Name
bp °C/mm (mp)
MW
D420
nD20
GERMANIUM
(properties of the element and common binary componds)
Germanium (elemental)
Germanium Dioxide insoluble
Atomic number:
32
Atomic/molecular weight:
72.61
104.59
CAS #:
7440-56-4
1310-53-8
Melting point:
937.4˚C
1,086˚C
Enthalpy of melting:
36.8 kJ/mole
Boiling point:
2,830˚C
Enthalpy of vaporization:
4,602 kJ/mole
Thermal conductivity, 27˚C:
59.9 W/(m K)
Heat capacity, 25˚:
322 J/kg˚
Thermal Properties
52.1 J/mole˚
Electrical Properties
Resistivity:
47 μΩ·cm
Electrode potential
-0.247 V (+2)
(st'd hydrogen scale):
Dielectric constant:
20-22
0.67 eV
Bandgap, 25˚:
Optical Properties
Reflectivity, 100-140 μ:
70-75%
Refractive index; α
4.0
1.99
β
γ
2.05
Acoustical Properties
5,400 m/s
Velocity of sound:
Bulk Properties
Specific gravity, 20˚:
5.323
Molar volume:
13.63 cm3
Hardness, Mohs:
6.3
Crystal form:
Cubic
Space group:
Fd-3m
4.703
Tetragonal
565.75 pm
Cell parameters, a:
b:
565.75 pm
c:
565.75 pm
4,395 pm
2,852 pm
Chemical Properties
Oxidation states:
0, 2, 4
Electronegativity, Pauling:
1.8
Ionization potential, spectral:
7.899 eV
15.934 eV
Optical Fiber
Fiber optics for telecommunications employ high purity silicon dioxide cores with high refractive index cladding generated by incorporating germanium dioxide into
silicon dioxide at the fiber periphery. The refractive index is changed abruptly (step-index) or gradually (graded-index), depending on the application.
Step-Index Multimode Fiber
Graded-Index Multimode fiber
This was the first fiber type to find practical application, and continues to
be in wide use today. A step-index multimode fiber allows the light to
travel at many different angles within the fiber, therefore allowing many
modes of propagation. The advantages of a step-index multi-mode fiber
are related by the relatively large core area and high numerical apertures.
Both of these properties allow light to be easily coupled into the fiber. In
turn, this allows the use of inexpensive termination techniques, low cost
diodes and high power handling capacitity.
Instead of taking a zigzag path down the fiber, the gradual change in
refractive index directs the light in a sinusoidal path. Since the light travels
faster in material of lower refractive index, the light traveling on the outer
reaches of the graded region moves more quickly, thereby reducing the
amount of pulse spreading. The result is a dramatic >25-fold increase in
bandwidth over step-index multimode fibers.
アヅマックス株式会社
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[email protected]
Name
MW
bp °C/mm (mp)
D420
72.59
(947.9)
5.32
nD20
SUBSTRATES
W-GE-25-1.0
GERMANIUM WAFER
Ge
Monocrystalline
Orientation: <100>
[7440-56-4]
TSCA
Optical grade, N-type
25.4 mm (1 inch) wafer
Resistivity: 4 - 40 Ω-cm
EC 231-164-3
HMIS: 0-0-0-X
Each ¥44,500
COMPOUNDS
CH 2
CH
GEA0515
CH 2
Cl
Ge
Cl
Cl
ALLYLTRICHLOROGERMANE
C3H5Cl3Ge
220.02
154-7
Flashpoint: 55°C (131°F)
1.5274
1.4928
1.000
1.4594
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[762-67-4]
HMIS: 3-3-1-X
5g ¥53,500
GEA0530
ALLYLTRIETHYLGERMANE
C9H20Ge
CH 2
CH
CH 2
CH 2CH 3
Ge
CH 3CH 2
CH 2CH 3
200.85
181-2
Flashpoint: 48°C (118°F)
TOXICITY: oral rat, LD50: 114 mg/kg
Yields amorphous GeC alloys on pyrolysis.1
Irradiation of benzene solutions with Fe(CO)5 gives E-propenyl isomer.2
Reacts with unsaturated compounds.3 - e.g. with EtO2CN=NCO2Et forms Et3GeCH=CH2N(CO2Et)NHCO2Et
Reacts with amines and aldehydes to form homoallylic amines.4
PhCHO
+
PhNH2
+
NHPh
Sc(OTf)3 (10 mol %)
GeEt3
Ph
MeNO2
81%
1. Morancho, R. Proc. Eur. Con. Chem. Vap. Dep., ed R. Porat, Iscar , p. 381, 1987; Chem. Abstr. 113, 101763h.
2. Mizuno, K. et al. Chem. Express 1992, 7 , 209.
3. Laporterie, A. et al. J. Organomet. Chem. 1975, 101 , 187.
4. Akiyama, T. and Iwai, Y. Synlett . 1998, 273.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
HMIS: 2-3-0-X
[1793-90-4]
5g ¥53,000
GEA0550
CH2
CH
CH2
CH3
Ge
CH3
CH3
ALLYLTRIMETHYLGERMANE
C6H14Ge
158.77
101
Flashpoint: 16°C (61°F)
Electrophilic allylation of aromatic compounds effected with thallium trifluoroacetate.1
Copolymerizes with styrene and methyl methacrylate.2
1. Ochiai, M. et al. Tetrahedron Lett. 1981, 22 , 4491.
2. Korshak,, V. Bull. Acad. Sci. SSSR 1959,, 140.
0.995
1.4333
0.982
1.4700
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
[762-66-3]
C4 H9
H2 NCH2 CH2 CH2
Ge
C4 H9
C4 H9
2.5g ¥53,000
HMIS: 2-4-0-X
GEA0600
3-AMINOPROPYLTRIBUTYLGERMANE
C15H35GeN
[71571-74-9]
302.04
105-9 / 0.2
Flashpoint: >100°C (>212°F)
HMIS: 2-1-0-X
2.5g ¥59,500
GEA0700
(NH 4)2GeF 6
AMMONIUM HEXAFLUOROGERMANATE
222.66
380 sub
H8F6GeN2
Soluble: water
Substitutes Al with Ge in Y type zeolites.1
1. Shul, Y. et al. Chem. Abstr. 110, 178261p; Nippon Kagaku Kaiishi , 1989, 3 , 429.
2.564
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
[16962-47-3]
Cl
CH2
Ge Cl
Cl
EC 241-037-4
5g ¥16,800
HMIS: 3-0-0-X
GEB0969
BENZYLTRICHLOROGERMANE
C7H7Cl3Ge
[6181-21-1]
272.12
HMIS: 3-2-1-X
111-8 / 18
(35-7)
5g ¥43,500
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
1.425
Name
bp °C/mm (mp)
MW
D420
nD20
GEB1025
BIS[BIS(TRIMETHYLSILYL)AMINO]GERMANIUM(ll)
393.36
60 / 0.4
(32-3)
GERMANIUM(II) BIS(HEXAMETHYLDISILYL)AZIDE)
(CH3)3Si
Si(CH3)3
N Ge N
(CH3)3Si
Si(CH3)3
C12H36GeN2Si4
Color: orange-yellow
1
Intermediate for germazene.
