Electrochimica Acta 49 (2004) 485–495 Ortho-substituted anilines to inhibit copper corrosion in aerated 0.5 M hydrochloric acid K.F. Khaled a,b,∗ , N. Hackerman b b a Chemistry Department, Ain Shams University, Roxy, Cairo, Egypt Chemistry Department, Rice University, 6100 Main street, Houston, TX 77005, USA Received 14 July 2003; received in revised form 14 July 2003; accepted 6 September 2003 Abstract Aniline derivatives, namely 2-chloroaniline, 2-fluoroaniline, 2-aminophenetole, 2-ethylaniline, o-aminoanisole and o-toluidine were studied for their possible use as copper corrosion inhibitors in 0.5 M HCl. These compounds were studied in concentrations from 10−3 to 10−4 M at temperature 298 K. Effectiveness of these compounds was assessed through potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) measurements. These compounds inhibit the corrosion of copper in HCl solution to some extent. In each case, inhibition efficiencies increase with increasing concentration. A suggested model for the interface as well as some kinetic data is presented. These inhibitors obey the Temkin adsorption isotherm. A correlation between structure and inhibition efficiencies is suggested. © 2003 Elsevier Ltd. All rights reserved. Keywords: Copper; Potentiodynamic polarization; EIS; Acid corrosion inhibition 1. Introduction Due to its excellent thermal conductivity and good mechanical workability, copper is a material commonly used in heating and cooling systems. Scale and corrosion products have a negative effect on heat transfer, and they cause a decrease in heating efficiency of the equipment, which is why periodic descaling and cleaning in hydrochloric acid pickling solutions are necessary. Most corrosion inhibitors can eliminate the undesirable destructive effect and prevent metal dissolution. Copper normally does not displace hydrogen from acid solutions and, therefore, is virtually unattacked in non-oxidizing conditions. In fact, if hydrogen is bubbled through a solution of copper salts, it reduces as fast as the process occurs [1]. Yet, most solutions to be handled contain dissolved air, which causes cathodic depolarization and enables some corrosion to take place. Copper dissolution in acidic solutions has been studied by several researchers [2–7]. Corrosion inhibitors can be used to prevent copper dissolution, benzotriazole, for instances, was studied and found to have excellent inhibition proper∗ Corresponding author. Fax: +202-25-81-243. E-mail address: [email protected] (K.F. Khaled). 0013-4686/$ – see front matter © 2003 Elsevier Ltd. All rights reserved. doi:10.1016/j.electacta.2003.09.005 ties in several corrosive environments [8–11]. This molecule contains nitrogen atoms and it is also useful in preventing copper staining and tarnishing [12–17]. In the present study, efficiency of a series of ortho-aniline derivatives for inhibition of copper corrosion in 0.5 M hydrochloric acid was investigated. The series consisted of 2-chloroaniline, 2-fluoroaniline, 2-aminophenetole, 2-ethylaniline, o-aminoanisole and o-toluidine. Corrosion inhibition was investigated using electrochemical impedance spectroscopy (EIS) measurements and potentiodynamic polarization (dc) measurements. The inhibition efficiency obtained from (EIS) measurements was compared with those obtained from potentiodynamic polarization (dc). Impedance spectra obtained from this study were analyzed to show the equivalent circuit that fits the corrosion data. The adsorption behavior of this series is examined. Correlation between the inhibition efficiency and the structure of these compounds is suggested. 2. Experimental Chemical structures of the studied compounds are presented in Fig. 1. Copper specimens from Johnson Mattey (Puratronic, 99.999%) were mounted in Teflon. An epoxy 486 K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 Fig. 1. 