A facility within the Nanometer Structure Consortium (nmC) at Lund University
lund
nanolab
Welcome to
» It’s a dream come true.
This is the lab I always
dreamt of. I didn’t know
it would ever exist.«
I v a n M a x im o v , P r o c e s s m a n a g e r
Lund Nano Lab is the latest addition among Swedish research and
development laboratories for semiconductor materials and devices.
It is specifically built around fundamental research and device
development based on nanostructures with nanowires as specialty.
K e y f e at u r e s
•Realization and analysis of structures in the nanometer range
• Integration between epitaxy and processing
• 300 m2 cleanroom for cutting edge nanofabrication
• Academic research
• Available to external research groups and to industry and start-ups
• Industrial product development and prototype testing
S t r at e g i c a l ly i m p o r ta n t a r e a s
• Research on nanowire growth, materials science
• Studies on fundamental and device physics, electronics and photonics
• Nano bio, life sciences
• Nanoimprint lithography
• Growth and physics of novel materials
• Nanowire-based solid state lighting and solar cells
• Processing of nanoelectronic devices and circuits
L a b ac c e s s , c o m m e r c i a l a n d ac a d e m i c
• Monthly access fee and hourly rate for machine usage
• Research collaboration
• Research projects within the Division of Solid State Physics
• Cleanroom safety introduction course and individual hands-on training available
• Customers can place their own employees in the lab
Fluorescence microscopy image of nerve cells
cultured for 72 h on GaP nanowires.
One of the unique features of the Lund Nano Lab is the close
coupling between the manufacturing of the semiconductor structures by epitaxial growth and the pre- and post-processing of
the nano­structures and nanodevices. The lab is designed with a
cleanroom staircase between epitaxy and nanoprocessing parts
to simplify sample transfer and allow researchers from processing
at levels 1 and epitaxy on level 2 to meet and discuss scientific
issues. The close cooperation between the crystal growers, processing and characterization scientists, and physicists is a necessary
prerequisite for a successful development of nanowire-based
fundamental physics and device-oriented research.
NANO - p r o c e s s l a b f l o o r 1
NANO - e p i ta x y l a b f l o o r 2
• ISO 5 cleanroom standard (≈”class 100”)
• Unidirectional air flow, FFU system and HEPA filters
• Temperature (T=20+–0.5 ºC) humidity (40+–5%)
• Three independent anti-vibration platforms
• ISO 7 cleanroom standard (≈”class 10 000”)
• Conventional cleanroom floor, FFU system
and HEPA filters
• Temperature control
• Connected with Berzelius cleanroom
Nano Imprint Lithography, NIL-patterned
device with 250-nm-wide cantilevers.
Nanotrees grown
from nanowires.
Fluorescence microscopy image of the axons from superior
cervical ganglia on a 1 by 1 mm nanowire-patterned surface.
Nano-wire based light
emitting diodes (LED).
InAs nanowire with InP barriers
of different thicknesses.
Measurement on a branched
InAs nanowire.
Vertical nanowire InAs transistors with 50 nm Lg and good DC
characteristics (gm = 0.8 S/mm, SS = 80 mV/dec., 20 mV hysteresis).
A selection of equipment available in Lund Nano Lab, all capable of up to 4-inch wafer processing. A complete list
of equipment can be found here: http://booking.ftf.lth.se (click on "view equipment").
EBL Raith 150: high-resolution patterning (≈15–20 nm after lift-off), fabrication of nano-devices in III-Vs, Si,
fabrication of Nanoimprint Lithography (NIL) stamps up to 6” in size. NIL Obducat 6-inch imprinter: sub50 nm pattern transfer onto up to 6 inch samples, alignment with ≈1 µm accuracy, thermal and/or UV-imprint.
MJB 4 DUV mask aligner: optical lithography with resolution up to 500 nm, up to 4 inch wafers. Atomic
Layer Deposition ALD Savannah-100: layer-by-layer deposition of high-quality dielectric films (Al3O4 , HfO2
etc). Sputterer AJA Orion 5: RF-and DC-sputtering/deposition of metals and dielectrics with high precision,
deposition of multilayer structures. Evaporator Pfeiffer Classic 500: Thermal evaporation of metals for e.g.
lift-off applications, semi-automatic multilayer metal deposition. Evaporator AVAC: thermal evaporation of
metals and dielectrics. E-beam evaporator AUTO306: e-beam evaporation of metals (e.g. W). ICP-RIE,
Oxford Instruments: low-energy plasma etching of III-Vs, fabrication of devices in III-Vs in combination with
lithographic patterning. Plasma asher Emitech and ozone cleaner system: Removal of organic residues, oxidation in O2 plasma. Rapid Thermal Processing oven RTP1200: formation of contacts, oxidation.
FIB/SEM FEI Nova NanoLab 600: high resolution (≈1.1 nm) SEM, focused ion beam (FIB) milling, FIB and
e-beam deposition of Au, W, SiOx, and manipulator. Field-emission SEM JSM6400F: resolution ≈5 nm,
characterization of nano-structures. Ellipsometer Wollram M2000VI: measurements of film thickness
with high precision, optical properties. Stylus profiler Dektak 6M: measurements of film thickness. AFM
Dimension 3100: characterization of nanostructures, AFM lithography. MOCVD, Aixtron 200/4: growth of
epitaxial GaAs, InP, antimonides, nanowires and epitaxial layers, device applications: lasers, detectors, HBTs, HEMT,
solar cells. MOCVD Thomas Swan CCS: growth of epitaxial nitride structures, nanowires and epitaxial layers,
device applications: blue LEDs, power electronic devices.
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Cover image: SEM picture of an array of InP nanowires. Design and production: www.tintinblackwell.com, 2008. Cover Photographs: Marcel van Helvoort, Monkey Business Images | Dreamstime.com
The Nanometer Structure Consortium (nmC) at Lund University
Since about 20 years, Lund University hosts a major interdisciplinary
research environment in Nanoscience, ranging from materials science
and quantum physics to applications in the areas of electronics, photo­
nics and the life sciences. It is a center for the development of nanotechnology and fields of science and applications based on the unique
properties and opportunities offered at the nanometer length scale.
David Adolph, MSc
Sören Jeppesen, MSc
Georg Rydnemalm
Sujeeka Lindborg
Mariusz Graczyk, MSc
Lena Timby, BSc
Peter Ramvall, PhD
Ivan Maximov, PhD
lab staff
The greatest strength of the consortium lies in the unique combination
of scientific and intellectual competence in areas covering physics,
electronics, materials science and life sciences on the nanoscale. The
common research goals, close interaction in joint projects and weekly
meetings and seminars on key thematic areas provide for the best
utilization of the consortium’s competence and resources and enables
us to take on important new challenges in science and technology.
Another important feature is the joint research infrastructure, giving
young scientists access to advanced resources, in terms of equipment as
well as people, way beyond those normally available to junior or postdoctoral researchers.
Highly skilled personnel.
Lund Nano Lab is a part of the Division of Solid State Physics at Lund
University. For further information please contact:
Peter Ramvall (lab manager)
phone: +46 703 999 957
[email protected]
http://www.nano.lth.se/lundnanolab
Lund Nano Lab
Solid State Physics
Lund University, Box 118
SE-221 00 Lund, Sweden