113th Annual Meeting of the DGaO 2012
Deutsche Gesellschaft
für angewandte Optik e.V.
Photonic Cluster
Netherlands
Invitation and program
113th Annual Meeting
Eindhoven, 29. May – 02. June 2012
Sponsors of the 113th Annual Meeting of the DGaO / Joint Meeting
DGaO-Photonics Cluster Netherlands
Optomechanische Werke
cover images: Theme Eindhoven University of Technology
Deutsche Gesellschaft
für angewandte Optik e.V.
Photonic Cluster
Netherlands
The German Society of Applied Optics (DGaO) e. V.
Chairman: Prof. Dr. Michael Pfeffer
and
The Photonics Cluster Netherlands
Chairman: Dr. Bart Snijders
Invitation
to the Joint meeting DGaO-PCN
(113. Annual Meeting of the DGaO)
From May 29th to June 2nd, 2012
and to the Statutory General Assembly
of the German Society of Applied Optics (DGaO)
June 1st, 2012
in Eindhoven/Netherlands
Eindhoven University of Technology
DGaO Proceedings
The authors of both societies can publish their contributions in the DGaO Internet
Journal DGaO Proceedings (www.dgao-proceedings.de). The contributions can
be published as two-page manuscripts or as posters. Papers in the Proceedings
may be quoted. The Proceedings of the 2010 event have been accessed about
9000 times to date.
The deadline for the upload of the manuscripts and of the posters is July 20th, 2012.
Instruction for the upload can be found in German at the DGaO Website address
http://dgao-proceedings.de/hinweise/hinweise_d.php, and in English at the address
http://dgao-proceedings.de/hinweise/hinweise_e.php.
Eds. G. Häusler, C. Faber
Program Committee 2012
Dr. Stefan Bäumer, Philips Lighting, Eindhoven, Netherlands
Dr. Christiaan Velzel, Veco b.v., Netherlands
Dr. Egbert Buhr, Physikalisch Technische Bundesanstalt, Braunschweig, Germany
Dr. Bernd Dörband, Carl Zeiss AG, Oberkochen, Germany
Christian Faber, University of Erlangen-Nürnberg, Germany
Prof. Dr. Gerd Häusler, University of Erlangen-Nürnberg, Germany
Dr. Frank Höller, Carl Zeiss AG, Oberkochen, Germany
Alfred Jacobsen, Opsys Project Consulting, Germany
With the kind collaboration of
Elizabeth Nagel, DGaO-office, Germany
Conference office TU/e, Eindhoven, The Netherlands
Chairman of the Meeting
Dr. Stefan Bäumer, Philips Lighting, Eindhoven
2
Content
Overview of the program . . . . . . . . . . . . . . . . . . . . . . . . . . . 4
Technical Program: Lectures . . . . . . . . . . . . . . . . . . . . . . . 8
Wednesday . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8
Thursday . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 50
Friday . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 68
Saturday . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 90
Technical Program: Posters . . . . . . . . . . . . . . . . . . . . . . . 100
Index of authors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 144
Fraunhofer lecture . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 148
Communications from the Organizing Committee . . . . . . 150
DGaO Members General assembly . . . . . . . . . . . . . . . . . . 158
Advertisement . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 164
3
Overview of the Program
Wednesday, May 30th
Time Room Lecture
08:30 Blauwe
Zaal
09:00 Blauwe H1
Zaal
Titel/Topic
Opening
Thursday, May 31st
Page
6
H. Nikol: Trends in
LED illumination
8
09:30 Blauwe H2
Zaal
R. Völkel: Optical
Lithography –
Key Enabling for our
Modern World
8
10:00
10:30 A
A1-A7
Coffee break
Optical Lithography
10
10:30 B
B1-B6
Illumination Optics
18
14:00 A
Lunch
R. D. Geckeler:
24
Recent advances in
autocollimator
calibration and
optimisation at the PTB
A8-A12 3D-Metrology 26
14:00 B
B8-B12 Optical Materials
32
15:15
17:00 A
Posterpresentation/
Coffee break
A13-A18 Interferometry
38
17:00 B
B13-B18 Optical Design
44
Time Room Lecture Titel/Topic
08:30 Blauwe H4
H. Feldmann:
Zaal
Optical Systems for
Lithography
S. Risse
09:00 Blauwe H5
Zaal
Diamond machining
of aspherical and
freeform mirrors
12:15
13:30 Blauwe H3
Zaal
Coffee break
A19-A22 Optical Design
for Lithography
Applications
50
09:30
10:00
A
10:00
B
11:00
11:15
A
Coffee break
A23-A26 Deflectometry and
Aspheres
60
11:15
B
B23-B26 Microstructuring
64
12:15
13:30
B19-B22 Manufacturing
Technology
Lunch
Excursion
Welcome and Opening: Blauwe Zaal
Plenary Sessions: Blauwe Zaal
Session A: Blauwe Zaal, except Wednesdays morning, then Collegezaal 4
Session B: Collegezaal 5
Poster session: Wednesday to Saturday P1 – P47
4
Page
50
52
56
Overview of the Program
Friday, June 1st
Saturday, June 2nd
Time Room Lecture Titel/Topic
J. Herrmann:
09:00 Blauwe H6
Zaal
Camera Systems
for Machine Vision
Applications – Overview, Developments,
and Outlook
M. Smit:
09:30 Blauwe H7
Zaal
Moore´s Law in
Photonics
10:00
Coffee break
A A35-A38 Fibres and Polarization
10:30
Optics
Time Room Lecture Titel/Topic
Page
08:30 Blauwe S1
G. Kroesen: Optical
68
Zaal
phenomena in nature
09:00 Blauwe S2
Zaal
09:30 Blauwe S3
Zaal
M. Vollmer:
68
Beautiful phenomena
in the skies: a colorful
journey in the realm of
atmospheric optics
P. Vukusic:
All things bright and
beautiful: light and
colour manipulation in
biology
68
10:00
10:30 Blauwe S4
Zaal
Coffee break
J. Schlichting:
70
Das Phänomenale im
Alltäglichen – Optische
Phänomene im Alltag
11:00 Blauwe S5
Zaal
K. Hamburger:
Visual illusions: brain
and consciousness
U. Trutschel:
Modern Lightening
effects the human
Circadian System
11:30 Blauwe S6
Zaal
12:00 Blauwe
Zaal
12:15
13:30
13:30
10:30
11:30
70
72
Discussion S 1 - S 6
Lunch
A
B
A27-A30 Scatterometry
B27-B30 Physiological Optics
14:45
A
A31-A34 Digital Holography
82
14:45
B
B31-B34 Microscopy
86
74
78
Coffee break
14:30
16:00 Blauwe
Zaal
18:30 DAF Museum
19:30 DAF Museum
Mitgliederver­
sammlung / Poster
Welcome
Fraunhofer – Lecture /
Banquet
5
B
B35-B38 Innovative Wave
Optical Methods
End of meeting
Page
90
90
92
96
Conference Program
Tuesday, May 29th, 2012
Welcome Meeting , Blauwe Zaal, Auditorium Building TU/e
18:00 h
Welcome of the participants by the Organizing Committee and the Chairman
18:30 h
Introductory Invited Talk: "Eindhoven: City of Technology and Design",
Prof. Jan-Erik Baars, Hochschule Luzern
19:30 h
Welcome Cocktail
Wednesday, May 30th, 2012
08:30 Uhr
Opening Session
Mary-Ann Scheurs (City council Eindhoven: culture, design and innovation)
Prof. G. Kroesen, Eindhoven Unversity of Technology
Prof. Pfeffer
Dr. Bäumer
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Welcome Meeting
Opening Session
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Trends in LED Illuimination
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H. Nikol, LED Strategist, Philips Lighting, Eindhoven
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[email protected]
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LEDs have revolutionzed Lighting like the Edison bulb has done 140 years earlier, transitioning
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gas lighting to electrical lighting. LEDs are not just another light source, capable of even more
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energy saving than most of the existing ones. Their optical and electrical characteristics allow
unprecendented application possibilities previously unthinkable.
The optics needed to shape and distribute the light in the desired distributions will play an
increasingly important role in general energy efficient lighting.
A view on the trends in LED lighting will be given with a special attention to the optics needed
for this new type of illumination.
H2
9:30
Optical Lithography - Key Enabling Technology for our Modern World
R. Voelkel, SUSS MicroOptics SA
[email protected]
In 1959, Richard P. Feynman initiated the Nano-age in his lecture “There’s plenty of room at
the bottom”. Feynman also had a clear vision about computers and asked:”Why can’t we
make them very small, make them of little wires, little elements - and by little, I mean little. For
instance, the wires should be 10 or 100 atoms in diameter, and the circuits should be a few
thousand angstroms across.”
At the same time, Jean Hoerni from Fairchild Semiconductors tried to get his “planar process”
to production. Hoerni’s planar process using silicon substrates, so-called “wafers”, revolutionized semiconductor manufacturing and was widely adapted by the industry. The great
success of the planar wafer process is also much related with tremendous improvements in
optical lithography over all the years. From the early age dominated by mask aligners to highly
sophisticated steppers and scanners, lithography was the key enabling technology, allowing
now – 50 years after Feynman’s vision – nanostructuring down to the atomic scale on 300mm
planar wafers. The evolutionary development of optical lithography is reviewed along with a
brief discussion of options for the future.
10:00 – 10:30 Coffee break
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Illumination Optics
Optical Lithography
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AMALITH: Advanced Mask Aligner Lithography
A. Bramati*, T. Weichelt*, L. Stürzebecher**, B. Meliorisz***, U. Vogler*, R. Voelkel*,
* SUSS MicroOptics SA, Neuchatel, Switzerland; ** Fraunhofer Institut für Angewandte Optik
und Feinmechanik IOF, Jena, Germany ; ***GenISys GmbH, Taufkirchen, Germany,
[email protected]
As predicted by Moore’s law, the number of components in integrated circuits is ever-growing.
Since the mid-1970s the need of smaller and smaller feature sizes in semiconductor manufacturing has encouraged the development of new technologies as Lithography Projection
Systems. Nevertheless, because of its comparatively low cost of ownership, versatility and
easy handling, many companies, research centres and universities still employ Mask Aligners.
Advanced Mask Aligner Lithography (AMALITH) makes it possible to overcome some application limits for this technology, by introducing innovative concepts to shadow printing. This
approach, in combination with lithography simulations, enables the use of Resolution
Enhancement Technologies, already employed in front end processes.
We will show some application of complex mask layers based on Diffractive Optical Elements
(DOE) as Fresnel Zone Plates or Diffractive Beam Splitters for process quality improvement
and control. Optical Proximity Correction (OPC), Source Mask Optimization (SMO) and PhaseShift Masks (PSM) have been used for increasing the process window, the resolution and the
accuracy of the resulting photoresist profile.
MO Exposure Optics: Pushing Limits of Shadow Printing Lithography in Mask
Aligners
U. Vogler*, A. Bramati*, R. Voelkel*, M. Hornung**, * SUSS MicroOptics SA, Neuchatel,
Switzerland; ** SUSS MicroTec Lithography GmbH, Garching, Germany, [email protected]
Mask aligners were the dominating litho tool for the first 20 years of semiconductor industry,
until industry changed over to projection litho in the 1980s. However, mask aligner lithography
was never sorted out. Still today, some hundreds of new aligners are sold every year. Mask
aligners have evolved much since then, however, the shadow printing mechanism and the
related illumination system has not changed much over 30 years.
We now present a new illumination system for mask aligners, the MO Exposure Optics®,
which is based on two microlens-type Köhler integrators located in Fourier-conjugated planes.
The optics stabilized the illumination against misalignment of the lamp position in ellipsoid. It
also provides improved light uniformity, telecentric illumination and allows to freely adjust the
angular spectrum of the illumination light by spatial filtering. It significantly improves CD uniformity and yield in production and opens the door to a new era of Advanced Mask Aligner
Lithography (AMALITH), providing customized illumination, optical proximity correction
(OPC), Talbot-lithography, phase shift masks (AAPSM) and source mask optimization (SMO)
in mask aligners.
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Optical Lithography
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Imaging gratings with modulated blaze realized by a combination of holography and
reactive ion beam etching
M. Burkhardt*, R. Fechner**, L. Erdmann*, F. Frost**, R. Steiner*, O. Sandfuchs*, A. Schindler**,
A. Gatto*, S. Sinzinger***, *Carl Zeiss Jena GmbH, Carl-Zeiss-Promenade 10, 07745 Jena,
Germany, ** Leibnitz-Institut für Oberflächenmodifizierung, Permoserstr. 15, 04318 Leipzig,
Germany, ***Technische Universität Ilmenau, Fakultät für Maschinenbau, Postfach 100565,
98684 Ilmenau, Germany, [email protected]
In a wealth of applications the requirement of high spectral resolution is accompanied by low
light energy arriving from the objects under investigation. Typically high and constant
diffraction efficiency would be beneficial in the whole spectral range of interest. A way to
enhance the dynamic of a spectrometer is the adaptation of the spectral efficiency
characteristic of the diffraction grating to the spectral properties of the remaining parts, in
particular the sensor and the light source. For surface relief gratings the saw tooth like or so
called ‘blazed’ gratings achieve maximal diffraction efficiency. However, on a conventional
blaze grating the physical boundary conditions lead to a spectral efficiency dependency with
a quite narrow maximum. In the majority of spectral sensor applications a different efficiency
characteristics would improve the device performance considerably.
We present a new method to tune the spectral characteristic of blazed gratings by a
combination of interference lithography and successive reactive ion beam etching employing
special masks. Measuring data of the resulting spectrometer system with the modified grating
type will be presented.
A4
11:15
The influence of Line Edge Roughness in scatterometry-based CD metrology
B. Bilski, K. Frenner, W. Osten, Institut für Technische Optik, Universität Stuttgart
[email protected]
Semiconductor industry still follows the Moore’s Law so that the Critical Dimension (CD) of
integrated circuits is shrinking. Many problems have been overcome until now, with new issue
entering the game - the Line Edge/Width Roughness (LER/LWR), defined as variations of a
given edge’s position or feature’s width occurring quickly over their length. Reports state that
LER/LWR is gaining in impact on the performance of lithography-fabricated circuits. This is
the reason for the need to monitor the LER/LWR so that it never exceeds certain limits.
International Technology Roadmap for Semiconductors (ITRS) states about monitoring the
LER/LWR that “manufacturable solutions are NOT known”. The motivation for our simulation
work is to verify if scatterometry, which is already successfully used in semiconductor
industry, can be used to “manufacturably” access the LER/LWR information. We show that
one scatterometric measurement is not sufficient for this purpose, as the LER/LWR-affected
structure is no different from LER/LWR-free structure of another CD. Only adding a second
measurement with different polarization of light makes LER/LWR detectable by introducing an
observable difference.
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Optical Lithography
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Metal oxide thin films for precision optics in the DUV spectral range
M. Bischoff, T. Nowitzki, O. Voß, S. Mewes, Qioptiq Photonics GmbH & Co. KG
[email protected]
DUV laser applications require optical coatings with minimal optical losses due to scattering
and absorption. Consequently, it is necessary to choose the coating materials very carefully.
In general, MgF2 and LaF3 are used as materials for 193nm coating designs, deposited by
electron beam or metal boat evaporation. But due to high interface roughness, high scattering
losses can be observed. Indeed, this problem can be solved by using a plasma assisted
deposition process but at the expense of higher absorption losses.
However, metal oxides can also be used as coating material for DUV applications. This paper
will demonstrate that optical coatings for 266nm, 248nm, and 193nm can successfully
produced by using ion beam sputtering technology. This deposition method guarantees
coatings with smooth interfaces and significantly lower scattering losses. Due to the
optimization of the deposition parameters as well as the post-deposition treatment, coatings
with low absorption losses can be realised. In this study, single layers of SiO2, Al2O3, and
HfO2 as well as antireflection and high reflection coatings were prepared. The mechanical and
optical properties were examined and discussed.
Stray light minimised optical coatings and their application in UV inspection optics
B. Görtz, M. Bischoff, S. Mewes, T. Thöniß, Qioptiq Photonics GmbH & Co. KG Göttingen
[email protected]
In UV inspection systems, the reduction of stray light has a special emphasis. As stray light is
induced by many different sources residual reflections and scattering of surface roughness
are the most pronounced effects for optical coatings.
Optical coatings are used to maximise the transmission of lenses in optical systems and play
an important role to minimise residual reflections in refracting optical systems. As a
consequence they reduce the stray light level that maintains a high image quality or low signal
to noise ratio.
This makes the development of appropriate optical coatings one key in the design of successful
high quality UV inspection optics.
In this presentation the influences of the coating on the stray light level in an UV inspection
microscope objective is shown. Solutions to minimise the stray light level will be presented
and their effects in an instance of a high numerical aperture UV inspection lens are given. The
scattering of coatings, that is very important in laser applications, will be considered here in
conjunction with the application in UV inspection objectives.
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Performance of FlexRay, a fully programmable Illumination system for generation
of Freeform
Sources on high NA immersion systems
M. Mulder, A. Engelen, O. Noordman, G. Streutker, B. van Drieenhuizen, C. van Nuenen, W.
Endendijk, J. Verbeeck, W. Bouman, A. Bouma, R. Kazinczi, R. Socha *, D. Jürgens,
J. Zimmermann, B. Trauter **, J. Bekaert, B. Laenens ***, D. Corliss, G. McIntyre ****, * ASML,
Veldhoven, The Netherlands; ** Carl Zeiss SMT AG, Oberkochen, Germany; *** IMEC, Leuven,
Belgium ; **** IBM Microelectronics, NY, [email protected]
In this paper the principle and performance of FlexRay, the first fully programmable illuminator
for a high NA immersion system, will be described. Arbitrary sources can be generated on
demand, by manipulating an array of mirrors instead of the traditional way of inserting optical
elements and changing lens positions.
This next generation illuminator is developed to give lithographers easy access to the
enhanced process windows as predicted by state of the art Source Mask Optimization
software (SMO) and to give virtually unlimited source tuning capability that can be used to
improve matching or correct for example mask bias errors.
To evaluate the performance of FlexRay, the illuminator has been integrated in a 1.35NA
TWINSCAN exposure system. We will present data of the key characteristics of FlexRay using
measured traditional and freeform illumination sources.
The benefit of FlexRay for SMO is demonstrated using some application examples for memory
and logic. We will show data on process window increase with SMO and enhanced proximity
matching by making use of the pupil tuning capability of FlexRay.
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Multi color LED Theatre spot with zoom function
S. Verbrugh*, R. Kurt*, T. Tukker*, E. Lenderink* and R. Voorspoels**, *Philips Lighting, Mathildelaan 1,
5611 BD Eindhoven, The Netherlands, **Philips Lighting, Steenweg Op Gierle 417, 2300,
Turnhout, Belgium, [email protected]
Theatre spots currently use Halogen lamps as light source and typical wattages range from
500 to 1000W. We have built a multi color LED module in the most often used Theatre spot
fixture, the Source Four from ETC and we have modified the optical system in order to get
homogeneous color mixing. With the modified optical system, the gobo projection, hard edge
spot beam and zoom functionality were still operational as in the original Source Four. In
addition the multi color LED module enabled a large variety of colors and white light with any
color temperature between 2500K and 6500K with a CRI of around 90.
The main advantage of the use of LEDs in theatre fixtures is related to the creation of colors.
Colored light is currently made by Halogen lamps combined with filters absorbing part of the
spectrum. Some frequently used filters transmit only a few percent of the light, so the use of
LEDs can lead to considerable energy saving. Further cost saving is achieved because of the
long lifetime of LEDs. In addition, LEDs enable new light effects like controlled color transitions
and instant black out.
Efficient freeform optics for street lighting applications
A. Bruneton*, A. Bäuerle* **, R. Wester**, P. Loosen* **, * Chair for the Technology of Optical
Systems, RWTH Aachen University, 52056 Aachen, Germany; ** Fraunhofer Institute for Laser
Technology, Steinbachstr. 15, 52074 Aachen, Germany, [email protected]
The recent developments in LED technology have created an attractive light source for new
efficient illumination systems. However, their high luminous efficacy can only be fully exploited
in combination with highly efficient optics, allowing to tailor the light into a given target irradiance.
The design of freeform optics is now the privileged route to tackle this challenge: using
relatively few optical components, a complex non-radially symmetric irradiance pattern can
be achieved. Combining these capabilities with a high optical efficiency brings up new
problems and leads to sensitive numerical schemes.
We report in this paper on the recent developments of our method to design two freeform
optical surfaces (either refractive or reflective) using an optimized ray mapping computation.
The procedure relies on the Monge-Kantorovich theory of optimal mass transport, and the
related conditions for an optimal mapping.
We illustrate our procedure with the design of an efficient street lighting lens, achieving an
optical efficiency over 85% while at the same time producing a homogeneous luminance
pattern on the road.
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Evaluation of illumination uniformity metrics in design and optimization of light guides
M. Maksimovic, Focal Optical Systems, Oldenzaal, The Netherlands, [email protected]
Spatially uniform illumination is an important design target in many applications such as
displays, backlights, medical lighting, solid-state lighting, microscopy etc. In the design
process, optical systems are assessed using uniformity metrics based on the statistical
analysis (min-max and min-average ratio, coefficient of variation) or using models incorporating
features of human visual system (based on weighted contrast sensitivity function). In this
contribution, we evaluate several uniformity metrics in the design of free-form and classical
polygonal light guides. We implemented, in Zemax optical design software, various uniformity
metrics as the constraints and as the terms in the suitable merit function. We compare
influence of different uniformity metrics on the merit function landscape with respect to
criterions such as number of local minima, robustness to parameter perturbation, sensitivity
to numerical noise etc. In addition, we consider extension of standard approaches to color
uniformity metrics. Our analysis and evaluation results can be used as a basis for choosing
application specific uniformity metric.
Geometrical optical design in phase space
D. Rausch, F. Mauch, A. M. Herkommer, Institut für technische Optik, Universität Stuttgart
[email protected]
The phase space concept in optics is a powerful method to treat many optical phenomena,
including diffraction and interference. Phase space can be used to evaluate an optical design
having regard on the effect on ray angles and ray positions simultaneously. Thus the analysis
of the phase space transformation provides an entire picture of the optical functionality of the
design. Especially for illumination problems, where the transport of radiance is relevant, the
phase space concept provides an interesting access. We show that also in geometrical
optics limit phase space provides an alternative perspective and tool for evaluating optical
designs, as compared to ray-tracing. As an example we consider integrator rods and optical
arrays, the most commonly used components to homogenize radiation fields. Since both
components affect the spatial light distribution as well as the angular distribution of the
radiation field, phase space methods allow to evaluate their operation principle, performance
and also differences.
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Illumination Optics
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A proposal for a new generalised rayfile format
U. Streppel, R. Dürr, Osram Opto Semiconductors GmbH, [email protected]
The optical design of illumination systems often requires near-field information of the light
source. In case ray-tracing methods are used for the design, it is inefficient to consider the
detailed internal set-up of the light source, or normally this internal information is not available
because it is the essential and confidential know-how of the light source manufacturer. The
common used interface to exchange the near-field information is the rayfile interface, which
contains basic data for each ray (e.g. starting point coordinates, direction cosines, intensity)
in a tabulated form. Unfortunately there exists no standard for the format specification, but a
huge variety of slightly different formats, which are not compatible to each other. In our
contribution we discuss the state of the art of rayfiles and propose a new generalised format
which could serve as a future new standard.
The array projector: Breaking Scheimpflug´s rule
S. Fischer*, M. Sieler*, P. Schreiber*, P. Dannberg*, *Fraunhofer-Institut für Angewandte Optik
und Feinmechanik IOF, [email protected]
State of the art projectors which use a single aperture for image forming require a certain
volume to provide a reasonable bright image. The developed ‘array projection’ technology
overcomes this constraint by using a multi-aperture design, consisting of two microlens
arrays for condensor and projection optics. Originally this method was used because it grants
a scalable flux by increasing only the lateral size of the projector. An important property of this
design is the large DOF of the individual channels. This ensures that images can be displayed
on inclined or curved screens only by using a specific distorting algorithm for the slide array.
Due to the extended depth of field this can be realized without considering Scheimpflugs
principle, which means tilting of slide and projection optics.
We introduce the theory as well as the design rules for the optics and slide pre-distortion.
Furthermore we present fabricated samples for the array projection on vertical, as well as
inclined screens.