2D structure of the o-substituted anilines. resin was used to fill the space between Teflon and copper electrode. The electrochemical measurements were performed in a typical three-compartment glass cell consisted of the copper specimen as working electrode (WE), platinum counter electrode (CE), and a saturated calomel electrode (SCE) as the reference electrode. The counter electrode was separated from the working electrode compartment by fritted glass. The reference electrode was connected to a Luggin capillary to minimize IR drop. Solutions were prepared from bidistilled water of the resistivity 13 M cm, The copper electrode was polished with different grit emery papers up to 4/0 grade, cleaned with acetone, washed with bidistilled water and finally dried. The electrode potential was allowed to stabilize 30 min before starting the measurements. All experiments were conducted at 298 K. The electrolyte solution was made from HCl (Fisher Scientific) and bidistilled water. The inhibitors (Aldrich Chemical Co.) used without any pretreatment. Electrochemical measurements were recorded with EG&G Princeton Applied Research Potentiostat/Galvanostat (PAR model 273) in combination with a Solarton 1250 frequency response analyzer. Fig. 2. Anodic and cathodic Tafel lines for copper in 0.5 M HCl without and with 10−3 M of o-substituted anilines. K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 487 Fig. 3. Anodic and cathodic Tafel lines for copper in 0.5 M HCl without and with 5 × 10−3 M of o-substituted anilines. The potentiodynamic current-potential curves were obtained by changing the electrode potential automatically from (−250 to +250 mVSCE ) versus open circuit potential with scan rate of 0.166 mV/s. EIS measurements were carried out in frequency range from 100 kHz to 30 mHz with an amplitude of 5 mV peak-to-peak using ac signals at open circuit potential. EIS spectra were analyzed by Zview impedance analysis software (Scribner Associates, Inc., Southern Pines, NC). 3. Results and discussion Polarization curves for copper electrode in aerated 0.5 M HCl in the absence and the presence of various concentrations of o-substituted anilines are shown in Figs. 2–4 (representative examples). Values of associated electrochemical parameters and inhibition efficiencies (I %) of the studied compounds are given in Table 1. The inhibition efficiencies are defined as: Fig. 4. Anodic and cathodic Tafel lines for copper in 0.5 M HCl without and with 9 × 10−3 M of o-substituted anilines. 488 K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 Table 1 Electrochemical parameters of copper in 0.5 M HCl without and with different concentrations of o-substituted anilines Conc. (M) Blank icorr (A cm−2 ) −Ecorr (mV) −bc (mV dec−1 ) ba (mV dec−1 ) CR (mpy) 11.17 I (%) 253.9 209.0 51.47 5.12 2-Ethylaniline 10−3 5 × 10−3 9 × 10−3 10−2 1.796 1.659 1.635 1.522 254.8 256.1 259.8 266.1 227.7 228.7 207.1 203.9 51.64 52.34 52.62 55.1 0.82 0.76 0.75 0.69 83.92 85.147 85.36 86.37 2-Chloroaniline 10−3 5 × 10−3 9 × 10−3 10−2 1.856 1.766 1.674 1.593 255.1 258.0 269.7 269.9 251.7 221.3 175.0 191.2 52.58 54.04 55.7 55.83 0.85 0.81 0.76 0.73 83.33 84.8 85.01 85.73 2-Fluoroaniline 10−3 5 × 10−3 9 × 10−3 10−2 2.234 2.09 1.71 1.7 257.1 269.2 272.8 284.1 303.1 190.3 203 174.8 52.89 53.54 54.13 55.97 1.02 0.95 0.78 0.77 80.0 81.28 84.69 84.78 o-Toluidine 10−3 5 × 10−3 9 × 10−3 10−2 2.324 2.142 2.055 1.878 259.1 261.6 261.2 273.9 264.8 200.0 204.1 296.7 53.84 54.12 54.7 54.9 1.06 0.98 0.94 0.86 79.19 80.08 81.6 83.18 o-Aminoanisole 10−3 5 × 10−3 9 × 10−3 10−2 2.455 1.998 2.014 2.034 254.4 254.8 255.3 259.2 224.6 269.9 245.3 281.0 51.45 51.36 54.43 52.84 1.12 0.92 0.92 0.93 78.02 82.11 82.09 81.82 2-Aminophenetole 10−3 5 × 10−3 9 × 10−3 10−2 2.608 2.353 2.146 2.134 259.1 255.8 260.0 269.8 257.0 280.0 205.4 270.2 53.4 54.28 55.56 54.80 1.19 1.07 0.98 0.97 76.65 78.93 80.7 80.89 I(%) = i0corr − icorr × 100 i0corr (1) where i0corr and icorr are the uninhibited and inhibited corrosion current densities, respectively, determined by – extrapolation of Tafel lines to corrosion potential. These results