QUALITATIVE ANALYSIS OF SILICON NITRIDE SYNTHESIZED BY AMMONOLYSIS OF SILICON TETRACHLORIDE Richetto, K.C. S.1 ; Silva, C R. M.2; Baldacin, S. A.3 1 UNITAU – Universidade de Taubaté CTA/IAE/AMR 2,3 Keywords: Silicon Nitride, Synthesis, Qualitative Analysis. ABSTRACT: Silicon nitride powder synthesis, performed by the ammonolysis of silicon tetrachloride, is described in this work. Gaseous ammonia reacts with liquid SiCl4 , at low temperature and inert atmosphere, producing an insoluble ammonolysis product. At a second step, a powder pyrolysis is performed between 1300 and 15000C, for ammonium chloride removal and Si3N4 formation. Phase formation is evaluated by X-ray diffraction. Particle medium size and form is determined by Scanning Electron Microscopy. INTRODUCTION Silicon nitride ceramic (Si3N4), is strongly considered a important material for use in structural applications, and its performance is severely influenced by modern synthesis processes for high quality powders[1]. The advantages of using this ceramic for several structural applications is related to its high thermal stability up to 18000C, oxidation resistance up to15000C[2], low electrical conductivity, low coefficient of thermal expansion, excellent thermal shock and creep and corrosion resistance in hostile environment[2,3]. Such properties are highly dependent upon microstructural characteristics, originated on fabrication processes[4]. There are three major routes for the preparation of silicon nitride[2]: high temperature reaction of gaseous nitrogen with elemental silicon; gas-phase reaction of ammonia with a chlorosilane (SiCl4, HSiCl3, H2SiCl2) at high temperatures; reaction of ammonia with SiCl4 or HSiCl3 in solution, followed by pyrolysis of the insoluble ammonolysis product and ammonium chloride removal. The higher free energy formation of NH3 makes reactions involving this compound more favorable than similar reactions with N2, considering the higher free energy of formation of NH3[3]. In the present work, synthesis of Si3N4 powder by ammonolysis of SiCl4, at low temperature in the presence of an organic solvent (hexane) is described. The chemistry reaction has been examined in some detail by Billy[5], et al., Glemser, et al. [6], Mazdiyasni, et al. [3], and Morgan[7, 8, 9], as described. The Hexane/Silicon Tetrachloride solution reacts with gaseous ammonia, yielding a precipitate of silicon diimide and ammonium chloride, according to the reaction: SiCl4 (l) + 6 NH3 (g) n-C6H14 00 C Si (NH)2 + 4NH4Cl (1) The kinetic of reaction is more effective at low temperatures product causes NH4Cl sublimation [3,11], as following: [10] . Pyrolysis of obtained 3600C nSi(NH)2 (l) + 4 NH4Cl vac. 4 NH4Cl + [Si (NH)2]n (2) The Si(NH)2 polymerizes readily and spontaneously with increasing temperature; its pyrolysis results in two intermediate species before it yields α-Si3N4, according to the reaction (3): 4000C 6[Si(NH)2]n (l) - 2NH3 6500C 2 [Si3(NH)3N2]n - NH3 3 [Si2(NH) N2]n 12000C 2 α-Si3N4 - NH3 (3) EXPERIMENTAL Diimide synthesis was performed in a two litters capacity glass Kettle reactor (figure1): Fig. 1: Kettle Reactor. A high purity solution of silicon tetrachloride/hexane was introduced in the reactor, in Argon or Nitrogen atmosphere. A controlled flow of gaseous ammonium is introduced in the above mentioned reactor, starting a very exothermic reaction. Better results are obtained in a temperature range of 0 and 50C, during approximately four hours. The homogenization of reaction media was achieved using a magnetic agitator. In a second step, the obtained silicon diimide was transferred from the reactor to the alumine and silicon carbide crucibles. This step was performed inside a glove box (figure 2), to avoid diimide contamination by oxygen . Fig. 2: Glove box The formed white precipitate was then isolated by the n-hexane distillation under reduced pressure at 250C. Last step for silicon nitride powder synthesis was the diimide pyrolysis, carried out in high purity Argon or Nitrogen atmosphere, at 14000C, for two hours. During such heat treatments, ammonium chloride evolution was always observed, at approximately 900 0C. Table 1 shows the conditions of diimide silicon pyrolysis, during 2 hours: Table 1: Pyrolysis conditions Speciment a b c d Temperature 14500C 14000C 14000C 14000C Atmosphere Argon Argon Argon Nitrogen Crucible Silicon carbide Silicon carbide Alumina Alumina Preliminary powder characterization was performed