12:15 – 13:30 Lunch
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Recent advances in autocollimator calibration and optimisation at the PTB
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R. Geckeler, O. Kranz, A. Just, M. Krause, Physikalisch-Technische Bundesanstalt, Braunschweig
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[email protected]
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Autocollimators (AC) are versatile optical instruments for the contact-less measurement of the
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inclination angles of reflecting optical surfaces. They are applied in optics, angle metrology,
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and precision engineering (form measurement of flat and aspherical optics, angular adjustment
of components, calibration of angle encoders and artefacts). A comprehensive overview of
the current status of AC characterisation, calibration, and optimisation at the PhysikalischTechnische Bundesanstalt (PTB) and its implications for practical applications are provided.
Information on the development of our Solid Angle Autocollimator Calibrator (SAAC) will be
presented. Its aim is to extend traceable angle calibrations from the plane to the solid angle
- which has not yet been realised by any metrology institute - and to calibrate the effects of
optical path length changes of the AC beam. Further topics include the ray-tracing modelling
of ACs, the realisation and experimental testing of novel phase-shifting reticles to improve AC
performance at small apertures down to 1.5 mm, algorithms for the evaluation of the reticle
image on the CCD, and THz ACs.
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Why can’t we purchase a perfect single shot 3D-sensor?
G. Häusler, C. Faber, F. Willomitzer, P. Dienstbier, Institute of Optics, Information and Photonics,
University of Erlangen-Nuremberg, [email protected]
Many high quality 3D-sensors are available. Surprisingly, there are no sensors at the market
that deliver „single-shot acquisition“ and at the same time measurement of „dense surface
data“ in 3D-space. „Single-shot acquisition“ means the option to get 3D-data within one
single exposure, which would allow for real time 3D-data acquisition of moving objects by
moving sensors. By „dense 3D-data“ we mean, that each pixel carries individually measured
distance information, neither interpolated from its neighbor pixels nor using any other kind of
lateral (bandwidth limiting) context information.
To our knowledge, a sensor that combines both features is not yet available. Why? Is such a
„pixel-dense single-shot 3D-camera“ possible at all? The discussion will reveal surprising
insights about information theoretical differences between optical 3D-sensing and 2D-imaging.
Understanding these differences and limits provokes thoughts about a novel sensor singleshot principle that may overcome the fundamental difficulty.
A comparison of the correspondence assignment quality between the fringe projection
and band-limited pattern projection method
M. Große, M. Schaffer, B. Harendt, R. Kowarschik, Institut für Angewandte Optik, FriedrichSchiller Universität Jena, [email protected]
In recent years, the need for rapid surface measurements has grown due to the availability of
industrial grade cameras with 1500 Hz (VGA resolution) at moderate cost. Due to the lack of
suitable projection devices, which are able to create high-quality illumination sequences at
this rate, we developed and presented a fast surface measurement scheme based on bandlimited pattern projection last year. In order to evaluate if the method is feasible for industrial
inspection a comparison to existing methods has been conducted. We compared the
achievable correspondence accuracy of the fringe projection plus gray code method to the
approach of a band-limited pattern sequence projection as well as to our approach of fixedpattern projection. The results of this comparison are discussed and the crucial parameters
for the illumination pattern design are given. Media will substantiate the results shown.
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Optimization of global accuracy on specular surfaces with a “Dual Core” 3D sensor
(SIM + µPMD)
Z. Yang, A. Bielke and G. Häusler, Institute of Optics, Information and Photonics, University of
Erlangen-Nuremberg, [email protected]
SIM has been proven as an incoherent microscopic 3D technology on technical surfaces that
may even compete with white light interferometry [1]. Height measuring uncertainties can be
achieved down to 10nm by choosing the optimal system parameters. However, as we extend
SIM to a larger field of view, the aberrations of the objective will introduce large space variant
systematic errors, which are dependent on the surface normal and cannot be easily calibrated.
This phenomenon is due to the coma and spherical aberration and critical on strongly curved
specular surfaces.
In order to compensate for these systematic errors, we have carried out a modelfree calibration
strategy, measuring the relationship between focus shift (Δx, Δy, Δz), pixel position (i,j) and
surface normal (θ,φ) for the given system. During realistic measurement, μPMD (micro Phase
Measuring Deflectometry) was incorporated into SIM to obtain the unknown surface normals
enabling us to calculate the corrective vectors. In this presentation we will show how the focus
shift depends on the third order aberrations and introduce the novel calibration strategy with
a „Dual Core“ 3D sensor (SIM+µPMD).
[1]Kranitzky, DGaO,A12,2009
A11
14:45
Motion compensation for three-dimensional measurements of macroscopic objects
using fringe projection
A. Breitbarth*, P. Kühmstedt*, G. Notni*, J. Denzler**, * Fraunhofer-Institut für Angewandte Optik
und Feinmechanik IOF, ** Fakultät für Mathematik und Informatik, Friedrich-Schiller-Universität
Jena, [email protected]
Fringe projection is an established method to accurately measure the 3d structure of
macroscopic objects. To receive a high accuracy and robustness at once there is need of
several images with different projection patterns. Over the sequence of these images it is
necessary that each 3d object point corresponds to the same image point at every time. This
situation is no longer given for measurement objects moving under the process of projection
and image acquisition.
To solve this problem we propose a method to realign the captured images. Because of
different view angles over the measurement process this have to be done in 3d space.
Primarily our method is based on a kind of back projection of realigned sparse 3d point clouds
in the image planes as well as the projection plane. Therefore you need a well calibrated
measurement system and images without or only small motion blur. The 3d point clouds are
results of a single shot analysis like fourier transformation and realigned by ICP. Back
projection in the projection plane is necessary because of an unknown phase step between
two realigned images each. Overall our method results in a motion compensated dense
3d point cloud.
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Translation of speckle patterns for highspeed 3D shape measurements
M. Schaffer*, M. Große*, B. Harendt*, R. Kowarschik*, * Institute of Applied Optics, FriedrichSchiller-University Jena, Fröbelstieg 1, 07743 Jena, [email protected]
3D shape acquisition is a broad research field. Many approaches exist giving advantages for
special applications. In close-range scenarios like quality control, demanding highly accurate
reconstructions, stereophotogrammetry including structured illumination is the widely used
technique. It is able to achieve high relative accuracies (~1*10-4). Such high relative accuracies
are reached by projecting many patterns, typically about 50, for the illumination and therefore
the projection rate is an important factor considering highspeed acquistion. Our workgroup
developed several high speed approaches to overcome the projection limitation of commonly
used DLP projectors for structured illumination purposes. The idea of and the explanations in
this talk will cover a projection setup that uses objective laser speckles coming from a diffuser
that is illuminated by a laser. The propagating pattern is deflected by a rotating mirror and is
used for object illumination. Using highspeed cameras acquiring simultaneously shifted
speckle patterns on the object dense, accurate reconstructions of object scenes can be
created at ~ 200Hz. Media will substantiate the experimental results shown.
15:15 Posterpresentation/Coffee break
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ZERODUR® - Bending strength data for mechanically loaded support structures
P. Hartmann, SCHOTT AG, [email protected]
The request for ZERODUR® substrates enduring higher operational accelerations increases.
The integrity of structures such as wobbling mirrors, elements for satellites surviving rocket
launches and reticle and wafer stages in microlithography must be guaranteed with low failure
probability. Their design requires statistically relevant strength data. The approach using the
statistical two parameter Weibull distribution suffered from two problems. The data sets were
too small to obtain distribution parameters with sufficient accuracy and also too small to
decide on the validity of the model especially for the low failure probability levels that are
required for reliable applications. Extrapolations to 0.1 % failure probability led to design
strength so low, that higher load applications seemed to be not feasible. New data have been
collected with numbers per set large enough to enable tests on the applicability of the three
parameter Weibull distribution, which delivers a threshold value for breakage stresses.
The data and distributions for several practically relevant surface conditions of ZERODUR will
be given and consequences on the strength design of substrates will be discussed.
Bulk Laser Damage Threshold of Optical Glasses
R. Jedamzik, V. Dietrich, T. Roßmeier, SCHOTT AG, [email protected]
Modern pulsed laser applications cover a broad range of wavelength, power and pulse widths.
Beam guiding optics in laser systems do not only have specific requirements on the imaging
quality but also have to withstand high laser powers. The laser damage threshold of an optical
component depends on the surface (polishing, coating ..) but also on the bulk material
properties. Actual values of bulk laser damage thresholds of optical glasses are rarely found
in literature, except for fused silica which is known as a key optical material for components in
high power laser. Nevertheless, the material is rather expensive and limited in optical
properties. That is the reason why customers often ask for laser damage threshold data of
optical glasses. Therefore SCHOTT has started a project for the characterization of the bulk
laser damage threshold of optical glasses over the wavelengths 532 nm and 1064 nm with
pulse lengths in the nano- and pico-second range. In this presentation the measurement
approach will be described and first results will be presented.
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Optical Materials
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Solarization of Optical Filter Glass
R. Biertümpfel, A. Engel, S. Reichel, SCHOTT AG, Mainz, [email protected]
Solarization - the change in transmission due to strong UV light - is an undesired reaction in
several optical materials. However this effect is more dominant in plastic materials and
although the majority of glasses are inert to solarization, there are some glasses that are
sensitive to UV radiation. The solarization effect is very much dependent on the compounds
of the glass and the effect is different for any glass types. The functionality of optical filter
glass („color glass“) relies on the stability of transmission spectrum in order to filter the
desired wavelength. Therefore the transmission spectrum needs to stay unchanged despite
UV light illumination or it dependency needs to be known beforehand.
Extensive investigations at several optical filter glasses regarding solarization were performed
by SCHOTT. Now SCHOTT is able to give a guideline for the effect of solarization in optical
filter glass. An overview for several optical filter glasses and its dependency on solarization is
given.
International Comparison of Refractive Index Measurements
A. Fricke , M. Schulz, Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116
Braunschweig, Germany, [email protected]
The refractive index of glasses is an important measurement quantity. Uncertainties in the
visible range of 1E-5 to 1E-6 are reported. To guarantee traceability, it is important to compare
the different measuring systems. A new international comparison with PTB as pilot laboratory
has been initialized. Participants are national metrology institutes and optics companies and
new participants are welcome.
A former high accuracy comparison with 13 participants ten years ago was based on prismatic
samples, since the “minimum deviation method,” which uses prisms in the orientation of
minimum beam deviation, reached the lowest uncertainty. For this comparison prisms were
circulated among the participants.
For the new comparison, also glass blanks can be specimen, which the participants have to
process. Thus the manufacturing of the prisms (e.g. surface quality), which can influence the
uncertainty, is included.
The concept of the international comparison and the highly accurate refractive index
measuring setup of PTB will be presented and the different influence quantities will be
discussed with a special view to the demands of this new ‘ab initio’ refractive index comparison.
[1] A. Walther, „The Ray and Wave Theory of Lenses“, Cambridge University Press, 1995
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Growth and optical characterization of GaN nanorods covered with InGaN multiple
quantum wells
M. Heilmann*, **, C. Tessarek**, S. Christiansen**, M. Pfeffer*, * Fakultät Technologie und
Management, University of Applied Science Ravensburg-Weingarten; ** Photonic Nanostructures,
Max Planck Institute for the Science of Light, [email protected]
The tunable and direct band gab, ranging from 3.4 eV (GaN) to 0.7 eV (InN) depending on the
indium content, makes InGaN interesting for high efficient optoelectronic devices in the visible
spectra of the light. However strain between the substrate, such as sapphire or silicon, and
the InGaN layer causes defects in the lattice which reduce the optical performance of the
material. An advantage of nanorods compared to 2D layer is that the extent of those strain
compensating lattice defects is smaller due to elastic strain relaxation at the free surfaces of
the nanorods. In this talk the self-organized, and therefore mask-free, growth of core-shell
nanorods by metal-organic vapor phase epitaxy on (0001) sapphire will be presented. The
optical properties of the nanorods, consisting of a GaN core and a shell of InGaN multiple
quantum wells, have been characterized by cathodoluminescence.
15:15 Posterpresentation/Coffee break
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Optical Materials
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Interferometric Homogeneity Test using Adaptive Frequency Comb Illumination
K. Mantel*, J. Schwider**, * Max Planck Institute for the Science of Light, Erlangen; ** Institute of
Optics, Information, and Photonics, University of Erlangen-Nürnberg, [email protected]
Homogeneity tests require the separation of refractive index variations of glass plates from
surface deformations or geometrical thickness variations. This separation requires a
combination of reflected and transmitted light tests within an interferometer cavity. For the
measurement in transmitted light, however, this leads to a nested cavity setup. To separate
the interference signals from the different cavities, we illuminate a Fizeau interferometer with
an adaptive frequency comb, where the illuminating laser source has been replaced by a
broad band light source with a spectral comb structure [1]. In this way, rigid glass plates can
be measured, and linear variations in the homogeneity can also be detected. Compared to
approaches using a two-beam interferometer as a filter for the broad band light source, the
visibility of the fringe system is considerably higher.
[1] I. Harder, G. Leuchs, K. Mantel, J. Schwider, “Adaptive frequency comb illumination for
interferometry in the case of nested two-beam cavities”, Appl. Opt. 50, p.4942-4956 (2011)
A14
17:15
Interferometric frequency stabilization for tunable lasers with very high accuracy
verified by means of a frequency comb
Th. Kinder*, Th. Müller-Wirts*, H. Brachmann**, K. Dieckmann***, * TEM Messtechnik GmbH,
Hannover; ** Max- Planck-Institut für Quantenoptik, Garching; *** Centre for Quantum
Technologies, National University of Singapore, [email protected]
The application of tunable single-frequency lasers often requires the measurement and
stabilization of the frequency with high accuracy, e.g. for spectroscopy, distance measurement
and so on. In an earlier DGaO conference we presented an interferometric method for laser
locking, which uses the phase difference between a quadrature interferometer signal and
some arbitrary computer-generated quadrature signal as an error signal. The latter is fed back
to the laser in control loop, in order to keep the optical frequency stable. As the method can
stabilize to an arbitrary target frequency in a wide range of several hundred nanometers, it
was a challenge to specify the absolute uncertainty of the actual laser frequency for the whole
range. This was now done using an optical frequency comb generated by a fiber laser. As a
result, the deviation of the observed beat frequency between the locked laser and the comb
to the postulated value was less than 1.6MHz RMS (maximum 6MHz) in a range of 750 to
795 nm. We also mention the calibration procedure which led to this high accuracy.
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Stitching errors in diffractive nulltest elements
A. Berger*, I. Harder**, V. Nercissian*, K. Mantel**, N. Lindlein*, * Chair of Optics, University
Erlangen, ** Max Planck Institute for the Science of Light, Erlangen, [email protected]
For a nulltest of aspheric lenses diffractive optical elements (DOEs) can be used as they offer
the freedom of design to adapt easily to the desired sample under test.
Like every other component in the measurement setup they introduce systematic errors to the
measurement. The main error sources concerning the phase of the DOE are the aberrations
of the substrate and the structure distortion due to the lithography machine used for fabricating
the DOE.
Here, a x-y direct writing lithography, where the exposure is done stripewise, was used to
fabricate amplitude DOEs of a spherical lens. A local pattern distortion due to the stitching of
the stripes and a global distortion due to errors of the global coordinate system could occur.
The DOEs were characterized by an absolute test in a Mach-Zehnder Interferometer. A study
concerning global and local distortions of the DOE pattern was performed.
Two-step phase-shift-interferometry with arbitrary reference waves
N. Sabitov, D. P. Kelly, S. Sinzinger and T. Meinecke, Fachgebiet Technische Optik, Institut für
Mikro- und Nanotechnologien (IMN-MacroNano®), Technische Universität Ilmenau
[email protected]
The two step phase-shifting interferometry is a challenging technique for many on-axis
holographic applications. The significant advantage is the high dynamic and lateral resolution.
Practically it is possible to reconstruct the initial complex wave signal with the resolution of the
matrix detector (pixel wise). In this contribution we assume an analytical generalization of the
two-step-phase-shifting algorithm. The suggested method is similar to the solution of Meng
et al.(Opt. Lett. 31(10), 1414-1416, (2006)) but operates with two reference waves arbitrary in
phase and amplitude. Because of the complexity of the analytical expressions a graphical
method for solving the duality problem is proposed. The simulation of the reconstruction
process shows the reliability of the method.
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Application of a Fabry-Pérot-Interferometer for multi-point flow measurements
R. Schlüßler*, A. Fischer*, L. Büttner*, J. Czarske*, * Professur für Mess- und Prüftechnik,
Technische Universität Dresden, [email protected]
Spectroscopic methods enable flow velocity measurements by analysis of the Doppler
frequency shift. Usually the conversion of the frequency shift into an intensity variation is
accomplished via a molecular absorption cell. There is the will to solve this function
interferometrically by a Fabry-Pérot-Interferometer (FPI), since FPI provide sharper slopes,
hence a higher sensitivity. Still there is no limitation to a special wavelength. In common
systems for astronomical Doppler frequency measurement the telecentric setup with very low
Numerical Aperture (NA) is employed. In contrast, for an imaging measurement of a technical
flow a high NA is necessary, which requires a different setup.
The article deals with the dimensioning and realization of a multi-point measurement system
using a plane-parallel FPI in the collimated setup. Especially the complementarity between
detectable stray light power and edge steepness of the transmission characteristic is outlined.
Building on that, an estimation for the minimum approachable uncertainty of the frequency
determination is presented and compared to measurement results. Consequently a first
measurement with FPI on a technical flow is shown.
Vibration measurements of rotating objects by a novel interferometric technique
J. Czarske, P. Günther, R. Kuschmierz, T. Pfister, L. Büttner, Institut für Grundlagen der Elektro­
technik und Elektronik, TU Dresden, [email protected]
The precise vibration and displacement measurement of fast moving solid objects is an
important task both in process control and production engineering. A lot of measurement
techniques are available, but their distance uncertainty at fast rotating objects is often not
sufficient. The interferometric evaluation of the phase difference of two scattered light signals
in principle allows precise velocity and distance measurements of high-speed objects.
However, the speckle effect at rough surfaces usually results in systematic deviations.
Recently, a new concept has been developed, which successfully suppresses these deviations
resulting in a measurement uncertainty of only 110 nm. This novel interferometric phase
sensor has been applied successfully to vibration measurements at vacuum pumps (48000 rpm,
surface velocity of 23 m/s) and to diameter measurements of rotating workpieces in a lathe.
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Double tailoring of freeform surfaces for off-axis aplanatic systems
A. Hofmann*, J. Unterhinninghofen*, A. Timinger**, H. Ries*, *OEC AG, Lindwurmstr. 41, 80337
München, Germany, **Philips Lighting GmbH, Philipstr. 8, 52068 Aachen, Germany (formerly at
OEC AG), [email protected]
The optical design of freeform surfaces is particularly demanding due to the inherently large
number of degrees of freedom. Therefore the technique of tailoring
optical freeform surfaces (mirrors or lenses), which is based on solving the underlying
differential equations, is routinely used in non-imaging optics to efficiently achieve predefined
light distributions.
Tailoring can also be employed in for imaging optics: an optical freeform surface can be
tailored such that one condition is exactly fulfilled - i.e. spherical aberration at a specific point
is corrected. Recently, we extended this method such that two freeform surfaces can be
tailored at the same time (double tailoring). This gives the freedom to impose a second
condition and thereby allows for instance to simultaneously correct spherical aberration and
satisfy the sine condition.
As an example for a tailored off-axis aplanatic system we show a head-up display (HUD)
consisting of two simultaneously tailored freeform mirrors.
Towards a continuous data chain for optics design, manufacturing, and tolerancing
of free-form optics
J. Unterhinninghofen*, S. Junginger, A. Hofmann*, A. Timinger**, *OEC AG, Lindwurmstr. 41,
80337 München, Germany; ** OEC AG, Lindwurmstr. 41, 80337 München, Germany, presently
at: Philips Lighting GmbH, Philipstr. 8, 52068 Aachen, Germany, [email protected]
Free-form optics can provide unique functions for illumination systems. In many applications,
free form elements provide high efficiency while yielding well prescribed lighting functions.
They are usually manufactured by reproduction techniques, such as injection moulding of
plastic; the process chain from optics design to construction, injection moulding, quality
control and back to optics design and simulation for tolerancing generally links many partners.
Along this process chain, data has to be transferred between different partners – which is
often inefficient, as standards for data formats and free-form tolerances are lacking in
illumination optics. In the research project DesiChain (funded by the BMBF) we develop an
approach to combine information from optics design, mechanical construction, manufacturing
and testing into one continuous data chain, which is based on a single base data set
unchanged throughout the chain. Using this approach, conversion errors can be minimised
and quality control and tolerancing are simplified: i.e., it is possible to directly transfer
measured shape deviation patterns to the surface(s) from optics design for simulation and
analysis.
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Parabasal field decomposition and its application to non-paraxial field propagation
D. Asoubar*, S. Zhang*, F. Wyrowski*, M. Kuhn**, *Friedrich-Schiller-Universität Jena, MaxWien-Platz 1, 07743 Jena; **LightTrans VirtualLab UG, Kahlaische Straße 4, 07745 Jena
[email protected]
We propose a parabasal field decomposition of non-paraxial fields, which enables various
operations on such fields which are otherwise not feasible because of too high numerical
effort. It is useful to distinguish between two basic cases of non-paraxial fields:
1) The field can be sampled without problems in the space domain but it is very divergent
because of small features. A Gaussian beam with large divergence is an example. In this case
the propagation of the field typically causes too high numerical effort and is not feasible.
2) The field possesses a smooth but strong phase function, which does not allow its sampling
in space domain. Spherical, cylindrical and astigmatic waves with small radius of curvature
are examples. In this case all operations which require a field sampling cannot be applied. For
both cases a parabasal field decomposition is suggested which overcomes the problems. By
separating linear phase factors from the parabasal fields the sampling effort is reduced
drastically. This technique is applied to propagate non-paraxial fields.
Tilt operator for harmonic fields and its application to propagation through plane
interfaces
S. Zhang*, D. Asoubar*, F. Wyrowski*, M. Kuhn**, Friedrich-Schiller-Universität Jena, MaxWien-Platz 1, 07743 Jena; **LightTrans VirtualLab UG, Kahlaische Straße 4, 07745 Jena
[email protected]
The propagation of harmonic fields between non-parallel planes is a challenging task in
optical modeling. Many well-known methods are restricted to parallel planes. However, in
various situations a tilt of the field is demanded, for instance in case of folded setups with
mirrors and tolerancing with tilted components. We propose a rigorous method to calculate
vectorial harmonic fields on tilted planes. The theory applies a non-equidistant sampling in
the k-space of the field before rotation in order to obtain an equidistant sampling of the rotated
field. That drastically simplifies the interpolation challenge of the tilt operation. The method
also benefits from an analytical processing of linear phase factors in combination with
parabasal field decomposition. That allows a numerically efficient rotation of any type of
harmonic fields. We apply this technique to the rigorous propagation of general harmonic
fields through plane interfaces. If the field is known on the interface a fast algorithm results
from a plane wave decomposition of the field. However in general, the field is not known on
the interface. Then a rotation operator must be applied first.
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Photonic integrated circuit simulations that incorporate physical device effects
B. Michel*, J. Pond**, J. Klein**, *Hembach Photonik GmbH, Rednitzhembach, Germany
**Lumerical Solutions, Inc., Vancouver, Canada, [email protected]
We will demonstrate the simulation of photonic integrated circuits, both in the time and
frequency domains, initially using idealized models for each element of the circuit. The results
of physical electromagnetic and electrical solvers will then be incorporated to simulate
physically realistic photonic integrated circuits. The performance of an electro-optical MachZehnder modulator will be considered and we will show how the simulated electrical and
optical properties of each element affect the performance of the entire circuit. The elements
considered include input/output couplers, tapers, waveguides, bends, waveguide couplers,
and a voltage dependent phase delayed waveguide. The physical effects considered include
waveguide dispersion, multi-mode and multi-polarization effects, modal mismatch, reflections,
and losses as well as charge accumulation and its impact on waveguide properties. The
impact of non-ideal properties for each element, calculated by physics based solvers, will be
assessed through its effect on relevant photonic circuit performance measurements such as
the eye diagram.
Automated pre- and post processing of optical simulations using the Python scripting
language
M. Kroneberger, B. Michel, R. Hermann, Hembach Photonik GmbH, [email protected]
Optical simulation tasks such as illumination system design or straylight analysis are normally
performed using commercial raytracers. While the latter are excellent for predicting the
performance of optical systems, they are often pushed to their limits, if huge amounts of input
and output data need to be handled, if system geometry variations have to be computed or if
the data analysis is non-standard.
Splitting the task into the input/output data management and the optical simulation itself can
help. We implement the first using the standard scripting language Python as a “server”. The
latter is performed by the raytracer, which acts as the “client” and appears to the server only as
a black box. Because the raytracer is reduced to its basic functionality, the different software
products become more or less interchangeable.
