Applied Mechanics and Materials ISSN: 1662-7482, Vols. 138-139, pp 612-617 doi:10.4028/www.scientific.net/AMM.138-139.612 © 2012 Trans Tech Publications, Switzerland Online: 2011-11-16 Preparation and Characteristic Measurement of Born Doped Diamond Film Electrode on Tantalum Substrate and Its Properties for Degradation of High COD Wastewater Chengyao GAO1, a 1 Chinese Peoples Armed Police Forces Academy, Langfang,Hebei, P. R. China a [email protected] Keywords:Diamond film; Electrode material; Electrochemical characterization; Wastewater treatment Abstract.The boron-doped diamond film electrode grown on tantalum substrate (BDD/Ta) was prepared by hot filament chemical vapor deposition (HFCVD) technique. The morphology and quality of BDD/Ta film electrode were investigated by SEM and Raman spectroscopy respectively. The electrochemical behavior of the BDD/Ta film electrodes in Na2SO4 solution was also investigated by cyclic voltammetry and the window potential of BDD/Ta film electrode in Na2SO4 solution is of 4.1V, the hydrogen and oxygen evolution potentials are of -1.8V and +2.3V respectively. The characteristic measurements of BDD/Ta film electrode and its application to degradation of high concentration organic wastewater indicated that BDD/Ta film electrode have a series of advantages, including high overpotential for oxygen revolution, high current efficiency, good removal of chemical oxygen demand (COD). Introduction Recent researches have demonstrated that electrochemistry offers an attractive alternative to traditional methods for treating wastewaters containing organic compounds[1, 2]. It is well known that the anodes material is the most important of the anodic oxidation process. The pollutants oxidation efficiency depends highly on the material and properties of the anodes[3]. In this frame, several anode materials have been tested, but some of them presented a rapid loss of activity due to surface fouling (glassy carbon) others released toxic ions (PbO2)[4] and others showed a limited service life (SnO2)[5]. Synthetic boron-doped diamond (BDD) thin film coating on a p-silicon substrate has been paid great attention recently[6, 7]. The wide potential window and the high anodic stability of the BDD film permit its applications in electroanalysis and preparation of powerful oxidant. The electrochemical behavior of diamond electrodes has been also studied with the goal of developing application in the electrochemical oxidation of organic pollutants for wastewater treatment and for electrosynthesis. However,it is impossible to wide application of the BDD film electrodes grown on Si to treat wastewater because of the poor mechanical strength and low conductivity of Si[8]. BDD film electrode grown on Ta has good conductivity, high mechanical strength, and electrochemical inertness. In this paper, boron-doped diamond film grown on tantalum substrate (BDD/Ta) film electrode was synthesized and characterized; the electrochemical properties of BDD/Ta film electrode were investigated. The high removal ratios of COD, high efficiency, high chemical stability were obtained in electrochemistrydegradation by using BDD/Ta film electrode. Experimental Electrode Preparation. Boron-doped diamond films were grown on Ta substrates in term of HFCVD technique. The experimental apparatus is schematically shown in Fig.1. Ta substrates (0.5 mm thick, 30 cm2 in area) were pretreated by solvent washing in acetone. After rinsing with ultrapure All rights reserved. No part of contents of this paper may be reproduced or transmitted in any form or by any means without the written permission of Trans Tech Publications, www.ttp.net. (ID: 130.203.136.75, Pennsylvania State University, University Park, USA-12/05/16,17:43:07) Applied Mechanics and Materials Vols. 138-139 613 water and drying, the substrates were sonicated in diamond powder/acetone slurry for 30 min. Acetone was placed in the container filled with water and ice compounds to keep temperature permanent. Tantalum substrates were scratched by diamond powder with a diameter of 0.5µm for the goal of easy nucleation and then cleaned by using ultrasonic method. Filament temperature measurement is carried out by infrared thermometer. The specific craft parameters can be seen at reference[9] . reacter 1.mixture of ice and water 2.acetone 3.thermal couple 4.Ta substrate copper pipe Ta filament mass flow controller 3 4 Mo hydrogen mass flow controller 2 1 vacuum pump Fig. 1 Schematic diagram of HFCVD apparatus electrode power supplier + - pump organic warter Fig. 2 Scheme of the equipment used for degradation