reveal that the best inhibition in the short time test was at the highest concentration (10−2 M). By increasing inhibitor concentration, inhibition efficiency increases and the corrosion rate decreases. The corrosion potential Ecorr Fig. 5. Complex-plane impedance for copper in 0.5 M HCl without and with 10−3 M of o-substituted aniline. K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 489 Fig. 6. Complex-plane impedance for copper in 0.5 M HCl without and with 5 × 10−3 M of o-substituted anilines. shifted towards more cathodic values in the presence of o-substituted anilines. The shift of Ecorr with increasing concentration of the inhibitor could be due to the fact that the inhibitor had a strong influence on the oxygen reduction than the copper dissolution [18]. The corrosion potential Ecorr , anodic Tafel slopes ba and cathodic Tafel slopes bc obtained in uninhibited 0.5 M HCl solution agreed with those reported in the literature [19]. At concentrations <1 M HCl, the accepted copper dissolution mechanism [18] follows two steps: fast : slow : − Cu(S) → Cu+ (ads) + e 2+ − Cu+ (ads) → Cu(sol) + e The slope variation in the inhibited solution especially at high inhibitor concentrations indicated a change in the copper dissolution. Unlike two electrons’ electro-dissolution mechanism, copper in the presence of o-substituted anilines Fig. 7. Complex-plane impedance for copper in 0.5 M HCl without and with 9 × 10−3 M of o-substituted anilines. 490 K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 Fig. 8. Complex-plane impedance for copper in 0.5 M HCl without and with 10−2 M of o-substituted anilines. could as reported for other inhibitors [20] electro-oxidize primarily to Cu+ and is able to form slightly soluble [Cu(o-anilines)n ]+ ads complex as the main electro-deposition products in the presence of a “clean” surface (i.e. in the case of (Cu/Cu2 O-system) [21–23]. For example, the cuprous organometallic complex with the participation of indole, a molecule similar to the anilines, was proposed by Balogh–Hergovic and Speier to explain the dehydrogenation Table 2 Impedance data of copper in 0.5 M HCl without and with different concentration of o-substituted anilines Conc. (M) Rct (Ohm) 10.22 × Blank 10−3 5 × 10−3 9 × 10−3 10−2 27.56 31.35 33.94 36.4 2-Chloroaniline 10−3 5 × 10−3 9 × 10−3 10−2 2-Fluoroaniline 103 1/Rct (Ohm−1 ) 9.78 × Cdl (F) 10−5 9.83 10−5 I (%) Coverage (θ) – 103 × × 103 × 103 × 103 3.62 3.18 2.94 2.74 × × 10−5 × 10−5 × 10−5 3.64 3.20 2.96 2.76 62.9 67.40 69.88 71.92 0.62 0.67 0.69 0.72 24.72 27.39 31.07 34.4 × × × × 103 103 103 103 4.04 3.65 3.21 2.91 × × × × 10−5 10−5 10−5 10−5 4.06 3.66 3.23 2.92 58.65 62.68 67.1 70.29 0.58 0.63 0.671 0.71 10−3 5 × 10−3 9 × 10−3 10−2 23.98 26.98 30.75 32.85 × × × × 103 103 103 103 4.17 3.71 3.2 3.04 × × × × 10−5 10−5 10−5 10−5 4.18 3.72 3.26 3.05 57.38 62.12 66.76 68.88 0.57 0.62 0.66 0.68 o-Toluidine 10−3 5 × 10−3 9 × 10−3 10−2 22.61 26.38 30.01 31.82 × × × × 103 103 103 103 4.42 3.79 3.33 3.14 × × × × 10−5 10−5 10−5 10−5 4.44 3.81 3.34 3.15 54.79 61.25 65.94 67.88 0.54 0.61 0.65 0.67 o-Aminoanisole 10−3 5 × 10−3 9 × 10−3 10−2 20.7 24.63 29.02 30.88 × × × × 103 103 103 103 4.83 4.1 3.44 3.23 × × × × 10−5 10−5 10−5 10−5 4.85 4.07 3.46 3.25 50.62 58.50 64.78 66.91 0.51 0.58 0.64 0.66 2-Aminophenetole 10−3 5 × 10−3 9 × 10−3 10−2 19.30 22.77 26.1 27.26 × × × × 103 103 103 103 5.183 4.39 3.83 3.66 × × × × 10−5 10−5 10−5 10−5 5.2 4.41 3.85 3.68 47.04 55.11 60.84 62.51 0.47 0.55 0.61 0.62 2-Ethylaniline K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 491 case of tryptophan as inhibitor for copper in aerated sulfuric acid [18]. A typical set of Nyquist plots for copper in 0.5 M HCl solutions in the presence of various concentrations of o-anilines are shown at Figs. 5–8. Curves obtained from impedance data response of copper changes significantly on addition of inhibitors. Generally, the impedance of the inhibited substrate increased with increasing concentration of