Gigaphoton Argon Xenon Neon mixtures.
SPECTRA Lithography Product data.
Application
Linde’s expertise
Product specification
Argon xenon neon gas mixtures are used in 193 nm lithography applications, usually in conjunction with a
halogen gas mixture.
• Advanced manufacturing processes ensure consistency of product with purity specifications exceeding the
industry requirements .
• SPC/SQC production systems ensure product consistency and reliability of finished material.
• Comprehensive global raw material production capability ensure future availability of gases.
• Our extensive distribution and stocking network ensure on time delivery of SPECTRA Lithography products.
Major Components
Gas
Argon (Ar)
Xenon (Xe)
Neon (Ne)
Concentration
3.50%
10 ppm
Balance
Tolerance
3.45% - 3.55%
8 - 12 ppm
Maximum Impurity Levels
Carbon Dioxide (CO2)
Carbon Monoxide (CO)
Carbon Tetrafluoride (CF4)
Helium (He)
Moisture (H2O)
Nitrogen (N2)
Oxygen (O2)
THC (as methane CH4)
SPECTRA Lithography gas mixtures are available in a range of cylinder size and valve combinations. Please
contact Linde to discuss your specific application.
The technical data and shipping information is a summary of information from relevant government and industry sources.
Please refer to the relevant DOT, CGA or product MSDS as the authoritative guide.
Linde Electronics and Specialty Gases
One Greenwich Street, Suite 100, Stewartsville, NJ 08886, USA
Phone +1.908.329.9700, Fax +1.866.417.8064, [email protected], www.linde.com/electronics
LINDEMAN/1580E_0511
Packaging
Max. Concentration (ppmv)
<0.5
<0.5
<0.5
<8.0
<0.5
<1.0
<0.5
<0.5