Clever interfaces on the server-side solve many optical problems almost independently of the
underlying client. In the talk, an example is shown where we perform an optimization of an
illumination system using ASAP (Breault Research Organization) as the client.
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Optical Systems for Lithography
H. Feldmann, Carl Zeiss SMT GmbH, Oberkochen, [email protected]
One of the cornerstones for the tremendous success of microelectronics is the continuous
advancement of optical lithography. Optical systems for illumination and projection of IC
patterns have been developed to meet several reductions of projection wavelength, increases
in numerical aperture, and the introduction of immersion optics. Today techniques like double
patterning are being used to reduce the dimensions of electronic devices to below the optical
resolution limit. These techniques further increase the demand on optics regarding wavefront
control, image placement, and illumination variability. Currently the leading IC companies are
preparing the transition to mirror based EUV systems, which is the largest change in the
history of lithography optics.
A stream of innovations enables optical lithography to meet those demands and to maintain
its position as the predominant structuring technology for the foreseeable future. The
innovations involve several areas like e.g. system layout, optical and mechanical design, as
well as optical metrology, optics production, and coating technology.
We will sketch the development of optical systems for lithography and observe how increasing
demands are driving new design principles, all the way from DUV optics to high NA EUV
projection systems.
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9:00
Diamond machining of aspherical and freeform mirrors
S. Risse, S. Scheiding and R. Eberhardt, Fraunhofer Institut for Applied Optics and Precision
Engineering, Albert-Einstein-Str. 7, 07745 Jena / GERMANY, [email protected]
The fabrication of metal mirrors with aspherical surface or freeform is increasingly discussed
by optical community. The technical advancements allow a high accuracy in freeform
manufacturing. Another enabler is the implementation of freeform elements into modern
optical design tools. Diamond machining like turning or milling are ultra-precise techniques
especially for the fabrication of metal mirrors. With the development of diamond machines in
the early 1970s diamond turning became an accepted manufacturing approach for the
fabrication of rotational symmetrical optics, such as flats, spheres and aspheres for IRapplications. Applications in the VIS or UV spectral range require outstanding form and
roughness. Therefore, post-polishing and post-figuring processes are applied on amorphous
coatings on thermally matched mirror substrates.
Modern servo-assisted techniques allow the fabrication of off-axis mirrors in the center of the
turning axis. The expected benefits are reduction of the surface shape deviation coming from
centrifugal force and the chance to correct non-rotationally symmetric errors. Referring to
this, the manufacturing of reference marks and interfaces are mandatory for measurement
and integration. A hybrid fabrication process comprising a diamond freeform turning and a
diamond milling in one and the same ultra-precision setup for manufacturing of freeform will
be presented.
9:30 - 10:00 Coffee break
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Optical Lithography
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Manufacturing Technology
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Room A
A19
10:00
Global map of possible lens design shapes for simple optical systems
P. van Gro, *, T. Liebig**, M. van Turnhout*, F. Bociort**, * Optics Group, TNO; ** Optics Research
Group, Delft University of Technology, [email protected]
The choice of a starting system is one of the main difficulties in optical system optimization
due to the presence of multiple local minima in the merit function landscape. During the
design process an optical designer often does not have a global overview of which stable
local minima are present in the merit function landscape.
At least for relatively simple systems we found a robust network structure that contains all lens
design shapes (i.e. types of local minima) that can exist in the merit function landscape,
including their connections with respect to each other.
We will present the so-called ideal network for doublets and triplets which contains the
general design shapes, individually separated by saddle points. In practical problems, some
minima disappear and the set of existing local minima appears to be a subset of the maximum
set present in the ideal network. Remarkably, the network of the remaining solutions is closely
related to the ideal network. Therefore, knowledge about the structure of the merit function
landscape can help the designer to navigate through the design space for improving the
design.
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A20
10:15
Saddle Point Methods in Global Optimization of Complex Optical Systems
T. Liebig, P. van Grol, F. Bociort, Optics Research Group, Delft University of Technology
[email protected]
Global optimization in optical design is a challenging task, especially with complex optical
systems with large numbers of variables e.g. sophisticated multilayer structures or imaging
systems with advanced surface profiles. We will report on the methods saddle point detection
and saddle point construction that are developed at TU Delft, in order to improve the global
optimization of such complex optical systems. These methods are used both to solve distinct
design problems and to provide a more general insight in the structure of the solution space
by means of a systematic analysis in order to improve the optimization process of similar
design tasks. The discovery of the network of the positive triplet lens system is one milestone
of this approach. Also the reduction of the number of variables in lithographic systems i.e.
individual lenses or surface parameters, while maintaining or even exceeding the performance
of the initial designs will be discussed. Moreover, the presented optimization methods are
conceptually not limited to applications in optical design, but are in general applicable to
global optimization problems.
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Optical Design for Lithography Applications
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Room A
A21
10:30
Challenges of ZOOM - microscopy
J. Sprenger, R. Wartmann, Carl Zeiss MicroImaging GmbH, [email protected]
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One of the most important features of compound microscopy is the perfect pupil fit of
illumination systems and objectives. This advantage enables the compound microscopy to
use many different kinds of contrasting methods. In the field of ZOOM - microscopy the fit of
Illumination to imaging systems is not the best and because of this the use of contrasting
methods is much more complicated. An other big challenge is the design of objectives for
ZOOM - microscopy. A compound objective matches perfectly to a defined object size and a
settled numerical aperture. But an objective for ZOOM - microscopy must meet the object
size and the numerical aperture for many different ZOOM - positions. Therefore such an
objective must be much stronger than one for compound microscopy. But despite of all
challenges ZOOM - microscopy is very attractive because of some unique features. Especially
one can change the magnification continuously while the object of interest remains in focus
and at the centre of view for all the time. This is the biggest advantage of ZOOM - microscopy.
Color Corrected Optics for Multi-Wavelength White Light Interferometers
E. Langenbach*, G. Franz**, *FISBA OPTIK AG, St. Gallen; **Robert Bosch GmbH, Stuttgart
[email protected]
Interferometers with short coherence length light sources show white light interference
patterns only if the group delays are equal for the different paths in the optical system. When
white light interferometry is combined with multi-wavelength interferometry in the same
instrument, its optical system requires a special color correction: In addition to the conventional
color correction, which reduces the wavelength dependence of the normal aberrations, the
balancing of the group delays is necessary. The sum of the group delays of all components in
each path may still depend on the wavelength, but it must be the same for the different paths.
In the air spaces the group delay is independent of the wavelength, and for visible light the
group delay decreases with increasing wavelengths for all usual optical glasses. In the infrared
materials with both signs of the dispersion of the group delay are available. With a careful
selection of crown and flint glasses the normal color correction and the delay of the group
delay can be achieved simultaneously.
11:00 - 11:15 Coffee break
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Optical Design for Lithography Applications
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Room B
B19
10:00
Hybrid Beam Shapers - Compound Design and Integrated Fabrication Techniques
R. Kleindienst, R. Kampmann, S. Stoebenau, S. Sinzinger, Fachgebiet Technische Optik, Institut
für Mikro- und Nanotechnologien (IMN-MacroNano®), Technische Universität Ilmenau
[email protected]
Progress in the development of micro machining techniques allows the fabrication of a wide
range of surface shapes at highest precision. However, every fabrication approach is restricted
either by technological or economical boundary conditions. Thus the realization of complex
optical surfaces composed of features from several microns to millimeters demands the
combination of different machining modes. In our contribution we present a highly flexible and
precise integrated machining of a reflective hybrid freeform beam shaper offering beam
deflection, transformation and splitting capabilities. For this purpose we combined ultraprecision micro milling, to realize the reflective basic shape, and direct ps-laser ablation, to
produce exactly aligned diffractive structures. In combination with a compound optical design
procedure this allows for integrating numerous optical functionalities within fewer surfaces.
This means a huge potential for miniaturization and the reduction of alignment sensitivity of
optical systems. The suitability of the applied fabrication and design approach is verified by
experimental investigations of the optical performance and profilometric measurements.
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B20
10:15
Aktive, strahlhomogenisierende Optik für die applikationsangepasste Lasermateria­
lbearbeitung
O. Pütsch*, P. Loosen * **, * Lehrstuhl für Technologie Optischer Systeme TOS, RWTH Aachen
University; ** Fraunhofer-Institut für Lasertechnik ILT, Aachen,
[email protected]
In der Lasermaterialbearbeitung führt die Abbildung der von der Laserstrahlquelle i.d.R. erzeugten gaußförmigen Intensitätsverteilung zu einer Überschreitung der max. zulässigen
Energie im Zentrum der Wechselwirkungszone. Eine übermäßige Erwärmung des Materials
führt zur Zerstörung der Werkstoffstruktur und zu Qualitätseinbußen beim Arbeitsergebnis.
Durch die Verwendung facettierter Optiken lässt sich die Gaußverteilung homogenisieren und
eine gleichmäßige Energieeinbringung in der Bearbeitungszone realisieren. Die zunehmende
Varianz der Prozessbedingungen durch unterschiedliche Brennfleckgeometrien und Materia­
lien stellt zudem Anforderungen an das optische System, sich aktiv an den Bearbeitungsprozess
anzupassen. Für die Lasermaterialbearbeitung mit CO2-Lasern wird eine Optik entwickelt,
welche in der Bearbeitungszone eine rechtecksymmetrische homogene Intensitätsverteilung
erzeugt. Durch die Verwendung ausschließlich reflektierender optischer Komponenten wird
auf Halbleitermaterialien verzichtet. Die Integration von positionsgeregelter Linear- und
Rotationsaktorik ermöglicht durch Verstellung des Strahlengangs eine unabhängige zweidimensionale Skalierung der Brennfleckgeometrie.
56
Manufacturing Technology
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Room B
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10:30
Polishing of illumination optics with CO2 laser radiation
A. Richmann*, Dr. E. Willenborg**, Dr. K. Wissenbach**, * RWTH Aachen; ** Fraunhofer Institut für
Lasertechnik, [email protected]
Polishing of illumination optics with CO2 laser radiation - Polishing of optical components with
CO2 laser radiation is a current research topic at the Fraunhofer ILT. The laser radiation is
guided on the surface of the glass and due to the high absorption of the laser radiation in the
material the temperature rises. The viscosity is lowered and the glass can flow. Due to the
surface tension the surface is smoothened. With this polishing technique the micro roughness
can be efficiently reduced in the sub-nanometer regime while the form deviation is below 1 µm
for a 25 mm diameter lenses. This form deviation is sufficient for lightning app
cations. The micro roughness of the laser polished optics is very low so that e.g. the
transmission of the optics can be increased. The processing time is with less than 10 s for a
whole lens of 25 mm diameter very short compared to conventional techniques. This process
is suitable for different glass materials e.g. BK7 and Floatglass. To prevent thermal damage
while polishing the glass is preheated to the glass transition temperature. The glass can be
annealed after to reduce thermal tensions but this is not always necessary.
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10:45
Laser Power Stabilization for Improved Ablation Depth Uniformity
R. Kampmann, R. Kleindienst, F. Rose, N. Hartung, M. Naglatzki, S. Sinzinger, Technische Universität Ilmenau, [email protected]
Due to low heat deposition into the surrounding material, ps-lasers are well suited for a precise
ablation of micro structures. However, to obtain constant removal rates the laser parameters
as well as the environmental conditions need to be kept stable. For our investigations we used
a frequency tripled ps-laser operating at 355 nm. Without any additional power stabilization
system, long term micro structuring processes of OFE-copper typically resulted in depth
variations of about +/- 10 % which are strongly correlated with detected laser power
fluctuations. The developed system for laser power stabilization takes advantage of the linear
polarized radiation of our laser source. With a fast photoelectric detector the power fluctuations
are measured. A specifically designed feedback control system turns a half wave plate
mounted in a piezo driven rotation stage to decouple fluctuating power fractions via a
polarizing beam splitter. We demonstrate a nearly constant laser power at the work piece.
Substantially improved ablation depth uniformity is verified by a profilometric analysis of
directly ablated diffractive structures.
11:00 – 11:15 Coffee break
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Manufacturing Technology
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Room A
A23
11:15
Highly accurate surface reconstruction for deflectometry
W. Li*, J. Burke**, *Vereinigte Elektronik-Werkstätten GmbH (VEW), Bremen, **Bremer Institut für
Angewandte Strahltechnik GmbH (BIAS), [email protected]
Deflectometry utilises the deformation of a sample pattern after reflection from a test surface
to infer the surface normals. The absolute surface is reconstructed through integration of the
slope data, at which small systematic errors can add up to significant shape deviations. In
addition, the reconstruction problem is not unique: there are infinitely many solutions that
satisfy a given field of surface normals.
Therefore, the reconstruction must be constrained by extra information. We have previously
presented the use of a confocal distance sensor to obtain a valid starting point for the
integration (http://www.dgao-proceedings.de/download/112/112_a2.pdf), whose uncertainty
was then taken to be zero.
Further improvement is possible when the approximate shape of the measured surface is
known. The starting point is then allowed to be altered by using surface reconstruction results.
In certain cases, this method even allows finding the distance if it cannot be measured.
Once the starting datum has been set, an unconstrained algorithm reconstructs the surface,
and for a 200-mm telescope mirror the deflectometric data agree to within 1 µm with a tactile
shape measurement.
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A24
11:30
Fully automated form and radius measurement of microoptic components based on
Shack-Hartmann sensor technology
I. Erichsen, A. Ruprecht, TRIOPTICS GmbH, [email protected]
The form measurement of micro-optic components is a big challenge due to the increasing
complexity of the surfaces and the demand of short measurement times. The often aspheric
surfaces sometimes inherit a large slope angles near the outer diameter. One possibility to
measure the form of this kind of lenses is given by the measurement of the wavefront reflected
on the sample surface. Large slope angles can be measured by illuminating the sample with
a spherical wavefront. The topography is measured relative to a basic sphere with a radius
which has to be determined additionally.
We present a fully automated measurement system based on a Shack-Hartmann sensor in
reflection mode. This setup enables to measure topography and base radius of the lens
surface within a short measurement time. Measurement principle and limitations are
discussed in this talk.
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Deflectometry and Aspheres
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Room A
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11:45
Compact PMD measurement and PSF reconstruction for large mirrors
R. Krobot*, C. Faber*, E. Olesch*, A. Wörnlein**, A. Schulz***, F. Stinzing**, J. Bähr***, C. Stegmann***, C. van Eldik**, G. Häusler*, * Institute of Optics, Information and PhotonicsUniversity of
Erlangen-Nuremberg; ** Erlangen Centre for Astroparticle Physics (ECAP)
University of Erlangen-Nuremberg; *** DESY, Zeuthen, [email protected]
Phase measuring deflectometry (PMD) is currently used to inspect the astronomical mirrors of
the Cherenkov Telescope Array (CTA). In this project, about 10,000 mirror tiles will be mounted
on the telescopes. For a 100% test, certain requirements regarding the spatial extent of the
PSF have to be fulfilled. Due to the large radius of those mirrors (~33 m), it is not possible to
measure the PSF directly within the limited space of a laboratory. We implemented a PMD
sensor with a footprint 4 x 3 x 2 m3 which fits into the existing climate chamber. Moreover, this
technique allows the reconstruction of the PSF for a real case scenario (the light source in
infinity and off-axis) which is not possible for direct PSF measurement (the point like source in
2f and on-axis).
We will present our PMD solution and discuss how to optimally reconstruct the PSF from
stitched spatially resolved data. Additionally, results for different mirror types and environmental
conditions will be presented.
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12:00
Measurement of Off-Axis Parabolic Prisms
C. Brüggemann, FISBA OPTIK AG, St. Gallen, Schweiz, [email protected]
It is well known that Off-Axis Parabolic Surfaces are offering the advantage of an unobstructed
aperture, giving access to the focal plane in system designs. They often can provide the most
cost effective answer with no compromise in performance because they produce perfect
images for infinite-conjugate off-axis points.
But it always appears to be difficult to measure the surface shape of such an optical element.
To qualify the optical performance of an Off-Axis Parabolic Prism FISBA OPTIK has been
developed a two stage test.
The first test is the fully sized measurement of the surface deviation of the Off-Axis Parabola.
This is done by using an interferometer together with intelligent software which allows
analysing weak aspheric surfaces.
The second test inspects the function of the whole optical system. For this we are using a
digital microscope which measures the extent of the focal spot generated by the Off-Axis
Parabolic Surface.
Both measurements are presented exemplary.
12:15 Lunch
13:30 Excursion
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Deflectometry and Aspheres
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Room B
B23
11:15
Perfect blazing with echelle gratings in Littrow mount
B. H. Kleemann, Carl Zeiss AG, Corporate Research and Technology, 73447 Oberkochen
[email protected]
Perfect blazing with echelle gratings in a high order Littrow mount exists simultaneously in TE
and TM polarizations /1/. This finding contradicts with a heuristic explanation as why perfect
blazing is not possible simultaneously in TE and TM polarizations given in (E. G. Loewen and
E. Popov, Diffraction Gratings and Applications, New York: Marcel Dekker (1997)). As a matter
of fact, in the ideal case of infinite conductivity, light is diffracted in the Littrow order with
100% efficiency for both polarization states. For metal gratings a small loss occurs. Three
conditions are necessary for perfect blazing. The most intriguing property is the blaze angle
being 4° to 6° larger than the Littrow angle. Typically the difference between the two angles is
smaller than 1.0°. The ingredients for perfect blazing are shown and its behaviour and further
conditions are discussed.
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/1/ Bernd H. Kleemann, „Perfect blazing with echelle gratings in TE and TM polarization“, Opt.
Lett., accepted for publication.
B24
11:30
Laser direct writing of diffractive structures on curved surfaces
M. Häfner, R. Reichle, C. Pruss, W. Osten, Institut für Technische Optik (ITO), Universität Stuttgart, Pfaffenwaldring 9, 70569 Stuttgart, Germany, Stuttgart Research Center of Photonic Engineering (SCoPE), Universität Stuttgart, Pfaffenwaldring 9, 70569 Stuttgart, Germany
[email protected]
Laser direct writing is a valuable tool for the fabrication of binary and grey scale diffractive
structures. In the past genuinely hybrid elements, i.e. elements with surfaces that combine the
refractive and diffractive approach, have proven to be very attractive for a wide range of
applications. However, the production of such structures with high accuracy is a challenge. In
this contribution we present a versatile laser direct writing system for the fabrication of such
diffractive structures on curved substrates. Our system makes use of a non-perpendicular
exposure technique. We will address the challenges implicated by that writing method e.g.
tight focusing on the tilted surface.
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Microstructuring
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Room B
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11:45
LED-OASYS - Manufacturing of prototypes for illumination optics using an industrial
robot
A. Kelm, R. Boerret, HTW Aalen, [email protected]
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Illumination optics often are produced using injection-molding technologies. Before a design
is manufactured in high volumes the fabrication of prototypes is needed. Using an industrial
robot with an attached milling spindle enables a cheap and fast prototype production. The
advantages and limitations are discussed.
Replication of Monolithic Micro Structured Optics in Quartz Glass using a Sol-Gel
Process
R. Kleindienst*, M. Bär**, T. Kreuzberger**, S. Sinzinger*, *Fachgebiet Technische Optik, Institut
für Mikro- und Nanotechnologien (IMN-MacroNano®), Technische Universität Ilmenau, ** Silicaglas Ilmenau GmbH, [email protected]
Considerable investment costs due to complex single part production techniques are still a
major obstacle inhibiting the high volume application of high quality micro structured
(diffractive, hybrid) optics in quartz glass. We present a replication process which helps to
overcome this fundamental trade off. Initially developed for the production of extraordinarily
shaped laboratory quartz glass products a specific Sol-Gel process was adapted to meet the
demands of diffractive (monolithic) optics fabrication. Significant effort has in particular been
spent in the optimization of the minimum realizable feature size, the remaining surface
roughness as well as the feature shape, depth and width accuracy within the replicated
component. In our contribution we present the latest results at the example of binary diffractive
beam shaping diffusers possessing a minimum feature size of 2 µm and a surface roughness
(Ra) of less than 20 nm. Profilometric measurements and a characterization of the optical
performance show that the process is qualified for the fabrication of high quality micro
structured quartz glass optics.
12:15 Lunch
13:30 Excursion
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Microstructuring
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Blauwe Zaal
S1
08:30
Optical phenomena in nature
G.M.W. Kroesen, Eindhoven University of Technology, [email protected]
Optical phenomena are abundant in nature. Light sources all around: the sun, stars, lightning,
the Aurora, sprites etc. These light sources are all based on plasmas: ionized gases. When
electrons are accelerated in an electrical field, they can get enough energy to excite atoms
and molecules, which then emit photons. The trajectories of electrons and cosmic radiation
are altered if magnetic fields are present. This is visible as the moving light patterns near the
earth‘s magnetic poles. Thermal effect cause discharges in the atmosphere to contract into
lighting strikes.
In this lecture we will demonstrate, by performing gas discharge physics experiments in the
lecture room, the processes that lead to excitation, contraction, resonance, de-mixing and
moving under the influence of magnetic fields.
S2
09:00
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Beautiful phenomena in the skies: a colorful journey in the realm of atmospheric
optics
M. Vollmer, University of Applied Sciences Brandenburg, [email protected]
There is a multitude of fascinating beautiful phenomena in nature which is related to the
atmosphere.
These include for example mirages, rainbows, halos, glories, or coronas, but also auroras,
eclipses or the colorful skies with or without clouds from before sunrise to well after sunset.
The talk will shortly discuss the underlying physics, i.e. scattering and/or emission of light
from the constituents of the atmosphere, and then present a survey mostly with photographs
of such marvels in nature as seen from earth and partly also from space.
S3
09:30
All things bright and beautiful:
light and colour manipulation in biology
P. Vukusic, School of Physics. University of Exeter, Exeter, UK, [email protected]
The study of structural colour in biological systems is an exciting interdisciplinary research
area. Photonic bandgap (PBG) structures in many animals and plants suggest broad innovation
in nature’s use of materials to manipulate light. In certain butterflies long-range visibility of up
to one kilometre is attributed to nano- and micro-structures formed by discrete multilayers of
cuticle and air. This contrasts to other butterfly photonic structures designed for camouflage
that not only produce strong polarisation effects but also create additive colour mixing using
highly adapted geometries.
Optical systems also exist that employ remarkable 2D and 3D photonic crystals to produce
partial PBGs, with the effect that bright colour is reflected, or fluorescence emission is
inhibited, over specific angle ranges. From the perspective of optical technology, these
structures indicate a significant evolutionary step since they are potentially able to manipulate
the flow of light in all directions.
This lecture will present an overview of this field of study, as well as several of the exciting
recent discoveries that reflect nature’s optical design ingenuity.
10:00 – 10:30 Coffee break
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Symposium: Optics in Nature
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Blauwe Zaal
S4
10:30
Das Phänomenale im Alltäglichen - Optische Phänomene im Alltag
J. Schlichting, Universität Münster, [email protected]
Anhand von (physikalisch) einfachen Beispielen aus dem Bereich der Optik soll gezeigt werden, dass es in der meist fraglos hingenommenen Alltagswelt unerwartete, oft faszinierende
Phänomene zu entdecken gibt. Dazu muss man lernen, das Alltägliche aus einer unvertrauten
- physikalischen - Perspektive zu sehen. Denn oft übersehen wir gerade das, was offen vor
unseren Augen liegt.
Neben einigen Ergänzungen zu den wunderbaren Erscheinungen, die Alice hinter den
Spiegeln erlebt, werden auch Beispiele aus dem Bereich der Wellenoptik gegeben, die zeigen,
wie wenig aufgeschlossen wir für das Phänomenale im Alltäglichen sind. So wird u.a.
demonstriert, dass Quételetsche Ringe weit mehr sind als das Ergebnis eines verstaubten
Laborexperiments und nicht selten natürlicherweise in völlig verschiedenen Kontexten im
Alltag beobachtet werden können.
S5
11:00
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Visual illusions: brain and consciousness
K. Hamburger, Experimental Psychology and Cognitive Science, Justus Liebig University Giessen,
Otto-Behaghel-Str. 10F, 35394 Giessen, Germany, [email protected]
Visual illusions are not just entertaining, but represent ideal means for testing empirical
questions on the neurobiology of vision and underlying cognitive processes. A variety of
visual illusions will be introduced and possible underlying mechanisms will be discussed,
including retinal and cortical approaches and how such illusory phenomena can be created in
order to test specific research questions. Typically, someone discovers a new visual illusion
and scientists then try to explain why and how it occurs. However, the other way around may
be of interest as well: creating certain illusions on the basis of our knowledge about the visual
system. Furthermore, we are sometimes aware of being tricked by these patterns but cannot
overcome the illusory effects. Therefore, another important question is: what is the role of
consciousness in the perception of visual illusions?
