First principles study of point defects in titanium oxycarbide H. M. Pintoa , J. Coutinhob, M. M. D. Ramosa , F. Vaza , L. Marquesa,∗ a University of Minho, Department of Physics, Campus de Gualtar, 4710-057 Braga, Portugal of Aveiro, Department of Physics, Campus Santiago, 3810-193 Aveiro, Portugal b University Abstract We have performed first principles density functional theory calculations to study the formation energy of point defects in TiC, TiO and TiCO compounds. The formation energy of isolated vacancies were obtained for different equilibrium conditions. For binary compounds, we have also calculated the formation energy of antisite defects. It was found that the defect formation energies strongly depend on the chemical environment. Our results show that C vacancies are easily formed in TiC and TiCO. For the TiO compound, Ti vacancies are highly probable to occur and O vacancies are also easily formed under titanium rich atmosphere. Key words: Defect formation, Titanium oxide, Titanium carbide 1. Introduction Titanium oxycarbide is a multifunctional material crystalizing in the rocksalt structure. Changing the oxygen/carbon ratio it is possible to tune its mechanical and electrical properties from the metallic-like, such has high electrical conductivity and ductility to insulating behavior and extreme hardness of typical covalent bonded materials. [1, 2, 3] This variety of properties has attracted the attention to this material due to its potential for a wide range of high technological applications. These materials presents a high concentration of defects, specially vacancies, which play an important role in the material properties.[5, 4] Thus, it is important to investigate the formation of isolated vacancies and antisite point defects in titanium oxycarbide, which can be obtained at different chemical environment. In this work we present a theoretical study of point defects in titanium oxycarbides using first principles calculations. The formation energy of vacancies and antisite defects for the binary TiC and TiO compounds and the formation energy of vacancies in the ternary compound TiC 0.5 O0.5 are calculated by ab initio methods. 2. Method The calculations were performed within the density functional theory (DFT), using the (VASP) code [7, 8, 9], with local density approximation (LDA) for the exchange-correlation energy and projector augmented wave (PAW) ∗ Email addresses: [email protected] (L. Marques) Preprint submitted to Plasma Processes & Polymers February 3, 2009 pseudopotentials [10], in supercells containing 64 atoms. Cut-off energy (E cut ) of 500 eV was used for the plane-wave basis set expansion. The Brillouin zone (BZ) was sampled using the Monkhorst-Pack scheme [11] with a mesh of 7×7×7 points in the reciprocal unit cell. The formation energy of a defect in a binary compound like TiC is given by [12]: ΩD = ED − nTi µTi − nC µC (1) where ED is the total energy of a supercell containing n Ti Ti atoms, nC C atoms and one defect, µ Ti and µC are the chemical potentials of Ti and C, respectively. This equation may be written in the form 1 ΩD = ED − (nC − nTi )Δµ 2 (2) 1 1 ED = ED − (nC + nTi )µBTiC − (nC − nTi )(µCB − µBTi ) 2 2 (3) where The superscript B in the chemical potential indicates the corresponding bulk value.The difference Δµ is defined as Δµ = (µC − µTi ) − (µCB − µBTi ) (4) The chemical potential of Ti and C should not exceed their bulk chemical potential, otherwise the respective precipitate would be formed. Consequently, µ Ti µBTi and µC µCB . At thermal equilibrium, the sum of the Ti and C chemical potentials is equal to the chemical potential of bulk TiC per pair of atoms; µ Ti + µC = µBTiC . Then, the difference in the chemical potentials of both elements is restricted by the following condition −ΔH Δµ ΔH (5) where ΔH is the heat of formation of TiC. This determines the growth conditions during the defect