Forms poly(germanium enolates) by reaction with α,β-unsaturated ketones.2
Reacts with carbon dioxide to form silylated isocyanates and carbodiimides.3
Forms 3-coordinate complexes with (Et3P)2Ptacac that reversibly bind CO2, H2.4
1. Chen, H. et al. Inorg. Chem . 1991, 30 , 3390.
2. Kobayashi, S. et al. J. Am. Chem. Soc . 1992, 114 , 4929.
3. Sita, L. et al. J. Am. Chem. Soc. 1996, 118 , 10912.
4. Litz, K. et al. Organometallics 1995, 14 , 5008.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[55290-25-0]
HMIS: 2-1-1-X
2.5g ¥25,500
10g ¥72,800
GEB1026
(CH 3)3Si
Si(CH3)3
H C Ge C H
(CH 3)3Si
Si(CH3)3
BIS[BIS(TRIMETHYLSILYL)METHYL]GERMANIUM(ll)
C14H38GeSi4
Color: yellow
391.39
110 / 0.001 sub
(179-180)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[60111-69-5]
HMIS: 2-2-1-X
1.0g ¥37,500
GEB1050
CH3
ClCH 2
Ge
ClCH 2
CH3
BIS(CHLOROMETHYL)DIMETHYLGERMANE, 95%
C2H10Cl2Ge
201.62
174-5
Flashpoint: 51°C (124°F)
1.382
1.4810
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[21581-91-9]
HMIS: 3-3-0-X
2.5g ¥57,000
GEB1700
Bi 4Ge 3O 12
BISMUTH GERMANATE
1,245.68
(1,050)
7.13
BiO3 molar equivalent: 40%
Bi4Ge3O12
Used as a scintillator for positron CAT scanners and for detection of gamma rays in high energy physics
Photorefractive compound for non-linear optical devices.1
1. Fuet, S. et al. J. Am. Ceram. Soc. 1997, 80 , 2501.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[12233-56-6]
TSCA
EC 235-457-7
HMIS: 1-0-0-X
10g ¥14,500
BROMOTRIMETHYLGERMANE - see GET8440 TRIMETHYLBROMOGERMANE
GEB1933
CH 3
(CH 3)3C
Ge
Cl
CH3
t-BUTYLDIMETHYLCHLOROGERMANE
C6H15ClGe
195.24
147-54
Flashpoint: 34°C (93°F)
(93-4)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[41879-34-9]
HMIS: 2-3-1-X
2.5g ¥26,000
GEB1969.5
H
CH3CH2CH2CH2
Ge H
H
n-BUTYLGERMANE
C4H12Ge
Employed in CVD of germanium
132.73
74
1.022
1.4200
See also GEI6480, ISOBUTYLGERMANE
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[57402-96-7]
HMIS: 2-4-1-X
5g ¥28,500
25g ¥101,000
GEB1970
H
(CH3)3C
Ge H
H
t-BUTYLGERMANE
C4H12Ge
Source for Ge by CVD
50
0.97
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[149540-54-5]
5g ¥37,500
HMIS: 3-4-1-X
GEB1975
Cl
nC4H9
132.73
Ge Cl
Cl
n-BUTYLTRICHLOROGERMANE
C4H9Cl3Ge
Vapor pressure, 40˚: 2.8 mm
ΔHvap: 10.15 cal/mole
236.07
184
Flashpoint: 82°C (180°F)
TOXICITY: oral rat, LD 50: 48 mg/kg
1.451
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[4872-26-8]
5g ¥19,500
HMIS: 3-2-1-X
25g ¥64,500
GEB1980
Cl
(CH 3)3C
Ge
Cl
Cl
t-BUTYLTRICHLOROGERMANE
C4H9Cl3Ge
Dipole moment: 3.20
Intermediate for organogermylene precursor.1
1. Ando, W. et al. Organometallics 1989, 8 , 2759.
236.07
169-70
(94-5)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1184-92-5]
HMIS: 3-2-1-X
5g ¥21,500
25g ¥72,500
アヅマックス株式会社
TEL 03-5543-1630
03 5543 1630
FAX 03
03-5543-0312
5543 0312
sales@azmax
[email protected]
co jp
1.4760
Name
bp °C/mm (mp)
MW
D420
nD20
GEC2100
O
HOCCH 2CH2
GeO 1.5
CARBOXYETHYLGERMANIUM SESQUIOXIDE
C6H10Ge2O7
Equilibrates in water to germanetriol
Solubility, water, 60°: 20 g/l
1,2
Anti-neoplastic agent.
1. Kumano, N. et al. Chem. Abstr. 97, 103976e 1982.
2. Asai, K. Chem. Abstr. 83, 172843g 1975.
339.32
(320 dec)
TOXICITY: oral rat, LD50: 6,300 mg/kg
pH (aqueous sol'n): 2.5-2.6
1.280
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[12758-40-6]
TSCA
EC 235-800-0
HMIS: 1-1-0-X
5g ¥11,500
25g ¥32,500
GEC2262
O
Cl
CARBOXYETHYLTRICHLOROGERMANE
HOCCH 2CH2Ge Cl
252.06
(83-5)
TRICHLOROGERMYLPROPANOIC ACID
C3H5Cl3GeO2
Cl
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[15961-23-6]
EC 240-096-3
HMIS: 3-1-1-X
5g ¥33,500
GEC2150
CESIUM TRICHLOROGERMANATE, 95%
Cl3CsGe
Contains cesium chloride
Decomposes at 100° in HCl atmosphere to GeCl2
311.86
3.45
Ge+2 compound
1
Reacts with RI to yield RGeCl3.
Auxiliary catalyst with Pt for hydroformylation of olefins.2
1. Poskozim, P. J. Organometal. Chem . 1968, 12 , 115.
2. Ogata, I. et al. Chem. Abstr. 92, 6067y; German Patent DE 2,909,042, 1979.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[72128-24-6]
Cl
ClCH2
HMIS: 3-0-1-X
5g ¥15,800
25g ¥49,500
GEC2289.8
Ge CH3
Cl
CHLOROMETHYLMETHYLDICHLOROGERMANE
C2H5Cl3Ge
208.01
155
1.6694
1.4920
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[6727-63-5]
HMIS: 3-3-1-X
2.5g ¥47,500
GEC2300
CH 3
ClCH2
Ge
CH 3
CH 3
CHLOROMETHYLTRIMETHYLGERMANE
C4H11ClGe
1
Converts to ethyldimethylchlorogermane with AlCl3.
1. Mironov, V. et al. Zh. Obshch. Khim . 1969, 397.
167.17
113
Flashpoint: 6°C (43°F)
1.21
1.4419
1.664
1.5070
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[5830-55-7]
ClCH2CH2CH2
Ge Cl
Cl
CH 3
CH 3
3-CHLOROPROPYLTRICHLOROGERMANE, 95%
256.48
C3H6Cl4Ge
[19268-40-7]
HMIS: 3-1-1-X
78-9 / 8
5g ¥63,500
CYCLOPENTADIENYLTRIMETHYLGERMANE
182.79
182 79
C8H14Ge
[26168-12-7]
HMIS: 2-3-0-X
85 / 85
1.4805
1 4805
1.0g ¥32,000
GED3150
O
DI-n-BUTYLDIACETOXYGERMANE, tech-90
304.90
127 / 5
C12H24GeO4
Contains other butylacetoxygermane analogs
Low toxicity catalyst for the production of polyesters
[13971-75-0]
1.0g ¥16,500
HMIS: 2-1-1-X
OCCH 3
C4H 9
2.5g ¥39,500
GEC2550
CH 3
Ge
HMIS: 2-4-0-X
GEC2400
Cl
Ge C4H 9
OCCH 3
O
1.444
1.4452
1.208
1.4724
GED3200
Cl
C4H9
DI-n-BUTYLDICHLOROGERMANE, 95%
C8H18Cl2Ge
257.73
242
Flashpoint: 107°C (225°F)
TOXICITY: ipr rat, LD50: 100 mg/kg
Ge
Cl
C4H9
Intermediate for UV sensitive polygermanes.1
1. Hallmark, V. Macromolecules 1990, 23 , 2346.
EC 224-986-9 HMIS: 3-2-1-X
[4593-81-1]
TSCA
2.5g ¥16,800
10g ¥44,500
GED3300
C4H 9
H
DI-n-BUTYLGERMANE
Ge
H
C4H 9
70-5 / 15
0.9782
1.4428
C8H20Ge
[29823-30-1]
HMIS: 2-3-1-X
1.334
1.4653
1.374
1.4700
5g ¥74,500
GED3365
CH 3
Cl2CH
188.84
DIBUTYLGERMANIUM HYDRIDE
Ge CH 3
CH 3
DICHLOROMETHYLTRIMETHYLGERMANE, 95%
C4H10Cl2Ge
201.62
149-50
Flashpoint: 33°C (91°F)
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
[19272-94-7]
HMIS: 2-3-0-X
2.5g ¥43,500
GED3400
C2H 5
Cl
Ge
C2H 5
Cl
DIETHYLDICHLOROGERMANE
C4H10Cl2Ge
Dipole moment: 3.19
201.62
175
Flashpoint: 52°C (126°F)
(-39)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[13314-52-8]
OCH2 CH3
C2 H5
Ge
CH3 CH2 O
C2 H5
EC 236-344-5
HMIS: 3-2-2-X
2.5g ¥21,800
10g ¥60,500
GED3404
DIETHYLDIETHOXYGERMANE
C8H20GeO2
220.85
72-3 / 13
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[51174-08-4]
HMIS: 2-2-1-X
10g ¥52,000
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
1.4250
28
Name
MW
bp °C/mm (mp)
132.73
74
nD20
D420
GED3410
DIETHYLGERMANE
C4H12Ge
H
C2H 5
Ge
C2H 5
H
1.039
1.4208
1,2
Precursor for germanium by CVD.
