Lab4MEMS “LAB FAB for smart sensors and actuators MEMS” ENIAC KET Pilot Line 2012 Alberto Corigliano Politecnico di Milano Lab4MEMS: an ENIAC KET Pilot Line Duration: 30 months Start: January 2013 End: June 2015 Budget: 28 M Euro (about 38 M $) 21 partners belonging to 10 Countries Project Coordinator: Roberto Zafalon, STMicroelectronics s.r.l. Italy 2 Lab4MEMS: Consortium 3 • Italy, France, Malta, The Netherlands, Finland, Belgium, Romania, Poland, Norway, Austria. Lead 1 STMicroelectronics srl (Coordinator) ST-I Italy Ind 2 3 4 5 STP PoliTO IIT PoliMI Italy Italy Italy Italy Ind-Res Uni Res Uni IUNET Italy Uni CEA France Res 8 9 ST-POLITO s.c.a.r.l. Politecnico di Torino Istituto Italiano di Tecnologia Politecnico di Milano Consorzio Nazionale Interuniversitario per la Nanoelettronica Commissariat Energie Atomique Et Aux Energies Alternatives SERMA Technologies SA STMicroelectronics Ltd. SERMA ST-M France Malta Ind Ind 10 11 12 13 14 15 16 17 18 19 20 21 University of Malta SolMateS BV Cavendish KINETICS BV Okmetic OYJ VTT Technical Research Centre of Finland PICOSUN OY KLA-Tencor University POLITEHNICA of Bucharest, CSSNT Instytut Technologii Elektronowej, Warsaw Stiftelsen SINTEF Sonitor Technologies AS Datacon Technology GmbH UoM SOL CK OKM VTT Picosun KLA UPB ITE SINTEF SON DCON Malta The Netherlands The Netherlands Finland Finland Finland Belgium Romania Poland Norway Norway Austria Uni Ind Ind Ind Res Ind Ind Uni Res Res Ind Ind 6 7 Lab4MEMS: STMicroelectronics & MEMS • ST is ideally placed to lead the Lab4MEMS research into next-generation devices. Over 800 MEMS-related patents, more than 3 billion devices shipped, extensive in-house production capabilities currently producing more than 4 million MEMS devices per day. • ST is working with universities, research institutions and technology businesses across ten European countries. The project benefits from ST’s MEMS facilities in France, Italy and Malta to establish a complete set of manufacturing competencies for next-generation devices, spanning design and fabrication to test and packaging. • The project will develop advanced packaging technologies and vertical interconnections using flip-chip, through-silicon vias and through-mold vias, enabling 3D-integrated devices for applications such as body area sensors and remote monitoring. A key target is to perfect a PZT deposition process compatible with mass production, enabling innovative actuators and sensors on System-On-Chip. 4 Lab4MEMS’s vision: key-enabling technologies and new Application application areas areas Actuation: Fluid.: Ink-jet, micropumps Acoustic: ultrasound trans. Optics: tunable filters, lenses RF: Switches Piezoelectric thin-films (PZT) Sensing & Energy harvesting: Low noise, low power sensors: microphones, accelerometers Vibration energy harvesters + Sensing: Mech.: Accelerometer, gyro, pressure, flow, tactile Therm.: flow, temperature Established MEMS technology + Anisotropic magneto resistive materials (permalloy) Sensing: Magnetic field: electronic compass 3D heterogenous packaging + System aspects: Miniaturisation, compact elements New functionalities Wireless sensor nodes 5 Lab4MEMS: Scope & Mission • Lab4MEMS will feature the Pilot Line for innovative technologies on advanced piezoelectric and magnetic materials, including advanced Packaging, expected to fuel the next generation’s smart sensors and actuators based on MEMS. • Micro-actuators, micro-pumps, sensors and electrical power generators, integrated on silicon-based piezoelectric materials (PZT) • for use in Data Storage, Ink Jet, Health Care, Automotive and Energy Scavenging • Magnetic field sensors integrated on silicon-based Anisotropic Magneto Resistance (AMR) materials. • for use in consumer applications such as GPS platforms and mobile phones • Advanced packaging technologies and vertical interconnections (flip chip, Through Silicon Vias or Through Mold Vias) for full 3D integration. • For use in CONSUMER and HEALTHCARE applications such as body area sensors and remote monitoring 6 Lab4MEMS: Relevance with ENIAC Grand Challenges Lab4MEMS KET Pilot Line Technological development 7 Expected Achievements/ Applications Relevance with MASP Grand Challenge and priority research areas 7. Semiconductor Process Integration 7.3.3 Opportunities in System in Package Advanced substrates, Focus on Advanced packaging technologies and vertical wafer and module level integration. TSV and interconnections (flip chip, Through Silicon Vias or innovative assembly Through Mold Vias) for full 3D integration. This is to technology. add value and flexibility to a wide range of new smart sensors which will combine different sensing/actuation features with an extensive analog and digital processing on the single package. . Equipment, materials and manufacturing 8.3.2 More than Moore The over-arching goal of Lab4MEMS in this Grand Challenge is to enable European E&M companies to keep the leadership on MEMS sensors. 