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Symposium: Optics in Nature
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Blauwe Zaal
S6
11:30
Modern Lightening affects the human Circadian System
U. Trutschel*, U. Langbein**, * Circadian; Stoneham, MA 02180, USA
** Institute for Microtechnologies, RheinMain University of Applied Sciences, Wiesbaden
[email protected]
Sun light has controlled the human life over most part of our existence. As consequence all
body functions show a strong circadian rhythm. We sleep at night when our body temperature
is low and we are awake during the day when body temperature is high. This all began to
change with the invention of the artificial light. Our daily life transformed to a 24 hour 7 days
per week operation. Particular with the new powerful modern light sources such as LED and
OLED’s there are new possibilities and new risks. We give a short overview when and why
during the 24 hour day artificial light with high portion of the blue spectra is beneficial for us
and when it disturbs our well-being.
12:00 – 12:15 Discussion S1 - S6
12:15 – 13:30 Lunch
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Symposium: Optics in Nature
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13:30
Nanometrology of molded sub-µm structures by means of light scattering
F. Widulle*, V. D. Calzadilla*, S. Shukla*, B. Kleemann*, *Carl Zeiss AG, Corporate Research and
Technology, Oberkochen, [email protected]
The integration of functional nanostructures into devices used in, e.g., photovoltaic or
biomedical applications, represents an additional design parameter, which is employed to
improve the device properties or to generate novel modalities. In solar cells, for example,
nanostructures are embedded in order to increase the conversion efficiency. In mass
production, these functional structures with sub-µm lateral and height dimensions are
manufactured on large-area substrates (~m²), e.g. by injection molding. Appropriate
techniques for nanometrology are needed to qualify the structures in the development stage
(lab tools) and to assure the specified quality during the manufacturing process (inline process
control). We investigated light scattering from injection molded nanopillar arrays and evaluated
the adoption of the technique to production requirements. Polarized light scattering from the
periodic structures has been simulated in order to derive appropriate camera-based
experimental configurations. Finally, the deviation from the nominal structure geometries can
be retrieved.
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Towards traceability in scatterometric-optical dimensional metrology for optical
lithography
B. Bodermann, J. Endres, H. Groß, M.-A. Henn, A. Kato, F. Scholze, M. Wurm, PhysikalischTechnische Bundesanstalt, [email protected]
Currently, the application of scatterometry for dimensional metrology for optical lithography is
limited to a relative measurements for process control and development. To establish
scatterometry for traceable and absolute dimensional metrology an estimation of the
measurement uncertainty is required. In scatterometry, the geometry of the object is deduced
from measured light properties after interaction with the object under test. This indirect
method requires the solution of an inverse diffraction problem e. g. by nonlinear optimisation.
Different aspects have to be considered: Algorithms are required to propagate the uncertainties
of the input parameters, the directly measured optical properties, to the output using
covariance or Monte-Carlo methods. The model representation of the geometry of the object
and inherent model assumptions of the used mathematical methods are essentially imperfect.
We present an analysis of uncertainty contributions based on experimental data.
To enable traceable scatterometry in semiconductor industry, we started to develop a wafer
based scatterometry standard. Design, suitable materials and calibration procedures for this
standard are discussed.
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Scatterometry
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Room A
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14:00
Optical performance and symmetry assessment of diamond cuts using the
ALBATROSS-TT system
A. von Finck, M. Hauptvogel, A. Duparré, Fraunhofer Institute for Applied Optics and Precision
Engineering (IOF), Jena, [email protected]
The compact table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance,
Reflectance and Optical Scatter measurement - Table Top) enables angle resolved scattering
(ARS), T and R measurements with highest sensitivity (dynamic range of 13 orders of
magnitude) of arbitrary surfaces, materials, and components at multiple wavelengths and in
the full 3D sphere.
Diamond grading is typically performed by the so-called “4C rule” to evaluate Carat, Clarity,
Color, and Cut. Moreover, cut quality is classified with respect to symmetry, polish, shape,
and proportions. These have a major impact on the optical performance of the gemstone
(“brightness”, “fire”, and “scintillation”) and can be related to scatter level, characteristic angle
resolved scatter distributions, and dispersion effects. It will be shown that our table top
system can be effectively used for the comprehensive characterization of high performance
gemstones, in particular diamonds. Further examples of applications are also demonstrated.
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Optical scattering - from simple models to complex applications
S. Schröder, M. Trost, T. Herffurth, A. Duparré, J. Wang, H. Schreiber, Fraunhofer-Institut Angewandte Optik und Feinmechanik, Jena, Corning Specialty Materials, Fairport, NY, USA
[email protected]
Residual surface roughness of polished and coated optical surfaces gives rise to light
scattering that impacts the image quality and the throughput and is therefore critical for
optical lithography applications. Therefore, models are required that link structural and
scattering properties as well as sensitive and accurate light scattering measurements at the
wavelengths of application. These models are not just useful for predicting the impact of a
given roughness onto the optical properties. In turn, scatter measurement and analysis can
be used to measure roughness with several advantages regarding sensitivity, robustness, and
the capability to inspect even large freeform surfaces. A variety of instruments for angle
resolved and total light scattering measurements have been developed at Fraunhofer IOF.
Complex laboratory instruments as well as user-friendly table-top tools will be presented
briefly. Instructive examples of application are discussed ranging from the characterization of
large superpolished mirror surfaces to complex multilayer systems for e.g. EUV lithography
and IR components.
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Scatterometry
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Room B
B27
13:30
The next generation 3D vision system for measuring the individual parameters of
spectacle wearers
M. Tiemann, P. Seitz, G. Esser, W. Müller, Rodenstock GmbH,
[email protected]
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The ImpressionIST®3 is the third generation of the video centering systems developed by
Rodenstock. This device uses a 3D stereo vision system for measuring the individual
parameters of spectacle wearers for optimizing the individual lens designs. These parameters
are especially important for progressive spectacle lenses generated with free form technology.
The new generation implements an optimized software algorithm for an automated recognition
of the correspondent points in the two images. Therefore the 3D information is more accurate
and can be retrieved much faster. Another big advantage is the specially developed WLAN
based dual head camera system, which enables the separation of the measurement system
and the evaluation system. This feature allows a slim mechanical setup in three different
shapes to fulfill the cost and space saving needs of the optometrist. The new cameras have a
larger depth of field and a bigger field of view compared to the preceding generations, which
leads to an easier and more flexible positioning of the person under test. An optimized camera
orientation leads to images with a better cosmetic impression of the spectacle frame suitable
for consulting.
Novel vision aids for people suffering from Age-Related Macular Degeneration
M. Hillenbrand, B. Mitschunas, S. Homberg, S. Sinzinger, Fachgebiet Technische Optik, IMN
MacroNano®, Technische Universität Ilmenau, [email protected]
In Germany alone, about 4.5 million people suffer from Age-Related Macular Degeneration
(AMD), a disease that causes progressive damage to the central part of the retina. People
suffering from AMD usually experience growing dark or blurred spots in the center of their
vision which render them unable to read texts, to drive cars, or to recognise faces. Current
vision aids for AMD patients are mainly based on the magnification and/or the redirection of
the full field of view which will inevitably result in a loss of information at the outer parts of the
field of view. In contrast, we present different optical principles for the redirection of the
central part of the field while the loss of information at the boarders is kept to a minimum. Our
focus is on highly integrated, nonelectric, spectacle-like systems. Possible principles include
the field dependent displacement and magnification/reduction of the object information as
well as a deliberately induced distortion. Our contribution includes the mathematical and
optical modelling of the imaging setup, numerical simulations as well as the presentation of
first experimental results.
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Physiological Optics
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Room B
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14:00
Bestimmung des Wassergehaltes von Pflanzenblättern mittels Terahertz-Strahlung
Th. Kinder*, Th. Müller-Wirts*, M. Scheller**, M. Schwerdtfeger**, M. Koch**, B. Breitenstein***,
D. Selmar***, * TEM Messtechnik GmbH, Hannover; ** Fachbereich Physik, Philipps-Universität
Marburg; *** Institut für Pflanzenbiologie, TU Braunschweig, [email protected]
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Wasserbedarf und die physiologische Reaktion von Pflanzen auf Wassermangel, der
Trockenstress, sind weltweit Gegenstand der Forschung. Die wichtigsten bisherigen Methoden
zur quantitativen Untersuchung von Wassergehalt und Trockenstress sind destruktiv. Dies
macht wiederholte Messungen an demselben Blatt oder längere Messreihen an einem
Individuum unmöglich. Die Autoren entwickelten ein transportables Gerät, welches den invivo-Wassergehalt von Pflanzenteilen räumlich und zeitlich unmittelbar und zerstörungsfrei
bestimmen kann – z.B. an Feldpflanzen direkt auf dem Acker. Es verwendet TerahertzStrahlung, welche von Wasser stark absorbiert wird, während sie unpolares organisches
Material quasi verlustfrei durchdringt. Die Anordnung verhält sich etwa wie ein Mach-ZehnderInterferometer, mit dem Unterschied, dass ein Teil des Weges ein Terahertz-Strahlengang ist.
Man kann auch von einem Terahertz-Refraktometer sprechen. Aus dem Vergleich der
Amplituden- und Phasen-Daten mit und ohne eingebrachte Probe wird der (komplexe)
Transmissionskoeffizient derselben bestimmt. Kennt man weiterhin die Blattdicke, so kann
man den relativen Wassergehalt des Gewebes berechnen.
Laser light interaction in a strongly scattering turbid medium: theory and experiment
Y. Wu*, D.P. Kelly**, * TU Ilmenau; ** Institut für Mikro- und Nanotechnologien, Macro-Nano,
Fachgebiet Optik Design, TU Ilmenau, [email protected]
The interaction of laser light and a turbid scattering medium is a complex optical problem. It
remains however an important one with applications ranging from the analysis of high
concentrations of particles in fluids to the optimal design of laser based surgical equipment
for cutting skin tissue. Due to the complexity of the problem, statistical techniques are often
used and the characteristics of the system are described by reference to scattering and
absorption coefficients. Monte-Carlo based simulation techniques have proven to be very
useful in understanding how such systems behave and this is the approach we adopt here. A
detailed theoretical model is developed for several different scattering scenarios and
simulation results are presented. This theoretical analysis is then supported with a series of
experimental results. Theoretical and experimental results are then compared and discussed
in the conclusion section.
14:30 – 14:45 Coffee break
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Physiological Optics
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Room A
A31
15:00
Sensitivity-enhanced complex amplitude retrieval using multi-plane intensity detection
and a lens
X. Liu, K.-H. Brenner, ZITI, Chair of Optoelectronics, University of Heidelberg, xiyuan.liu@ziti.
uni-heidelberg.de
Phase retrieval methods like the classical Gerchberg-Saxton algorithm have an advantage
compared to interferometric and holographic methods, because they require no reference
wave. Thus the set-up can be very simple and stable. Recently, Pedrini has proposed a
method for complex amplitude retrieval from a sequence of diffraction intensities [1]. The
method is very reliable for high contrast phase distributions. For weak phase distributions,
however, the intensity change along the propagation direction z is very small, thus phase
retrieval is only possible by increasing the z-sampling. Here we propose an extension of this
method by including a lens or a microlens array. The lens enhances the intensity variation in
the recorded patterns and it is numerically easy to eliminate from the recovered phase
distribution. The improved performance of the algorithm is demonstrated by numerical
simulations.
[1] G. Pedrini, W. Osten and Y. Zhang Opt. Lett. 30, 833-835 (2005)
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Reduction of coherence induced scattering patterns in self interference digital
holographic microscopy
R. Schubert, G.von Bally, B. Kemper, Center for Biomedical Optics and Photonics, University
of Muenster, Germany, [email protected]
Self interference based digital holographic microscopy (DHM) has been found particular
suitable for simplified quantitative phase imaging of living cells [1]. However, main drawbacks
of the self interference DHM principle are scattering patterns that are induced by the coherent
nature of the laser light which affect the resolution of optical path length changes. We present
a simple and efficient technique for the reduction of coherent disturbances in quantitative
phase images. The principle is based on the amplitude and phase modulation of the sample
illumination and has been found in particular convenient with the self interference DHM
concept. Results from the characterisation of the methods and the performance for enhanced
quantitative imaging of particles and living cells are presented.
[1] B. Kemper, A. Vollmer, C. Rommel, J. Schnekenburger, G. von Bally
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Digital Holography
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Room A
A33
15:15
Modified phase shifting algorithm for digital holography
H. Babovsky, R. Schwede, B. Harendt, A. Kiessling, R. Kowarschik, Institute of Applied Optics,
Friedrich-Schiller-University Jena, [email protected]
Phase shifting digital holography offers a large advantage compared to conventional digital
holography. The resulting images are free of zero order and blurred conjugate image of the
object and thus allow for a wider viewing angle. In this talk, we propose a new phase shifting
technique based on the advanced iterative algorithm by Wang and Han to simplify automatic
recordings. It was done by reconstructing the amplitude distribution in the hologram plane
numerically.
A34
15:30
Lateral speckle size in phase retrieval systems
L. Megel, T. Meinecke, D. P. Kelly, S. Sinzinger, TU Ilmenau, [email protected]
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Phase Retrieval (PR) techniques provide a complimentary approach to Digital Holography
(DH) for estimating the complex amplitude of a wavefield. If one uses a Gerchberg-Saxon
type iterative approach, generally two intensity distributions at different optical planes are
captured. Fast Fourier Transform (FFT) based algorithms are then employed to iteratively
recover the phase information. Once we have estimated the complex amplitude of the
wavefield we can use numerical propagation algorithms to calculate the distribution at any
optical plane. We expect however that the finite size of the camera aperture and the sampling
effect introduced by the camera pixels will act to reduce the performance of the optical
system. In this manuscript we attempt to examine these performance limiting factors in more
detail using a special field as the input into our system; namely a speckle field. This particular
type of field contains high spatial frequencies which in turn are related to the lateral speckle
size. A series of PR experiments at different capture planes are conducted and we report on
how the system performance is affected.
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Digital Holography
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Room B
B31
14:45
SLM-based Microscopy
M. Hasler, T. Haist, W. Osten, Institut für technische Optik Universität Stuttgart
[email protected]
In microscopy it is customary to use a wide variety of imaging methods. Unfortunately, it is
necessary for most of them to change the setup physically (e.g. filters, special objectives,
etc.). We present a programmable microscope in which an integrated spatial light modulator
(SLM) is used in order to realize a number of otherwise complicated physical modifications.
We employ a HDTV LCOS SLM, 2 different LED illuminations in reflection and transmission,
an Olympus UmPlanFl 50x with a NA of 0.8 and a CCD camera with 1024x768 resolution. By
the use of computer generated holograms (CGHs) we were able to recreate a number of
classical phase contrast imaging techniques such as Zernike phase contrast or DIC, and
modify them in unconventional ways. In addition, by halfing the filter plane stereovision for
three dimensional object reconstruction was achieved. Furthermore, aberrations can be
prevented by applying concerning filters. By extending the setup with a laser illumination over
an SLM, the setup gains the ability to employ structured illumination and confocal microscopy
techniques.
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HF-sputtered glass waveguide slides for waveguide evanescent field microscopy
N. Detrez*, Ch. Halfpap*,**, M. Morawitz*,**, A. Peter*, S. Mittler**, U. Langbein*, * Institute for
Microtechnologies, RheinMain University of Applied Sciences, Wiesbaden; , ** Department of
Physics and Astronomy, The University of Western Ontario, London, ON N6A 3K7, Canada
[email protected]
Waveguide evanescent field microscopy (WEFM) relies on a particular strongly interface
confined dark field illumination technique where guided modes interact with the specimen
deposited on top of the film by their evanescent field tails.
We report on the deposition of high refractive index P-LASF-47-glass films on silica substrate
slides by a high-frequency sputtering technique. The resulting step-index waveguides are
optimized for green and red HeNe-laser radiation and can support up to three guided modes
both for s- and p-polarization. For mode excitation the silica substrates have been provided
with a coupling grating formed by interference lithography and subsequent ion beam etching.
The waveguide films have been characterized by m-line- spectroscopy, spectral reflectometry
and AFM-scans. They showed homogeneous coupling gratings, very narrow m-lines and
proved resistance against combined chemical/ultrasound cleaning procedures. We found
that the refractive index of the deposited glass film has been increased with respect to its bulk
value by approx. 3%. The slide performance when implemented into a microscopic set-up has
been demonstrated.
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Microscopy
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Room B
B33
15:15
Waveguide Evanescent Field Scattering (WEFS) Microscopy of Bacterial Biofilms
Q. Nahar*, M. Morawitz*,**, Ch. Halfpap*,**, N. Detrez**, D. Imruck*,**, J. Shuster***, G. Southam***,
U. Langbein** and S. Mittler*, * Department of Physics and Astronomy, The University of Western Ontario, London, Ontario, N6A 3K7, Canada;** Institute for Microtechnologies, RheinMain
University of Applied Sciences, Wiesbaden; *** Department of Earth Sciences, The University of
Western Ontario, London, Ontario, N6A 5B7, Canada, [email protected]
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Waveguide Evanescent Field Scattering (WEFS) Microscopy was introduced in 1997 with
examples on technical structures such as thin SiO2 and photoresist pattern. The evanescent
field of a slab waveguide mode was used to illuminate ultrathin structures located on the
waveguide. The scattered photons were collected under 90° geometry in a microscope.
This technology had been expanded in recent years to Waveguide Evanescent Field
Fluorescence (WEFF) microscopy for the investigation of cell-substratum interactions. Here
the plasma membranes of the cells were stained.
We now demonstrate WEFS microscopy of living bacteria forming biofilms. WEFS allowed
investigation of the adhesion of bacteria onto a waveguide surface via close junctions. We
were able to distinguish between bacterial colonies, single bacteria and dividing bacteria. The
big advantage of WEFS over WEFF microscopy is the label-free approach. It is now possible to
image living bacteria adhered to a surface without the addition of chemical treatment such as
staining. This is of great relevance for the development of anti-bacterial surfaces and for
sensor applications, e.g. in monitoring drinking water.
Experimental Validation of the Extended-Nijboer-Zernike (ENZ) based Aberration
Retrieval Method for Microscope Objectives
A. Wiegmann*, S. van Haver**, N. Kumar**, S.F. Pereira**, *Physikalisch-Technische Bundes­
anstalt, Bundesallee 100, 38116 Braunschweig, Germany; **Delft University of Technology,
TNW-IST, Optics Research Group, Lorentzweg 1, 2628 CJ Delft, The Netherlands
[email protected]
The quality of optical systems is conventionally assessed by interferometric tools requiring
special setups and environmental conditions. The aberration retrieval method presented here
relies only on intensity measurements in the focal region of the imaging system being tested.
A simple setup for the measurement of through-focus intensity distributions of a microscope
objective is presented. The wavefront in the exit pupil of a microscope objective (NA=0.4) is
reconstructed from the intensity distributions of up to 30 focal planes. Two measurements
have been performed. One of the single microscope objective and a second measurement
with an additional aberration plate inserted close to the entrance pupil of the objective. The
first measurement is used for calibration of the setup while the difference between both
measurements depends only on the aberration plate and is independent of all constant
systematic aberrations of the setup.
Comparisons of the ENZ measurements with interferometric measurements showing an
agreement better than Lambda/70 (rms) are presented.
16:00 Mitgliederversammlung / Poster
18:30 Welcome at the Museum
19:30 Fraunhofer - Lecture
Banquet
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Microscopy
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Blauwe Zaal
H6
09:00
Camera systems for Machine Vision applications - Overview, Developments and
Outlook
J. Herrmann, Adimec Advanced Image Systems B.V., Eindhoven, The Netherlands
[email protected]
In the past 30 years, Machine Vision grew from a technology that was used in some very high
end niche applications into an important part of many automated production processes. An
important part of any Machine Vision system is the camera which together with the optical
system determines the accuracy and speed of the system.
This lecture will provide an overview of camera types (like CCD, CMOS, line scan, area scan),
important camera characteristics and interface standards today and the future trends. Some
high end applications will be described in more detail, including how the system accuracy is
influenced by the optical system.
H7
09:30
Moore’s law in Photonics
M. Smit, Technical University Eindhoven, [email protected]
The complexity development of Photonic ICs shows a similar development as Moore’s law in
electronics. The development of photonic integration technology in the past decades will be
reviewed and similarities and differences between photonic and microelectronic integration
will be discussed. So far the main driver for Photonic Integration has been telecommunications.
New developments in Photonic Integration will bring the costs of Photonic ICs down to a level
where they become attractive to SMEs for a broad range of applications, including
interconnect, sensors, metrology and health. The presentation will conclude with a vision on
the future development of photonic integration.
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10:00 – 10:30 Coffee break
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Camera Systems
Integrated Optics
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Room A
A35
10:30
Design and Concept of Fiber-Optical and I²C Hybrid Sensor Bus System for
Telecommunication Satellites
P. Putzer*, A. Hurni**, M. Manhart**, C. Tiefenbeck**, M. P. Plattner**, A. W. Koch*, * Lehrstuhl
für Messsytem und Sensortechnik, TU München, Theresienstraße 90/N5, 80333 München; **
Kayser-Threde GmbH, Wolfratshauserstr. 48, 81679 München, [email protected]
In this paper the design of the Hybrid Sensor Bus (HSB) for telecommunication satellites is
presented.
In state of the art European telecommunication platforms hundreds of point-to-point wired
sensors are necessary for satellite control and monitoring. To reduce the high mass impact of
the wiring a modular open-standard bus system consisting of an electric I²C sensor bus and
a fiber bragg grating based fiber-optic sensing for thermal mapping is developed.
Special attention is given to the fiber optical interrogator module. A trade-off between different
designs, based on edge filter and scanning laser concepts is also presented. In the edge filter
concept the FBG’s are illuminated by a broadband light source, the reflected light is split up in
two parts; both paths are analyzed by a photodiode, whereas one part is first fed through an
edge filer. In the tunable laser concept the laser light is tuned in wavelength and the
backscattered light is analyzed. The advantages and disadvantages of both systems are
discussed and taken into account to select the most suitable system.
A36
10:45
Chromatic dispersion measurement of microstructured optical fibers for nonlinear
applications
D. Hoh, R. Spittel, M. Jäger, H. Bartelt, Institut für photonische Technologien (IPHT) Jena
[email protected]
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Microstructured optical fibers (MOFs) play an important role in the field of nonlinear optics.
Due to their great design flexibility it is possible to fabricate both single mode MOFs with a
very large mode area to suppress nonlinear effects and fibers with very small, strongly
confining cores to enhance the nonlinear interaction. For supercontinuum generation, the
knowledge of the chromatic dispersion of the fiber modes and the zero dispersion wavelengths
is crucial because pumping at these wavelengths prevents spectral broadening of the pump
pulse.
We present a frequency domain group velocity dispersion (GVD) measurement setup based
on a white light Mach-Zehnder interferometer. A supercontinuum light source is used to
ensure that enough power is transmitted even through fibers with very small cores over a wide
spectral range. We show GVD measurements of Lanthanum doped specialty MOFs with
enhanced nonlinear coefficient and compare them with finite element method (FEM)
simulations.
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Fibres and Polarization Optics
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Room A
A37
11:00
Fringing Field Effect and the measurement of the subpixel jones matrices of an LCD
C. Lingel, C. Thiel, T. Haist, W. Osten, Institut für Technische Optik, Stuttgart
[email protected]
Liquid Crystal Displays (LCD) are commonly employed as computer-generated holograms
(CGH) in active optical systems to manipulate the phase of light. Since reflective Liquid
Crystals on Silicon (LCoS) displays are manufactured today with pixelsizes of few micrometers, subpixel-effects gain in importance. One major effect is the fringing field effect, which is
the major type of crosstalk between neighbouring pixels so that the liquid crystals of pixel B
get influenced by the electric field of pixel A. As a result a desired sharp phasestep between
two pixels gets blurred so that the computed hologram is not displayed exactly. Thus, the
diffraction efficiency decreases. For higher diffraction efficiency the fringing field effect must
be considered during the computation of the CGH and, therefore, it is necessary to measure
the effect. In the following an optical setup is presented for measuring the subpixel jones
matrices of an LCD. Afterwards a simulation model based on the results is shown.
