Dip-in Laser Lithografie (DiLL)
PI 2012/14
2012-09-19
Innovative technique for the fabrication
of tall nano- and microstructures
Press Department
Anke Werner
Fon (+49) 721 60 82 88 49
Fax (+49) 721 60 82 88 48
E-Mail [email protected]
With the development of Dip-in Laser Lithography (DiLL) the
German company Nanoscribe has started a new chapter in
nano- and microfabrication of true three-dimensional (3D)
structures. The patent-pending DiLL technique enables the
production of 3D micro-parts far taller than the working
distance of the objective lens.
Company: Nanoscribe (Germany)
Product: Upgrade for Nanoscribe´s 3D laser lithography
system Photonic Professional for the fabrication of high 3D
structures
(> 100 µm) with optimal homogeneity and high resolution.
Features: With the novel DiLL technique 3D micro-parts can
be manufactured up to the millimeter range while retaining a
constant feature size along the entire fabrication height.
In combination with Nanoscribe´s dedicated IP-L photoresists
the high numerical aperture of the DiLL objective allows
highest resolution and quality. Intensity compensation or
other kinds of compensation along the optical axis are no
longer necessary. The desired structures can be easily
imported via CAD data from common DXF files as well as
stereo lithography files (STL).
The wide scope of applications ranges from 3D scaffolds for
cell biology to rapid prototyping of workpieces on the nanoand microscale.
Burj Khalifa, with 828 meters the tallest building all
over the world, fabricated on microscale
(1:1.000.000) using Nanoscribe’s Photonic
Professional lithography system.
More information: www.nanoscribe.de
.
CONTACT
Nanoscribe GmbH
Hermann-von-Helmholtz-Platz 1
76344 Eggenstein-Leopoldshafen
Germany
E-Mail
Web
[email protected]
www.nanoscribe.de
Fon
Fax
+49 721 60 82 88 49
+49 721 60 82 88 48
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