1. Weidu, L. et al. J. Vac. Sci. Technol., A 1984, 12 , 2281.
2. Kellerman, B. et al. J. Vac. Sci. Technol., A 1995, 13 , 1819.
HMIS: 2-4-1-X
[1631-46-5]
5g ¥76,000
GED3450
H
H
H
Ge
Ge H
H
H
DIGERMANE, 60 wgt.% in hydrogen
Ge2H6
2 vol. %
Vapor pressure, 0˚: 239 mm
Total pressure: 50 psig
151.24
31
(-109)
1.98
-109
Critical pressure: 45.7 atm
Critical temperature: 483˚K
ΔHvap: 6.09 kcal/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[13818-89-8]
HMIS: 4-4-2-X
2.5g (1.5 g contained digermane) inquire*
* includes zCYL-HPA-6000 (CGA350) cylinder
GED3600
CH3
(CH3)2N
Ge CH3
CH3
DIMETHYLAMINOTRIMETHYLGERMANE
C5H15GeN
161.77
102-4
Flashpoint: -10°C (14°F)
1
Reacts with α-diketones to yield α-amino-β-oxoalkoxygermanes, which decompose to α-ketoamines.
1. Riviere-Baudet, M. Recl. Trav. Chim. Pays-Bas 1975, 94 , 19.
[13361-67-6]
EC 236-428-1 HMIS: 3-4-2-X
2.5g ¥45,500
1.4246
GED4100
Cl
CH 3
Ge
CH 3
Cl
DIMETHYLDICHLOROGERMANE
C2H6Cl2Ge
Dipole moment: 3.14
173.57
124
Flashpoint: 32°C (90°F)
(-22)
1.493
1.4600
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 216-216-5
[1529-48-2]
HMIS: 3-4-1-X
2.5g ¥17,500
10g ¥46,800
GED4150
H
CH3
Ge
CH3
H
DIMETHYLGERMANE
C2H8Ge
Dipole moment: 0.62
104.67
3
(-144.3)
Vapor pressure, 25˚C: 1,800 mm
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-4-1-X
[1449-64-5]
10g inquire includes zCYL-G-0025 cylinder
GED4500
DIPHENYLDICHLOROGERMANE
C12H10Cl2Ge
Vapor pressure, 110˚: 0.01 mm
Cl
Ge
Cl
297.71
223 / 12
Flashpoint: 160°C (320°F)
(9)
1.415
25
1.5975
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1613-66-7]
TSCA
EC 216-562-7
HMIS: 3-1-1-X
2.5g ¥24,000
10g ¥63,000
GED4538
CH3
Ge
CH3
DIPHENYLDIMETHYLGERMANE
C14H16Ge
256.87
145 / 10
1.180
1.5730
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[7301-42-0]
[7301
42 0]
HMIS: 2
2-2-0-X
20X
2.5g ¥18,300
10g ¥49,300
GED4550
DIPHENYLGERMANE
C12H12Ge
228.81
93 / 1
Flashpoint: 104°C (219°F)
1.22
25
1.5921
Forms stable diphenylhydrogermyl lithium.1
Precursor for single-crystal Ge nanowires.2,3
Bridging ligand for Pt complexes.4
1. Castel, A. et al. Organometallics 1990, 9 , 205.
2. Hanrath, T. et al. Adv. Mater . 2003, 15 , 437.
3. Hanrath, T. et al; J. Am. Chem. Soc . 2004, 126 , 15466.
4. Tanabe, M. et al. J. Organomet. Chem. 2006, 25 , 796.
H
Ge
H
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[1675-58-7]
CH3CH2
Ge
H
H
ETHYLGERMANE
C2H8Ge
Cl
Cl
OCH 2CH 3
CH 3CH 2
Ge
104.67
11.5
10g inquire includes zCYL-G-0025 cylinder
HMIS: 2-4-1-X
GEE4700
Cl
Ge
5g ¥53,500
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[1747-99-5]
CH3CH2
1.0g ¥16,800
HMIS: 2-2-1-X
GEE4695
H
OCH 2CH 3
OCH 2CH 3
ETHYLTRICHLOROGERMANE
C2H5Cl3Ge
Dipole moment: 2.28
[993-42-0]
208.01
144
Flashpoint: 51°C (124°F)
HMIS: 3-3-1-X
(-33)
5g ¥26,500
1.604
1.4745
25g ¥92,500
GEE4710
ETHYLTRIETHOXYGERMANE
C8H20GeO3
236.83
180
1.1105
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[5865-92-9]
HMIS: 2-2-1-X
1.0g ¥13,000
5g ¥38,500
アヅマックス株式会社
TEL 03-5543-1630
03 5543 1630
FAX 03
03-5543-0312
5543 0312
sales@azmax
[email protected]
co jp
1.4178
25
Ge H
H
MW
劇物
（既）1-1208
GEG5000
GERMANE
H4Ge
CAUTION: CAN IGNITE SPONTANEOUSLY IN AIR
ΔHform: 21.6 kcal/mole
ΔHvap: 3.36 kcal/mole
76.62
-88
(-165)
TOXICITY: ivn mus, LD50: 56 mg/kg
Critical pressure: 54.8 atm
Critical temperature: 308˚K
Cylinder pressure: 80 psig
nD20
D420
1.53
-142
COMMERCIAL
H
H
bp °C/mm (mp)
Name
Employed in epitaxial chemical vapor deposition of germanium thin films for solar devices and LEDs.1,2
1. DeBoer, W. et al. Appl. Phys. Lett. 1991, 58 , 1286.
2. Kühne, H. et al. J. Mater. Res. 1993, 8 , 131.
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric glove box or sealed system required
[7782-65-2]
H
H
Ge H
H
TSCA
EC 231-961-6
HMIS: 4-4-3-X
劇物
（既）1-1208
GEG5001
GERMANE 99.99+%
H4Ge
CAUTION: CAN IGNITE SPONTANEOUSLY IN AIR
ΔHform: 21.6 kcal/mole
ΔHvap: 3.36 kcal/mole
10g inquire includes zCYL-HPS-0420-35 cylinder
50g inquire includes zCYL-HPA-6000 cylinder
76.62
-88
(-165)
1.53
-142
Critical pressure: 54.8 atm
Critical temperature: 308˚K
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric glove box or sealed system required
[7782-65-2]
H
H
Ge H
H
TSCA
EC 231-961-6
HMIS: 4-4-3-X
劇物
（既）1-1208
GEG5001-H1
GERMANE, 10% in hydrogen (v/v)
H4Ge
CAUTION: CAN IGNITE SPONTANEOUSLY IN AIR
10g inquire includes zCYL-HPS-0420-35 cylinder
50g inquire includes zCYL-HPA-6000 cylinder
76.62
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric glove box or sealed system required
[7782-65-2]
TSCA
EC 231-961-6
10g inquire includes zCYL-HPS-0420-35 cylinder
HMIS: 4-4-3-X
GEG5020
Ge
GERMANIUM, 99.99%
-100 mesh powder
Ge
Atomic number: 32
Atomic radius: 1.26 Å
Covalent radius: 1.22 Å
Hardness, Mohs: 6.3
[7440-56-4]
TSCA
EC 231-164-3 HMIS: 1-1-0-X
72.59
2,830
(947.4)
5.323
TOXICITY: ipr rat, LD50: 586 mg/kg
ΔHfus: 111.5 kcal/g-atom
Vapor pressure, 25˚: 8 x 10-7 mm
Specific heat: 0.074 cal/g˚
Intrinsic resistivity, 27˚: 47 Ω-cm
10g ¥24,500
50g ¥84,500
GEG5180
GERMANIUM DICHLORIDE-DIOXANE COMPLEX
231.63
(106-165)
DICHLOROGERMADIYL DIOXANE
Cl2Ge·C 4 H 8 O 2
White powder
Intermediate for cyclic trigermanes.1
1. Ichinohe, M. et al. J. Chem. Soc . 2000, 122 , 6781.
[10060-11-4]
[10060 11 4]
EC 233-192-1
233 192 1 HMIS: 3-2-1-X
321X
5g ¥16,500
25g ¥52,500
GEG5200
GERMANIUM DIIODIDE
326.40
545 dec
(460)
5.73
GERMANIUM(II) IODIDE
GeI2
Vapor pressure, 284˚: 0.1 mm
Soluble: chloroform, cold water (reacts with hot water)