by X-Ray diffraction an scanning electron microscopy. For accurate morphologic examination, powder samples were previously prepared by ultrasonic dispersion, during five minutes, using distilled water and “Disperlan”, as dispersion media. RESULTS AND CONCLUSIONS Two intermediary compounds has been produced by the ammonolysis of silicon tetrachloride: silicon diimide and ammonium chloride. The compounds were subsequently heat treated in Ar or N2, obtained previously, are heat treated, and are transformed during heating. Ammonium chloride starts its transformations from solid to gaseous state at 3600C. The subsequent heating causes decomposition of the remanent product, followed by liberation of gas ammonia and hydrogen chloride, aiming crystalline silicon nitride powder production. The possible reaction, in this case, is described as follows: NH4Cl (s) NH3 (g) + HCl (g) (4) During the pyrolysis, vapor evolution was observed only after 4000C. Very fine grey particles of silicon nitride powder were obtained, occupying a small crucible volume, compared to the starting silicon diimide powder. They were subsequently characterized by scanning electron microscopy and X-ray diffraction. Silicon Nitride powder α+ β morphology is shown in the figure 3. High percentage of cilinder particles are observed. Fig. 3: Morphological analysis of Si3N4 α+ β to MEV. Figure 4 shows a X-Ray diffraction to different speciment. The speciment –a peaks present a β phase presence, while speciments b, c/d, shows α and α+ β phases, respectively. Speciment - a Si3N4 β 1500 β 1250 β α β 1250 α α α 1000 Intensity (cps) 1000 Intensity (cps) Speciment - b Si3N4 α 1500 750 β 500 750 α α 500 250 250 0 0 20 25 30 20 35 25 30 2θ Angle Speciment - c Si3N4 α / β α 75 35 2θ Angle α α α α Speciment - d Si3N4α / β 750 α α 50 α 25 α β β α β β Intensity (cps) Intensity (cps) 500 α α α 250 β α β β 0 0 20 25 30 35 20 2θ Angle 25 30 35 2θ Angle Fig. 4: X-Ray Diffracton of Si3N4 : (a) β ; (b) α ; (c) and (d) α+ β. The β peaks appears more frequently above 14000C (figure 4-a), while α phase is predominant below the same temperature. Very fine α - silicon nitride powders were obtained, using silicon carbide crucible, in Argon atmosphere (Fig 4-b). Apparently, the β-silicon nitride phase is not nucleated, for the same process conditions. For alumina crucibles, both phases were observed (figure –c/d), using either Argon or N2, as furnace atmosphere. Results suggest that oxygen is provided from alumina crucible, during pyrolysis, generating appropriate conditions for α plus β nucleation, therefore, this study is not concluded. REFERENCES [1] G. M. Crosbie, Preparation of Silicon Nitride Powders, Research Staff, Ford Motor Co., (1983), p. 1144-9. [2] D. Seyferth, G. H. Wiseman, A Novel Polymeric Organosilane Precursor to Si3N4/SiC Ceramics, Science of Ceramic Chemical Processing, (1986), p. 354-62. [3] K.S. Mazdiyasni, C.M.Cooke, Synthesis, Characterization and Consolidation of Si3N4 Obtained from Ammonolysis of SiCl4, J. Am. Ceram. Soc. 56 [12], (1974), p. 628-33. [4] J.R.S. Martins, C.R.M.Silva, Síntese do Pó de Nitreto de Silício Alfa, para Cerâmicos Avançados, XXXIV Congresso Brasileiro de Cerâmica , (1990). [5] M.Billy, M, Brossard, J. Desmaison, D. Giraud, and O. Goursat, Synthesis of Si and Ge Nitrides and Si Oxynitride by Ammonolysis of Chlorides – Comment on Synthesis, Characterization and Consolidation of Si3N4 Obtained from Ammonolysis of SiCl4, J. Am. Ceram. Soc. 57 [5-6], (1975), p. 254 [6] O.Glemser and P. Naumann, Ueber den thermischen Abbau von Siliciumdiimid Si(NH)2, Z. Anorg. Allg. Chem. 298 (1959), p. 134-41. [7] P.E.D. Morgan, Production and formation of Si3N4 from Precursor Materials, Final Report, March 1973- December 1983, NTIS AD-778-373, March 1974, (Spensored by Office Naval Research). [8] P.E.D. Morgan, Research on Densification, Character and Properties of dense Silicon Nitride, Annual Report, March 1972- March 1973, NTIS AD-757-748, (Contract No. N00014-72-C-0262, Office Naval Research). [9] P.E.D. Morgan, Studies for the Productions of Super-Pure Silicon Nitride Powder, Report: DOE/ER/04357-1, (1982). [10] Mazdiyasni et al., Synthesis of High Purity, Alpha Phase Silicon Nitride Powder, United States Patent: 3,959,446 (1976), p.1. [11] C.B.C.Cavalcanti, Síntese do Nitreto de Silício pela Amonólise do Tetracloreto de Silício, Tese de Doutorado- ITA – S.J.C, (1994), p. 1-129.
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