A38
11:15
Phase measurement of a spatially varying polarization distribution
V. Nercissian*, F. Geier*, A. Berger*, S. Dmitriev*, Z. Ghadyani**, I. Harder**, K. Mantel**, N. Lindlein*,
* Institute of Optics, Information, and Photonics, Friedrich-Alexander-University of ErlangenNuremberg, ** Max Planck Institute for the Science of Light, Erlangen
[email protected]
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For many optical measurement applications, a polarization matching is necessary. Therefore,
appropriate polarization manipulating elements are inserted into the measurement setup.
However, those optical elements result not only in the desired polarization distribution, but
also introduce an additional phase term. Usually, this phase term can be neglected, as it is
constant in space and time for a homogeneous polarization distribution. As the interest in nonhomogeneous polarization modes is increasing, spatially varying polarization manipulating
elements are needed. These optical elements introduce a spatially varying phase which
cannot be neglected any more.
In this contribution, an interferometric setup is presented for measuring the additional relative
phase of artificial wave plates and polarizers with spatially varying orientations of the optic
axes. Contrary to most interferometric setups which show a certain dependence of the
measurement results on the polarization distribution, this setup is designed to cope with any
polarization distribution.
11:30 End of meeting
94
Fibres and Polarization Optics
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Room B
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10:30
Optimized tunable Alvarez-Lohmann-Lenses
A. Grewe*, M. Hillenbrand*, S. Sinzinger*, R. Abd El-Maksoud*, *TU Ilmenau
[email protected]
In the late 1960s Alvarez and Lohmann independently suggested cubic phase plates as
varifocal elements. A variety of different theoretical as well as experimental approaches have
been discussed since. Today compact tunable optics is of specific interest e.g. in miniaturized
optical systems. Recently developed fabrication technologies like diamond turning or milling
nowadays enable the fabrication of higher order freeform surface profiles as implementation
of efficient phase plates for an optimization of the imaging properties. We present a nonparaxial analysis of the imaging behavior of diffractive, refractive and hybrid Alvarez-Lohmann
lenses with increased numerical aperture. Our analysis includes the influence of lateral focus
shifts as well as monochromatic and polychromatic aberrations over the tuning range.
Experimental results with phase plates fabricated by diamond milling and lithographic
techniques will be presented.
B36
10:45
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Novel integrated micro-optics system for the fabrication of Active Optical Cables
F. Merchán, K.-H. Brenner, ZITI, Chair of Optoelectronics, University of Heidelberg
[email protected]
Recently we proposed a concept for the integration, fabrication and adjustment of microoptical devices used in optical communication systems for short range interconnects. The
most important factors of this concept were the feasibility for commercial devices and
materials, the possibility to automate the fabrication and adjustment processes and to
develop a cost effective method for the production of Active Optical Cables (AOC). Here we
present a 12-channel system with integrated micro-optical and electronic subsystems. The
optical couplers, the VCSEL-Driver, the VCSEL-Array, the transimpedance-amplifier and the
photodiode-array are integrated in a volume of 22mm x 25mm x 3mm for the AOC. The PCB
is equipped with an electrical connector for the interface to the main board. With commercially
available devices, this concept enables a transfer rate of up to 12.5 Gbit/s per channel or up
to 300 Gbit/s for the complete duplex system.
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Innovative Wave Optical Methods
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Room B
B37
11:00
Photoacoustic spectroscopy with a laser diode based excitation and a self-mixing
detection scheme
V. Dovgal, Institut für Angewandte Physik, Technische Universität Darmstadt
[email protected]
Photoacoustic spectroscopy (PAS) is a powerful method for spectroscopic measurements in
turbid materials. It enables volumetric measurements inside a sample despite multiple
scattering of light. Furthermore it combines a high optical contrast with a low scattering
coefficient of acoustic waves. In order to make PAS suitable for industrial inline measurements
some improvements concerning robustness, size and cost of the system are introduced.
Instead of a bulky and expensive Nd:YAG/Dye laser combination a NIR laser diode is used for
photoacoustic excitation. Different modulation techniques for efficient ultrasound generation
in the sample are applied. An interferometric detection system based on the self-mixing effect
in a laser diode is used for displacement measurements of the sample surface. The detection
part needs no fine optical adjustment and makes a physical contact with the sample, as
compared to the common transducer approach, unnecessary. In order to estimate particular
absorber concentrations in the sample the local fluence is calculated by means of Monte
Carlo simulations at the excitation wavelength.
B38
11:15
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Analogous reconstruction of digital hologrammes
K.-R. Ernst*, H. Babovsky*, A. Kiessling*, R. Kowarschik*, * Institute of Applied Optics, FriedrichSchiller-University Jena, [email protected]
Digital holograms can be reconstructed optically with the help of LCoS microdisplays. The
talk presents the influence of the discrete pixel structure of the display on the quality of the
reconstructed image. In particular, the effects of the different pixel pitches of the camera and
the display are analyzed. A method is proposed to use an LCoS microdisplay to compare
similar objects holographically regardless the not coincident pixel pitches.
11:30 End of meeting
98
Innovative Wave Optical Methods
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Poster
P1
Design and integration of a multi-channel fluorescence detector
X. Ma, A. Grewe, M. Hofmann, M. Amberg, S. Sinzinger, Technische Optik, TU Ilmenau
[email protected]
In combination with fluidic systems, fluorescence detectors have a large variety of applications
e.g. in biomedicine for ph-sensoring or the characterization of chemical reaction processes.
Highly integrated and miniaturized optofluidic microsystems enable the handling of very small
sample volumes in so-called segmented flow systems, which is beneficial for the practical
application. A single-channel fluorescence sensor using planar integrated free space optical
systems has been developed in the past. In order to increase the measuring flexibility and
accuracy the extension to a multi-wavelength and multi-channel sensor system based on this
concept is currently investigated. We present the concept, optical design and fabrication
strategy of a highly integrated free space optical fluorescence detector for the application in
a segmented-flow environment. The performance of the system is characterized and the
application as a biochemical analysis system is discussed.
P2
Concept and implementation of a compact multi-channel fluorescence-microscope
unit
E. Slogsnat*, L. Lehmann**, P. Fischer**, K.-H. Brenner*, *ZITI, Chair of Optoelectronics, University of Heidelberg; **ZITI, Chair of Circuit Design, University of Heidelberg
[email protected]
Due to the large number of single experiments in systems biology there is a demand for
accelerating image acquisition. We present the concept and the implementation of a compact
multi-spectral microscope unit, which is able to acquire images of four fluorophores in parallel.
The unit consists of four excitation channels and four emission channels realized by dichroic
filters. The imaging is performed by one standard objective lens for all channels and one tubus
lens and one camera for each emission channel. By combining multiple units, a parallelization
in the spatial domain can be achieved.
P3
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3D Scanning system based on tunable cylindrical lenses
D. Pätz*, S. Sinzinger*, S. Leopold**, M. Hofmann**, * Fachgebiet Technische Optik, TU Ilmenau; **
Fachgebiet Mikromechanische Systeme, TU Ilmenau, [email protected]
We present a compact micro-optical system with capability to change the focus position in
depth as well as in lateral direction. In this way we reduce the influence of field aberrations by
scanning the object space with a decreased field of view. With the same system we are able
to capture a wide range in depth by refocussing the system.
The scanning element is a set of cylindrical lenses shifted laterally to the optical axis. Thus it
has a prismatic effect and deflects the light which can be tuned by changing the lens curvature.
The imaging element is a pair of cylindrical lenses with separately tunable focal power in x and
y. So we are able to compensate astigmatism caused by the scanning element. We
demonstrate an optimized membrane design to achieve a cylindrical surface shape over the
squared aperture of the optical system. The actuation is realized by applying pressure to the
immersion fluid. The tunable lenses are immersed membranes of aluminum nitride with a high
dynamic response and long term stability.
100
Integrated Optics
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101
Poster
P4
Integrated optical microsystem based on Talbot interferometry for the measurement
of particle concentration in tubes
M. Hofmann*, R. Müller**, S. Stoebenau*, S. Sinzinger*, * Institut für Mikro- und Nanotechnologien
MacroNano, TU Ilmenau, ** CiS Forschungsinstitut für Mikrosensorik und Photovoltaik Gmbh,
Erfurt, [email protected]
We demonstrate an integrated system for the measurement of partilce volume concentration
in flowing suspenstions of water and test dust. The measurement is based on Talbot
interferometry and we show an analytical model to determine suitable system parameters. We
show the realization of the microsystem that consists of two parts: a planar emitter-receiver-unit
comprising a VCSEL at 850 nm as light source and photodiodes and a PMMA-module. A flexible
tube is embedded therein and the optical functionalitiy is realized by a micromilled lens surface
for light collimation and a Ronchi grating for the generation of the interfering diffraction orders.
We discuss the multiplexing of the system for the determination of particle size distributions.
P5
Integrated Hybrid GRIN Lenses
M. Hillenbrand*, E. Markweg**, M. Hoffmann**, S. Sinzinger*, * Fachgebiet Technische Optik,
IMN MacroNano®, Technische Universität Ilmenau, ** Fachgebiet Mikromechanische Systeme,
IMN MacroNano®, Technische Universität Ilmenau, [email protected]
The use of microsystems technology for the manufacturing of integrated on-wafer optical
systems often leads to shape restrictions of the optical surfaces. To achieve full performance in
integrated free-space optical systems, light propagation has to be controlled in two directions:
In the plane of the wafer and perpendicular to it. We present novel hybrid gradient index (GRIN)
elements that allow for independent control of the optical function in these two directions.
A functional GRIN layer structure for beam shaping perpendicular to the wafer plane is realized
by a parameter variation of a plasma-enhanced chemical vapor deposition (PECVD) of silicon
oxynitride. The optical functionality in the wafer plane can be achieved by a deep reactive ion
etching process. The etched sidewalls in this case act as refractive or diffractive optical surfaces.
Our work includes the discussion of this new hybrid concept, simulations, manufacturing as well
as first experimental results.
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Integrated Optics
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103
Poster
P6
Optimised Glass Rod Drawing Process for Gradient-Index Microlenses
J. Bierlich*, J. Kobelke*, K. Schuster*, S. Gerlach**, B. Messerschmidt**, A. Gebhardt***, * Institute
of Photonic Technology, Jena; ** GRINTECH GmbH, Jena; *** VITRON Spezialwerkstoffe GmbH,
Jena-Maua, [email protected]
Gradientenindex-Mikrooptiken sind wichtige Systemkomponenten z. B. in der hochauflösenden
optischen Sensorik, der optischen Nachrichtenübertragung und der technischen sowie
medizinischen Endoskopie. Mit ihren planen optischen Stirnflächen bieten sie große qualitative
Vorteile bei der Montage und Miniaturisierung von mikrooptischen Systemen. An die Stelle
gewölbter Optikflächen treten radial abnehmende Brechzahlgradienten, die durch eine gezielte
rotationssymmetrische Variation der Glaszusammensetzung erreicht werden.
Abweichungen vom angestrebten parabolischen Brechzahlprofil können durch Inhomogenitäten
im Glaswerkstoff hervorgerufen werden und beeinflussen empfindlich das Leistungsvermögen
der Gradientenoptiken. Daher fanden Untersuchungen zur Optimierung des StablinsenZiehprozesses bezüglich der Lokalisierung von Preformstörungen, der Vermeidung thermischer
Abkühlasymmetrien, der Unterdrückung von Entmischungserscheinungen sowie zur Erhöhung
der Maßhaltigkeit und Längenausbeute der Rohlinsenstäbe statt. Die Ergebnisse der Optimierung
der ziehtechnologischen Parameter in Abhängigkeit von Preform- und Linsengeometrie sowie
der gestellten Qualitätsansprüche werden diskutiert.
P7
Study of graphene-like layer deposition at interfaces
A. Müller*; **, U. Langbein**, B. Menges*, *Molecular Spectroscopy Group, Max Planck Institute
for Polymer Research, Mainz, **Institute for Micro Technologies, RheinMain University of Applied
Sciences, Wiesbaden, [email protected]
Graphene are in focus of scientific interests due to its unique optical, thermal and electrical
properties. In this paper we present a method suitable for the in-situ monitoring of the
deposition processes of graphene-like layers on gold surfaces. By using surface plasmon
resonance spectroscopy SPR as a high surface sensitive method we successfully illustrate
both the time-resolved monitoring of the deposition process and the optical properties.
Furthermore we studied the influence of a pulsed UV-laser on the deposition process.
With SPR imaging we attained a resolution for layer thickness in the sub nanometer range. So
we were able to analyze the homogeneity of the deposition process.
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Integrated Optics
Coatings and Interfaces
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105
Poster
P8
Evanescent wave optics to study diffusion in polymers at interfaces
C. Kasparek* **, M. Strasser* **, U. Langbein**, B. Menges*, * Molecular Spectroscopy Group,
Max Planck Institute for Polymer Research, Mainz; ** Institute for Micro Technologies, RheinMain
University of Applied Sciences, Wiesbaden, [email protected]
Diffusion processes in polymers are important in many applications such as coatings, sensor
devices, fuel cells and drug delivery. To understand the transport processes in these applications,
the role of the interface becomes more important. The affinity of the polymer chains to the
interface proves to be crucial. Surface plasmon resonance and optical waveguide spectroscopy
can be used to determine the optical density, diffusion of gas and orientation of polymer chains
at interface and bulk in a single measurement. Therefore different metal-enhanced waveguide
sensors have been developed and evaluated. We could show that the penetration of molecules
into a polymer film by diffusion gives rise to reversible refractive index changes. We have
investigated films from amorphous fluoroploymers on different metal-coated interfaces and
observed clear differences in the interphase close to the interface but not in the bulk.
P9
Hochtemperaturresistente Metallbeschichtungen für optische Fasern
J. Kobelke*, J. Bierlich*, K. Schuster*, C. Aichele*, E. Lindner**, J. Mörbitz**, H. Bartelt*, * Institut
für Photonische Technologien e.V., Albert-Einstein-Str. 9, 07745 Jena, **Fibre Bragg Grating
Sensors (FBGS) Technologies GmbH Buchaer Str. 6, 07745 Jena, [email protected]
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Obwohl das eigentliche Fasermaterial bis zu Temperaturen oberhalb 1000°C stabil ist, limitieren
übliche organische Coatings (z.B. Acrylate) den Einsatzbereich von quarzglasbasierten Fasern
unterhalb 300°C.
Metallbeschichtete Fasern bieten neue Möglichkeiten für Hochtemperaturanwendungen,
z.B. in der Bragg-Gitter-Fasersensorik. Wir stellen ein atmosphärisches, reaktives Goldbe­
schichtungsverfahren für optische Fasern vor, das die Nachteile von Schmelzbeschichtungsverfahren, wie hohe Temperaturbelastung bei der Metallisierung oder niedrige Viskosität von
Metallschmelzen, die zu ungleichmäßigen Beschichtungen führen, umgeht. Die Ergebnisse der
Prozessentwicklung zeigen, dass homogene, abriebfeste Goldschichten im Mikrometer- und
Submikrometerbereich bei Anwendung geeigneter Auftrags- und Aushärteparameter erzielt
werden können. Mehrfachbeschichtungen bieten ein zusätzliches Verbesserungspotential für
mechanische Stabilität und chemische Umweltresistenz. Außerdem weisen die goldbeschichteten Fasern eine hohe elektrische Leitfähigkeit auf, so dass sie galvanisch nachbeschichtet
werden können oder auch für elektrische Funktionen genutzt werden könnten.
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Coating and Interfaces
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107
Poster
P10
Defect assessment of optical surfaces using the light scatter sensor HOROS
T. Herffurth, S. Schröder, A. Duparré, Fraunhofer Institute for Applied Optics and Precision
Engineering (IOF), Jena, [email protected]
Light scatter measurement and analysis are widely used for the characterization of micro and
nano structures as well as defects on optical surfaces. In particular the 3D Angle Resolved
Scattering (ARS) of particles, digs, and scratches provides characteristic features usable for
defect classification. The recently presented light scatter sensor horos (high sensitive optical
roughness sensor) constitutes an elaborated tool for 3D-ARS measurements of various light
scattering phenomena as will be demonstrated by roughness and defect characterization over the
entire surface area. The compact and fast CMOS-matrix based measurement concept enables
easy combination with independent characterization techniques like white light interferometry.
Based on this combination a direct comparison of ARS features and defect geometries as well
as an investigation of their correlation becomes possible. In addition, the application of light
scatter modeling to determine defect size and shape from the ARS distributions is investigated.
P11
Parallel execution of Mie scattering events
S. Streicher, O. Kalthoff, Fakultät für Informatik, Hochschule Heilbronn,
[email protected]
Mie theory describes the scattering of electromagnetic waves on spheroidal particles
whose diameter is small compared to the wavelength of the incident radiation. A variety of
computer algorithms exist to calculate scattering parameters. These are sufficiently exact
but computationally slow, so the simulation of radiation transport in a medium can be a time
consuming task. To our best knowledge no attempt has been made to adapt algorithms to
parallel processors such as programmable graphics adapters.
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We have implemented a parallel algorithm to calculate perpendicular and parallel polarization
of scattered waves, from which other scattering parameters can be derived. This facilitates
simultaneous tracking of particular waves in scattering media. Our code can be invoked from
scripting languages like Matlab. It can be invoked from high-level languages such as C/C++
and is executable on conventional processors as well. We tested our approach using Monte
Carlo simulations. The results correspond to reference implementations. We have shown that
execution time can be reduced significantly compared to sequential approaches.
Forward light scattering analysis of particles and cells
M. Channaoui, G. von Bally, B. Kemper, Center for Biomedical Optics and Photonics, University
of Muenster, Germany, [email protected]
Information about forward light scattering properties of particles and biological cells is important
for the understanding of imaging in optical microscopy, optical trapping and high throughput
measurement techniques like flow cytometry. Digital holography provides the storage and the
numerical reconstruction of wave fields. If an off-axis setup is used for hologram recording, the
wave field behind particle-like scatterers can be calculated in amplitude and phase from a single
digital hologram. Data from digital holographic microscopy measurements on microspheres in
different immersion media and from different cell types are analysed and compared to results
from simulations.
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Scatterometry
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Poster
P13
Holographic reconstruction of the displacement vector on arbitrary objects
H. Babovsky, R. Schwede, A. Kiessling, R. Kowarschik, Institute of Applied Optics, FriedrichSchiller-University Jena, [email protected]
With the help of digital holography it is possible to get amplitude as well as phase information
of an optical wave field at the position of the detector. Numerical reconstruction enables the
user to reconstruct an image of the object via back projection in space. In earlier works, our
group was able to demonstrate 3D surface reconstruction of an object by combining digital
holography and stereophotogrammetry. Therefore, two cameras have been used. In this work,
we will demonstrate an additional technique. We are going to reconstruct the full displacement
vector on the objects surface by recording holograms at four different positions in space and
stereophotogrammetric matching of the resulting images.
P14
Optical Metrology, Remote Laboratories, and Cloud Computing
M. Wilke, G. Pedrini, W. Osten, Institut für Technische Optik, Universität Stuttgart,
[email protected]
Cloud computing, the paradigm of providing external IT resources „as a service“ with the
underlying infrastructure transparent to the user, offers new dimensions in the economic
utilization of limited resources. Expanding on this concept by adding remote access to more
conventional hardware, such as a scientific laboratory, creates a new environment for research,
where findings, including the raw data, can not only be shared throughout the community using
the internet, but just as easily verified, without even having to replicate the original setup. In
this paper, we report our recent work on building a remote laboratory for digital holographic
metrology. We describe the architecture and the techniques involved in setting up the remote
controlling metrology system. Further consideration will be given to the integration into an
advanced infrastructure for remote experimentation, data storage and publication.
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Digital Hologrphy and Phase Retrieval
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111
Poster
P15
Diffractive Optical Elements in Polymeric Media Based on Polymethylmethacrylate
with Distributed Phenanthrenequinone Molecules
E. Tolstik*, V. Matusevich*, R. Kowarschik*, D.N. Marmysh**, V.V. Mahilny**, * Friedrich-SchillerUniversity Jena, Institute of Applied Optics, Jena, Germany, ** Belarusian State University Minsk,
Physical Department, Minsk, Belarus, [email protected]
The prospective polymeric medium based on Plexiglas (polymethylmethacrylate, PMMA) with
a high concentration of phenanthrenequinone (PQ) molecules with good photosensitivity, long
storage time and easy fabrication make it possible to create diffractive optical elements having
unique properties. The photoattachment of the PQ-molecules to the polymeric chains and the
formation of the stable photoproduct play the decisive role for the light-induced increase of the
refractive index allowing the recording of the holographic gratings with the diffraction efficiency
close to 100% and the wide range of operation temperature (up to 100oC). The whole set
of these parameters makes it possible to replace complex optical systems by volume phase
holograms recorded in PQ-PMMA materials with the thickness of about 70-200 µm. The novel
diffractive elements can be used e. g. as diffusers for beam projectors, light concentrators for
solar cells, screens for head-up-displays. The photopolymeric layers with diffractive elements
can be also integrated in laminated glass and can be used in windshields of vehicles and
cockpits as well as in architectural solutions.
P16
Artificial wave plates made from sub-wavelength structures
S. Dmitriev*, I. Harder**, N. Lindlein*, * Institut für Optik, Information und Photonik, FriedrichAlexander-Universität Erlangen, ** Max-Planck-Institut für die Physik des Lichts,
[email protected]
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Current and finished studies on the fabrication of polarisation elements made from Si3N4 subwavelength gratings will be presented. The form birefringence of a dielectric material is achieved
by structuring the surface in the nano meter range.
The structure of the presented half wave plates is based on sub-wavelength gratings with period
300 nm. The depth and the duty cycle are optimised to introduce a retardation of π to light at a
wavelength of 633 nm.
The design of a radial polariser is based on sub-wavelength silicon nitride structures introducing
a retardation of π, with a space variant orientation of the optical axis. The first results of a
transformation of linear polarised light into a radial polarised one will be shown.
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Diffractive Optics and Lithography
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Poster
P17
Phase-shifting fringe projection system based on a tailored free-form mirror
S. Zwick, Y. Franzl, R. Steinkopf, P. Kühmstedt, G. Notni, Fraunhofer-Institut für Angewandte
Optik und Feinmechanik IOF, [email protected]
Phase-shifting fringe projection is a very effective method for 3D-shape measurements.
Conventional fringe projection systems are based on a digital projector that images fringes
into the measurement plane. Such systems are limited to the visible spectral range, as most
projectors suffer from technical problems in UV or IR spectral ranges.
We propose a novel fringe projector that is based on a single tailored free-form mirror. The freeform mirror generates fringes in the measurement plane by redistribution of light comparable to
illumination purposes. Therefore no classical imaging is performed. Due to the application of a
single free-form mirror, the projector is wavelength independent and therefore applicable in UV
and IR spectral ranges.
We present the design and realization of a prototype and a characterization of the generated
intensity distribution in the measurement plane.
P18
3D-Schneidkantenvermessung von Präzisionsschneidwerkzeugen
P. Kühmstedt, R. Ramm, M. Heinze, I. Schmidt, G. Notni, Fraunhofer-Institut für Angewandte,
Optik und Feinmechanik IOF, [email protected]
Die Fertigung präziser Objektgeometrien wird industriell durch zerspanende Bearbeitung
erreicht. Ein wichtiges Qualitätsmerkmal der Schneidwerkzeuge ist die Form der Schneidkante,
welche typischerweise mit Radien zwischen 3 bis 50 µm verrundet sind.
Vom IOF wurde ein (mikro-)streifenprojektionsbasierter 3D-Sensor entwickelt, mit dem die
Topografie der Schneide für Neigungswinkel bis 60° in einem Volumen von 700 x 500 x 50 µm³
mit einer lateralen Auflösung von 1,2 µm erfasst wird.
Die extreme Dynamik der Bilder der metallischen Oberflächen und die Glanzlichter erforderten die
Entwicklung eines neuen robusten Auswertealgorithmus. Die aufgenommene 3D-Punktewolke
der Schneidkante wird dabei auf einen einzelnen Querschnitt komprimiert. Hierdurch wird
der Einfluss der Oberflächenrauheit auf die gemessene Form der Schneidkante vermindert.
Aus dem ermittelten Querschnitt können der Radius, die Symmetrie und die Abflachung der
Kantenverrundung robust berechnet werden. Verrundungsradien werden bis 3 µm mit einer
Wiederholpräzision von ≤ 1 µm bestimmt.