Oxidizes in air at 210° to form GeI4 and GeO2
Reacts with alkylhalides, yielding alkylgermaniumdiiodohalides
Forms stable ionic adduct with carbenes.1
Diastereoselective Reformatsky catalyst formed on reduction with potassium.2
Forms nanowires at ~350° in trioctylphosphine with Bi seeds.3
Forms infrared-emitting nanocrystals.4
1. Arduengo, A. et al. Inorg. Chem. 1993, 32 , 1541.
2. Kagoshima, H. et al. J. Org. Chem. 1998, 63 , 691.
3. Lu, X. et al. J. Am. Chem. Soc. 2005, 127 , 15728.
4. Lee, D. et al. J. Am. Chem. Soc. 2009, 131 , 3426.
EC 236-998-1 HMIS: 3-0-1-X
2.5g ¥24,500
10g ¥69,500
[13573-08-5]
TSCA
GEG5300
104.59
(1,086)
4.703
TOXICITY: oral rat, LD50: 1,250 mg/kg
Solubility, water, 25°: 4.47 g/l
Solubility, water, 100°: 10.7 g/l
Bulk density: 1.3 - 1.4 g/ml
Employed in phosphors and infrared transmitting glass; component of optical fibers
[1310-53-8]
TSCA
EC 215-180-8 HMIS: 1-0-0-X
10g ¥17,500
50g ¥56,500
GEG5350
GeSe 2
毒物
GERMANIUM DISELENIDE
GeSe2
Orange granules
Decomposes >450˚ to GeO2 and Se
230.51
(704-10)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[12065-11-1]
TSCA
EC 235-063-5
HMIS: 4-0-0-X
5g ¥39,500
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
4.56
1.99
COMMERCIAL
GeO2
（既）1-706
GERMANIUM DIOXIDE, 99.99%
GeO2
Hexagonal crystals
ΔHform: -131 kcal/mole
1kg inquire
Name
bp °C/mm (mp)
MW
nD20
D420
GEG5355
GERMANIUM DISULFIDE
GeS2
136.72
(800)
2.94
GERMANIUM(IV) SULFIDE
GeS2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[12025-34-2]
EC 234-705-1
5g ¥32,000
HMIS: 3-0-0-X
GERMANIUM ETHOXIDE - see GET7100 TETRAETHOXYGERMANE
GERMANIUM IODIDE - see GEG5200 GERMANIUM DIIODIDE or GEG5800 GERMANIUM TETRAIODIDE
GERMANIUM METHOXIDE - see GET7500 TETRAMETHOXYGERMANIUM
GEG5420
Ge 3N 4
GERMANIUM NITRIDE
273.80
Ge3N4
ΔHcomb: -369.0 kcal/mole
ΔHform: -15.6 kcal/mole
Employed as a dielectric in gallium arsenide MISFETS.1,2
1. Pande, K. et al. Appl. Phys . 1982, A28 , 123.
2. Pande, K. et al. Solid State Elec . 1981, 25(2) , 145.
[12065-36-0]
TSCA
EC 235-064-0 HMIS: 2-0-0-X
(500 dec)
5.35
5g ¥37,500
GERMANIUM SELENIDE - see GEG5350 GERMANIUM DISELENIDE
GEG5430
GeS
GERMANIUM(ll) SULFIDE
GeS
104.65
(615)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[12025-32-0]
TSCA
EC 234-704-6
HMIS: 2-2-0-X
5g ¥39,500
GEG5480
GeTe
GERMANIUM TELLURIDE
200.19
GeTe
Chips
Dipole moment: 1.10
ΔHform: 8.9,kcal/mole
Semiconductor
ΔGform: -14.2 kcal/mole
Phase change reversible alloy for erasable optical storage.1
1. Libera, M. et al. MRS Bull . 1990 15(4) , 40.
[12025-39-7]
TSCA
EC 234-706-7
HMIS: 3-1-0-X
(725)
6.2
5g ¥44,500
GEG5500
Br
Br
Ge Br
Br
Cl
Cl
Ge Cl
Cl
GERMANIUM TETRABROMIDE
392.23
186.5
(26.1)
3.132
Br4Ge
TOXICITY: ivn mus, LD50: 56 mg/kg
Vapor pressure, 93.7˚: 58.4 mm
Surface tension, 30˚: 35.5 dynes/cm
ΔHform: -78.5 kcal/mole
Soluble: ethanol, toluene, ether
ΔHvap: 21.8 cal/mole
Doping source in vapor phase epitaxy of III-V semiconductors.1
1. Hitachi Chem. Abstr. 77, P119870p; Brit. Patent 1,285,686, 1972.
EC 236-612-1 HMIS: 3-0-1-X
5g ¥24,500
25g ¥84,500
[13450-92-5]
TSCA
1.879
1.6269
1.4644
COMMERCIAL
（既）1-636
GEG5600
GERMANIUM TETRACHLORIDE, 99.9+%
214.40
83.1
(-49 to -52)
Cl4Ge
TOXICITY: ivn mus, LD50: 56 mg/kg
Vapor pressure, 0˚: 25 mm
Critical pressure: 36.6 atm
Vapor pressure, 20˚: 67 mm
Critical temperature: 548˚K
ΔHform: 165 kcal/mole
Specific heat, Cp: 0.699 joule/g-deg
ΔHvap: 7.35 kcal/mole
Dielectric constant: 2.36
Soluble: ether, chloroform, hexane, liquid phosphine, ethanol (slowly reacts)
Employed in production of optical waveguides
Catalyst for chlorination of activated aromatics yielding chlorinated cyclohexadienes.1
25
Coupling agent (star site) for production of rubbers from living polymers.2,3
Employed in formation of mixed SiO2-GeO2 powders in hydrogen-oxygen flames.4
1. DiBella, E. et al. U.S. Patent 3,355,506, 1967.
2. Chem. Abstr. 97, P128909y.
3. Hanna, J. et al. J. Non-Cryst. Solids 1996, 198 , 879; Chem. Abstr. 97, P40160m.
4. Hung, C. et al. J. Mater. Res. 1992, 7 , 1870.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[10038-98-9]
TSCA
EC 233-116-7
HMIS: 3-0-1-X
25g ¥23,500
100g ¥66,500
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
sales@azmax
[email protected]
co jp
2kg inquire
Name
GEG5601
Cl
Cl
Cl
bp °C/mm (mp)
214.40
83.1
nD20
D420
（既）1-636
GERMANIUM TETRACHLORIDE 99.999%
Cl4Ge
Ge Cl
MW
(-49 to -52)
1.879
1.4644
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[10038-98-9]
TSCA
EC 233-116-7
HMIS: 3-0-1-X
100g ￥94,500 packaged in borosilicate bottles
GEG5700
GERMANIUM TETRAFLUORIDE, 99.9+%
F4Ge
148.59
-36.5
Triple point: -15˚
Vapor pressure, -62.7˚: 75.9 mm
Co-implantation with active species forms shallow p junctions
1
In combination with SiH4 forms photoconductive films.
F
F
Ge F
F
2.126
0
In combination with disilane forms SiGe films on glass.2
1. Chem. Abstr. 107, 15544g Jap. Pat.
2. Hanna, J. et al. J. Non-Cryst. Solids 1996, 198-200 , 879; Chem. Abstr. 107, P15544g.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[7783-58-6]
TSCA
EC 232-011-3
HMIS: 4-0-3-X
10g inquire includes zCYL-HPS-0420-33 cylinder
GEG5800
GERMANIUM TETRAIODIDE
580.21
(146)
GeI4
Orange cubic crystals
Vapor pressure, 373˚: 0.17 mm
ΔHsub: 20.1 kcal/mole
Employed in growth of germanium nanowires.1
In combination with benzoyl peroxide initiates living radical polymerization of styrene.2
1. Wu, Y. et al. Chem. Mater. 2000, 12 , 605.
2. Goto, A. et al. Polym. Prepr. 2005, 46 , 245.
I
I
Ge I
I
4.416
25
Germanium Nanowires (Courtesy P.
Yang)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[13450-95-8]
C2H 5
C2H 5
C2H 5
Ge
Ge C2H 5
C2H 5
C2H 5
TSCA
EC 236-613-7
HMIS: 3-1-1-X
10g ¥24,000
50g ¥82,500
GEH6000
HEXAETHYLDIGERMANE
C12H30Ge2
[993-62-4]
319.55
65-6 / 0.01
HMIS: 2-3-1-X
(-60)
1.4960
2.5g ¥35,500
GEH6066
C2H 5
C2H 5
C2H 5
Ge O Ge C2H 5
C2H 5
C2H 5
HEXAETHYLDIGERMOXANE
C12H30Ge2O
335.55
88-90 / 2
TOXICITY: oral rat, LD50: 240 mg/kg
1.147
1.4612
1.148
1.4564
1
Triethylgermylates carboxylic acids.