8.3.3 Manufacturing Focus on highly flexible, high quality and cost competitive, manufacturing line of MEMS sensors and smart heterogeneous integrated products. Piezoelectric and magnetic materials at the nanoscale and associated enabling compounds, for a new class of integrated MEMS sensors. 3D heterogeneous integration and packaging. Manufacturing proven quality and process robustness, handling of new material under high yield/low defectivity constraints. Highest automatization and yield. Quality inspection, failure analysis, characterization and modeling. Innovative and EU centric FrontEnd vs. Back-End value chain. Agile line production, mainly driven by Consumer and Automotive markets. Fab process control flow, equipment and tools for PZT epi deposition and AMR sputtering, metrology, quality assurance and defect inspection, Lab4MEMS: Innovation • Despite the presence of research centers in EU at the forefront of adv. material research, there is still little industrial investment ready to push through. • It is of paramount importance to increase the scientific know-how on those key materials, but also the fast transferring of knowledge to production, by setting the advanced infrastructure and R&D manufacturing Pilot Line. • Lab4MEMS will be promoted as an add-on to the current facilities in Agrate and Malta, aiming to implement and optimize the industrial processes and to validate the demonstrators suitable to penetrate the market. • 3D package integration for MEMS products will allow to integrate the ASIC die & the MEMS sensors in a stacked configuration, thus enhancing performance and reliability while reducing size and cost. 8 Lab4MEMS: Expected Impact • The MEMS PL will be based in Agrate (IT), on 200 mm wafer scale and, once in operation, it will process more than 600 wafers/week. • ST-I will fit a new set of R&D equipments for PZT and AMR, as part of a larger manufacturing facility already in place for high volume (i.e. >100M devices/month) 3-axis MEMS accelerometers and gyroscope. This strategy will allow increasing and maintaining the know-how on those very strategic enabling technologies, combining scientific skills with the ability to design and manufacture a wide range of smart systems on silicon. • The Packaging PL will be based in Kirkop (Malta) • ST-M will integrate a new set of R&D equipment for flip chip, vertical interconnections (Through Silicon Vias and/or Through Mold Vias) and Wafer Level Package, as part of a larger manufacturing facility already in place for high volume MEMS products. • Kirkop has a vast experience of BE technologies and assembly of 3 million MEMS devices per day (Motion sensors, Microphones and Pressure Sensors). 9 Lab4MEMS: demonstration strategy 1. proof-of-concept : a suite of intermediate demonstration vehicles will be delivered and assessed at midterm (i.e. D5.2 at M18), to prove the actual feasibility of initial device solutions, wafer substrates, process steps, tools or equipments. 2. Final Technology Demonstrators : from the "proof-of-concept", the work-flow will then converge and optimize a set of four Tech Demonstrators intended to become the main flagship vehicles to demonstrate the KET Pilot Lines. Technology Demonstrators: a. Print-head for industrial printers, piezo actuated b. Micro-electric scavenger, powered by mechanical/vibration energy c. AMR magnetic sensor d. 3D MEMS packaging 10 Focus on: micro energy scavenger 11 11 Basic concept convert kinetic energy (e.g. from ambient vibration) into electric energy Possible applications - Bridge/Building Vibration Monitoring Low frequencies, large displacements - Human motion Power generation for sensors Low frequencies, high accelerations (shoes inserts) - Tires monitoring - Vehicle vibration monitoring and power generation for sensors High frequencies - …. Paradiso et al., 2006, Design Automation Conference Focus on: micro energy scavenger 12 From Mechanical to Electric Energy KINETIC ENERGY • • ELASTIC ENERGY Large seismic Mass Low frequency energy • • ELECTRIC POTENTIAL Transduction at MEMS scale High frequency energy ELECTRIC ENERGY • Electric Circuit Contrasting needs Seismic Mass: large mass vs. size reduction Frequency mismatch: high MEMS natural frequencies vs. low frequency of external signals Focus on: micro energy scavenger ELECTROSTATIC: Mobile plate capacitors Easy integration in silicon MEMS, low power generation, need to pre-charge the plates MAGNETIC: Induction in coils High power generation, need for big magnets and difficult integration in MEMS PIEZOELECTRIC: Material strain High power density, possible integration in MEMS. Functional Requirements: - Power density, size, operational frequency, bandwidth Goals: - small scale (< < 0.5 cm3) - power generation ~100 μW continuous 13 Focus on: micro energy scavenger Cantilever beam with piezoelectric layer piezoelectric layer e.g. Pb(Zr,Ti)O3 (PZT) Roundy et al., 2005, IEEE Pervasive Computing • • • • inertial force on the tip mass flexural vibration of the composite beam non-zero strain rate in the PZT layer generation of electric potential on the electrodes Remarks • mass-proportional power generation • importance of piezoelectric coupling coefficient • possible optimization of the mechanical scheme for maximum energy generation • optimal behavior at resonance 14 14 Focus on: micro energy scavenger 15 Possible MEMS design for optimal power generation L = 1000 µm b = 200 µm Mass = 400x200x200 µm3 Acc. = 10 g Q = 1000 P = 7.11 µW u = 510 µm u/L = 0.51 Ropt = 11 kΩ f0 = 1562 Hz power obtained for resonance driven device Problems: • vibrations e.g. from human movements are in the range 2-10 Hz • power generation is negligible for such a low excitation frequency! • small bandwidth Question 1: how can we harvest energy with high mismatch between source and MEMS frequency? FREQUENCY UP CONVERSION Question 2: how can we increase the bandwidth? NONLINEAR RESONANCE Frequency-up conversion Forced vibration Impulsive phenomenon Free oscillation Frequency-up conversion 17 17 Bistable beams - Easy MEMS integration - In-plane mechanism - Complex compatibility with piezoelectricity Piezo works out of plane (process constraints) - Electrostatic transduction Cottone et al., 2013, Proc. IEEE MEMS - Low power generations Magnetic loading - Difficult MEMS integration - Reliability issues - Compatible with piezoelectric transduction - Need for high acceleration Impact loading Kulah et al., 2008, IEEE Sensors Journal - Easy MEMS integration - Reliability issues - Compatible with piezoelectric transduction - Need for high acceleration Zorlu et al., 2011, IEEE Sensors Journal Frequency-up conversion fEXT = 2 Hz 18 Size = 1x1x1 mm3 fmems = 52 kHz - Peak Power generation = 43.18µW - Sine Excitation Impulsive Excitation Big Mass motion (to “capture” kinetic energy) Big Mass CONTACT (Transfer of energy) Small Beam Small Beam motion (to convert elastic energy into electric energy) ST-Polimi Patent pending Nonlinear resonance Non linear resonance helps increasing the bandwidth Geometric non linearity: Hard spring effect, Duffing oscillator - Bridge shape beam - Only 33- mode - Still too high natural frequency - Need for a technique to avoid jump-down phenomenon 3rd gen. UWB-PMPG Micro/Nano systems laboratory Hajati and Kim, 2008, Proceedings of SPIE - The International Society for Optical Engineering fmems = 359 Hz Size = 1x1x1 mm3 MIT-Polimi collaboration Peak Power generation = 21.95 µW 19 Closing remarks Lab4MEMS - Large ENIAC Pilot Line project focusing on KET - Enabling technology for terrific exploitation of MEMS in the short future - Major Technology demonstrators Energy scavengers - Piezoelectric energy harvesters - Resonant harvesters: for specific frequency and accelerations - Frequency up conversion: to overcome the frequency mismatch - Nonlinear harvesters: to increase the bandwidth - Introduce new heavy materials to increase the weight of the seismic mass - Find new mechanical schemes to optimize the conversion of energy 20 21 Thank you for your attention!
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