formation: Δµ = ΔH corresponds to Ti-rich limit and Δµ = −ΔH corresponds to C-rich limit. The bulk chemical potentials of Ti, C, O, TiC and TiO were calculated using VASP, assuming a hcp structure in case of titanium, the diamond structure for carbon and a NACl structure for TiC and TiO compounds. For the calculation of the chemical potential of oxygen we considered a large supercell with an oxygen molecule in the center. In order to illustrate the application of the theoretical formalism described to ternary compounds, we will just consider in this work, as a reference, an ordered TiCO alloy with the composition TiC 0.5 O0.5 and the spatial arrangement illustrated in figure 1 for an eight atom supercell. In the case of a ternary compound, like TiCO, the defect formation energy is given by [13] ΩD = ED − nTi µTi − nC µC − nO µO (6) The Ti, C and O chemical potencials (µ Ti , µC e µO ) should not exceed their corresponding bulk values and the sum of those chemical potentials must satisfy the following conditions µTi + µC µBTiC 2 (7) Figure 1: NaCl structure of TiC0.5 C0.5 . One sublattice is occupied by metal atoms (grey) and the other by carbon (black) and oxygen atoms (white), with the spatial distributions shown. and µTi + µO µBTiO (8) At thermal equilibrium, the sum of the chemical potentials of the isolated elements is equal to to the chemical potential of the ternary compound, 2µTi + µC + µO µBTiC0.5 O0.5 (9) This conditions limit the ranges over which the chemical potentials can vary. Defining two new parameters Δµ and δµ Δµ = (µO + µC − 2µTi ) − (µBO + µCB − 2µBTi ) (10) δµ = (µC − µO ) − (µCB − µBO ) (11) and the formation energy in Eq. 6 can be rewritten as 1 1 ΩD = ED − (nC + nO − nTi )Δµ − (nC − nO )δµ 4 2 (12) where 1 nTi B 1 nTi B ED = ED − (nC − )(µC − µBTi ) − (nO − )(µO − µBTi ) 2 2 2 2 1 1 − (nC + nO + nTi )µBTiC0.5 O0.5 − (nC − nO )(µCB − µBO ) 4 4 (13) which only depends of the bulk chemical potencial of Ti, C and O. On the other hand, the formation energy Ω D only depends on Δµ and δµ. In the case of the ternary compound, we have −ΔH Δµ ΔH 3 (14) Figure 2: The Ti- (A→B), C- (B→C) and O-rich (C→A) limits are represented as function of Δµ and δµ, which change along the range bounded by the triangle. where ΔH = (µBO + µCB + 2µBTi ) − µBTiC0.5 O0.5 (15) The parameter δµ is restricted by the constraint 1 1 − (ΔH − Δµ) δµ (ΔH − Δµ) 2 2 (16) In the Ti-rich condition (Δµ = −ΔH), δµ varies from −ΔH (O-rich limit) to ΔH (C-rich limit). In O- and C- rich conditions (Δµ = ΔH) thus δµ is equal to zero. Figure 2 shows the different chemical environments defined by Δµ and δµ. Note that Δµ has a minimum value at Ti-rich conditions and a maximum at Ti-poor conditions. The formalism presented in this section, for binary and ternary alloys, was used to predict the relative occurrence probability of several types of structural single point defects in TiC, TiO and TiC 0.5 O0.5 compounds for different chemical growth conditions. 3. Results and Discussion 3.1. Vacancies and antisites in TiC and TiO Table 1 presents the vacancy (V Ti and VC ) and antisite (TiC and CTi ) formation energies for TiC compound. The formation energies of all defects are also plotted in figure 3 for the different equilibrium conditions. The VC is found to be the most probable defect in TiC, which is in agreement with experiments [4]. In Ti-rich environment the VC has a negative formation energy meaning that under this condition carbon vacancies are created spontaneously. However, this may happen only when enough thermal energy is available to surmount an eventual potential barrier. The other defects are very unlikely to occur because their formation requires high energies. The calculated formation energies of vacancies (V Ti , VO ) and antisite (TiO , OTi ) defects for TiO are presented in the table 2 and plotted in Figure 4 for the different chemical environments. 