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3D-Metrology
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Poster
P19
Simulation des Messfehlers und Bestimmung von Modellparametern bei der op­
tischen 3D-Vermessung transluzenter Objekte
P. Lutzke, P. Kühmstedt, G. Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik,
[email protected]
Optische 3D-Messverfahren basierend auf aktiver Triangulation nutzen strukturierte Beleuchtung
des Messobjektes zur Lösung des Korrespondenzproblems. Im klassischen Modellansatz wird
davon ausgegangen, dass die Reflexion der projizierten Intensitätsverteilungen ausschließlich
an den Oberflächen der Messobjekte erfolgt. Bei transluzenten Materialien ist dies nicht der Fall
und es tritt neben der Oberflächenreflexion zusätzlich eine Streuung von Licht im Objektvolumen
auf. Dies führt zu einer Abweichung zwischen der gemessenen und der tatsächlichen
Objektoberfläche. Unter Verwendung von Raytracingverfahren wurde in Verbindung mit einem
einfachen Fehlermodell ein Verfahren entwickelt, welches eine schnelle Simulation dieses
Messfehlers ermöglicht. Das Fehlermodell beschränkt sich dabei auf wenige Parameter zur
Beschreibung der Oberflächenreflexion und der Volumenstreuung. Es werden Methoden
vorgestellt, welche eine Abschätzung der relevanten Größen ermöglichen. Die Verknüpfung
der Simulationsumgebung mit diesen Parametern schafft die Basis für ein Verfahren zur
Kompensation des Messfehlers.
P20
Comparison of phase unwrapping algorithms applied to singular phase fields
K. Seifert*, A. Berger*, K. Mantel**, V. Nercissian*, N. Lindlein*, * Institute of Optics, Information
and Photonics, Friedrich-Alexander-University Erlangen-Nuremberg; ** Max-Planck-Institute for
the Science of Light, Erlangen, [email protected]
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Deformation measurements of objects with rough surfaces can be carried out using speckle
interferometry. To reconstruct the surface deformation, unwrapping of the measured phase
data is necessary. Due to the surface roughness, the phase data contain a high amount of
singularities, making the phase unwrapping highly involved.
To improve the evaluation of the phase data, physical means can be taken to reduce the number
of singularities in the Speckle field. Nonetheless, it is inevitable to apply elaborated software
algorithms for the phase unwrapping.
In this work, we test several well known phase unwrapping algorithms and apply them to phase
data with a varying amount of singularities. Furthermore, we judge the effectiveness of abovementioned physical means for reducing the number of singularities. Among the algorithms we
compare are path following algorithms like Goldstein‘s and Flynn‘s algorithms, as well as global
approaches like the minimum LP-Norm algorithm.
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3D-Metrology
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Poster
P21
An optical 3D shape and deformation measurement system for the analysis of
dental biomaterials
M. Dekiff*, P. Berssenbrügge*, B. Kemper**, C. Denz***, D. Dirksen*, * Poliklinik für Prothetische
Zahnmedizin und Biomaterialien, Universitätsklinikum Münster; ** Centrum für Biomedizinische
Optik und Photonik, Westfälische Wilhelms-Universität Münster; *** Institut für Angewandte
Physik, Westfälische Wilhelms-Universität Münster, [email protected]
Non-destructive analyses of biomaterials in prosthetic dentistry require sensitive measurement
techniques for the determination of deformations.
An optical 3D shape and deformation measurement system is presented, which combines
Electronic Speckle Pattern Interferometry (ESPI) with Digital Speckle Photography (DSP) and
photogrammetric 3D shape acquisition by digital image correlation of a projected laser speckle
pattern. While ESPI is employed to measure deformations in the direction of the optical axis,
DSP is used to determine deformations orthogonal to this axis. The photogrammetric 3D shape
acquisition is applied to determine deformations that exceed the measurement range of ESPI
and DSP.
The system is validated by comparisons of acquired measurement data with results from finite
element analysis.
Various parameters of the measurement system, such as the average size of the projected
speckles and the apertures of the cameras, are optimized with focus on simultaneous
measurements with all three techniques.
P22
Medical Applications enabled by a motion-robust optical 3D sensor
S. Ettl*, S. Fouladi-Movahed**, S. Bauer***, O. Arold*, F. Willomitzer*, F. Huber*, S. Rampp**,
H. Stefan**, J. Hornegger***, G. Häusler*, * Institute of Optics, Information and Photonics,
Friedrich-Alexander-University Erlangen-Nuremberg; ** Epilepsy Center, University Hospital of
Neurology, Friedrich-Alexander-University Erlangen-Nuremberg; *** Pattern Recognition Lab,
Department of Computer Science, Friedrich-Alexander-University Erlangen-Nuremberg,
[email protected]
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In the medical field, the demand for motion-robust, 3D data acquisition is steadily growing, e.g.
for capturing limbs to construct prostheses. For this purpose, an optical 3D sensor is required
which enables a flexible and comfortable 3D capturing of body parts.
The measurement principle „Flying Triangulation“ (S. Ettl et al., Appl. Opt. 51 (2012) 281-289)
enables such measurement tasks. The sensor, based on light sectioning, can be freely moved
around the object while capturing sparse 3D data with each single shot. The data is aligned and
displayed in real time and after a few seconds a dense 3D model of the object is generated.
As representative medical applications, we show two examples: an application in epilepsy
surgery and patient positioning in radiation therapy. In epilepsy surgery, the goal is to locate and
remove brain regions responsible for epilepsy by combining functional and anatomic data. The
co-registration of the two data is performed employing Flying Triangulation. In radiation therapy,
the patient position must be known for accurate dose delivery. It is captured employing Flying
Triangulation. We present measurement results and discuss further fields of applications.
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3D-Metrology
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Poster
P23
Sparse Active Triangulation Grids for Respiratory Motion Management
S. Bauer*, S. Ettl**, J. Wasza*, F. Willomitzer**, F. Huber**, J. Hornegger*, G. Häusler**, * Pattern
Recognition Lab, Department of Computer Science, Friedrich-Alexander-University ErlangenNuremberg; ** Institute of Optics, Information and Photonics, Friedrich-Alexander-University
Erlangen-Nuremberg, [email protected]
The management of respiratory motion poses a challenge to a variety of medical applications.
In radiation therapy, studies have shown that external body motion correlates with the internal
tumor position. Based on a patient-specific model learnt prior to the first fraction, the tumor
location can be inferred from an external surrogate during treatment, superseding intra-fractional
radiographic imaging. Existing solutions rely on a single 1D respiratory surrogate and exhibit a
limited level of accuracy due to inter-cycle variation. Recent work indicated that considering
multiple regions would yield an enhanced model.
Hence, we propose a novel solution based on a single-shot active triangulation sensor (Flying
Triangulation, Ettl et al., Appl. Opt. 51 (2012) 281-289) that acquires a sparse grid of 3D
measurement lines in real time, using two perpendicular laser line pattern projection systems.
Building on non-rigid point cloud registration, the elastic displacement field representing the
torso deformation with respect to a reference is recovered. This displacement field can then
be used for model-based tumor tracking. We present measurement results and non-rigid
displacement fields.
P24
Robust pattern indexing methods for “Flying Triangulation”
S. Ettl, F. Willomitzer, O. Arold, G. Häusler, Institute of Optics, Information and Photonics,
Friedrich-Alexander-University of Erlangen-Nuremberg, [email protected]
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The measurement principle „Flying Triangulation“ (S. Ettl et al., Appl. Opt. 51 (2012) 281-289)
enables a comfortable and motion-robust acquisition of 3D data. The handheld sensor, based
on light sectioning, is freely moved around the object, while generating a series of sparse 3D
views. These views are aligned to each other „on the fly“ and the current measurement result is
displayed in real time. A dense 3D model is generated within a few seconds.
An essential part of this process is a correct identification of the projected lines. If an object part
is observed within the measurement volume of the sensor, so-called „regions of uniqueness“
guarantee that no errors occur. However, object parts outside the measurement volume lead to
incorrect indexing. Since the sensor is freely hand-guided, such outliers are unavoidable. An
automatic removal a posteriori is commonly impossible, since the outliers might intersect with
correct data.
We will present methods to overcome this problem, by combining hardware- and softwarebased approaches. Measurement examples will be given to demonstrate the improvement.
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3D-Metrology
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121
Poster
P25
Calibration of “Flying Triangulation”
M. Schröter, F. Willomitzer, E. Olesch, O. Arold, S. Ettl, G. Häusler, Institute of Optics, Information
and Photonics, Friedrich-Alexander-University of Erlangen-Nuremberg,
[email protected]
In (Ettl et al., Appl. Opt. 51 (2012) 281-289) we introduced the optical 3D sensor, „Flying
Triangulation“. A hand-guided, easy, motion-robust measurement of complex objects is
possible. No external tracking is necessary, due to sophisticated registration algorithms.
To get real metric 3D data with best possible accuracy, a calibration of the sensor is needed.
The special feature is that we have to define internal and external parameters of the camera and
as well of the projector. Currently, we apply a model-free calibration method, which is timeconsuming and which needs much user interaction. The basic idea of our new approach is to
use a calibration pattern that can be either self-luminous or used as projection screen. This way,
we are able to apply a calibration that is much more user friendly, more accurate, and reliable.
P26
Color recipe prediction for facial epithesis materials
P. Berssenbrügge*, C. Runte*, M. Dekiff*, C. Denz**, D. Dirksen*, *Poliklinik für Prothetische
Zahnmedizin und Biomaterialien, Universitätsklinikum Münster; **Institut für Angewandte
Physik, Westfälische Wilhelms-Universität Münster, [email protected]
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The computer aided design of epitheses, i. e. artificial substitutes for body parts, involves the
construction of a suitable shape and the reproduction of the colors of the replaced or surrounding
skin surface. The latter is a crucial point especially for facial epitheses.
Color reproduction is based on a precise measurement of the color defining remission spectrum.
Furthermore, it requires a method of color recipe prediction, i. e. the calculation of concentrations
of given colorants, necessary to reproduce a certain color.
An adequate model describing the radiative transfer within translucent materials is the twostream approximation given by Kubelka and Munk. As this theory excludes a refractive index
change at the surface, an additional surface correction is applied in order to convert the
measured overall remission of a color specimen into the internal remission caused only by
absorption and scattering within the medium.
On the basis of color specimens of epithesis material mounted on white and black coated
substrates, the constants of absorption and scattering of the involved colorants are determined.
Examples of color recipe prediction based on these data are presented.
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3D-Metrology
Colour Measurement
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123
Poster
P27
Difference deflectometry with coupling mirrors for flatness measurements of rough
or scattering surfaces
M. Schulz, G. Ehret, Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig,
Germany, [email protected]
For flatness measurements of specular optical surfaces, the Extended Shear Angle Difference
technique (ESAD) has been established [1], which measures the difference of surface slopes
at two laterally separated positions. The surfaces slopes are determined by an autocollimator
and a pentaprism. From the slope differences measured along a scanning direction, the surface
topography is reconstructed.
Since ESAD uses autocollimators and thus requires specular surfaces, this technique cannot
be applied directly to scattering (technical) surfaces such as granite. This can be overcome by
using mirrors coupled mechanically to the surface under test. We have set up a demonstrator
using two mirrors with a fixed distance to realize the shear, and a common autocollimator
measures the slope difference.
We expect to achieve uncertainties lower than those attained by commercial inclination sensors
which reach sensitivities down to 1 µm/m. The principle and setup of the shearing unit will be
described and exemplary measurements will be presented.
[1] I. Weingärtner, M. Schulz, C. Elster, ”Novel scanning technique for ultra-precise measurement
of topography,” Proc. SPIE 3782 (1999), 306–317
P28
Object reconstruction by deflectometry
E. Olesch, C. Faber, G. Häusler, Institute of Optics, Information and Photonics, University
Erlangen-Nuremberg, Germany, [email protected]
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Phase-Measuring Deflectometry (PMD) is a meanwhile established method to measure specular
freeforms. A camera observes a sinusoidal pattern reflected by the specular object under test.
While having extremely high local sensitivity, this method suffers from a distinct weakness: It is
difficult to achieve a global accuracy that can compete with interferometry or CMMs. The reason
is that the relationship between the actually measured effect and the underlying object form is
complicated: It depends on unknown ray deflections at unknown positions in space. The most
common existing reconstruction method is an iteration which needs knowledge of one single
point location. Unfortunately, even under the assumption of a perfect sensor calibration the
global accuracy still depends strongly on the accuracy of this point.
To overcome this problem we developed a new reconstruction method which no longer relies
on this information. Instead, the new method minimizes the global error of all observed points.
Measurements with one or more subsequently tilted cameras can be used. The method is quite
simple and user friendly, the accuracy can be improved, and the angular dynamic range can be
increased.
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Deflectometry
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125
Poster
P29
Kill two birds with one stone - measure shape and reflectivity at the same time
A. Wörnlein*, R. Krobot**, C. Faber**, E. Olesch**, F. Stinzing**, C. Stegmann***, C. van Eldik*,
G. Häusler**, * Erlangen Center of Astroparticle Physics, Friedrich-Alexander-Universität
Erlangen-Nürnberg; ** Institute of Optics, Friedrich-Alexander-Universität Erlangen-Nürnberg;
*** DESY Zeuthen, [email protected]
The Cherenkov Telescope Array (CTA) collaboration will construct an array of telescopes to
perform astronomical observations in the very high energy range. The about 100 telescopes
will consist of a reflective and light focusing dish of all in all 10.000 mirror tiles. To reduce costs
and weight of the telescope, these mirrors will be constructed as composite mirrors with an
underlying structure and a coated glass surface on top.
Two important features of the mirrors have to be tested: first the shape must be accurate in order
to concentrate photons within a certain spot. Second, the local reflectivity must be sufficient
within a wavelength range from 300 nm to 600 nm.
An obvious geometry to measure both features is by concentric illumination and observation.
This method requires a big lab (~30m), so we developed a compact deflectometric device (PMD)
to measure the shape (e.g., within a climate chamber). We will discuss reflectivity measurements
with different geometries and will specifically deal with convenient measurement options, to be
integrated in the PMD device.
P30
Deflectometry for surface inspection and shape fidelity analysis for manufacturing
and polishing of safety spectacle molds
A. Speck*, B. Zelzer*, A. Langenbucher*, T. Eppig*, *Lehrstuhl für Experimentelle Ophthalmologie,
Universität des Saarlandes, [email protected]
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Work in hazardous zones with possible chemical, thermic or mechanical injuries requires
protection with safety spectacles, produced by injection molding techniques. Despite the high
importance of optical quality, molds are rarely tested before or during the injection process. The
purpose of this study was to implement 3D phase measuring deflectometry (PMD) for shape
fidelity tests of (bi)spherical and fullform mold surfaces.
The setup is based on a PMD sensor (3D-Shape GmbH, Erlangen, Germany) equipped with
3 cameras and a 5 axis positioning stage. Analysis of the object’s surface was reviewed by GOM
Inspect (GOM mbH, Braunschweig, Germany). Eight molds of a bispherical safety spectacle
and two spherical fullform molds were polished, measured and corrected through accurately
described form revision.
Target-actual comparisons and defined fit evaluations showed local groove, peaks and global
shape deviations from -19µm to 30µm. The molds were repolished concerning the surface
analysis.
In conclusion, the setup allows shape characterization of molds before and after repolishing.
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Deflectometry
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127
Poster
P31
Uncertainty estimation in a non-null metrology system
G. Baer*, D. Flöss*, C. Pruss*, W. Osten*, M. Schulz**, * Institut für Technische Optik (ITO),
Universität Stuttgart;, ** Physikalisch-Technische Bundesanstalt (PTB), Braunschweig,
[email protected]
A method to characterize the uncertainties in an optical system for the measurement of aspheric
and freeform surfaces without dedicated null optics in a non-null measurement fashion is
presented. Even though non-null test arrangements allow for increased measurement flexibility
the evaluation of the measurement results becomes much more complex than in the null test
variant. The problem becomes then the identification of small phase deviations caused by the
test surface in the presence of systematic system aberrations several orders of magnitude
larger. The characterization of the interferometer aberrations plays hereby a central role in the
measurement process for an accurate assessment of the test surface. In this work we present
an approach to estimate the measurement uncertainties of the setup.
P32
Measuring the refractive index of double-clad fibers using an interferometric technique
R. H. Abd El-Maksoud*,**, M. Hillenbrand*, S. Sinzinger*, M.F. Omar**, * Fachgebiet
Tech­­ni­­sche Optik, Institut für Mikro- und Nanotechnologien (IMN-MacroNano®), Technische
Univer­sität Ilmenau, ** Physics department, Faculty of Science, Ain Shams University,
[email protected]
Multiple-beam Fizeau interferometry is an accurate, simple, and nondestructive technique in the
field of fiber research. Inserting the fiber into the liquid silvered wedge causes the fringes to shift
across the fiber region with respect to the fringes at the liquid region. Fringe shift is a function
in the geometry of the different regions of the fiber and the refractive index profile of the fiber. In
a previous paper (Applied Optics, Vol. 50, No. 31, (2011)) the theory for the interference pattern
formation was developed. In this contribution, we extend the theory to include graded index
double-clad fibers. In addition, we discuss the experimental aspects of the measuring system.
P33
High speed “realtime” multi-lambda PS and FT interferometry
J. Wesner*, *Leica Microsystems CMS GmbH, [email protected]
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Vibration, turbulence and thermal drift are critical in interferometry, especially when testing or
fine adjusting high NA microscope objectives. We present an optimized multi-core software
that does pretty fast Fourier Transform (FTI) as also Phase Shifting (PSI) interferometry with up
to 25 frames/s in FTI and 14 4-bucket frames/s in PSI mode at 512x512 pixels (26 frames/s
at 390x390 pixels) on an Intel i7 4-core computer while SIMULTANEOUSLY calculating and
“live” displaying raw phase, modulation, unwrapped phase, Zernike fit and coefficients, artificial
interferograms, PSF etc. Even higher speeds are achievable if some of the output is disabled,
but for PSI actually the camera speed (currently 65Hz, optionally 135Hz @ >1 Mpixels with a
double data rate GigE camera) limits the number of N-bucket frames/s. The light source can
be switched to 8 different wavelengths from frame to frame, allowing “realtime” testing and
adjustment of lateral and longitudinal color errors. We present a working setup with a Michelson
interferometer and explain some details of the multithread structure to transfer buffers from the
grabber thread to the freely selectable number of calculator threads.
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Interferometry
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129
Poster
P34
Digitale Lochkamera
M. Rose*, M. Baierl**, A. Koch*, K. Bobey*, * Fakultät Naturwissenschaften und Technik,
Hochschule für angewandte Wissenschaft und Kunst Hildesheim / Holzminden / Göttingen; **
GAMB Cross-Media-Design, [email protected]
Die Entwicklung von Bildsensoren und Kompakt-Systemkameras motivieren zur Wiederentdeckung des Lochkameraprinzips. Durch ein kleines Aufnahmeformat kann das vorhandene Licht
möglichst effizient ausgenutzt werden. Das Design der Lochkamera basiert auf einem Kompromiss zwischen Lichtstärke und Auflösungsvermögen. Die Verwendung eines zeitgemäßen
CMOS-Bildsensors mit Mikrolinsen sowie einer optimierten Lochblende verhelfen der Lochkamera bewegte Szenen fotografisch festzuhalten und gleichzeitig ein Maximum an Auflösung zu
erzielen.
Mit Hilfe strahlenoptischer und wellenoptischer Grundlagen wird Beugung als auflösungsbegrenzender Faktor und die Lochblendengröße als lichstärkebegrenzender Faktor identifiziert.
Eine experimentelle Umsetzung der digitalen Lochkamera dient zur Bewertung der vorangegangenen Modellstudie. Die besten Bildresultate bezüglich Bildschärfe und Auflösung werden
erreicht, wenn die Lochkamera im Übergangsbereich zwischen Nah- und Fernfeldbeugung arbeitet. Die Praxis zeigt, dass optimale Lochdurchmesser größer sein müssen, als die Theorie
auf Basis der Fraunhoferschen Näherung vorgibt. Die digitale Bildaufnahme und –verarbeitung
vereinfacht die Lochkamerafotografie.
P35
A minimal invasive visualization system for industrial combustion chambers at 310 nm
C. Pruss*, M. Werschy**, A. Giese***, W. Osten*, * Institut für Technische Optik (ITO), Universität
Stuttgart; ** DBI - Gastechnologisches Institut gGmbH Freiberg; *** Gaswärme-Institut e.V.,
Essen, [email protected]
The monitoring of industrial combustion processes at high temperatures beyond 1000°C (e.g.
in glass production) is a challenge for the used optical detection system. We present a minimal
invasive endoscopic system designed for operation inside the combustion chamber. A three
level cooling system protects the image intensifier based camera system inside the probe that
can be inserted into the combustion chamber through existing inspection ports. The camera
system is designed to detect light in the UV spectral band of OH- Emissions, which allows to
visualize the flames on the background of the hot chamber walls.
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Camera Systems
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131
Poster
P36
Manipulation of Birefringent Micro particles using the Angular Momentum of Light
in a Fabry-Perot Resonator
E. Frins*, B. Hils**, W. Dultz**, H. Schmitzer, * Universidad de la Montevideo; ** Physikalisches
Institut Universität Frankfurt(Main); Xavier University Cincinnati USA, [email protected]
Small birefingent particles absorb the spin-angular-momentum of photons in whole or in
part and start to rotate or orient in a defined statical way in a polarized beam of light; Laser
intensities of some ten milliwatts are sufficient to stabilize them in the grip of optical tweezers
and to manipulate them according to the incident polarization. To further reduce this power we
investigated the feasibility of placing birefringent particles between the two mirrors of a FabryPerot interferometer were the laser beam passes through them several times. Using the Poincarésphere method we calculated the influence of mirrors and birefringent plates on the polarization
of light and the angular momentum transfer from light to these plates. Experimentally we verified
our results by measuring the polarization of different orders of a Fabry-Perot interferometer
with birefringent plates inside the resonator. Our results can be applied to Laguerre-Gaussian
modes which illuminate screw like shaped microparticles and we show first results of angular
momentum transfer to bacteria of the species spirillum.
P37
Investigating the transfer of orbital angular momentum of light to micrometer-sized
helical structures
H. Schmitzer, J. Link, D. Engle, S. Herbert, H.-P. Wagner*, D. Tierney, T. Horton, Xavier University
Cincinnati, *University of Cincinnati, [email protected]
Light with orbital angular momentum has a helical phase front. The number of pitches that the
Poynting vector makes per wavelength determines the angular momentum number ℓ. Light with
ℓ=1 has 1 helical turn (pitch) per wavelength. If the beam diameter and the wavelength are each
~1µm in size, then the pitch angle for ℓ=1 is ~45º. A µ-sized helical structure held in optical
tweezers usually starts to rotate due to linear momentum transfer [1,2]. If its pitch angle is similar
to the one of the tweezing light, its rotation should depend on the helicity of the light’s orbital
angular momentum. When the structure and the light have the same helicity (looking toward the
light source) the rotation should stop or slow down, when they have opposite helicity the rotation
should speed up. To investigate this effect, we tweeze helical bacteria with light of ℓ=-1,0 and+1
and observe their rotational speed.
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[1] J. R. Robbins, D. A. Tierney, H. Schmitzer, Applied Physics Letters, 88, 023901, 2006
[2] H. Schmitzer, M. Henstridge, D. Engle, W. Dultz, D. Tierney, Proceedings to the 110th Spring
meeting of the German Society of Applied Optics in Brescia, June 2009
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Optical Tweezers and Manipulation
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133
Poster
P38
Ghost images for optical systems with tilted object plane
R. H. Abd El-Maksoud*, **, M. Hillenbrand*, S. Sinzinger*, * Fachgebiet Technische Optik, IMN
MacroNano®, Technische Universität Ilmenau, ** Physics department, Faculty of Science, Ain
Shams University, [email protected]
Ghost images are formed by light that is partially reflected by optical surfaces. Ghost images
may cause contrast reduction and may veil parts of the nominal image. Performing ghost image
analysis during the design stage is important to ensure the success of the system. In a previous
paper (Applied Optics, Vol. 50, Issue 15, pp. 2305-2315 (2011)), modeling ghost images was
performed using a sequential ray tracing technique. Synthesizing ray paths into ghost and
nominal paths and performing sequential ray tracing provides a powerful tool for describing
ghost image formation in optical systems. We address the applicability of Scheimpflug principle
for ghost image formation and we present a new criterion to identify problematic ghost images
in the paraxial approximation. Numerical examples are considered and discussed.