of wastewater with ultra high COD Physicochemical Characterization. Scan electron microscope (SEM) and Raman spectroscopy were employed to investigate the morphology and quality of the BDD/Ta film. Electrochemical measurements were obtained using a conventional three electrodes cell in conjunction with a computer-controlled potentiostat/galvanostat. BDD/Ta film was used as the working electrode, commercial saturated calomel electrode (SCE) as a reference electrode, and stainless steel as a counter electrode. Voltammetry experiments were performed in unstirred solutions. The electrode was anodically polarized for 5 min with a 1 M H2SO4 solution at 10 ampere prior to experiment. The cyclic voltammetry (CV) curves of the BDD/Ta film electrode in the solution of 0.5M Na2SO4 were recorded. Furthermore, the CV curves at BDD/Ta film electrode at different scan rates in 0.1M KCl solutions containing 0.01M [K3Fe(CN)6]/[K4Fe(CN)6] were recorded to test the reversibility of it. The scan rates were set as : 62.5,125,250,500,1000mV/s. All solutions were prepared using reagent grade chemicals in doubly distilled water. The solutions were purged by vacuum treatment prior to the electrochemical measurements. The degradation of organic wastewater with ultra-high COD (>130000mg/L) was performed in a one-compartment electrolytic flow cell (see Fig.2). BDD/Ta film was used as anode and titanium as cathode with an interelectrode gap of 5 mm, the 614 Applied Mechanics and Mechanical Engineering II geometric area of each rectangular 30 cm2. The wastewater electrolyte was stored in a 1000mL thermoregulated glass tank and circulated through the electrolytic cell by means of a centrifugal pump(see Fig.2). The flow rate of the electrolyte in the cell was 160 dm3 /h. COD was determined by the dichromate method. The instantaneous current efficiency (ICE) was calculated according to Eq.1: ICE = FV COD t -COD t +∆t 8I ∆t (1) Where CODt and CODt+∆t are the COD values at times ” t” and” t+∆t” (g O2 dm-3) respectively, I :the applied current (A), F : the Faraday constant (96 487 C mol-1) , V : the volume of electrolyte (dm3), and coefficient 8: the oxygen equivalent mass (g equiv.- 1). Results and Discussion Morphological Characterization. In Fig. 3, SEM image of BDD/Ta film shows that the granularity of diamond particles is about 3-7µm and the oriented growth direction is along (111). Fig. 4 shows the Raman spectrum of BDD/Ta film electrode, in which the first broad peak (A) at 1334 cm-1 is corresponds to sp3 diamond and the peak (B) at about 1560 cm-1 is assigned to the sp2impurities. When comparing the both peak intensities of both sp3(diamond) and sp2(non-diamond) carbon, it is necessary to consider that Raman signal of non-diamond carbon is 50 times more sensitive than that of the diamond one . Fig. 3 SEM image of a polycrystalline BDD electrode grown on Ta by HFVCD method A 6000 Counts 5000 4000 B 3000 2000 1000 1000 1200 1400 1600 Wavenumber /cm 1800 2000 -1 Fig. 4 Raman spectrum of BDD film grown on Ta by HFVCD Electrochemical Characterization.Background cyclic voltammetric I-E curves are useful for examining the diamond film quality, because the electrochemical response is highly sensitive to physicochemical properties of the surface. The magnitude of the background current, the working potential window and the voltammetric features within the working potential window are all sensitive Applied Mechanics and Materials Vols. 138-139 615 to the presence of non-diamond, including amorphous, graphitic and carbon impurities. Fig. 5 shows CV curve at the BDD/Ta film electrode in the solution of 0.5M Na2SO4 at scan rate of 100mV/s over the potential range of −3.0 to 3.0V. There is no evidence for surface redox processes. Therefore, the film appears to be ideally polarizable in this potential region. A low and featureless background current is observed .The BDD/Ta film electrode is electrochemically stable and there no significant decomposition of water occur over a wide potential range. In Na2SO4 solution, the overpotential ranges from +2.3V for oxygen evolution to - 1.8V for hydrogen generation (vs. SCE). Since oxygen evolution is the main secondary reaction on the anode, the higher onset potential for oxygen evolution indicates the electrodes will have higher CE for organic pollutant oxidation. The CV curves of BDD/Ta film electrode at different scan rates in 0.1M KCl solutions containing 0.01M [K3Fe(CN)6]/[K4Fe(CN)6] redox-couple are shown in Fig. 6, in which the symmetrical anodic and cathodic peaks associated with the oxidation and reduction of the ferricyanide–ferrocyanide couple at the diamond–solution interface. The anodic peak potential shifts positively with the rising of the scan rate, while the peak current increases. The ratios of anodic/cathodic peak currents approach 1, which indicates that both ferrocyanide and ferricyanide are stable in solution and the process is a quasi-reversible one. The linear relationship between anodic peak current Ip and the square root of scan rate v1/2,as shown in Fig. 7, indicates a diffusion-controlled process at the electrode. 