CENTER FOR DIELECTRICS AND PIEZOELECTRICS FALL 2014 MEETING DOUBLE TREE BY HILTON RALEIGH BROWNSTONE-­‐UNIVERSITY NOVEMBER 3-­‐4, 2014 AGENDA Sunday, November 2, 2014: 5:00 PM-­‐ 6:30 PM Registration — Lobby of Double Tree 6:30 PM – 9:00 PM IAB and Faculty Reception David’s Dumplings-­‐ Walk from hotel Monday, November 3, 2014: 7:30 AM – 5:00 PM Registration — Roosevelt Room Foyer, 2nd floor Double Tree 7:45 AM – 8:30 AM Breakfast Buffet — Lincoln Room 8:15 AM MEETING BEGINS— Roosevelt Room 8:15-­‐8:25 Welcome and Introduction Elizabeth Dickey, NCSU Clive Randall, PSU 8:25-­‐8:35 Greetings John Gilligan, Assoc. Dean for Research NCSU College of Engineering 8:35-­‐8:45 Evaluation Process Steve McGregor, NSF Evaluator 8:45 AM – 12:00 PM Session 1 — Roosevelt Room 8:45-­‐9:05 I-­‐1 Role of Simulation and Design for Novel Microwave Materials and Devices Mike Lanagan, PSU 9:05-­‐9:25 I-­‐2 Expanding the Electrical Characterization of Dielectric Materials to Diagnose Failure Mechanisms Clive Randall, PSU 9:25-­‐9:40 I-­‐3 Thin Films for Dielectric Energy Storage Elizabeth Michael, PSU 9:40-­‐9:55 I-­‐4 Energy Storage Technology Roadmap-­‐ A Lockheed Martin Aero Perspective
Roger Brewer, Lockheed Martin 9:55-­‐10:15 BREAK-­‐ Lincoln Room 10:15-­‐10:45 I-­‐5 Controlling the Thermal Conductivity of Ferroelectric Nanostructures: Phonon Interactions with Domain Boundaries Patrick Hopkins, UVA 10:45-­‐11:05 I-­‐6 Direct Observation of Charge-­‐Mediated Lattice Distortions Jim LeBeau, NCSU Center for Dielectrics and Piezoelectrics Fall 2014 Meeting -­‐ Monday 11:05-­‐11:25 11:25-­‐11:45 11:45-­‐12:00 I-­‐7 Point Defect Dynamics in Perovskites Russell Maier, PSU/NIST I-­‐8 DFT Driven Approach to Point Defect Equilibria Doug Irving, NCSU
I-­‐9 Phase Field Modeling of Domain Dynamics and Defect Interactions with Domains Jason Britson, PSU 12:00-­‐1:00 LUNCH —HARVEST GRILLE 1:15-­‐4:45 PM SESSION II — Roosevelt Room 1:15-­‐1:35 II-­‐1 ALD Development for Electronics: Powders, Pores, and Plastics
Markus Groner, ALD Nanosolutions 1:35-­‐1:55 II-­‐2 Utilizing ALD as a processing aid in passive compounds Damoon Heidary, PSU 1:55-­‐2:15 II-­‐3 ALD for Psuedocapacitors James Daubert, NCSU 2:15-­‐2:35 II-­‐4 Ionic Transport Properties of Proton and Lithium Conducting Polymer Electrolytes Ramakrishnan Rajagopalan, PSU 2:35-­‐ 2:55 II-­‐5 A Physicochemical Mathematical Model Describing the Discharge Characteristics of Electrochemical Capacitor Danhao Ma, PSU 2:55-­‐3:10 3:10-­‐3:30 BREAK II-­‐6 Imprint, Aging, and Reliability of Piezoelectric MEMS Susan Trolier McKinstry, PSU 3:30-­‐3:50 II-­‐7 Dual Frequency Piezoelectric Transducers for Superharmonic Imaging and Therapy Xiaoning Jiang, NCSU 3:50-­‐4:10 II-­‐8 New Approaches for Structural Characterization of Films and Polycrystals 4:10-­‐ 4:30 4:30-­‐4:45 4:45-­‐5:30 II-­‐9 Update on Piezoelectric Crystal Growth Chris Fancher, NCSU Shujun Zhang/Clive Randall PSU II-­‐10 Piezoelectrics with Integrated Electronics Margeaux Wallace, PSU BREAK 5:30-­‐7:00 Poster Session/Reception — Lincoln Room