4 VTi VC TiC CTi Ti-rich 9.34 -0.95 5.88 14.90 C-rich 7.49 0.89 9.58 11.20 Table 1: Formation energies (ΩD ) in eV, of vacancies (VTi , VC ) and antisites (TiC , CTi ) in TiC. Figure 3: Defect formation energies (ΩD ) as function of chemical potentials from Ti-rich limit to the C-rich limit, for TiC. VTi VO TiO OTi Ti-rich -0.74 -1.37 6.74 7.75 O-rich -6.82 4.71 18.91 -4.41 Table 2: Formation energies (ΩD ) in eV, of vacancies (VTi , VO ) and antisites (TiO , OTi ) in TiO. Under Ti-rich conditions the V Ti and VO formation energies are both negative and are highly probable to occur with formation energy of -0.74 and -1.37 respectively. This results are supported by the experimental observation of vacancies in both lattices of TiO compounds [5, 14]. The antisites are unlikely to occur in Ti-rich conditions due to their high formation energies. Oxidation conditions are favorable to the formation of O antisites (O Ti ) and Ti vacancy defects (V Ti ) in the metallic lattice, due to their negative formation energies. This suggests an imminent phase transition towards a substoichiometric TiO 2 . The relatively high formation energy of V O and TiO defects means that under O-rich conditions they are hard to be formed in TiO. 3.2. Vacancies in TiC 0.5 O0.5 The formation energy of vacancies was studied for the ternary compound TiC 0.5 O0.5 as function of the chemical potential difference (see figure 2). Table 3 presents values obtained for the formation energies of Ti, C and O vacancies 5 Figure 4: Defect formation energies as function of atomic chemical potentials between two extremes, the Ti-rich and O-rich conditions, for TiO. (VTi , VC and VO ) in TiC0.5 O0.5 , for the different chemical environments. Ti-, O-rich Ti-, C-rich C-, O-rich VTi 2.40 2.40 -1.80 VC -7.59 0.82 -7.59 VO 6.10 -2.31 6.10 C-poor O-poor Ti-poor Table 3: Formation energies (ΩD ) of vacancies (VTi , VC and VO ) for TiC0.5 O0.5 In Ti-rich and C-poor conditions (A) the carbon vacancy (V C ) is highly probable to occur. In this conditions the other defects, (V Ti and VO ) hardly occur due to their high formation energies. In C-rich and O-poor conditions (B), VO has the lowest formation energy and V Ti has the highest one. These are the unique conditions favorable to the occurrence of V O defect in TiC0.5 O0.5 . For O-rich and Ti-poor conditions (C), C and Ti vacancies are likely to occur. As expected, in O-rich atmospheres the occurrence of O vacancies are unlikely to occur. 4. Conclusions This work provides a general overview of the formation of several types of structural point defects in titanium oxycarbides for different chemical growth conditions. We used first principles methods to calculate the formation energies of vacancies and antisite defects in TiC, TiO compounds and the formation energy of vacancies in a ordered TiCO alloy with composition TiC 0.5 O0.5 . Our calculations suggest that C vacancies are likely to be formed during the growth of TiC and TiC 0.5 O0.5 , whereas Ti vacancies are highly probable to occur during the growth of TiO and O 6 Figure 5: The defect formation energies are plotted in the Ti-, C-, and O-rich limits for TiC0.5 O0.5 . antisite defects are also likely to be formed on O-rich atmospheres leading to an imminent phase transition towards a substoichiometric TiO 2 . The obtained results are supported by the existent experimental studies of point defects in TiC and TiO compounds. References [1] J. Yao, J. Shao, H. He, Z. Fan, Vacuum 2007, 8, 1023. [2] A.T. Santhenam, Application of transition metal carbides and nitrides in industrial tools, in: S.T. Oyama (Ed.), The Chemistry of Transition Metal Carbides and Nitrides, Blackie Academic and Professional, London 1996, 28. [3] A. R. Bally, P. Hones, R. Sanjins, P. E. Schmid, F. Lvy, Surface and Coatings Technology 1998, 108, 166. [4] M. Guemmaz, A. Mosser, J. C. 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