P39
RBF-based optical surfaces
J. Werner, M. Zhao, M. Hillenbrand, S. Sinzinger, Technische Universität Ilmenau,
[email protected]
Freeform optical surfaces offer additional degrees of freedom for designing imaging systems
without rotational symmetry. This allows for a reduction in the number of optical elements,
leading to more compact and lightweight systems, while at the same time improving the image
quality. This also enables new areas of application. Commonly used representations for freeform
surfaces are x-y-polynomials, Zernike polynomials and NURBS. Radial basis functions (RBF)
have been used for many years e.g. in artificial neural networks and functional approximation
and can also be used to describe optical surfaces. In this contribution we investigate properties
specific to RBF-based optical surfaces and compare the performance of RBF-based surfaces
to other representations in selected optical imaging systems. Interesting aspects include the
dependency on the number of RBF that are summed to form the surface, the locality structure
and its effects on optimization.
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P40
Talbot Focussing - a new effect of periodic structures and its utilization
R. Buschlinger, K.-H. Brenner, ZITI, Chair of Optoelectronics, University of Heidelberg,
[email protected]
The Talbot effect is a well know phenomenon, in which periodic structures reproduce themselfes
at multiples of the Talbot distance. Also it was discovered by Lohmann, that for some fractional
Talbot distances, self similarities with a conversion from phase to amplitude appear. This effect
was called the fractional Talbot effect. Here we discuss a new phenomenon of periodic gratings
which we call Talbot focussing. In this case, the observation is not a reproduction of the initial
distribution but instead a very sharp focus in the center of the cell. The theory of this effect and
applications to metrology are discussed.
134
Optical Design, Simulation and Modeling
Fundamental Optics
135
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Poster
P41
Simulation of higher order aberrations using adaptive optics
D. Weigel*, H. Jungnickel**, H. Babovsky*, A. Kiessling*, R. Kowarschik*, * Institute of
Applied Optics, Friedrich-Schiller-University Jena; ** Course of Optometry, University of Applied
Sciences Jena, [email protected]
It is possible to measure and correct the aberrations of the human eye almost in real time by
using adaptive optical systems. Furthermore, it enables the generation of test images containing
defined aberrations by deforming the wave fronts of the image. This gives us the possibility to
investigate the influence of single aberrations on the subjective human vision. The deformable
mirror Mirao 52e is used as an adaptive optical element to modify the wave fronts before
they enter the human eye. Thereby, higher order aberrations (HOA) up to the 6th order can be
generated by the mirror, due to its 52 actuators.
In this work, we present a study in cooperation with the University of Applied Sciences Jena.
The study contains the evaluation of 30 subjects on the „just noticeable differences“ (JND) of
two single HOA (trefoil and coma).
P42
Characterization of the deformable mirror Mirao 52e
D. Weigel*, A. Kiessling*, R. Kowarschik*, * Institute of Applied Optics, Friedrich-SchillerUniversity Jena, [email protected]
During the last years, adaptive optical systems became important tools in vision science and
ophthalmology. As the deformable mirror we use the Mirao 52e. It is widely used, due to a high
stroke of up to ±50µm. At the our institute we use this mirror in an adaptive optical system to
correct as well as to generate wavefront aberrations of the human eye. We investigated the
ability of our mirror to generate defined wave front aberrations up to the 6th order. Furthermore,
we analyzed the dynamic properties of the mirror to estimate the possibilities to use this mirror
in a high speed operation mode.
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136
Physiological Optics
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137
Poster
P43
Traceable measurement of nanoparticle size using transmission scanning electron
microscopy (TSEM)
E. Buhr, T. Klein, D. Bergmann, C.G. Frase, Physikalisch-Technische Bundesanstalt, Bundes­
allee 100, 38116 Braunschweig, Germany, [email protected]
Nanoparticles are increasingly applied in science and technology. Possible associated risks and
regulatory demands emphasize the need for versatile and traceable methods for nanoparticle
characterization. We developed a method which uses a scanning electron microscope operated
in transmission mode (TSEM) to enable nanoparticle size measurements which are traceable to
the SI unit ‘metre’.
Traceable TSEM measurements rely on a calibration of the instrument and an appropriate
physical model of the image formation process. To determine the particle boundary in TSEM
images we use a threshold approach. The correct threshold level is calculated using a Monte
Carlo simulation of the image generation taking into account the 3D shape and composition of
the nanoparticles as well as relevant properties of the instrument.
An automated image analysis tool enables the analysis of a series of TSEM images containing
thousands of particles to attain particle size distributions. As examples, nanoparticles of three
different material classes with sizes ranging from about 7 to 200 nm have been measured. The
expanded uncertainty of the mean diameter is between about 1.5 to 5 nm.
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138
Electron Microscopy
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Poster
P44
Advancing from plane to solid angle in autocollimator calibration
O. Kranz, R.D. Geckeler, A. Just, M. Krause, Physikalisch-Technische Bundesanstalt, Braun­schweig,
[email protected]
Autocollimators have proven to be capable of accurate and traceable angle metrology. Their
characterisation and calibration is central to making full use of their potential by correcting
residual angle errors. In the recent years, great progress has been made at the PhysikalischTechnische Bundesanstalt (PTB) in this field. However, important challenges remain, such as (1)
the extension of traceable calibration from the plane to the solid angle and (2) the calibration
of the effects of optical path length changes. In this contribution, we will present our latest
efforts at PTB to build up a novel device for this purpose, the Solid Angle Autocollimator
Calibrator (SAAC). It makes use of an innovative Cartesian arrangement of three autocollimators
(two reference autocollimators and the autocollimator to be calibrated) which allows a precise
measurement of the angular orientation of a reflector cube in space. Important engineering
considerations of the calibration device will be discussed. Strategies for the adjustment of the
components and the determination and correction of residual adjustment errors will be outlined
which might be of general interest.
P45
Measurement of wavefront deformations and absorptance in high power laser
optics
K. Mann, U. Leinhos, J. Sudradjat, B. Schäfer, Laser-Laboratorium Göttingen, Hans-AdolfKrebs-Weg 1, 37077 Göttingen, Germany, [email protected]
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Beam guiding and focusing optics for high power lasers are subjected to thermal stress, leading
to transient distortions of the transmitted wavefront. This ‘thermal lens’ effect is caused by the
residual absorption of optical materials (glasses, mirrors, coatings), resulting in local changes of
both refractive index and surface figure. Thus, time-dependent wavefront aberrations associated
with the heating of the opto-mechanical system can lead to significant deviations of the beam
parameters from targeted design and process values (‘focus shift’).
A measurement system for quantitative registration of this thermal lens effect was developed. It
is based upon a Hartmann-Shack wavefront sensor with extreme sensitivity, which can record
relative wavefront changes in the range of λ/10,000. Since the extent of deformation is directly
proportional to the absorption, the technique can be employed for rapid assessment of the
material quality. We present results from photo-thermal measurements on optical elements
under 193nm irradiation. In addition, examples for assessment of complex optical systems for
high power solid-state lasers are given, as e.g. F-theta objectives.
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Optical Metrology
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Poster
P46
The first optical distance sensor offering true nm-uncertainty
L.A. Cacace*, W.D. van Amstel**, R. Asjes***, R. Henselmans****, * AC Optomechanix,
** WimOptik; *** SensoRon, ****TNO, [email protected]
Till now, every commercially available optical distance sensor does not (and fundamentally
cannot) deliver nm-level uncertainty when measuring even slightly tilted surfaces, though
spec sheets often suggest differently! The reason is that all common single point optical
distance sensors suffer from strong tilt-dependency, resulting in measurement uncertainty in
the µm range, which is not good enough for ultra-precision CMMs and freeform measurement
machines. Our sensor designs solve this problem by both preventing and correcting tilt
dependent errors (patent pending), enabling tilt-robust measurements with nanometer-level
uncertainty. Moreover, the proven response model allows us to match each sensor to specific
measurement needs, and the primary range of 3 μm to 10 μm can be extended up to millimeters
by addition of a servo and secondary measurement system while preserving nm-accuracy. As
such, our sensor is applied in TNO’s NANOMEFOS freeform optics measurement machine,
enabling its state-of-the-art accuracy.
P47
Messung der Erosion an Luftfahrtmaterialien durch Speckle-Analyse
F. Salazar, A. Barrientos, ETSIMinas, Universidad Politécnica de Madrid (UPM Spanien;
Departamento de Física Aplicada, [email protected]
Die Untersuchung der Erosion an Luftfahrtmaterialien ist wichtig, weil sie das mikroskopische
Oberflächenprofil der Strukturen ändert. Diese Modifizierung der Oberfläche kann kleine
Instabilitäten verursachen und eine Verschiebung der Grenzschichtdicke hervorrufen. Ziel dieser
Arbeit ist die Bestimmung der Erosion an Materialien, die üblicherweise in der Luftfahrtindustrie
verwendet werden. Zu diesem Zweck wurde ein Specklesystem aufgebaut, das die Messung der
Oberflächenänderungen ermöglich. Die statistische Verarbeitung der experimentellen Ergebnisse
zeigt einen inhomogenen Einfluss von den Umweltfaktoren auf der Materialoberfläche.
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Optical Metrology
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Index of authors
Name
Abd El-Maksoud R. Aichele C.
Amberg M.
Arold O. Asjes R.
Asoubar D.
Babovsky H. Baer G.
Bähr J.
Baierl M.
Bär M.
Barrientos A.
Bartelt H.
Bäuerle A. Bauer S. Bekaert J. Berge A.
Berger A. Bergmann D.
Berssenbrügge P.
Bielke A.
Bierlich J.
Biertümpfel R.
Bilski B.
Bischoff M.
Bobey K.
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Christiansen S.
Corliss D. Czarske J.
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Dieckmann K.
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Ehret G. Endendijk W. Endres J. Engel A.
Engelen A. Engle D.
Eppig T. Erdmann L. Erichsen I. Ernst K.-R.
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Gebhardt A.
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Ghadyani Z.
Giese A.
Görtz B. Grewe A.
Große M.
Groß H.
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Häfner M.
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Halfpap Ch.
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Hils B.
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Link J. 132
Liu X.
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112
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Mitschunas B.
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Müller A.
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Peter A.
Pfeffer M.
Pfister T.
Plattner M. P.
Pond J. Pruss C.
Pütsch O.
Putzer P.
Ramm R.
Rampp S. Rausch D.
Reichel S.
Reichle R.
Richmann A.
Ries H.
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Ruprecht A.
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Scheiding S.
Scheller M.
Schindler A. Schlichting J.
Schlüßler R.
Schmidt I.
Schmitzer H.
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Schröter M.
Schubert R.
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Shukla S.
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Verbrugh S.
Voelkel R. Vogler U. Vollmer M.
von Bally G.
von Finck A. Voorspoels R. Voß O.
Vukusic P.
Wagner H.-P. Wang J.
Wartmann R.
Wasza J. Weichelt T.
Weigel D. Werschy M. Werner J.
Wesner J.
Wester R. Widulle F.
Wiegmann A.
Wilke M.
Willenborg E. Willomitzer F.
Wissenbach K. Wörnlein A.
Wurm M.
Wu Y.
Wyrowski F.
Yang Z.
Zelzer B.
Zhang S.
Zhao M. Zimmermann J. Zwick S.
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Friday, 1st June
DAF Museum
Fraunhofer Lecture and Gala Dinner
18:30h Welcome at the Museum
(Tongelresestraat 27, 5613 DA Eindhoven)
19:30h
Fraunhofer Lecture
Dr. Jos Benschop, Vicepresident Research ASML
„Optical Lithography”
Moore’s Law dictates that every 18 months the number of transistors on an integrated chip doubles. This is first and foremost enabled by optical lithography printing ever smaller transistor on an integrated circuit.
ASML is market and technology leader in this multi-billion euro industry. State-of-the art immersion scanners, using 193 nm light and immersion optics with numerical aperture of 1.35, print 40 nm wide lines on a 300mm resist coated silicon wafer. Extreme Ultra Violet (EUV) scanners are printing lines below 20nm.
To enable a cost-effective continuation of Moore‘s law the productivity of these optical lithography scanners have
increased steadily over the last decades. Today‘s pixel rate exceeds 2 Terapixel/second.
The combination of sub-nm precision and high acceleration continues to push the envelope of optics and sensor tech
nology.
After an introduction into IC fabrication, and the role of
lithography, it will be explained how lithography, and optics used for lithography, have evolved over the years enabling a cost effective continuation of Moore‘s law.
20:30h
Gala dinner
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Poster award
Farewell notes
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Communications from the Organizing Committee
Meeting Location
The Joint Meeting of the DGaO and Photonics Cluster Netherlands (113. annual Meeting of the DGaO)
will take place from
May 29th – June 2nd 2012
at the Eindhoven University of Technology, Eindhoven The Netherlands. Presentations and exhibition will
take place in the Auditorium building on the campus of the TU/e.
Technische Universiteit Eindhoven
Den Dolech 2
5612 AZ Eindhoven
www.tue.nl
There are paid parking possibilities on the campus of TUE. Parking tickets can be bought at the
registration desk (7.50 EUR / day) or can be paid through the available ticket machines (5.00 EUR / day).
Opening times:
Tuesday, May 29th, from 16:00h to 19:00h;
Wednesday, May 30th - Friday, June 1st from 8.00 until the end of the presentations;
Saturday, June 2nd, from 8:30h to 13:00h.
Registration to the Meeting:
Participants are kindly requested to register to the meeting using the online form at www.dgao.de.
There is a possibility to enroll through letter or fax to:
Congres- en Evenementenbureau TU/e
Postbus 513, AUD 2.26
NL-5600 MB Eindhoven
Tel. +31 40 24-74000, Fax +31 40 27-56564
using the Registration Form downloadable from the website or enclosed with this publication.
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Payment:
For payments before April 28th 2012, the following Registration Fees apply:
DGaO, DPG, PCN, EOS Members:
200.00 Euros
Non members:
250.00 Euros
80.00 Euros
Students, Retired, Unemployed:
After April 28th 2012, all the above fees will be increased by 30.00 Euros.
Accompanying persons do not pay any conference fee.
There are no day tickets available.
Students giving a presentation (verbal or poster) may apply to the DGaO for financial support. The
amount of support provided is determined by the DGaO - management.
Applicants are requested to submit the completed application form to the conference office, approved
and signed by the Head of their Institution.
150
The payment of the registration fee should be made at the following bank accounts:
Accountname:
Congressoffice
/ Eindhoven
University of Technology, Den Dolech 2, 5612 AZ Eindhoven
Deutsche
Gesellschaft
für angewandte
Optik
Accountnr.:
1501.82.821
Sparkasse
Burbach-Neunkirchen
IBAN no.:number:
NL65RABO0150182821
Account
200 6401
BIC: RABONL2U
(bank
40 Identifier Code=Swift)
Bank
code 460 512
Bank: Rabobank
Kronehoefstraat 87, 5612 HL EINDHOVEN, The Netherlands
Comment:
DGaOEindhoven,
2012
VATpayments
nr. TU/e: from
NL001956218B01
For
abroad:
BIC: WELADED1BUB
IBAN: DE 41 46051240 000 2006401
Or:
Accountname:
Congressoffice
/ Eindhoven
University of Technology, Den Dolech 2, 5612 AZ Eindhoven
Deutsche
Gesellschaft
für angewandte
Optik
Or:
Sparkasse
Burbach-Neunkirchen
Accountname:
Congressoffice / Eindhoven University of Technology, Den Dolech 2, 5612 AZ Eindhoven
Account
number:
200 6401
Accountnr.:
1501.82.821
Bank
460 512 40
IBAN code
no.: NL65RABO0150182821
Comment:
DGaO(bank
2012Identifier Code=Swift)
BIC: RABONL2U
For
payments
from
abroad: Kronehoefstraat 87, 5612 HL EINDHOVEN, The Netherlands
Bank:
Rabobank
Eindhoven,
BIC:
VAT WELADED1BUB
nr. TU/e: NL001956218B01
IBAN: DE 41 46051240 000 2006401
Hotels and Hotel reservation
Through the TU Eindhoven rooms are reserved at several hotels in the vicinity of the TU/e. These rooms
can be booked using the online registration.
Holiday Inn Eindhoven
Single room 135 EUR, Double room 155 EUR
Eden Crown Hotel Eindhoven
Single room 131 EUR, Double room 151 EUR
Queen Hotel
Single room 97.50 EUR, Double room 120 EUR
Sandton Hotel Eindhoven City Centre
Single room 100 EUR, Double room 115 EUR
Crown Inn
Single room 70 EUR, Double room 90 EUR
All prices are per room and night breakfast included.
Tourist tax is additional with 3.50 € per day.
For more information and other hotels / bed and breakfast please check:
http://www.vvveindhoven.nl/en/hotels/spending-the-night
Students:
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Budget hotel:
http://www.budgethotel.nl/
Woonhotel Eindhoven: http://www.woonhoteleindhoven.nl/index.php/en/g-location
Instructions for presenters
Each meeting room is equipped with a Video beamer. For Microsoft Powerpoint™-based presentations a
PC will be available, equipped with Microsoft Office. The presentations to be displayed can be uploaded
from CD’s or flash USB memory devices during coffee breaks before the session. If the presentation is
done using the presenter’s computer, it is required that a connection test be performed by him/her well
in advance of the Session to ensure proper functioning and to avoid delays.
Poster exhibition
The poster session takes place in the Aula of the Auditorium. An adequate number of poster boards
having dimensions 1m*2m will be available for putting up the posters. (A0)
Company Exhibition
A number of companies offered to sponsor the meeting and exhibiting their products and services. The
table top exhibition will take in the Aula of the Auditorium building. The participants are invited to walk
around the exhibition Wednesday through Friday during the conference and especially during the
breaks.
Exhibitors are welcome for booth set-up on Tuesday, May 29th 2012, starting at 16:00h. Booths can be
dismounted starting Friday, June 1st 2012, 16:00h and Saturday, June 2nd from 8.30 to 13.00.
Proceedings
The authors of both societies can publish their contributions in the DGaO Internet Journal DGaO
Proceedings. The contributions can be published as two-page manuscripts or as posters. Papers in
the proceedings can be cited. The Proceedings of the 2010 event have been accessed about 9000
times to date.
The deadline for the upload of the manuscripts and of the posters is July 20th 2012. Instructions
for the upload can be found at the DGaO Website:
http://dgao-proceedings.de/hinweise/
Editors: G. Häusler, C. Faber
Organizing Committee
Conference Chair:
Dr. Stefan Bäumer
Philips Lighting, EEC 210
Mathildelaan 1
NL-5611 BD Eindhoven
Tel. +31 40 27-94799
Members of the Organizing Committee:
Rene Aartsen, Adimec
Wim van Amstel, WimOptik
Chris Velzel, Veco b.v.
In collaboration with:
Congres- en Evenementenbureau TU/e
Postbus 513, AUD 2.26
152
NL-5600 MB Eindhoven
Tel. +31/40/24-74000
e-mail: [email protected] (www.tue.n/conferences)
How to reach the TU Eindhoven:
Train:
Walk down the ramp at the railway station, turn right and exit through the north side towards the bus
station. Walk 25 meters to the right and you will see the university buildings. Cross at the traffic light
and follow the winding path towards the TU/e campus.
The path on the right side of the campus, called Prof. Dr. Dorgelo Avenue, is suitable for wheelchair
users.
By car:
All motorways to and around Eindhoven (A2, A50, A58, A67 and A270) lead the way to the campus
which is located in the center of Eindhoven. Follow the 'Centrum' directions on the small blue signs, until
you see 'University'.
For further information please see:
http://www.tue.nl/en/university/about-the-university/accessibility-tue-campus/
Social events:
Tuesday, May 29th 2012: Welcome Meeting, Auditorium building Eindhoven University of Technology
18:00h Welcome by Stefan Bäumer
18:30h Presentation: Eindhoven – City of Technology & Design by Hans Robertus, Head of the Dutch
Design Week
Thursday, May 31st 2012: Guided Excursion to ‘s Hertogenbosch
The participants will be brought to ‘s Hertogenbosch by bus and then tour the city in small guided
groups. The tour includes some walking and a boat trip through and under the city of Den Bosch. At the
end of the excursion dinner will be served.
Friday, June 1st 2012: Fraunhofer Lecture and Gala Dinner at the DAF Museum
18:30h Welcome at the Museum, Tongelresestraat 27, 5613 DA Eindhoven
19:30h: Fraunhofer lecture:
Dr. Jos Benschop: Optical Lithograhpy
20:30h: Gala Dinner with music
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Eindhoven
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Eindhoven: Locations, Food & Drinks
1: Dommelstraat: lots of different restaurants and bars
2: Markt: lots of different restaurants and bars with outside chairs
3: Grote Berg: several restaurants and bars
4: Wilhelminaplein: several restaurants and bars
5: Stratumseind: lots of bars for some after dinner entertainment
6: DAF Museum, Tongelresestraat 27, 5613 DA Eindhoven
Bike rental:
There are several possibilities to rent bikes in Eindhoven the closets one is
Rijwielshop Kortland en Partner NS Station, Stationsplein 22, T 040-2436617
Other options can be investigated through VVV Tourist office, Stationsplein 17.
Program for accompanying persons:
For accompanying persons there will be two organized events:
Wednesday:
Floriade, Venlo
Friday:
van Abbe Museum, Museum of modern arts in Eindhoven
For both events one can register through the DGaO website.
Suggestions for other activities:
DAF Museum, Tongelresestraat 27 5613 DA Eindhoven
De Krabbedans : exposities, art rental, designshop, Clausplein 2 (Witte Dame)
Strijp S complex (old Philips complex now newly developed for the city), Torenallee 1 5617 BA
Eindhoven
Histortisch Openlucht Museum (Historical open air museum), Boutenslaan 161/B 5644 TV Eindhoven
Shopping in the city center of Eindhoven (pedestrian zone around the Markt)
General information: VVV – tourist information, Stationsplein 17 (in front of the station (south exit))
Pronunciation aid: Dutch – German:
In quite a few cases words read out loud show a resemblance between the Dutch and German words.
However there are a couple of letter combinations in Dutch, that are pronounced differently from what
one might expect coming from German. The short list below should give a very first insight on how
to read and pronounce some Dutch words correctly. Note that the list is not complete , but it is a start.
DUTCH
Æ GERMAN
oe Æ u
u
Æ ü
ij
Æ ei
ui Æ eu
z
Æ s
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Ordentliche Mitgliederversammlung der DGaO
am Freitag, den 1. Juni 2012, 16:00 Uhr, TU Eindhoven, Auditorium, Blauwe Zaal,
Den Dolech 2, Eindhoven / Niederlande
Tagesordnung:
1. Eröffnung
2. Bericht des Vorsitzenden
3. Neuaufnahmen (Liste wird zur Mitgliederversammlung ausgelegt)
4. Kassenbericht des Schatzmeisters
5. Bericht der Kassenprüfer und Beschluss über Entlastung
6. Wahl der/des Vorstandsvorsitzenden, der Schriftführerin/des Schriftführers,
der Schatzmeisterin/des Schatzmeisters, von zwei Beisitzerinnen/Beisitzern,
der EOS–Vertreterin/des EOS-Vertreters
7. Jahrestagungen der DGaO 2013 und 2014
8. Berichte über EOS, ICO, DPG
9. Berichte der Arbeitskreise
10. Verschiedenes
Bitte beachten!
Anträge zur Tagesordnung müssen mindesten 4 Wochen vor der Mitgliederversammlung
beim Schriftführer eingereicht werden:
Prof. Hartmut Bartelt
IPHT
Albert-Einstein-Str. 9
07745 Jena
Fax: 03641-206299
Mail: [email protected]
Termin: 04. Mai 2011
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DGaO Members General assembly
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Notizen
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Notizen
161
Notizen
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Notizen
163
Notizen
PVD Evaporation Materials
and Consumables
Oxides
Fluorides
Top Coats
Specials
Crucibles
Cathodes
APS Parts
164
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stellen, uns die Möglichkeiten vorstellen, und diese
dann in bahnbrechende Innovationen umsetzen.
Wir entwickeln und produzieren Schlüsselkomponenten für anspruchsvolle technische Systeme in
den Bereichen Consumer Electronics, Abgasnachbehandlung, Telekommunikation und Life Sciences.
Corning ist einer der wenigen Hersteller mit weitreichenden Erfahrungen in Materialwissenschaft,
Optik-Design, Glasproduktion, Bearbeitung, Beschichtung und Montage. Unsere optischen Materialien decken das komplette Spektrum ab, vom extremen Ultraviolett (EUV) bis ins Infrarot. Dies ermöglicht es uns, die Anforderungen vieler Märkte wie
Display, Halbleiter, Luft- und Raumfahrt, Astronomie,
Augenoptik, Lithographie, industrieller und kommerzieller Anwendungen, Messtechnik und Telekommunikation zu erfüllen.