(Et3Ge)2]O + RCOOH -----> Et3GeOOCR + H2O
Triethylgermylates uric acid with HMDS catalyst.2
1. Anderson, H. et al. J. Am. Chem. Soc. 1950, 72 , 2089.
2. Gordetsov, A. Chem. Abstr. 112, 179256u; Metalorg. Khim. 1989, 2 , 884.
[2538-70-7]
HMIS: 2-2-0-X
10g ¥36,500
GEH6100
HEXAMETHYLDIGERMANE
C6H18Ge2
CH 3 CH 3
CH 3 Ge
Ge CH 3
CH 3 CH 3
235.39
137-8
(-40)
Flashpoint: 14°C (57°F)
Initiator for visible light induced photoreduction of 10-methylacridinium ions.1
Employed in surface activation of dehydrogenation catalysts.2
1. Fukuzumi, S. J. Chem. Soc., Chem. Commun . 1990, 1236.
2. Nuzzo, R. et al. J. Catal . 1984, 85 , 267.
[993-52-2]
2.5g ¥36,000
HMIS: 2-4-1-X
GEH6150
Ge
HEXAPHENYLDIGERMANE
C36H30Ge2
Forms Ph3GeLi with Li in THF
[2816-39-9]
Ge
271 / 1 sub
607.82
(340)
UV max: 239 nm
1.0g ¥15,800
HMIS: 2-1-0-X
5g ¥49,500
GEH6160
HEXAPHENYLDIGERMOXANE
C36H30Ge2O
Soluble: THF
[2181-40-0]
Ge O Ge
623.82
(182-3)
2.5g ¥26,500
HMIS: 2-1-0-X
GEH6170
HYDROXYGERMATRANE, monhydrate
235.76/253.78
(156-7)
C6H13GeNO4·H 2 O
TOXICITY: orl rat, LD50: 8,500 mg/kg
Soluble: water
Reacts with [(CH3)3Si]2NH to form trimethylsiloxygermatrane
Catalyst for polyesters
[67453-19-4]
5g ¥14,500
25g ¥44,500
HMIS: 2-1-0-X
N
O
HO
Ge
O
O
GEI6480
ISOBUTYLGERMANE
C4H12Ge
132.78
68
(-78)
1
GeH3
CH3
Applied to the low temperature growth of Ge films on GeSi films.
Liquid germanium precursor for growth of high-purity Ge and GeSi films.2
1. Woelk, E. et al. Semiconductor International 2006, 29 , 39.
2. Shenai, D. V. et al. J. Crystal. Growth 2007, 298 , 172.
See also GEB1969.5 n-BUTYLGERMANE
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[768403-89-0]
HMIS: 2-4-1-X
5g ¥49,500
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
1.002
Name
MW
bp °C/mm (mp)
D420
(1,239)
3.53
nD20
GEL6467
Li 2GeO 3
LITHIUM METAGERMANATE
134.47
GeLi2O3
Solubility, water, 25°: 8.5 g/l
1
Pyroelectric.
Potential use as solid electrolyte in thin film microionic devices.2
1. Bhalla, A. Ferroelectrics 1981, 38 , 935.
2. Awitor, K. et al. Mater. Res. Bull . 1991, 26 , 67.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[12315-28-5]
EC 235-581-1
HMIS: 2-0-0-X
25g ¥35,500
GEM6485
O
CH2
CH3
CCOCH 2
Ge CH3
CH3
CH3
METHACRYLOXYMETHYLTRIMETHYLGERMANE
216.80
64-7 / 7
C8H16GeO2
Flashpoint: 63°C (145°F)
Candidate for high R.I. contact lenses
Soluble: acetonitrile
1
Comonomer with chloromethylstyrene for RIE resistant photoresist.
1. Mixon, D. et al. J. Vac. Sci. Technol., B 1989, 7(6) , 1723.
1.13
1.4469
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[125668-59-9]
HMIS: 3-3-0-X
store <5°C
2.5g ¥23,500
10g ¥66,500
GEM6490
O
CH2
C2H 5
CCO Ge C2H 5
CH3
C2H 5
METHACRYLOXYTRIETHYLGERMANE
C10H20GeO2
Copolymerization parameters - e,Q: -0.640, 0.840
Copolymerizes with styrene and methyl methacrylate.1
1. Kolesnikov, G. et al. J. Polymer Sci . 1961, 52 , 55.
244.85
69-70 / 5
1.144
1.4564
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X
[95347-64-1]
store <5°C
5g ¥45,500
GEM6499
H
CH3 Ge H
H
METHYLGERMANE
90.65
-35
CH6Ge
Vapor pressure, 20°: 6.6 atm
Dipole moment: 0.58
ΔHvap: 4.98 cal/mole
1
In combination with GeH4 forms diamond structure Ge(1-x)Cx alloys.
1. Michaell, T. et al. Chem. Mater. 1996, 8 , 2491.
(-158)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 3-4-1-X
[1449-65-6]
10g inquire includes zCYL-0325 cylinder
GEM6500
Cl
CH3 Ge Cl
METHYLTRICHLOROGERMANE
CH3Cl3Ge
193.98
110-1
Flashpoint: 10°C (50°F)
Dipole moment: 2.70
Cl
1.706
1.4685
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[993-10-2]
EC 213-604-6
2.5g ¥15,000
HMIS: 3-4-1-X
10g ¥38,500
GEM6550
OCH 2CH 3
CH 3 Ge OCH 2CH 3
OCH 2CH 3
METHYLTRIETHOXYGERMANE
C7H18GeO3
222.80
CH3
CH3
1.1280
1.4128
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[5865-91-8]
Ge Cl
166-7
5g ¥37,500
HMIS: 3-4-2-X
GEP6727
PHENYLDIMETHYLCHLOROGERMANE
C8H11CIGe
215.23
80 / 5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[22702-76-7]
1.0g ¥15,000
HMIS: 3-2-1-X
5g ¥46,500
GEP6749
GeH 3
PHENYLGERMANE
C6H8Ge
152.73
40 / 22
1.237
1.5353
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[2875-92-5]
5g ¥69,500
HMIS: 3-3-1-X
GEP6800
Cl
Ge Cl
Cl
CH 3
Ge CH 3
CH 3
PHENYLTRICHLOROGERMANE
256.06
226-8
C6H5Cl3Ge
Forms polycyclic phenylgermanosiloxanes upon reaction with PhSi(OH)3.1
1. Tikhonov, V. Zh. Obshch. Khim . 1996, 66 , 83.
EC 214-039-8 HMIS: 3-2-2-X
[1074-29-9]
2.5g ¥20,500
1.584
10g ¥56,500
GEP6806
PHENYLTRIMETHYLGERMANE
C9H14Ge
[1626-00-2]
194.80
183
Flashpoint: 53°C (127°F)
HMIS: 2-3-0-X
5g ¥26,000
1.117
GEP6894
K 2GeF 6
1.5536
POTASSIUM HEXAFLUOROGERMANATE
264.78
835
F6GeK2
Solubility, water: 5.4 g/l
Employed in scintillator type radiation detector.1
Employed in green phosphors.2
1. Yamada, T. et al. Chem. Abstr. 112, 242041n; JP. Patent 01 221,485, 1989.
2. Hitachi, Chem. Abstr. 95, 214047f; Jpn. Patent 56 103,276, 1981.
(730)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[7783-73-5]
HMIS: 2-0-0-X
5g ¥24,500
PROPENYLTRIMETHYLGERMANE - see GEA0530 ALLYLTRIETHYLGERMANE
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
3.32
1.5045
Name
nD20
D420
bp °C/mm (mp)
MW
GES6940
SODIUM METAGERMANATE, hydrate, 95%
166.57
GeNa2O3
Contains sodium orthogermanate
Deliquescent
Dehydrates at 81-3˚
Solubility, water, 25°: >500 g/l
1
Catalyst for the preparation of polyesters.
1. Logeat, M. Chem. Abstr. 105, P227577d; Fr. Patent 2,570,077, 1986.
(1,083)
3.31
1.59
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions
[12025-19-3]
TSCA
EC 234-703-0
HMIS: 2-0-0-X
5g ¥16,800
25g ¥53,500
GET7000
TETRAALLYLGERMANE
C12H20Ge
CH 2
CHCH 2
CH 2
CHCH 2
CH 2CH
CH 2
CH 2CH
CH 2
Ge
236.88
105 / 10
1.015
1.482
Polymerizes.1
Forms copolymers with alkenes.2
Allylates aromatic aldehydes with scandium triflate catalyst.3
1. Mazerolles, P. et al. Compt. Rendu . 1959, 248 , 2018.
2. Jones, J. et al. U.S. Patent 2,985,631, 1961.
3. Akiyama, T. et al. Tetrahedron Lett. 1997, 38 , 853.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 2-2-0-X
[1793-91-5]
1.0g ¥14,500
5g ¥44,500
GET7060
C4 H9 O
OC4 H9
Ge
C4 H9 O
OC4 H9
C4 H9
C4 H9
Ge
C4 H9
C4 H9
TETRA-n-BUTOXYGERMANE
365.05
143 / 8
1.017
C16H36GeO4
Flashpoint: 112°C (234°F)
Viscosity, 20˚: 2 cSt
Surface tension, 25˚: 24.0 dynes/cm
1
With Pb(OAc)2 forms Pb5Ge3O11 piezoelectric films useful in second harmonic generation.
