPPRESSED PEAK VLPXODWLRQ QP QP QP ´VXSSUHVVHGSHDNµ SKRWRUHVLVW $5& 4 , !NDREW (9 4SAI 2 -ENON 3CIENCE 0DSSLQJWKH/LQH6SUHDG)XQFWLRQ/6) UHVLVWFOLSSLQJOHYHO LQFUHDVLQJGRVH H[SRVHG QHJDWLYH SKRWRUHVLVW :GRVH :GRVH 50HQRQ ET AL * /PT 3OC !M ! 4XDQWLWDWLYHYHULILFDWLRQRI$EVRUEDQFH0RGXODWLRQ WUDQVPLWWHG LQWHQVLW\L PHDVXUHG WUDQVPLWWHG LQWHQVLW\L VLPXODWHG ,QWHQVLW\ QRUPDOL]HG ï ï 'LVWDQFHMP 50HQRQ ET AL 0HYS 2EV ,ETT
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