Photonic Materials
Produkte wie Polarcor® Glaspolarisatoren und
optische Spezialfasern (z.B. biegeunempfindlich,
polarisationserhaltend, polarisierend oder verstärkend) spielen eine wesentliche Rolle in optoelektronischen Komponenten für die Telekommunikation, in der Messtechnik und Sensorik.
Technische Gläser und Glaskeramiken
Das reichhaltige Portfolio technischer Gläser und
Glaskeramiken spiegelt Cornings Innovationspotential in der Glastechnologie wider. Das Spektrum
reicht von MACOR® maschinenbearbeitbarer
Glaskeramik
über
Strahlenschutzgläser
und
Eagle XG™ LCD und Industrial Grade Substraten,
sowie Semiconductor Glass Wafer bis hin zu Gorilla®
Glass,
einem
kratzresistenten,
beständigen
Schutzglas für mobile Geräte und Touch Screens.
ULE®, ein Glas mit extremer Temperaturstabilität
Nicht nur EUV-Optiken oder große astronomische
Spiegel, sondern auch technische Produkte wie Referenzmaßstäbe oder Etalons zählen zu den Anwendungsbereichen von ULE®. Der verschwindend geringe Ausdehnungskoeffizient kann zerstörungsfrei
bis unter 10 ppb/K zertifiziert werden. Durch die
speziellen Eigenschaften von ULE® lassen sich auch
Leichtgewichtsstrukturen herstellen, bei denen eine
Gewichtsreduktion bis zu 95% erreicht wird.
Synthetisches Quarzglas
Corning HPFS® ist ein synthetisches Quarzglas höchster Reinheit mit exzellenten optischen thermischen
und mechanischen Eigenschaften. Die anspruchsvollen Einsatzgebiete reichen von der Mikrolithographie im DUV über Hochenergielaser bis zu
Fenstern für Raumfähren.
Corning Advanced Optics
hat über 50 Jahre Erfahrung in der Bereitstellung von
optischem Design auf dem neuesten Stand der
Technik, sowie in der Herstellung von Präzisionsoptik-Subsystemen. Corning ist auf die Entwicklung
und Herstellung hochleistungsfähiger Präzisionsoptik für Ultraviolett- bis Infrarot-Anwendungen
spezialisiert. Zu den Zielanwendungen gehören
Qualitätsprüfung in der Halbleiterindustrie (IC und
LCD), Mikrolithographie, Medizintechnik, Luft- und
Raumfahrttechnik und elektro-optische Sensorsysteme.
CaF2 und MgF2 Excimer Laser Optics
Hohe Transmission im UV und ausgezeichnete Laserbeständigkeit sind der Grund, warum Corning Fluoridkristalloptiken für Anwendungen in Industrie,
Medizin und Lithographie eingesetzt werden.
Corning Tropel® Metrology Instruments
Für Anwendungen in Messlabors, aber auch in Fertigungsstraßen in Präzisionsmechanik und Halbleitertechnik sind die Messgeräte von Corning Tropel®
Metrology Instruments ausgelegt. Corning Tropel®
ist Spezialist für verschiedene interferometrische
Messlösungen im Submikrometerbereich an technischen und optischen Flächen.
Corning International
Abraham-Lincoln-Straße 30
D-65189 Wiesbaden
Tel.: 00800-42676464
Fax: 00800-52676464
[email protected]
www.corning.com
Der Moment, in dem Sie als Forscher oder Entwickler
bei uns ungeahnte Möglichkeiten für sich entdecken.
Für diesen Moment arbeiten wir.
// PIONIERGEIST UND
BODENHAFTUNG
MADE BY CARL ZEISS
Carl Zeiss ist ein weltweit führendes Unternehmen der Optik und Optoelektronik
mit rund 24.000 Mitarbeitern. Zusammen mit den Besten ihres Fachs arbeiten
Sie hier in einem kollegialen Klima für technologisch bahnbrechende Produkte.
Mitarbeiter von Carl Zeiss stehen leidenschaftlich dafür ein, immer wieder etwas
zu schaffen, das die Welt ein bisschen besser macht.
Starten Sie Ihre Karriere bei uns: www.zeiss.de/karriere
YOUR PARTNER
FOR PRECISION
OPTICS AND
OPTICAL SYSTEMS
Consulting, Development, Design,
Engineering and Manufacturing
SPECTROS AG
4107 Ettingen, Switzerland
Tel: +41 61 726 20 20
Fax: +41 61 726 20 21
www.spectros.ch
Berliner Glas Gruppe:
Ihr Partner für optische Systemlösungen.
Die Berliner Glas Gruppe ist einer der führenden europäischen
Anbieter optischer Schlüsselkomponenten, Baugruppen und Sys­
teme. Mit unserem Verständnis für optische Systeme und opti­
sche Fertigungstechnik entwickeln und integrieren wir für unsere
Kunden Optik, Mechanik und Elektronik zu innovativen Systemlö­
sungen. Diese Lösungen kommen weltweit in der gesamten licht­
nutzenden Industrie zum Einsatz – von der Medizin über die Halb­
leiterindustrie, Laser und Raumfahrt, Messtechnik und Analytik
bis hin zur Verteidigung.
Als eigentümergeführtes mittelständisches Unternehmen mit
rund 1.000 Mitarbeitern können wir unseren Kunden maßge­
schneiderte und marktgerechte Lösungen von höchster Qualität
anbieten.
Selbstverständlich sind wir in allen Bereichen nach DIN ISO 9001
und DIN ISO 14001 zertifiziert.
Unsere Leistungen.
Ihr Vorteil.
Entwicklung
J Systementwicklung J Optik- und Mechanikdesign J Beschichtungsdesign J Produktbezogene Messtechnik
Schlüsselkomponenten
J Sphärische Linsen J Asphärische Linsen J Zylindrische Linsen
J Planoptik: Fenster, Prismen und Prismensysteme J Mikrostrukturierung J Beschichtung: Beschichtungsdesign, Spektralbereich:
Berliner Glas KGaA
Telefon + 49 30 60 905-0
[email protected]
www.berlinerglas.de
VUV, DUV, UV, VIS, NIR, IR entsprechend ca. 130 – 6.000 nm
J Antireflexschichten J Filter J Spiegel J Strahlteiler/-kominierer
J ITO-Schicht J Holografische Gitter
Baugruppen &
Systeme
J Optische Baugruppen und Systeme (verkittete Strahlteiler, Prismensysteme, Doublets, Triplets, Stufensysteme) J Opto-mechanische Baugruppen und Systeme J Elektrooptische Systeme J Linsensysteme J Objektive, Zoomsysteme J Messsysteme J Kameras
J Lasersysteme J Lichtquellen J Beleuchtungssysteme
SwissOptic AG
Telefon + 41 71 727-3074
[email protected]
www.swissoptic.com
LightTrans
Vir t u a lL ab™ 5
unified optical modeling
Starter Toolbox
Unified modeling for nano,
micro and macro optics
Diffractive Optics Toolbox
Laser Optics
Ultra-Short Pulses
Laser Resonators
High-NA Optics
Micro Optics
Gratings
Interferometry
Holography
Polarization Optics
Design of diffractive
and micro optical elements
Grating Toolbox
Rigorous analysis
of 2D and 3D gratings
Laser Resonator Toolbox
Flexible eigenmode analysis
of laser resonators
Color
Temporal Coherence
Spatial Coherence
Laser Beam Shaping
Diffusers
Diffractive Beam Splitters
Illumination
Index Modulated Media
Excimer Modeling
LED Modeling
Lighting Toolbox
Shaping and homogenization
of LED light
µPhase Inter
®
• Compact size and modularity
enable adaptation to a vast variety
of applications
• Ultra wide measurement range of
optics and surfaces with reflectivities from 0.3% to 100%
• Valuable features like the second
camera for alignment of the lenses
• Twyman-Green and Fizeau modus
in none instrument
• Well structured and comprehensive
software supports both production
and laboratory use
www.trioptics.com
erferometers
MO expOSUre OpTicS®
cUSTOMized illUMinATiOn fOr prOceSS
windOw OpTiMizATiOn And yield enhAnceMenT
SUSS MicroOptics, a SÜSS MicroTec AG
micro-optical components meet highest
company, is a leading supplier for
demands as required for applications in
high-quality micro-optics comprising
photolithography, optical networking
profound experience in optical design,
and metrology.
micro-fabrication and metrology. The
AdvAnced MASk AliGner liThOGrAphy
For highest demands SUSS MicroOptics
light. MO Exposure Optics® significantly
illumination
improves the yield in production and opens
systems for all SUSS MicroTec Mask Aligners,
the door to a new era of Advanced Mask
manual and automatic. MO Exposure
Aligner Lithography, where Customized
Optics® comprises two subsequent Köhler
Illumination, Optical Proximity Correction,
integrators based on fused silica microlens
Talbot-Lithography, Phase Shift Masks and
arrays. This patented concept allows to
Source Mask Optimization are introduced
homogenize both the light intensity and the
to Mask Aligner Lithography.
offers MO Exposure Optics
®
angular spectrum of the mask illumination
SUSS MicroOptics SA
|
Phone: +41 32 720 5104
|
www.suss.ch
2.05
95
90
85
80
75
70
65
60
55
Ohara GmbH
Nordring 30 A
D-65719 Hofheim
2.00
Tel. +49 6192 965050
Fax +49 6192 965051
eMail [email protected]
Web www.ohara-gmbh.com
nd -
1.95
d
Diagram Optical Glass
1.90
95
2.15
90
85
80
75
70
65
60
55
50
45
40
35
30
25
20
15
2.15
L-BBH1
2.10
2.10
2.05
1.85
2.05
low Tg glasses
2.00
2.00
1.95
1.80
1.80
1.75
1.70
1.65
1.60
S-FPM2
L-PHL2
1.55
1.70
1.45
1.85
1.80
1.75
1.70
1.65
L-BAL35
L-BAL42
L-PHL1
85
80
75
70
S-LAL18
S-LAL
60
55
50
45
40
35
30
25
20
S-LAL13 S
S-LAL14
S-LAL9
1.45
65
S-L
S-LAL8
1.50
S-FPL53
90
S-LAL61
1.55
S-FSL5
1.40
95
S-YGH5
nd
1.60
L-BSL7
S-FPL51
1.50
S-YGH
1.90
L-LAH83
L-TIH53
L-LAH85
L-LAH85V
L-LAH53 L-LAH84
L-LAH81
L-LAH87
L-LAM60
L-LAL13 L-LAM72 L-LAM69
L-LAL12
L-TIM28
L-LAL67
1.85
1.75
1.95
L-NBH54
L-LAH86
1.90
S-LAL7 S-LAL54
1.65
S-BSM81
S-PHM
S-BSM16
S-PHM52
S-BAL35
S-FPM2
S-BAL
S-BSM18
S-BSM15
S-BSM10
S-BSM
S-BSM
S
S-BAL42
S-BAL11
S-BAL41
1.55
S-BSM2
S-BS
S-BSM9
S-BSM4
S-BSM2
S-BSM14
S-PHM53
1.60
S
S-LAL12
1.40
15
S-BAL14
S-BAL3
S-
S-BAL12
S-BSL
S-BSL7
S-NSL5
S-NSL3
S-NSL3
1.50
S-FPL51
S-FSL5
S-NSL
1.45
S-FSL
S-FPL
S-FPL53
1.40
95
90
85
80
75
70
65
60
55
50
45
40
35
30
25
20
15
2.05
S-LAH79
2.00
S-TIH
S-NPH
S-NPH3
1.95
S-NPH2
1.90
S-LAH58
S-LAH
S-LAH71
S-NPH53
S-LAH55
S-LAH55V
S-LAH59
GH
S-LAH53
S-LAH65
S-LAH65V
S-LAM66
S-LAM55
S-LAM54
S-LAL59
S-LAL10
LAL13 S-LAL58
S-LAM3
S-LAM7
S-LAM2
S-LAM60
L61
S-LAM61
S-LAM58
S-LAM51
S-BAH27
S-LAM59
S-BAH10
1.65
S-TIM22
S-TIM27
S-TIM5
S-TIM8
S-TIL25
S-TIL27
S-TIL26
S-BAL2
1.70
S-TIM35
nd
S-TIM1
S-TIM2
S-TIM3
S-NBM51
S-BAM4
S-BAM3
S-TIH10
S-TIH18
S-TIH1
S-TIM25
S-TIM39
S-NBH5
S-BAM
S-NBM
1.75
S-TIH13
S-TIM28
S-NBH52
S-BAM12
S-BSM22
SM9
S-BSM28
S-TIH3
S-NBH8
S-BAH
S-NBH
S-BAH32
S-BAH11
-BSM
L3
S-NBH51
S-BAH28
S-LAM52
1.80
S-TIH11
S-TIH14
S-TIH4
S-NBH53
S-LAL56
S-BSM25
S-BSM71
S-TIH23
S-LAM
S-LAH66
S-YGH51
S-NPH1
S-TIH6
S-NBH55
S-LAH63
S-LAH52
S-LAH51
S-LAH64
1.85
S-TIH53
S-LAH60
1.60
S-FTM16
1.55
S-TIM
S-FTM
S-TIL1
S-TIL2
S-TIL6
S-NSL36
1.50
S-TIL
1.45
50
45
40
35
30
25
20
1.40
15
Date: 10/2010


           

 


        





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        
         
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


High Precision Optical Components
Optimize Your Product
As “Your Partner for Excellence in Optics” we leverage our extensive portfolio of
optical materials to offer the perfect custom component to fulfill your request
• High precision optical components such as prisms, lenses, substrates,
interference filters, and more
• Highest product quality due to more than 125 years of experience with glass
• Extensive technical equipment and most advanced in-house R&D capabilities
• High precision machining using latest state-of-the-art technologies
• World wide customer support providing integrated optical solutions
Advanced Optics
SCHOTT AG
Hattenbergstrasse 10
55122 Mainz, Germany
Phone +49 (0)6131/66-1812
Fax +49 (0)3641/2888-9047
[email protected]
www.schott.com/advanced_optics
Drives innovative technologies
You inspire,
we create...
• High performance cameras
• Tuned cameras to enhance your OEM equipment
• Full custom camera designs
Adimec is the leading supplier of high‑end cameras for machine vision,
medical and outdoor imaging applications. Our Adimec True Accurate
Imaging® technology forms the foundation for a broad range of camera
products, and brings new levels of precision and accuracy to vision systems.
We support our products with customized and expert service to systems
developers around the world.
www.adimec.com
The cornea-sclera topographer
measure up to 20mm diameter of the anterior surface of the eye
true topography because of direct measurement of height data
more than 120.000 measurement points
talk to Chris Velzel
during the conference
or visit our website
Making fitting all types of contact lenses faster, easier and more precise
comprehensive software
easy to operate, repeatable results
Eye Surface Profiler is a product of Eaglet Eye
www.eaglet-eye.com
Polarizing Beam Splitting Cubes
Phase Retardation Plates
Crystalline Optics
VM-TIM develops and produces polarizing optical elements from optical, laser,
and non-linear crystals. The application of the elements is possible for the
wavelengths from 120nm up to 25µm, whereas the standard elements in the
wavelength range between 190nm and 2.5µm are usually available from store.
Polarizing Cubes
Tp > 90%, Rs > 99%, Tp/Ts > 1000/1
UV grade: narrow band +/-5nm within 220-400nm
VIS grade: broad band 400-700nm
NIR grade: broad band 700-950nm, 950-1150nm
IR grade: broad band 1040-1560nm, 1400-2000nm
sizes: from 5mm up to 150mm
Phase Retardation Plates
Low Order, Zero Order, True Zero Order
narrow band: +/- 2-5nm within 120nm – 25µm
retardation tolerance: +/- 1 degree (ca. λ/300)
Achromatic Waveplates, broad band:
400-750nm, 700-1150nm, 1000-1750nm
sizes: from 5mm up to 75mm
Crystalline Materials
Crystalline Quartz: 180nm – 3µm
BaF2: 150nm – 12.5µm
CaF2: 150nm – 10µm
LiF: 120nm – 7µm
MgF2: 120nm – 8µm
ZnSe: 0.5 – 10µm
VM-TIM, Lutherstr. 48, 07743 Jena, Germany
Tel. +49 3641 384859, Fax +49 3641 384860
[email protected], www.vm-tim.de
Take Your Innova
to New Height
The LINOS eCatalog
2012/2013
For the "Print Catalog feeling" on
your iPad, Mac or PC. Download
here: www.qioptiq-shop.com
Micro Objecti
Diameter >=0.8 mm
FOV up to 150°
E.g. objective for w
smallest video came
Ruled, holog
transmission
mag.x system 125
Variable microinspection system
New approach in micro-inspection
Sensor diagonals up to 56 mm
Maximum performance on the
whole sensor
Optical Power Monitor
Cost efficient, hi
low stray light
Gold Pla
Laser Q
Up to 25 µ
Avg. reflec
Improved
USB powered and controlled
Different detector heads 190 – 1600 nm available
ation
ts
ectives
8 mm with
°
or world‘s
camera
Discover the Q!
Our core competencies for
the Semiconductor Industry
Conception, development and production
of turnkey solutions
UV-system design, production,
measurement and packaging
Complex 3D shaped optical components
DUV and broadband micro-inspection
solutions
lographic and
sion gratings
Our capabilities in Micro Optics
Micro Optical Components
Spherical lenses with diameter ≥ 0.3 mm
Doublets and triplets with diameter ≥ 0.5 mm
All optical glasses & special materials
Plane Mirrors,
r Quality
Endoscope Optics
Compact objectives, Rodlenses, Negatives,
Prisms and T-Windows for rigid endoscopy
Objectives for flexible endoscopy (chip-on-the-tipp)
Assembling of Image Transmitters and complex
mono- and biocular Eyepiece Assemblies
nt, high efficiency,
ght
25 µm
reflection > 98 %, 0° ≤ AOI ≤ 60°
oved environmental stability
e
Qioptiq
Tel. + 49 (0) 551/69 35-0
[email protected]
[email protected]
[email protected]
www.qioptiq.com
Mehr Optik. Mehr Technologie. Mehr Service.
70 Jahre
Kompetenz
und
Innovation
1942 - 2012
J U B I L Ä U M
www.edmundoptics.com/70-years
Kennen Sie optikprojekte,
die sich durch herausragende
Forschung & Innovationsfreude
auszeichnen?
Wir vergeben Produkte im Gesamtwert von €15.000 für wissenschaftliche Projekte
aus den Bereichen Optik und Bildverarbeitung an Studenten und Mitarbeiter
europäischer Universitäten bzw. öffentlicher Forschungseinrichtungen.
Erster Preis:
Zweiter Preis:
Dritter Preis:
€7.000
€5.000
€3.000
w Jetzt bewerben:
www.edmundoptics.com/research
Bewerbungsschluss: 30. Juni 2012
Edmund Optics® (EO) ist ein führender Hersteller und Distributor von Standard
und kundenspezifischen Präzisionsoptiken und Baugruppen in den Bereichen
Photonik und Imaging. Mit Kunden aus aller Welt in den Bereichen F&E, Elektronik,
Halbleiter, Pharmazie und Biotechnologie werden EO Produkte in einer Vielzahl
von Anwendungen eingesetzt: von biomolekularer Analyse über Sensorik bis hin
zur Automatisierungstechnik. Fertigung nach dem aktuellsten Stand der Technik
ergänzt durch ein weltweites Distributionsnetzwerk und einen aufwendigen
Produktkatalog machen Edmund Optics zum weltweit größten Lieferanten von
optischen Komponenten.
Optical
Measurement
OMS Services
Measurement
Services
opsira luca’rayset ray data
The more accurate the measurement the more reliable
the result: In our metrology laboratories we measure the
optical characteristics of products and components. The
measurements, such as the optical properties and characteristics of materials and light sources, are used directly
into our process to ensure high quality simulations and
products resulting from those simulations. Our metrology
services not only provide development input but also ensure that products meet their performance requirements.
Optical
Engineering
OES Services
Engineering
Services
ring light guides developed by opsira
opsira develops optical systems for industries as diverse
as medical technology, automobiles, sensors, household
appliances and other consumer goods. The demands and
challenges placed on us by our customers are manifold,
but there is one thing they can rely on: the experience of
our engineers who have designed optical systems for
more than ten years now – reliable know-how within an
innovative and enhancing market! Our optical engineering
is strongly based on our customers’ requirements, which
means to create highest quality as well as to save time
and costs. Therefore our simulation models are based on
our in-house measurements of light sources, materials
and surfaces. The optical behavior of these virtual prototypes largely corresponds with the optical behavior of
the real product. Result: a faster and more sophisticated
way for new products of seeing the light of day.
Optical
Test
OTS Systems
Measurement
Systems
The design of opsira’s optical measuring systems is strongly
based on our customer’s requirements. Our measurement
systems are distinguished by graphical interfaces with easyto-use functionality, portability, low-prices, and customizable
software.
Data acquisition and compliance protocols in the required
standards format are produced automatically with the final
inspection or can be archived for later use. Our software,
written at our facilities, is designed to allow us to react
quickly and flexibly to changes and redirections of the latest
standards.
Latest product: opsira robo-goniometer
Robot-based multi-functional far field light measurement
goniometer
opsira’s multi-functional robot-goniometer system and its
various detectors enable the measurement of angle-resolved photometric parameters of light sources or luminaires.
The robo-goniometer can detect illuminance, luminous intensity and luminance, as well as their intensity distribution
in the near- and far-field.
opsira’s multi-functional robot-goniometer
opsira GmbH
Leibnizstr. 20
D-88250 Weingarten/Germany
Tel. +49 751 561 890
Fax +49 751 561 899
www.opsira.de
Enabling Innovative
Optical Solutions
Optics Balzers has been the preferred partner for
innovative optical solutions for more than 60 years.
As a global leader, Optics Balzers focuses on hightech markets such as Biophotonics, Fluorescence Microscopy,
Lighting & Projection, Sensors & Imaging, Space & Defence,
and Industrial Applications. The company possesses comprehensive know-how in optical thin-film coatings and components, glass
processing, patterning, and sealing technologies.
Optics Balzers AG
Balzers/Liechtenstein
Optics Balzers Jena GmbH
Jena/Germany
www.opticsbalzers.com
How do you make a
lithography system that
goes to the limit of what
is physically possible?
At ASML we bring together the most creative minds in science and
technology to develop lithography machines that are key to producing
cheaper, faster, more energy-efficient microchips.
Per employee we’re Europe’s largest private investor in R&D, giving
you the freedom to experiment and a culture that will let you get
things done.
Join ASML’s multidisciplinary teams and help us push the
boundaries of what’s possible.
www.asml.com/careers
For students who think ahead
DISTRIBUTOR OF
HIGH PERFORMANCE FILTERS &
INNOVATIVE THIN FILM SOLUTIONS
PRECISION CUSTOM OPTICAL FILTERS & COATINGS
EXTENSIVE PRODUCT RANGE: UV– LWIR
METALIZED SOLDERABLE COATINGS
FILTER ARRAYS & PATTERNED FILMS
ENGINEERED THIN FILM SERVICES
THIN FILM HYBRID CIRCUITS
LINEAR VARIABLE FILTERS
RUGATE NOTCH FILTERS
SOLUTIONS
DELIVERED
Within the HOYA GROUP, HOYA CANDEO OPTRONICS is responsible for
manufacturing and selling optical, electronic and industrial materials
that meet specific uses. It provides a variety of high-tech special glass
products to worldwide clients with diverse needs.
We are providing our products with attractive price by producing in
China with Japan quality level. Also, we are able to make our products
with special specification which customer specified (include coating
such as UV/IR, and AR).
www.kantner-praezisionsoptik.de
DISTRIBUTOR OF
• PRECISION GLASS MOLDED ASPHERES
• PRECISION MOLDED PLASTIC
• PRECISION MACHINED OPTICS
• OPTICAL ASSEMBLIES
• INFRARED OPTICS
• DIAMOND TURNING
• OPTICAL DESIGN
www.kantner-praezisionsoptik.de
How do you reposition
thousands of mirrors, to dozens
of microradian accuracy,
hundreds of times a second?
Join ASML as a Computer Scientist to find out.
We bring together the most creative minds to develop lithography machines that are key to
producing cheaper, faster, more energy-efficient microchips. Our machines image billions
of sub-microscopic structures in mere seconds. And to reach the required accuracy of
a few silicon atoms, the photo light source has to be software-controlled using
the latest computerized techniques. To take that feat even further, we need
talented technologists.
If you have a PhD or Master’s degree in mathematics or computer
science and enjoy working in a multi-platform environment,
then you’ll find a job at ASML highly rewarding.
www.asml.com/careers
For students who think ahead
Corporate Members of the DGaO
back page: Eindhovens Dagblad
113th Annual Meeting of the DGaO 2012