1. Boulton, J. et al. In Sol-Gel Optics II , MacKenzie, J. Ed. SPIE Proc., 1992, 1758 , 292.
TSCA
EC 246-595-2 HMIS: 2-1-1-X
5g ¥14,000
25g ¥42,500
[25063-27-8]
(既）2-2123
GET7080
TETRA-n-BUTYLGERMANE
301.05
274
0.929
C16H36Ge
Flashpoint: 90°C (194°F)
Vapor pressure, 200˚: 85 mm
TOXICITY: oral mus, LD50: 16,000 mg/kg
Viscosity, 25˚: 3 cSt
Dielectric constant, 25˚C: 2.33
Surface tension, 25˚: 26 dynes/cm
Forms catalytic PdGe alloy on reaction with Pd on Al2O3.1
1.4255
1.4561
Aromatic nitriles2, pyrillium salts3 undergo photoinduced alkylation.
1. Aduriz, H. et al. J. Catal . 1989, 119 , 97.
2. Nakadaira, Y. Proc. IX Int' Organosilicon Symp. Paper 1.12 1990 Roy. Chem. Soc.
3. Kyushin, S. Chem. Lett. 1990, 2191.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[1067-42-1]
TSCA
EC 213-929-3
HMIS: 2-2-0-X
5g ¥13,500
25g ¥40,500
GET7100
TETRAETHOXYGERMANE
252
252.84
84
185
185-6
6
(-72)
( 72)
>99.99% (metals basis)
Flashpoint: 62°C (144°F)
C8H20GeO4
Viscosity, 20˚: 1.2 cSt
ΔHcomb: -1,323.3 kcal/mole
Vapor pressure, 86°: 12 mm
ΔHvap: 10.3 kcal/mole
Surface tension, 25˚: 23.2 dynes/cm
Dipole moment: 1.7
1
Sol-gel intermediate for optical fiber preforms, and monoliths.2,3
4
Forms GeO2 by PCVD.
Incorporation into SiO2 interlayer dielectric / passivation reduces reflow temp.5
Sol-gel derived SiO2-GeO2 glasses are photosensitive / high-pressure H2 loading.6,7
Reacts with H2S, sulfur, water to form semiconductor germanium disulfide.8
1. Matsuo, N. et al. Chem. Abstr. 105, 10766e; German Patent 3,535,367, 1986.
2. Mukherjee, S. Mater. Res. Soc. Symp. Proc. 1984, 32 , 111.
3. Mukherjee, S. Mater. Res. Soc. Symp. Proc. 1986, 73 , 443.
4. Secrist, D. et al. Bull. Am. Ceram. Soc . 1966, 45 , 784.
5. Fisher, S. et al. Solid State Tech ., p55, September, 1993.
6. Czekaj, C. et al. Amer. Chem. Soc. Meeting, August 1994.
7. Green, B. et al. J. Non-Cryst. Solids 1994, 16 8, 195.
8. Etsell, T. et al. J. Mater. Chem. 1997, 7 , 105.
1.134
1 134
1.4049
1 4049
GERMANIUM ETHOXIDE
C2 H5O
OC2 H5
C2H5O
OC2 H5
COMMERCIAL
Ge
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[14165-55-0]
TSCA
EC 238-007-8
HMIS: 2-2-1-X
10g ¥15,000
50g ¥46,500
1kg inquire
GET7101
C2 H5O
OC2 H5
Ge
C2H5O
OC2 H5
TETRAETHOXYGERMANE, 99.999%
Low color, low metals grade
GERMANIUM ETHOXIDE
252.84
185-6
Flashpoint: 62°C (144°F)
(-72)
1.134
1.4049
C8H20GeO4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[14165-55-0]
TSCA
EC 238-007-8
HMIS: 2-2-1-X
25g ¥84,500 in fluoropolymer bottle
アヅマックス株式会社
TEL 03-5543-1630
03 5543 1630
FAX 03
03-5543-0312
5543 0312
sales@azmax
[email protected]
co jp
Name
bp °C/mm (mp)
MW
D420
nD20
GET7150
C2 H5
C2 H5
Ge
C2 H5
C2 H5
TETRAETHYLGERMANE
188.84
163-4
(-93)
C8H20Ge
TOXICITY: oral rat, LD50: 590 mg/kg
Decomposes >350°
Viscosity, 25˚: 0.9 cSt
ΔHform: -45.3 kcal/mole
Vapor pressure, 100˚: 110 mm
ΔHvap: 9 kcal/mole
Surface tension, 25˚: 24 dynes/cm
Dielectric constant, 25˚C: 1.97
1
Employed in synthesis of Ge nanowires for sensor applications.
1. Hanrath, T. et al. Adv. Mater . 2003, 15(5) , 437.
0.991
1.4428
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
TSCA
[597-63-7]
EC 209-905-7
HMIS: 2-3-0-X
2.5g ¥14,500
10g ¥37,000
GET7277
(CH 3)2N
N(CH 3)2
Ge
(CH 3)2N
N(CH 3)2
TETRAKIS(DIMETHYLAMINO)GERMANE
C8H24GeN4
Vapor pressure, 88˚C: 15 mm
Used to prepare GeTe films.1
1. Abrutis, A. et al. J. Cryst. Growth 2009, 311 , 362.
248.89
203
(14)
Decomposes >203˚
1.070
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[7344-40-3]
HMIS: 3-3-1-X
5g ¥26,500
GET7280
(CH 3 ) 2 CHO
OCH(CH3 ) 2
Ge
(CH 3 ) 2 CHO
OCH(CH3 ) 2
TETRAISOPROPOXYGERMANE
308.94
109 / 30
C12H28GeO4
Flashpoint: 68°C (154°F)
Viscosity, 20˚: 1.3 cSt
Dipole moment: 1.5
Surface tension, 25˚: 20.8 dynes/cm
Partial hydrolysis leads to chain extended structures.1
Intermediate for α- and β-barium germanate by sol-gel.2
Intermediate for Y2GeO5 by sol-gel.3
Intermediate for MgGeO3 by sol-gel.4
1.025
1.4141
Utilized in Ge-doped sol-gel encapsulation of quantum wells.5
1. Schwarz, R. et al. Z. Anorg. Chem . 1954, 275 , 193.
2. Yamaguchi, O. et al. Polyhedron 1983, 2 , 1213.
3. Yamaguchi, O. et al. J. Am. Ceram. Soc. 1985, 68 , C110.
4. Yamaguchi, O. et al. J. Chem. Soc., Dalt. Trans . 1983, 2139.
5. Ooj, B. Electrochem. Solid State Lett . 2004, 7, F96.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[21154-48-3]
HMIS: 2-2-2-X
2.5g ¥12,500
10g ¥30,500
GET7296
OSi(CH 3)3
(CH 3)3SiO
Ge
(CH 3)3SiO
OSi(CH 3)3
TETRAKIS(TRIMETHYLSILOXY)GERMANE
C12H36GeO4Si4
Catalyst for polyester
429.35
75-80 / 4
(-62 to -59)
0.967
1.4015
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[18766-53-5]
HMIS: 1-2-0-X
2.5g ¥44,500
GET7500
CH3 O
OCH3
Ge
CH3 O
OCH3
TETRAMETHOXYGERMANE
196.73
145-6
C4H12GeO4
Flashpoint: 34°C
34 C (93
(93°F)
F)
Viscosity, 20˚: 1 cSt
ΔHcomb: -713.2 kcal/mole
Vapor pressure, 25˚: 4 mm
ΔHvap: 9.6 kcal/mole
Surface tension, 25˚: 22.5 dynes/cm
Dipole moment: 1.8
Reacts with H2S in ethanol to yield amorphous sol-gel GeS2.1
(-18)
1.325
1.4015
Diffuses into porous silica, hydrolyzing to yield optical waveguide.2
Forms IR transmitting optic by sol-gel.3
In combination with silanol-terminated polydimethylsiloxanes forms coatings for GC.4