Center for Dielectrics and Piezoelectrics Fall 2014 Meeting -­‐ Tuesday Tuesday, November 4, 2014 7:30-­‐8:30 Breakfast Buffet — IAB: Lincoln Room (closed discussion) Guests, Faculty, Student: Roosevelt Room 8:30-­‐12:00 PM SESSION III – Roosevelt Room 8:30-­‐8:50 III-­‐1 Dielectrics Research at Sandia Leah Appelhans Sandia National Lab 8:50-­‐9:10 III-­‐2 Review of Penn State’s Activities in Polymer Dielectric Applications Zoubeida Ounaies, PSU 9:10-­‐9:25 III-­‐3 Flexible Piezoelectric Materials 9:25-­‐9:40 III-­‐4 Flux-­‐Assisted Thin-­‐Film Processing Hassene Ben Atitallah, PSU David Harris, NCSU 9:40-­‐10:00 III-­‐5 E-­‐field Enhanced Processing of Dielectrics Beth Dickey, NCSU 10:00-­‐10:15 III-­‐6 Low-­‐Fire Microwave Dielectrics Jing Guo, PSU 10:15-­‐10:30 BREAK-­‐ Lincoln Room 10:30-­‐10:55 III-­‐7 Material Properties to Enable Wide Bandgap Power Electronics Subhashish Bhattacharya, NCSU 10:55-­‐11:15 III-­‐8 Designing Antiferroelectrics for Power Electronics Clive Randall, PSU 11:15-­‐11:35 III-­‐9 Transient Charge Transport and Implication on Breakdown to Failure Mike Lanagan, PSU 11:35-­‐11:55 III-­‐10 Update on High-­‐Entropy Oxides Jon-­‐Paul Maria, NCSU 11:45-­‐12:45 LUNCH – Harvest Grill 1:00PM-­‐4:00PM Industrial Advisory Board Meeting (MEMBERS ONLY) Lincoln Room Center for Dielectrics and Piezoelectrics Fall 2014 Meeting Post-­‐Meeting Activities Wednesday, November 5, 2014* 8:30AM Bus departs from hotel to NCSU Centennial Campus 9:00AM-­‐Noon Tutorial: Fundamentals and Applications of Atomic and Molecular Layer Deposition Technology and Visualization Lab, Room 4045 James B. Hunt Library Instructor: Gregory N. Parsons Alcoa Professor, Department of Chemical and Biomolecular Engineering North Carolina State University, Raleigh NC, USA [email protected] Atomic layer deposition (ALD) is a chemical method to form ultrathin layers or coatings of materials, primarily metal oxides and metals, onto arbitrary surfaces. The ALD process provides extremely high precision in film thickness and coating conformality, such that current large-­‐scale manufacturing of advanced electronic computer devices requires ALD to form insulating and conducting layers in active transistors and circuits. The careful control provided by ALD processes has caught the attention of many industrial and academic researchers, and there is growing interest in gaining basic insight into about how the process works, and how it can be adapted and used for other future products. The purpose of this short course is to provide new insight to researchers with prior experience and to those without prior exposure to ALD, to broaden basic understanding and inspire new creative thinking. The first part of the course will cover the basic background of Atomic Layer Deposition, including an introduction to ALD chemistry, history of ALD, an overview of ALD materials, precursors and reactions, and a description of ALD reactor systems. The second part will focus on advances and challenges in ALD, including related Molecular Layer Deposition and Sequential Vapor Infiltration processes, understanding of ALD nucleation and selective area deposition, an overview of ALD in electronics, and a brief summary of new emerging ALD applications. The course attendees will also receive a set of course notes, including a partial list of references to help guide further study. * Tours of the NCSU Analytical Instrumentation Facility (www.aif.ncsu.edu) and/or the Future Renewable Electric Energy Delivery and Management Systems (FREEDM) Center (http://www.freedm.ncsu.edu) can be arranged throughout the day.