inhibitor. The impedance spectra for copper were recorded at 2 h immersion time. The shape of the Nyquist plot for copper in the absence and the presence of the studied compounds are incomplete semi-circle in the frequency range. Viewing the impedance results in the format of the Bode plots, CPE R1 R2 Fig. 9. Equivalent circuit model for the studied inhibitors. of indoline derivatives to indoles catalyzed by Cu complexes [22]. The same behavior was hypothesized in the case of indole and 5-chloroindole mild steel inhibitors, through the formation of [Cu(indole)n ]+ or [Cu(5-chloroindole)n ]+ complexes [23]. This assumption was suggested also in -10000 FitResult Z'' -7500 -5000 -2500 0 0 2500 5000 7500 10000 Z' (a) 10 4 -100 10 3 -75 10 2 -50 10 1 -25 10 0 10-1 (b) (b) 100 10 1 10 2 10 3 10 4 Phase angle |Z | FitResult 0 10 5 Frequency (Hz) Fig. 10. (a) Nyquist plots of copper corrosion in 0.5 M HCl solution at Ecorr . (b) Bode-phase plots of copper corrosion in 0.5 M HCl solution at Ecorr . 492 K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 -40000 FitResult -30000 Z'' -20000 -10000 0 0 100 00 20000 30000 40000 Z' (a) 5 10 -100 104 -75 103 -50 102 -25 101 10 -2 (b) 10 -1 100 101 102 103 Phase angle |Z| FitResult 0 104 Frequency (Hz) Fig. 11. (a) Nyquist plots of copper corrosion in 0.5 M HCl solution with 10−2 M of 2-ethylaniline at Ecorr . (b) Bode-phase plots of copper corrosion in 0.5 M HCl solution with 10−2 M of 2-ethylaniline at Ecorr . Figs. 10(b) and 11(b) showed that there is one phase angle maximum. Addition of various concentrations from the studied compounds increases the diameter of the semi-circles. The impedance loops measured are often depressed semicircles with their center below the real axis. This kind of phenomenon is known as the “dispersing effect” [24,25]. The charge transfer resistance Rct , double layer capacitance Cdl are calculated from Eq. (2): )= f(−Zmax 1 2πCdl Rct (2) ) is the maximum imaginary component of where (−Zmax the impedance, and inhibition efficiency is calculated from Rct data by Eq. (3) I% = 1/R0ct − 1/Rct 1/R0ct × 100 (3) here R0ct and Rct are the charge transfer resistance values without and with inhibitor, respectively. Data from Table 2 reveals that by increasing the concentration of o-substituted anilines the corrosion rate (1/Rct ) decreases. K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 493 Fig. 12. Temkin adsorption plots of copper in 0.5 M HCl containing 10−2 M of o-substituted anilines. Results from EIS and potentiodynamic polarization measurements are in good agreement. Analysis of impedance data by EQUIVCRT.PAS & Zview impedance analysis computer programs (Scribner Associates, Inc., Southern Pines, NC) yielded different parameters, such as Ohmic resistance (R) and constant phase element (CPE) represented as Q. These elements are necessary for the description of the equivalent circuit of the electrode process. The impedance of CPE is given by: ZCPE = [Q(iω)n ]−1 (4) where ω is the angular frequency. Depending on the value of the exponent n, Q may be a resistance, R (n = 0); a capacitance, C (n = 1); Warburg impedance, W (n = 0.5) or an inductance, L (n = −1) [26]. The equivalent circuit is suggested as in Fig. 9, where R1 represents the solution resistance, R2 the charge transfer resistance, and CPE, Fig. 13. Correlation of log P with inhibition efficiency of o-substituted anilines. 