1. Melling, P. Ceram. Bull . 1984, 63 , 1427.
2. Kondu, O. Jpn. J. Appl. Phys ., Part 1 1990, 29, 2868.
3. Gael, S. et al. J. Am. Chem. Soc. 1990, 112 , 5636.
4. Fang, L. et al. Anal. Chem. 2007, 79 , 9774.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[992-91-6]
HMIS: 3-3-1-X
10g ¥18,300
50g ¥59,500
GET7550
CH3
CH3
Ge
CH3
CH3
TETRAMETHYLGERMANE
C4H12Ge
Viscosity, 25˚: 0.3 cSt
Vapor pressure, 0˚: 139 mm
Vapor pressure, 27˚: 375 mm
Dielectric constant, 25˚C: 1.82
Surface tension, 25˚: 24 dynes/cm
Source of GeO2 films by PECVD.1
132.73
43.4
(-88)
Flashpoint: -19°C (-2°F)
Critical pressure: 27.7 atm
Critical temperature: 493.1˚K
ΔHfus: 1.78 kcal/mole
ΔHvap: 6.3 kcal/mole
0.975
Ionization currents / free ions on exposure to γ-rays suggest utilization in detectors.2,3
Forms amorphous GeC:H films by CVD with negative bias.4
1. Reich, S. et al. Thin Solid Films 1990, 189 , 293.
2. Geer, S. Nucl. Instrum. Methods Phys. Res., Sec. A 1990, A287 , 447.
3. Holroyd, R. et al. Phys. Rev. B: Condens. Matter 1991, 43 , 9003.
4. Grill, A. et al. J. Mater. Res . 2002, 17 , 367.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[865-52-1]
EC 212-745-0
HMIS: 2-4-0-X
2.5g ¥11,800
10g ¥28,000
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
1.3871
Name
bp °C/mm (mp)
MW
D420
nD20
GET7750
TETRAPHENYLGERMANE
381.02
210 / 1 sub
C24H20Ge
Soluble: acetone, hot toluene
ΔHform: -208.6 kcal/mole
Solubility, benzene: 400 g/l
ΔHsub: 37.5 kcal/mole
Resists reaction with boiling alkali, hydrogen under catalytic conditions
Reacts with Br2 in CCl4, Li in glyme, sulfur at 240°.
Ge
(231-4)
1.58
Catalyst in olefin polymerization.1,2
Catalyst in polyester condensation.3
1. Carrick, W. et al. J. Am. Chem. Soc. 1960, 82 , 3383.
2. Kelsey, R. Brit. Patent 1,147,912, 1969.
3. Matsuzawa, K. et al. Chem. Abstr. 82, 17806, 1975; Jpn. Patent 74-05918, 1974.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[1048-05-1]
TSCA
EC 213-880-8
GET7850
C3 H7
C3 H7
Ge
C3 H7
C3 H7
HMIS: 2-1-0-X
5g ¥13,500
(既）2-2123
TETRA-n-PROPYLGERMANE
C12H28Ge
Viscosity, 25˚: 1.1 cSt
Vapor pressure, 100˚: 29 mm
Surface tension, 25˚: 25 dynes/cm
Catalyst for styrene polymerization.1
1. Anand, L. et al. Ind. J. Chem . 1967, 5(5) , 188.
244.95
86-7 / 5
(-73)
TOXICITY: orl rat, LD50: 5,690 mg/kg
ΔHcomb: -2,144.5 kcal/mole
ΔHform: -69.6 kcal/mole
Dielectric constant, 25˚C: 1.92
0.954
1.4510
1.195
1.4809
1.054
1.4652
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
TSCA
[994-65-0]
C4H 9
C4H 9
Ge Br
C4H 9
EC 213-620-3
HMIS: 2-2-0-X
10g ¥43,500
GET8075
TRI-n-BUTYLBROMOGERMANE, 95%
C12H27BrGe
323.84
143-4 / 10
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X
[2117-37-5]
5g ¥32,500
GET8080
TRI-n-BUTYLCHLOROGERMANE, tech-90
279.38
269-270
C12H27ClGe
Flashpoint: 94°C (201°F)
Vapor pressure, 140˚: 13 mm
TOXICITY: ipr rat, LD50: 1,970 mg/kg
Employed in metallization of polylphenyleneoxide membranes to separate EtOH/H2O.1
1. Fusaoka, Y. et al. Chem. Abstr. 110, 115598hj, Jpn. Patent 63,273,640, 1988.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[2117-36-4]
TSCA
EC 218-323-2
HMIS: 3-2-2-X
5g ¥18,000
25g ¥58,500
GET8100
TRI-n-BUTYLGERMANE, 99%
C4H 9
C4H 9
Ge H
C4H 9
TRIBUTYLGERMANIUM HYDRIDE
244.94
123 / 20
Flashpoint: 78°C (172°F)
0.916
C12H28Ge
Effects free-radical reductive addition of alkyl halides to olefins with AIBN.1,2
RCH2I + H2C=CHCN ---> RCH2CH2CH2CN
Reduces benzylic chlorides 70 X faster than silyl hydrides.3
Initiates radical cyclization of polyenes.4
1. Hershberger, J. Tetrahedron Lett. 1986, 26 , 6289.
2. Pike, P. et al. Tetrahedron 1988, 44 , 6295.
3. Mayr, H. et al. Angew. Chem., Int. Ed. Engl. 1992, 31 , 1046.
4. Spino, C. et al. J. Org. Chem. 1999, 64 , 5292.
[998-39-0]
HMIS: 3-2-1-X
2.5g ¥23,500
10g ¥66,300
アヅマックス株式会社
TEL 03-5543-1630
03 5543 1630
FAX 03
03-5543-0312
5543 0312
sales@azmax
[email protected]
co jp
1.4508
Name
bp °C/mm (mp)
MW
D420
nD20
GET8150
Cl
H
Ge
Cl
TRICHLOROGERMANE
HCl3Ge
Hazy liquid
Vapor pressure, -10˚: 9.2 mm
Vapor pressure, 20˚: 80 mm
Decomposes >140°, yielding Ge, HCl, GeCl4
Trichlorogermane is in equilibrium with GeCl2 and HCl
179.97
75
Flashpoint: 12°C (54°F)
(-71)
1.930
Cl
Pure GeCl2 may be provided by cooling to -30° and pulling vacuum.1,2
Complex with 2 moles ether; reduces nitro compounds and ferric chloride.3,4
Hydrogermylates olefins without catalyst.5,6
Undergoes superacid reactions with aromatics.7,8
1. Schwarz, R. et al. Z. Anor. Allg. Chem . 1954, 275 , 1.
2. Brauer, G. Handbook of Preparative Inorganic Chemistry, 717, Academic, 1963.
3. Craddock, S. et al. Inorg. Chem. 1967, 6 , 1751.
4. Creemers, H. et al. J. Organomet. Chem . 1967, 7 , 237.
5. Lesbre, M. et al. The Organic Compounds of Germanium, 223, Wiley, 1971.
6. Wolfsberger, W. J. Praktische Chem . 1992, 334 , 453.
7. Kolosnikov, S. Main Group Metal Chem . 1989, 12 , 305.
8. Kolosnikov, S. Chem. Abstr. 110, 114984u; Izv. Akad. Nauk. Ser. Khim . 1988, 3 , 666.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[1184-65-2]
O
Cl
ClCCH2CH 2 Ge Cl
Cl
C2H 5
C2H 5
Ge Br
C2H 5
TSCA
EC 214-673-5
10g ¥52,000
HMIS: 3-4-2-X
GET8160
3-(TRICHLOROGERMYL)PROPIONYLCHLORIDE
270.48
C3H4Cl4GeO
[15961-24-7]
TSCA
EC 240-097-9 HMIS: 3-2-1-X
89-91 / 7
1.751
1.5115
1.412
1.4829
1.175
1.4643
1.004
1.4382
2.5g ¥39,000
GET8200
TRIETHYLBROMOGERMANE
C6H15BrGe
[1067-10-3]
239.68
190-1
(-32)
10g ¥37,500
HMIS: 3-2-1-X
GET8240
TRIETHYLCHLOROGERMANE
195.23
176
C6H15ClGe
Flashpoint: 38°C (100°F)
With Et3N converts benzothiazolines to Schiff bases pentacoordinated to Ge.1
C2H 5
C2H 5
Ge Cl
C2H 5
Cocatalyst with AlCl3 for polymerization of terpenes.2
Selective protecting agent for alkyne substituted oligosaccharides.3
1. Jain, L. Ind. J. Chem., Sec. A 1982, 21A , 583.
2. Chem. Abstr. 86, 55962w; German Patent 2,620,597, 1976.
3. Ernst, A. et al. Helv. Chim. Acta 1996, 79 , 1279.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1067-10-3]
HMIS: 3-2-1-X
5g ¥30,500
GET8300
TRIETHYLGERMANE
C6H16Ge
C2H5
C2H5
Ge H
C2H5
160.78
122
Flashpoint: 5°C (41°F)
1
Hydrogermylates alkylpropiolates to give triethylgermylacrylates.