0.08 0.06 Current /A 0.04 0.02 0.00 -0.02 -0.04 -0.06 -0.08 -3 -2 -1 0 1 2 3 Potential/ V Fig. 5 Background cyclic voltammetric I-E curve for BDD/Ta film electrode in 0.5 M Na2SO4. 0.003 1000 (a) 0.002 500 250 Current /A 0.001 125 62.5 0.000 62.5 125 -0.001 (b) 250 500 -0.002 1000 -0.003 -0.004 1.5 1.0 0.5 0.0 -0.5 -1.0 -1.5 Potential /V Fig. 6 Cyclic voltammetric I-E curve curves for BDD/Ta film electrode in 0.1M KCl + 0.01M K3Fe(CN)6/K4Fe(CN)6 at different scan rates 616 Applied Mechanics and Mechanical Engineering II -3 3.5x10 -3 3.0x10 -3 Current /A 2.5x10 -3 2.0x10 -3 1.5x10 -3 1.0x10 -4 5.0x10 0.2 0.3 0.4 0.5 0.6 1/2 0.7 1/2 V / V s 0.8 0.9 1.0 1.1 -1/2 Fig. 7 Plots of peak currents versus square roots of scan rates in Fig.6 COD Remove of Organic Water. As shown in Fig.8, the high remove ratio of COD and high current efficiency were obtained by using BDD/Ta film electrode. As it can be observed, the almost complete removal of the COD in the organic water was obtained, no refractory compounds were found as product at the end of the electrochemical treatment. At the beginning of electrolysis when the COD is relatively high(>10000mg/L), the COD decreased linearly with time and the current efficiency was almost 100% because the oxidation was under limiting current control and all the electrogenerated hydroxyl radicals were consumed in the oxidation of the organics. Only when the COD is below 10000mg/L, the COD decreased exponentially and the current efficiency was lower than 100% because the process was under mass-transfer control and the secondary reaction of oxygen evolution occurred. 140000 100 ICE /% 120000 COD/ mg/L 100000 80 60 40 80000 20 00 2 4 6 8 10 12 14 16 18 20 22 60000 Time /h 40000 20000 0 0 2 4 6 8 10 12 14 16 18 20 22 Electrolysis Time /h Fig. 8 Degradation curve of wastewater with ultra high COD on BDD/Ta film electrode.ICE curve was inserted Conclusions Diamond films could be successfully deposited on Ta substrates by HFCVD. Physicochemical and electrochemical examinations demonstrated that the BDD/Ta films had compact microstructure, low background current, high overpotential for oxygen evolution. The electrocatalytic activity of the electrodes was found to be superior in oxidizing high concentration organic pollutants, including the high remove ratio of COD, high current efficiency and high chemical stability. Applied Mechanics and Materials Vols. 138-139 617 Acknowledgement Wewould like to express our thanks to Prof. M.Chang at Tianjin University of technology for his assistance anddiscussion on HFCVD experiments. This work was supported by National Natural Science Founda-tion of China (no. 50972105) and National high-tech research and development 863projects(no. 2009AA03Z444). References [1] A. M. S. Solano, J. H. B. Rocha, N. S. Fernandes, D. R. Da Silva, and C. A. Martinez-Huitle, Oxidation Communications, Vol. 34(2011), p. 218 [2] S. Zodi, O. Potier, F. Lapicque, and J. P. Leclerc, Desalination, vol. 261(2010), p. 186 [3] L. Szpyrkowicz, S. N. Kaul, R. N. Neti, and S. Satyanarayan, Water Research, vol. 39(2005),p. 1601 [4] C. Tan, B. Xiang, Y. J. Li, J. W. Fang, and M. Huang, Chemical Engineering Journal, vol. 166( 2011), p. 15 [5] C. R. Costa, F. Montilla, E. Morallon, and P. Olivi, Journal of Hazardous Materials, vol. 180(2010), p. 429 [6] J. Y. Choi, Y. J. Lee, J. Shin, and J. W. Yang, Journal of Hazardous Materials, vol. 179 (2010), p. 762 [7] C. Y. Zhang, J. L. Wang, H. F. Zhou, D. G. Fu, and Z. Z. Gu, Chemical Engineering Journal, vol. 161(2010), p. 93 [8] V. Santos, J. Diogo, M. J. A. Pacheco, L. Ciriaco, A. Morao, and A. Lopes, Chemosphere, vol. 79(2010), p. 637 [9] M. Chang, C. Y. Gao, and J. Y. Jiang, Journal of the Electrochemical Society, vol. 156 (2009), p. E50 Applied Mechanics and Mechanical Engineering II 10.4028/www.scientific.net/AMM.138-139 Preparation and Characteristic Measurement of Born Doped Diamond Film Electrode on Tantalum Substrate and its Properties for Degradation of High COD Wastewater 10.4028/www.scientific.net/AMM.138-139.612
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