494 K.F. Khaled, N. Hackerman / Electrochimica Acta 49 (2004) 485–495 the constant phase element. Considering the impedance of a double layer does not behave as an ideal capacitor in the presence of dispersing effect, a constant phase element CPE is used as a substitute for capacitor in Fig. 9 to fit more accurately the impedance behavior of the electric double-layer. CPE has widely been used to account for deviations brought about by surface roughness. The value of n was found to increase from 0.79 to 0.92. Values of charge transfer resistance Rct are in good agreement with R2 values. Figs. 10 and 11 shows some impedance diagrams fitted for copper in 0.5 M HCl in the presence and the absence of additives (representative examples) in both Nyquist and Bode format. Both simulated and measured data are fitted very well. The high frequency part in Nyquist and Bode plots describes the behavior of an inhomogeneous surface layer of the electrode surface, while the low frequency contribution shows the kinetic response for the charge transfer reaction [27]. The values of θ have been inserted into Table 2. Basic information on the interaction between the inhibitors and the iron surface can be provided by the adsorption isotherm. The degree of surface coverage (θ) of different concentrations of inhibitor in acidic media have been evaluated from electrochemical impedance measurements according to [28,29], Eq. (5): θ= Cdl(θ=0) − Cdlθ Cdl(θ=0) − Cdl(θ=1) (5) where Cdl(θ=0) and Cdl(θ=1) are the double layer capacitances (per unit area) of the inhibitor-free and entirely inhibitor-covered surfaces, respectively, Cdlθ is the composite total double layer capacitance for any intermediate coverage θ. Attempts were made to fit these θ values to various isotherms including Frumkin, Langmuir, Temkin, etc. The simple Langmuir adsorption model could not fully explain the inhibition of o-anilines in the present case. The surface coverage θ is tested graphically for fitting a suitable adsorption isotherm as indicated in Fig. 12. The plot of θ versus ln Cinh yields a straight line with correlation coefficient equals more than 0.92, showing that the adsorption of these inhibitors can obeys Temkin adsorption isotherm. For a reliable and linear plot, surface coverage should fall within the linear window (monolayer) for inhibitor adsorption, i.e. θ =0.2–0.8 [30]. The strong correlation for the Temkin adsorption isotherm plot for o-substituted anilines confirms the validity of this approach. Molecular orbital theoretical calculations based on the semi-empirical self-consistent field method (SCF). Molecular modeling of these corrosion inhibitors was carried out using Hyperchem version 7, a quantum mechanical program marketed by Hypercube, Inc. A full geometry optimization was performed using PM3 semi-empirical molecular orbital method. The correlations generated were, in general, poor and of little use for optimizing inhibitor structure, however, the values of log P (P is the partition coefficient) [31,32] shows a degree of correlation with the inhibitor performance Fig. 13. o-Substituted anilines present similar inhibition efficiency. Ethyl aniline gives more protection due to the repelling power of ethyl group than other ortho groups. Chloro and fluoro substitute give also, good inhibition because of increase the delocalization of electron density in the molecule, which make the molecule more stable, i.e. better inhibition. Methyl substituted do the same action like ethyl substituted but with lower inhibition. In case of methoxy aniline and ethoxy aniline, the inhibition decrease owing to the presence of −I (inductive) and +M (mesomeric) effects which decrease the electron clouds on those substitutes. The previous discussion indicate that o-substituted anilines inhibit the corrosion of Cu in 0.5 M HCl according to the order: −C2 H5 > −Cl > −F > −CH3 > −OCH3 > −OC2 H5 4. Conclusions 1. All investigated o-substituted anilines show good inhibiting properties for copper corrosion in 0.5 M HCl. 2. The structure of o-substituted aniline influences their inhibiting efficiency 3. The inhibiting efficiency of those o-substituted aniline increases in the following order, –C2 H5 > –Cl > –F > –CH3 > –OCH3 > –OC2 H5 . 4. Results obtained from potentiodynamic polarization indicated that the o-substituted aniline are cathodic-type inhibitors. Acknowledgements The authors’ wish gratefully acknowledges the financial support provided by Robert A. Welch Foundation of Houston, TX. References [1] P.T. 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