Regioselective addition to alkynes gives (E) vinylgermanes.2
Catalyst for polymerization of α-olefins.3
Precursor for germanium deposition at 300°.4
1. Dimens, V. et al. J. Organomet. Chem. 1992, 4 35 , 257.
2. Esteruelas, M.A. et al. Organometallics 1999, 18 , 2267.
3. Shearer Jr., N. H.; Coover Jr., H. W. U.S. Patent 2,925,409, 1960.
4. Chen, J. et al. J. Vac. Sci. Tech., A 1997, 15 , 1140.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1188-14-3]
I
CF3 Ge I
I
5g ¥49,500
HMIS: 3-4-1-X
GET8360
TRIFLUOROMETHYLTRIIODOGERMANE
CF3GeI3
522.31
42 / .001
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1512-08-9]
HMIS: 3-1-1-X
2.5g ¥77,000
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
sales@azmax co jp
[email protected]
1.6571
Name
iC3H7
iC3H7
Ge Cl
iC3H7
bp °C/mm (mp)
MW
D420
nD20
GET8383
TRIISOPROPYLCHLOROGERMANE
C9H21ClGe
237.32
120-2 / 30
Flashpoint: 66°C (151°F)
1.092
1.4680
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[2816-54-8]
HMIS: 3-3-1-X
5g ¥33,500
GET8440
CH 3
CH 3 Ge Br
TRIMETHYLBROMOGERMANE
197.60
113-4
(-25)
1.549
1.4713
C3H9BrGe
Flashpoint: 37°C (99°F)
Dipole moment: 2.84
More sensitive and selective gas phase reactant for distinguishing 1,2-cyclopentanediol isomers than C, Si, or Sn analogs.1
Trimethylgermylation reagent for formation of dienolates of α,β-unsaturated esters which react with electrophiles.2
CH 3
Reagent for cyclopentannulation reactions.3
1. Meyerhoffer, W. J. Organomet. Chem. 1989, 373 , 14
2. Yamamoto, Y. et al. J. Chem. Soc., Chem. Comm . 1988, 1639.
3. Piers, E. et al. J. Org. Chem. 1990, 55 , 3454.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1066-37-1]
EC 213-913-6
HMIS: 3-3-1-X
5g ¥25,800
25g ¥89,500
GET8500
CH3
CH3 Ge Cl
CH3
TRIMETHYLCHLOROGERMANE
153.15
102
(-14)
C3H9ClGe
Flashpoint: 1°C (34°F)
Dipole moment: 2.89
1
Forms germanium enolates which react under controlled conditions to give syn or anti aldols.
Reagent for regioselective synthesis of α- or γ-aminoacids from masked dienolates.2,3
In combination with HSiCl3 forms strained silicon epitaxial films.4
1.249
1.4337
1. Yamamoto, Y. et al. F&F Vol. 14, p 329; J. Chem. Soc., Chem. Comm . 1988, 802.
2. Yamamoto, Y. et al. Tetrahedron Lett. 1989, 30 , 3445.
3. Yamamoto, Y. et al. J. Org. Chem. 1990, 55 , 3118.
4. Woelk, E. et al. Semiconductor Int'l. 2006, 4 , 39.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1529-47-1]
EC 216-214-4
HMIS: 3-4-1-X
5g ¥24,500
25g ¥84,500
GET8560
CH3
CH3 Ge H
CH3
TRIMETHYLGERMANE
118.70
26-7
C3H10Ge
Flashpoint: <-20°C (<-4°F)
Vapor pressure, 0˚: 270 mm
ΔHvap: 6.10 kcal/mole
Dipole moment: 0.67
Effects halogen displacement of haloalkanes with hydrogen when exposed to UV.1
Reacts with t-BuLi to form Me3GeLi.2
(-123)
1.013
1.3890
Undergoes demethanative coupling to form polygermanes.3
1. Coates, D. et al. J. Chem. Soc., Perkin Trans . 1978, 11 , 725.
2. Piers, E. et al. Organometallics 1995, 14 , 5011.
3. Reichl, J. et al. J. Am. Chem. Soc. 1996, 118 , 9430.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[1449-63-4]
CH3 Cl
CH3 Ge
Si Cl
CH3 Cl
HMIS: 3-4-1-X
store <5°C
2.5g ¥33,500
10g ¥99,000
GET8561
TRIMETHYLGERMYLTRICHLOROSILANE
C3H9Cl3GeSi
252.14
65-6 / 22
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
[150112-38-2]
HMIS: 3-2-1-X
10g ¥41,500
GET8562
CH3
CH3 Ge I
CH3
TRIMETHYLIODOGERMANE
C3H9GeI
Light sensitive
[1066-38-2]
244.60
133-5
HMIS: 3-3-1-X
1.796
2.5g ¥26,800
GET8595.5
(CH 3)3SiCH2Ge(CH 3)3
TRIMETHYLSILYLMETHYLTRIMETHYLGERMANE
C7H20GeSi
204.91
140
(-74)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[2290-62-2]
HMIS: 2-3-0-X
5g ¥40,500
アヅマックス株式会社
TEL 03-5543-1630
FAX 03-5543-0312
[email protected]
1.5189
Name
bp °C/mm (mp)
MW
D420
nD20
GET8630
TRIPHENYLBROMOGERMANE, tech-95
383.81
C18H15BrGe
Major impurity: tetraphenylgermane
1
Catalyst for cycloaddition of CO2 to oxiranes.
1. Chem. Abstr. 98, 16106y.
Ge Br
(138-9)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X
[3005-32-1]
5g ¥27,500
GET8640
Ge Cl
TRIPHENYLCHLOROGERMANE, tech-95
C18H15ClGe
Contains tetraphenylgermane
Soluble: methylene chloride, hot toluene
339.36
285 / 12
(117)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
[1626-24-0]
TSCA
EC 216-617-5
HMIS: 3-1-1-X
2.5g ¥16,800
10g ¥44,300
GET8660
TRIPHENYLGERMANE
304.91
128-9 / 0.03
(41-3)
1.6187
TRIPHENYLGERMANIUM HYDRIDE
C18H16Ge
Disproportionates at elevated temperature
1
Adds to epoxides in presence of Et3B.
Catalyst with Co2(CO)8 for preparation of glycol monoalkyl ethers from synthesis gas, HCHO and alkanols.2
Ge H
Forms carbonyl radical acceptor synthons yielding cyclopentanones3, oximes.4
Regioselective addition to alkynes gives (E) vinylgermanes.5
Undergoes H2PtCl6 catalyzed hydrogermylation reactions.6
1. Ichinose, Y. et al. Chem. Lett . 1988, 8 , 1437.
2. Knifton, J. J. Mol. Catal . 1985, 30 , 281.
3. Curran, D. et al. J. Am. Chem. Soc. 1997, 119 , 4797.
4. Iserloh, U. J. Org. Chem. 1998, 63 , 4711.
5. Esteruelas, M. A. et al. Organometallics 1999, 18 , 2267.
6. Schumann, H. et al. Organometallics 2007, 26 , 397.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
[2816-43-5]
EC 220-569-0
HMIS: 2-1-1-X
2.5g ¥21,500
10g ¥59,500
GET8717
CF3
CF3 Ge
I
CF3
TRIS(TRIFLUOROMETHYL)IODOGERMANE
406.51
C3F9GeI
1
Reacts with NH3 to form the digermazane.
1. Pola, J. et al. J. Organomet. Chem. 1991, 415 , 47.
[66348-18-3]
HMIS: 3-1-1-X
72
(-40)
2.074
1.3580
2.5g ¥72,000
GET8721.5
Si(CH3)3
(CH 3)3Si
Ge H
Si(CH3)3
Cl
CH2
CH Ge Cl
Cl
TRIS(TRIMETHYLSILYL)GERMANE
293.17
C9H28GeSi3
Readily converted to (Me3Si)3GeCl.1
1. Brook, A. et al. J. Organomet. Chem. 1986, 299 , 9.
[104164-54-7]
HMIS: 2-1-1-X
80 / 5
0.937
1.4974
1.652
1.4815
1.0g ¥49,500
205.99
128
VINYLTRICHLOROGERMANE
C2H3Cl3Ge
G
[4109-83-5]
HMIS: 3-3-1-X
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
GEV9200
C2H 5
CH2
CH Ge C2H 5
C2H 5
VINYLTRIETHYLGERMANE, 95%
186.82
C8H18Ge
Oligomerizes with butadiene in presence of NiCl2-Et2AlCl-Ph3P.1
152
Undergoes Diels-Alder reactions.2
Reacts with Fischer carbene complexes to form germyl enol ethers.3
1. Rafikov, S. Izv. Akad. Nauk. Ser. Khim . 1982, 920.
2. Salimgareeva, I. et al. Dokl. Nauk. 1981, 261 , 118.
3. Barluenga, J. et al. Organometallics 1997, 16 , 4525.
[6207-41-6]
HMIS: 2-4-0-X
2.5g ¥33,500
1.005
10g ¥76,000
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